DE102013110177A1 - Verfahren zur Herstellung von Eisen-dotiertem Kieselglas - Google Patents
Verfahren zur Herstellung von Eisen-dotiertem Kieselglas Download PDFInfo
- Publication number
- DE102013110177A1 DE102013110177A1 DE102013110177.1A DE102013110177A DE102013110177A1 DE 102013110177 A1 DE102013110177 A1 DE 102013110177A1 DE 102013110177 A DE102013110177 A DE 102013110177A DE 102013110177 A1 DE102013110177 A1 DE 102013110177A1
- Authority
- DE
- Germany
- Prior art keywords
- iron
- soot body
- blank
- mbar
- doped
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000000034 method Methods 0.000 title claims abstract description 55
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 31
- 230000008569 process Effects 0.000 title claims abstract description 14
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 147
- 239000004071 soot Substances 0.000 claims abstract description 44
- 229910052742 iron Inorganic materials 0.000 claims abstract description 36
- 239000011521 glass Substances 0.000 claims abstract description 27
- 230000003647 oxidation Effects 0.000 claims abstract description 24
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 24
- 230000001603 reducing effect Effects 0.000 claims abstract description 21
- 229910004298 SiO 2 Inorganic materials 0.000 claims abstract description 17
- 238000001035 drying Methods 0.000 claims abstract description 17
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 15
- 239000007858 starting material Substances 0.000 claims abstract description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 10
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 10
- 239000010703 silicon Substances 0.000 claims abstract description 9
- 230000007062 hydrolysis Effects 0.000 claims abstract description 8
- 238000006460 hydrolysis reaction Methods 0.000 claims abstract description 8
- 239000001257 hydrogen Substances 0.000 claims description 24
- 229910052739 hydrogen Inorganic materials 0.000 claims description 24
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 22
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 claims description 16
- 229910002091 carbon monoxide Inorganic materials 0.000 claims description 16
- 230000003595 spectral effect Effects 0.000 claims description 15
- 238000004017 vitrification Methods 0.000 claims description 14
- HMMGMWAXVFQUOA-UHFFFAOYSA-N octamethylcyclotetrasiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O[Si](C)(C)O1 HMMGMWAXVFQUOA-UHFFFAOYSA-N 0.000 claims description 9
- KTWOOEGAPBSYNW-UHFFFAOYSA-N ferrocene Chemical compound [Fe+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 KTWOOEGAPBSYNW-UHFFFAOYSA-N 0.000 claims description 5
- 239000001307 helium Substances 0.000 claims description 4
- 229910052734 helium Inorganic materials 0.000 claims description 4
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 claims description 4
- 238000005496 tempering Methods 0.000 claims description 4
- 230000003750 conditioning effect Effects 0.000 claims description 2
- 150000002894 organic compounds Chemical class 0.000 claims description 2
- 239000000377 silicon dioxide Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 11
- 239000002019 doping agent Substances 0.000 abstract description 6
- 239000000126 substance Substances 0.000 abstract description 5
- 150000002500 ions Chemical class 0.000 description 13
- 230000005540 biological transmission Effects 0.000 description 9
- 230000009467 reduction Effects 0.000 description 8
- 238000010521 absorption reaction Methods 0.000 description 6
- 229910052782 aluminium Inorganic materials 0.000 description 5
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 229910002804 graphite Inorganic materials 0.000 description 4
- 239000010439 graphite Substances 0.000 description 4
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- 208000005156 Dehydration Diseases 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 230000018044 dehydration Effects 0.000 description 3
- 238000006297 dehydration reaction Methods 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 229910052736 halogen Inorganic materials 0.000 description 3
- 150000002367 halogens Chemical class 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- 238000000137 annealing Methods 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 150000002431 hydrogen Chemical class 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- -1 iron-substituted silanes Chemical class 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000005368 silicate glass Substances 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- BUHVIAUBTBOHAG-FOYDDCNASA-N (2r,3r,4s,5r)-2-[6-[[2-(3,5-dimethoxyphenyl)-2-(2-methylphenyl)ethyl]amino]purin-9-yl]-5-(hydroxymethyl)oxolane-3,4-diol Chemical compound COC1=CC(OC)=CC(C(CNC=2C=3N=CN(C=3N=CN=2)[C@H]2[C@@H]([C@H](O)[C@@H](CO)O2)O)C=2C(=CC=CC=2)C)=C1 BUHVIAUBTBOHAG-FOYDDCNASA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 206010013786 Dry skin Diseases 0.000 description 1
- PMVSDNDAUGGCCE-TYYBGVCCSA-L Ferrous fumarate Chemical compound [Fe+2].[O-]C(=O)\C=C\C([O-])=O PMVSDNDAUGGCCE-TYYBGVCCSA-L 0.000 description 1
- 241000083869 Polyommatus dorylas Species 0.000 description 1
- 229910003902 SiCl 4 Inorganic materials 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000000265 homogenisation Methods 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 150000002505 iron Chemical class 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910052756 noble gas Inorganic materials 0.000 description 1
- 150000002835 noble gases Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000013386 optimize process Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000010981 turquoise Substances 0.000 description 1
- YXZRCLVVNRLPTP-UHFFFAOYSA-J turquoise blue Chemical compound [Na+].[Na+].[Na+].[Na+].[Cu+2].NC1=NC(Cl)=NC(NC=2C=C(NS(=O)(=O)C3=CC=4C(=C5NC=4NC=4[N-]C(=C6C=CC(=CC6=4)S([O-])(=O)=O)NC=4NC(=C6C=C(C=CC6=4)S([O-])(=O)=O)NC=4[N-]C(=C6C=CC(=CC6=4)S([O-])(=O)=O)N5)C=C3)C(=CC=2)S([O-])(=O)=O)=N1 YXZRCLVVNRLPTP-UHFFFAOYSA-J 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B25/00—Annealing glass products
- C03B25/02—Annealing glass products in a discontinuous way
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01413—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01446—Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/07—Impurity concentration specified
- C03B2201/075—Hydroxyl ion (OH)
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Dispersion Chemistry (AREA)
- Glass Compositions (AREA)
- Glass Melting And Manufacturing (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102013110177.1A DE102013110177A1 (de) | 2013-09-16 | 2013-09-16 | Verfahren zur Herstellung von Eisen-dotiertem Kieselglas |
| PCT/EP2014/069408 WO2015036493A1 (de) | 2013-09-16 | 2014-09-11 | Verfahren zur herstellung von eisen-dotiertem kieselglas |
| JP2016543364A JP6351727B2 (ja) | 2013-09-16 | 2014-09-11 | 鉄ドープシリカガラスの製造方法 |
| CN201480050733.4A CN105517965B (zh) | 2013-09-16 | 2014-09-11 | 制造铁掺杂的石英玻璃的方法 |
| US14/916,608 US9593034B2 (en) | 2013-09-16 | 2014-09-11 | Method for producing iron-doped silica glass |
| EP14761888.8A EP3046882B1 (de) | 2013-09-16 | 2014-09-11 | Verfahren zur herstellung von eisen-dotiertem kieselglas |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102013110177.1A DE102013110177A1 (de) | 2013-09-16 | 2013-09-16 | Verfahren zur Herstellung von Eisen-dotiertem Kieselglas |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE102013110177A1 true DE102013110177A1 (de) | 2015-03-19 |
Family
ID=51518790
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102013110177.1A Withdrawn DE102013110177A1 (de) | 2013-09-16 | 2013-09-16 | Verfahren zur Herstellung von Eisen-dotiertem Kieselglas |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US9593034B2 (https=) |
| EP (1) | EP3046882B1 (https=) |
| JP (1) | JP6351727B2 (https=) |
| CN (1) | CN105517965B (https=) |
| DE (1) | DE102013110177A1 (https=) |
| WO (1) | WO2015036493A1 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108517417A (zh) * | 2018-04-09 | 2018-09-11 | 昆山佳鹿石英有限公司 | 汞提纯精馏装置及利用该装置提纯汞的方法 |
| CN110183106B (zh) * | 2019-06-03 | 2020-05-26 | 广西仙玻节能玻璃有限公司 | 一种吸热节能玻璃及其制备方法 |
| US10858282B1 (en) * | 2019-06-07 | 2020-12-08 | Qualcomm Incorporated | Doped, low-temperature co-fired glass-ceramic (LTCC) insulating substrates, and related wiring boards and methods of manufacture |
| CN111238461B (zh) * | 2020-03-09 | 2022-05-06 | 中国建筑材料科学研究总院有限公司 | 一种谐振子及其制备方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4419118A (en) | 1980-12-23 | 1983-12-06 | Toshiba Ceramics Co., Ltd. | Quartz glass and a process for making same |
| US6619073B2 (en) * | 1996-03-05 | 2003-09-16 | Corning Incorporated | Method of increasing the initial transmittance of optical glass |
| US20040114903A1 (en) * | 2002-11-27 | 2004-06-17 | Masamitsu Yamaguchi | Optical fiber for attenuating optical signal |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2904713A (en) * | 1952-07-15 | 1959-09-15 | Heraeus Schott Quarzschmelze | Casings for gas discharge tubes and lamps and process |
| DE1667044C3 (de) | 1967-04-13 | 1981-01-29 | Bayer Ag, 5090 Leverkusen | Verfahren zur Herstellung feinteiliger Oxide aus Halogeniden |
| AU569757B2 (en) * | 1983-10-19 | 1988-02-18 | Nippon Telegraph & Telephone Corporation | Optical fibre preform manufacture |
| US5221309A (en) * | 1984-05-15 | 1993-06-22 | Sumitomo Electric Industries, Ltd. | Method for producing glass preform for optical fiber |
| US4789389A (en) * | 1987-05-20 | 1988-12-06 | Corning Glass Works | Method for producing ultra-high purity, optical quality, glass articles |
| JPH0196036A (ja) * | 1987-10-07 | 1989-04-14 | Seiko Epson Corp | ドープト石英ガラスの製造方法 |
| US5259856A (en) * | 1989-09-06 | 1993-11-09 | Sumitomo Electric Industrial, Ltd. | Method of producing glass preform in furnace for heating glass |
| US5043002A (en) * | 1990-08-16 | 1991-08-27 | Corning Incorporated | Method of making fused silica by decomposing siloxanes |
| US5326729A (en) * | 1992-02-07 | 1994-07-05 | Asahi Glass Company Ltd. | Transparent quartz glass and process for its production |
| US6136736A (en) * | 1993-06-01 | 2000-10-24 | General Electric Company | Doped silica glass |
| US5631522A (en) * | 1995-05-09 | 1997-05-20 | General Electric Company | Low sodium permeability glass |
| JP2955463B2 (ja) * | 1994-02-02 | 1999-10-04 | 信越石英株式会社 | 紫外線吸収性が良く、かつ可視光透過性の高いシリカガラスおよびその製造方法 |
| EP1471038A3 (de) * | 2003-04-26 | 2005-11-23 | Schott Ag | Verfahren zur Herstellung von Glaskörpern aus dotiertem Quarzglas |
| JP4442900B2 (ja) * | 2005-05-26 | 2010-03-31 | Ａｇｃテクノグラス株式会社 | 硬質赤外線カットガラス |
| DE102007017004A1 (de) * | 2007-02-27 | 2008-08-28 | Heraeus Quarzglas Gmbh & Co. Kg | Optisches Bauteil aus synthetischem Quarzglas mit erhöhter Strahlenbeständigkeit, sowie Verfahren zur Herstellung des Bauteils |
| WO2012021317A1 (en) * | 2010-08-12 | 2012-02-16 | Corning Incorporated | Treatment of silica based soot or an article made of silica based soot |
-
2013
- 2013-09-16 DE DE102013110177.1A patent/DE102013110177A1/de not_active Withdrawn
-
2014
- 2014-09-11 US US14/916,608 patent/US9593034B2/en active Active
- 2014-09-11 EP EP14761888.8A patent/EP3046882B1/de active Active
- 2014-09-11 JP JP2016543364A patent/JP6351727B2/ja active Active
- 2014-09-11 WO PCT/EP2014/069408 patent/WO2015036493A1/de not_active Ceased
- 2014-09-11 CN CN201480050733.4A patent/CN105517965B/zh active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4419118A (en) | 1980-12-23 | 1983-12-06 | Toshiba Ceramics Co., Ltd. | Quartz glass and a process for making same |
| US4500642A (en) | 1980-12-23 | 1985-02-19 | Toshiba Ceramics Co., Ltd. | Infrared absorbing quartz glass with iron and aluminum |
| US6619073B2 (en) * | 1996-03-05 | 2003-09-16 | Corning Incorporated | Method of increasing the initial transmittance of optical glass |
| US20040114903A1 (en) * | 2002-11-27 | 2004-06-17 | Masamitsu Yamaguchi | Optical fiber for attenuating optical signal |
Also Published As
| Publication number | Publication date |
|---|---|
| EP3046882A1 (de) | 2016-07-27 |
| JP2016534020A (ja) | 2016-11-04 |
| US20160200620A1 (en) | 2016-07-14 |
| CN105517965B (zh) | 2018-01-05 |
| US9593034B2 (en) | 2017-03-14 |
| JP6351727B2 (ja) | 2018-07-04 |
| WO2015036493A1 (de) | 2015-03-19 |
| CN105517965A (zh) | 2016-04-20 |
| EP3046882B1 (de) | 2018-04-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE102013101687B3 (de) | Optisches Bauteil aus Quarzglas zur Verwendung in der ArF-Excimerlaser-Lithographie sowie Verfahren zur Herstellung des Bauteils | |
| EP3033306B1 (de) | Verfahren zur herstellung von titan-dotiertem kieselglas für den einsatz in der euv-lithographie | |
| Huang et al. | Controllable fabrication of novel all solid-state PbS quantum dot-doped glass fibers with tunable broadband near-infrared emission | |
| DE19524545B4 (de) | Herstellungsverfahren für Gegenstände aus synthetischem Kieselsäureglas | |
| EP1982963B1 (de) | Verfahren zur Herstellung eines optischen Bauteils aus synthetischem Quarzglas mit erhöhter Strahlenbeständigkeit, sowie Rohling zur Herstellung des Bauteils | |
| EP3000791B1 (de) | Verfahren zur Herstellung eines Rohlings aus Fluor- und Titan-dotiertem, hochkieselsäurehaltigem Glas für den Einsatz in der EUV-Lithographie und danach hergestellter Rohling | |
| EP2976303B1 (de) | Verfahren zur fluorierung von dotiertem quarzglas | |
| DE102007017004A1 (de) | Optisches Bauteil aus synthetischem Quarzglas mit erhöhter Strahlenbeständigkeit, sowie Verfahren zur Herstellung des Bauteils | |
| DE102011120412B4 (de) | Excimerlampe mit Emissionsfenster aus Quarzglas mit einem bestimmten Gehalt an Hydroxylgruppen, Wasserstoff und Chlor | |
| DE102008033945A1 (de) | Verfahren zur Herstellung von mit Stickstoff dotiertem Quarzglas sowie zur Durchführung des Verfahrens geeignete Quarzglaskörnung | |
| EP3046882B1 (de) | Verfahren zur herstellung von eisen-dotiertem kieselglas | |
| DE3228008A1 (de) | Herstellung gesinterter glaeser mit hohem siliciumoxidanteil | |
| DE102005017739A1 (de) | Halter aus Quarzglas für die Prozessierung von Halbleiterwafern und Verfahren zur Herstellung des Halters | |
| EP1586544B1 (de) | Optisches Bauteil aus Quarzglas, Verfahren zur Herstellung des Bauteils und Verwendung desselben | |
| DE102006043738A1 (de) | Bauteil aus Quarzglas zum Einsatz bei der Halbleiterfertigung und Verfahren zur Herstellung desselben | |
| EP1712528A2 (de) | Optisches Bauteil aus Quarzglas, Verfahren zur Herstellung de Bauteils und Verwendung desselben | |
| WO2003022766A1 (de) | Germaniumoxid-haltige bismutoxidgläser | |
| DE2364803C3 (de) | Verfahren zur Herstellung eines Schmelzoxidglases mit wenigstens einem der Oxide P↓2↓O↓5↓, GeO↓2↓, TeO↓2↓, Sb↓2↓O↓3↓ durch Flammhydrolyse | |
| DE102010009589B4 (de) | Verfahren zur Herstellung eines Rohlings aus Titan-dotiertem, hochkieselsäurehaltigem Glas für ein Spiegelsubstrat für den Einsatz in der EUV-Lithographie | |
| DE19918001C2 (de) | Hitzbeständiges, synthetisches Quarzglas und Herstellungsverfahren dafür | |
| EP1327613B1 (de) | Quarzglasrohling für ein optisches Bauteil und Verwendung desselben | |
| EP0999190A2 (de) | Kernglas für eine Vorform für eine optische Faser, unter Verwendung des Kernglases hergestellte Vorform, sowie Verfahren zur Herstellung des Kernglases und einer optischen Faser | |
| CN106977095B (zh) | 一种无水氧卤碲酸盐玻璃及其制备方法 | |
| DE102008033946B3 (de) | Quarzglastiegel mit einer Stickstoffdotierung und Verfahren zur Herstellung eines derartigen Tiegels | |
| DE102017112996A1 (de) | Phosphatglas mit verbesserter Klimabeständigkeit |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R012 | Request for examination validly filed | ||
| R016 | Response to examination communication | ||
| R119 | Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee |