DE102012224005B4 - Verfahren zur Herstellung einer homogenen Lichtverteilung - Google Patents
Verfahren zur Herstellung einer homogenen Lichtverteilung Download PDFInfo
- Publication number
- DE102012224005B4 DE102012224005B4 DE102012224005.5A DE102012224005A DE102012224005B4 DE 102012224005 B4 DE102012224005 B4 DE 102012224005B4 DE 102012224005 A DE102012224005 A DE 102012224005A DE 102012224005 B4 DE102012224005 B4 DE 102012224005B4
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- 238000009826 distribution Methods 0.000 title claims abstract description 14
- 238000000034 method Methods 0.000 title claims description 39
- 238000000265 homogenisation Methods 0.000 claims abstract description 8
- 238000004519 manufacturing process Methods 0.000 claims abstract description 5
- 230000003287 optical effect Effects 0.000 claims abstract description 4
- 230000002123 temporal effect Effects 0.000 claims abstract description 3
- 239000007788 liquid Substances 0.000 claims description 11
- 238000005286 illumination Methods 0.000 claims description 6
- 230000001419 dependent effect Effects 0.000 claims 1
- 230000000694 effects Effects 0.000 description 6
- 239000007787 solid Substances 0.000 description 3
- 230000005855 radiation Effects 0.000 description 2
- 230000004913 activation Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000010408 sweeping Methods 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
- B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
- B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
- B29C64/135—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask the energy source being concentrated, e.g. scanning lasers or focused light sources
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/20—Apparatus for additive manufacturing; Details thereof or accessories therefor
- B29C64/264—Arrangements for irradiation
- B29C64/277—Arrangements for irradiation using multiple radiation means, e.g. micromirrors or multiple light-emitting diodes [LED]
- B29C64/282—Arrangements for irradiation using multiple radiation means, e.g. micromirrors or multiple light-emitting diodes [LED] of the same type, e.g. using different energy levels
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/20—Apparatus for additive manufacturing; Details thereof or accessories therefor
- B29C64/264—Arrangements for irradiation
- B29C64/286—Optical filters, e.g. masks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/30—Auxiliary operations or equipment
- B29C64/386—Data acquisition or data processing for additive manufacturing
- B29C64/393—Data acquisition or data processing for additive manufacturing for controlling or regulating additive manufacturing processes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70416—2.5D lithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
- B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
- B29C64/00—Additive manufacturing, i.e. manufacturing of three-dimensional [3D] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3D printing, stereolithography or selective laser sintering
- B29C64/10—Processes of additive manufacturing
- B29C64/106—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material
- B29C64/124—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified
- B29C64/129—Processes of additive manufacturing using only liquids or viscous materials, e.g. depositing a continuous bead of viscous material using layers of liquid which are selectively solidified characterised by the energy source therefor, e.g. by global irradiation combined with a mask
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y10/00—Processes of additive manufacturing
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Optics & Photonics (AREA)
- Manufacturing & Machinery (AREA)
- Mechanical Engineering (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Projection Apparatus (AREA)
- Micromachines (AREA)
- Transforming Electric Information Into Light Information (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (10)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102012224005.5A DE102012224005B4 (de) | 2012-12-20 | 2012-12-20 | Verfahren zur Herstellung einer homogenen Lichtverteilung |
| US14/654,184 US9914265B2 (en) | 2012-12-20 | 2013-12-17 | Method for producing a homogeneous light distribution |
| AU2013361779A AU2013361779B2 (en) | 2012-12-20 | 2013-12-17 | Method for producing a homogeneous light distribution |
| CN201380067167.3A CN104853902A (zh) | 2012-12-20 | 2013-12-17 | 用于产生均匀的光分布的方法 |
| JP2015548447A JP6436912B2 (ja) | 2012-12-20 | 2013-12-17 | 均一な光分布を形成する方法 |
| PCT/EP2013/076902 WO2014095864A1 (de) | 2012-12-20 | 2013-12-17 | Verfahren zur herstellung einer homogenen lichtverteilung |
| KR1020157014504A KR101860617B1 (ko) | 2012-12-20 | 2013-12-17 | 균일한 광 분포 생성 방법 |
| BR112015012368A BR112015012368A2 (pt) | 2012-12-20 | 2013-12-17 | processos para produção de uma distribuição de luz homogênea |
| CA2888844A CA2888844A1 (en) | 2012-12-20 | 2013-12-17 | Method for producing a homogeneous light distribution |
| EP13814504.0A EP2934858B1 (de) | 2012-12-20 | 2013-12-17 | Verfahren zur herstellung einer homogenen lichtverteilung |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102012224005.5A DE102012224005B4 (de) | 2012-12-20 | 2012-12-20 | Verfahren zur Herstellung einer homogenen Lichtverteilung |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE102012224005A1 DE102012224005A1 (de) | 2014-06-26 |
| DE102012224005B4 true DE102012224005B4 (de) | 2015-07-23 |
Family
ID=49885232
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE102012224005.5A Active DE102012224005B4 (de) | 2012-12-20 | 2012-12-20 | Verfahren zur Herstellung einer homogenen Lichtverteilung |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US9914265B2 (cg-RX-API-DMAC7.html) |
| EP (1) | EP2934858B1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP6436912B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR101860617B1 (cg-RX-API-DMAC7.html) |
| CN (1) | CN104853902A (cg-RX-API-DMAC7.html) |
| AU (1) | AU2013361779B2 (cg-RX-API-DMAC7.html) |
| BR (1) | BR112015012368A2 (cg-RX-API-DMAC7.html) |
| CA (1) | CA2888844A1 (cg-RX-API-DMAC7.html) |
| DE (1) | DE102012224005B4 (cg-RX-API-DMAC7.html) |
| WO (1) | WO2014095864A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| PT3040778T (pt) * | 2014-12-30 | 2020-12-23 | Visitech As | Método para fornecer brilho uniforme a partir de um projetor de luz sobre uma área de imagem |
| DE102015104394B4 (de) | 2015-03-24 | 2020-06-04 | Kulzer Gmbh | Verfahren zur Herstellung einer Teil- oder Totalprothese sowie Prothese erhältlich nach diesem Verfahren |
| US10180248B2 (en) | 2015-09-02 | 2019-01-15 | ProPhotonix Limited | LED lamp with sensing capabilities |
| FR3041560B1 (fr) * | 2015-09-29 | 2017-10-20 | Prodways | Procede de fabrication d'un produit par empilement de couche de matiere |
| CN108698883A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 石英玻璃制备中的二氧化硅的喷雾造粒 |
| US11339076B2 (en) | 2015-12-18 | 2022-05-24 | Heraeus Quarzglas Gmbh & Co. Kg | Preparation of carbon-doped silicon dioxide granulate as an intermediate in the preparation of quartz glass |
| JP6881777B2 (ja) | 2015-12-18 | 2021-06-02 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 合成石英ガラス粒の調製 |
| KR20180094087A (ko) | 2015-12-18 | 2018-08-22 | 헤래우스 크바르츠글라스 게엠베하 & 컴파니 케이지 | 실리카 과립으로부터 실리카 유리 제품의 제조 |
| EP3390296B1 (de) | 2015-12-18 | 2024-09-04 | Heraeus Quarzglas GmbH & Co. KG | Herstellung eines quarzglaskörpers in einem mehrkammerofen |
| TWI812586B (zh) | 2015-12-18 | 2023-08-21 | 德商何瑞斯廓格拉斯公司 | 石英玻璃體、其製備方法與應用、及用於控制烘箱出口處之露點 |
| US10676388B2 (en) | 2015-12-18 | 2020-06-09 | Heraeus Quarzglas Gmbh & Co. Kg | Glass fibers and pre-forms made of homogeneous quartz glass |
| JP6881776B2 (ja) | 2015-12-18 | 2021-06-02 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 不透明石英ガラス体の調製 |
| CN108698890A (zh) | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 利用在熔融烘箱中的露点监测制备石英玻璃体 |
| JP6984897B2 (ja) | 2015-12-18 | 2021-12-22 | ヘレウス クワルツグラス ゲーエムベーハー ウント コンパニー カーゲー | 石英ガラス調製時のケイ素含有量の増大 |
| JP6523194B2 (ja) * | 2016-03-14 | 2019-05-29 | 東京エレクトロン株式会社 | 補助露光装置 |
| CN106182772B (zh) * | 2016-07-25 | 2018-06-26 | 哈尔滨工业大学 | 多种材料快速原型成型装置及方法 |
| CN115464159B (zh) * | 2017-05-11 | 2024-07-16 | 速尔特技术有限公司 | 用于增材制造的图案化光的开关站射束路由 |
| WO2018235209A1 (en) * | 2017-06-21 | 2018-12-27 | Essilor International | Method of manufacturing optical article and optical shaping apparatus |
| CN107891596A (zh) * | 2017-12-15 | 2018-04-10 | 博纳云智(天津)科技有限公司 | 一种dlp光固化3d打印机的光强均匀校正方法 |
| CN110394980A (zh) * | 2018-04-24 | 2019-11-01 | 三纬国际立体列印科技股份有限公司 | 立体打印系统 |
| US10503076B1 (en) * | 2018-08-29 | 2019-12-10 | Applied Materials, Inc. | Reserving spatial light modulator sections to address field non-uniformities |
| NO20190617A1 (en) * | 2019-05-16 | 2020-11-17 | Visitech As | System and method for exposing a material with images |
| FR3119562B1 (fr) * | 2021-02-09 | 2024-08-30 | Univ Claude Bernard Lyon | Procédé d'impression d'un objet à imprimer, et imprimante adaptée pour la mise en oeuvre du procédé. |
| KR102443272B1 (ko) * | 2021-07-20 | 2022-09-15 | 단국대학교 산학협력단 | 특정 경로를 따른 중복 광조사를 이용하는 3d 프린터 및 3d 프린팅 방법 |
| CN118596582B (zh) * | 2024-06-24 | 2025-04-08 | 广州黑格智造信息科技有限公司 | 三维打印设备的光调制器控制方法及三维打印设备 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5620814A (en) * | 1993-10-15 | 1997-04-15 | Leica Lithographie Systeme Jena Gmbh | Process and arrangement for producing dose profiles for the fabrication of structured surfaces |
| US20020008091A1 (en) * | 2000-05-25 | 2002-01-24 | Brandinger Jay J. | Laser beam shaping device and apparatus for material machining |
| US20060119743A1 (en) * | 2004-12-07 | 2006-06-08 | Chosen Technologies, Inc. | Systems and methods for laser material manipulation |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3326902B2 (ja) * | 1993-09-10 | 2002-09-24 | 株式会社日立製作所 | パターン検出方法及びパターン検出装置及びそれを用いた投影露光装置 |
| JPH10163300A (ja) * | 1996-12-02 | 1998-06-19 | Nikon Corp | ステージ装置 |
| JP2001255664A (ja) | 2000-03-14 | 2001-09-21 | Fuji Photo Film Co Ltd | 画像露光方法 |
| JP2004157219A (ja) * | 2002-11-05 | 2004-06-03 | Fuji Photo Film Co Ltd | 露光ヘッドおよび露光装置 |
| ES2385984T3 (es) * | 2004-05-05 | 2012-08-06 | Sign-Tronic Ag | Método para habilitar la transmisión de cantidades de energía prácticamente idénticas |
| EP1894705B1 (de) | 2004-05-10 | 2010-08-25 | Envisiontec GmbH | Verfahren und Vorrichtung zur Herstellung eines dreidimensionalen Objekts mit Auflösungsverbesserung mittels Pixel-Shift |
| DE102004022961B4 (de) * | 2004-05-10 | 2008-11-20 | Envisiontec Gmbh | Verfahren zur Herstellung eines dreidimensionalen Objekts mit Auflösungsverbesserung mittels Pixel-Shift |
| JP2006319098A (ja) * | 2005-05-12 | 2006-11-24 | Pentax Industrial Instruments Co Ltd | 描画装置 |
| CN101176042B (zh) * | 2005-05-13 | 2010-04-07 | Nxp股份有限公司 | 空间光调制器装置、光刻设备、显示装置、产生具有空间光图案的光束的方法以及制造器件的方法 |
| JP4679249B2 (ja) * | 2005-05-31 | 2011-04-27 | 大日本スクリーン製造株式会社 | パターン描画装置 |
| JP2007017897A (ja) * | 2005-07-11 | 2007-01-25 | Fujifilm Holdings Corp | 露光装置及び洗浄方法 |
| DE102006019963B4 (de) * | 2006-04-28 | 2023-12-07 | Envisiontec Gmbh | Vorrichtung und Verfahren zur Herstellung eines dreidimensionalen Objekts durch schichtweises Verfestigen eines unter Einwirkung von elektromagnetischer Strahlung verfestigbaren Materials mittels Maskenbelichtung |
| JP5280615B2 (ja) * | 2006-06-16 | 2013-09-04 | シーメット株式会社 | 光学的立体造形用樹脂組成物 |
| EP1880830B1 (en) | 2006-07-19 | 2011-12-21 | Envisiontec GmbH | Method and device for producing a three-dimensional object, and computer and data carrier useful thereof |
| DE102008040742A1 (de) * | 2007-08-02 | 2009-02-05 | Carl Zeiss Smt Ag | Verfahren und Vorrichtung zur Überwachung von Mehrfachspiegelanordnungen, optische Anordnung mit einer derartigen Vorrichtung sowie mit einer zweiten Mehrfachspiegelanordnung zum Ein- und Ausschalten einer ersten Mehrfachspiegelanordnung sowie Beleuchtungsoptik für eine Projektionsbelichtungsanlage mit einer derartigen Vorrichtung |
| WO2010043275A1 (en) * | 2008-10-17 | 2010-04-22 | Huntsman Advanced Materials (Switzerland) Gmbh | Improvements for rapid prototyping apparatus |
-
2012
- 2012-12-20 DE DE102012224005.5A patent/DE102012224005B4/de active Active
-
2013
- 2013-12-17 AU AU2013361779A patent/AU2013361779B2/en active Active
- 2013-12-17 WO PCT/EP2013/076902 patent/WO2014095864A1/de not_active Ceased
- 2013-12-17 JP JP2015548447A patent/JP6436912B2/ja active Active
- 2013-12-17 EP EP13814504.0A patent/EP2934858B1/de active Active
- 2013-12-17 CA CA2888844A patent/CA2888844A1/en not_active Abandoned
- 2013-12-17 US US14/654,184 patent/US9914265B2/en active Active
- 2013-12-17 CN CN201380067167.3A patent/CN104853902A/zh active Pending
- 2013-12-17 BR BR112015012368A patent/BR112015012368A2/pt not_active IP Right Cessation
- 2013-12-17 KR KR1020157014504A patent/KR101860617B1/ko active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5620814A (en) * | 1993-10-15 | 1997-04-15 | Leica Lithographie Systeme Jena Gmbh | Process and arrangement for producing dose profiles for the fabrication of structured surfaces |
| US20020008091A1 (en) * | 2000-05-25 | 2002-01-24 | Brandinger Jay J. | Laser beam shaping device and apparatus for material machining |
| US20060119743A1 (en) * | 2004-12-07 | 2006-06-08 | Chosen Technologies, Inc. | Systems and methods for laser material manipulation |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2934858B1 (de) | 2023-02-08 |
| US20150328834A1 (en) | 2015-11-19 |
| JP6436912B2 (ja) | 2018-12-12 |
| US9914265B2 (en) | 2018-03-13 |
| WO2014095864A9 (de) | 2014-08-14 |
| CN104853902A (zh) | 2015-08-19 |
| JP2016508232A (ja) | 2016-03-17 |
| AU2013361779A1 (en) | 2015-06-04 |
| AU2013361779B2 (en) | 2017-01-19 |
| BR112015012368A2 (pt) | 2017-07-11 |
| WO2014095864A1 (de) | 2014-06-26 |
| KR101860617B1 (ko) | 2018-05-23 |
| CA2888844A1 (en) | 2014-06-26 |
| EP2934858A1 (de) | 2015-10-28 |
| DE102012224005A1 (de) | 2014-06-26 |
| KR20150096386A (ko) | 2015-08-24 |
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