DE102012204399B8 - Materialprüfungsverfahren und Anordnung zur Materialprüfung - Google Patents

Materialprüfungsverfahren und Anordnung zur Materialprüfung Download PDF

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Publication number
DE102012204399B8
DE102012204399B8 DE201210204399 DE102012204399A DE102012204399B8 DE 102012204399 B8 DE102012204399 B8 DE 102012204399B8 DE 201210204399 DE201210204399 DE 201210204399 DE 102012204399 A DE102012204399 A DE 102012204399A DE 102012204399 B8 DE102012204399 B8 DE 102012204399B8
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Germany
Prior art keywords
material testing
arrangement
testing method
testing
Prior art date
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Active
Application number
DE201210204399
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English (en)
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DE102012204399A1 (de
DE102012204399A8 (de
DE102012204399B4 (de
Inventor
Gert Nolze
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bruker Nano GmbH
Original Assignee
Bruker Nano GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Bruker Nano GmbH filed Critical Bruker Nano GmbH
Priority to DE201210204399 priority Critical patent/DE102012204399B8/de
Publication of DE102012204399A1 publication Critical patent/DE102012204399A1/de
Publication of DE102012204399A8 publication Critical patent/DE102012204399A8/de
Publication of DE102012204399B4 publication Critical patent/DE102012204399B4/de
Application granted granted Critical
Publication of DE102012204399B8 publication Critical patent/DE102012204399B8/de
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Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20058Measuring diffraction of electrons, e.g. low energy electron diffraction [LEED] method or reflection high energy electron diffraction [RHEED] method
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/05Investigating materials by wave or particle radiation by diffraction, scatter or reflection
    • G01N2223/053Investigating materials by wave or particle radiation by diffraction, scatter or reflection back scatter
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/40Imaging
    • G01N2223/418Imaging electron microscope
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00Investigating materials by wave or particle radiation
    • G01N2223/60Specific applications or type of materials
    • G01N2223/605Specific applications or type of materials phases
DE201210204399 2012-03-20 2012-03-20 Materialprüfungsverfahren und Anordnung zur Materialprüfung Active DE102012204399B8 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE201210204399 DE102012204399B8 (de) 2012-03-20 2012-03-20 Materialprüfungsverfahren und Anordnung zur Materialprüfung

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE201210204399 DE102012204399B8 (de) 2012-03-20 2012-03-20 Materialprüfungsverfahren und Anordnung zur Materialprüfung

Publications (4)

Publication Number Publication Date
DE102012204399A1 DE102012204399A1 (de) 2013-09-26
DE102012204399A8 DE102012204399A8 (de) 2013-12-12
DE102012204399B4 DE102012204399B4 (de) 2014-08-28
DE102012204399B8 true DE102012204399B8 (de) 2014-11-27

Family

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DE201210204399 Active DE102012204399B8 (de) 2012-03-20 2012-03-20 Materialprüfungsverfahren und Anordnung zur Materialprüfung

Country Status (1)

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DE (1) DE102012204399B8 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107894433B (zh) * 2017-10-10 2021-02-19 首钢集团有限公司 一种定量表征复相材料主相组织晶粒尺寸的方法
US11114275B2 (en) * 2019-07-02 2021-09-07 Fei Company Methods and systems for acquiring electron backscatter diffraction patterns

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6835931B2 (en) * 2002-05-15 2004-12-28 Edax Inc. Chemical prefiltering for phase differentiation via simultaneous energy dispersive spectrometry and electron backscatter diffraction
GB0810406D0 (en) * 2008-06-06 2008-07-09 Kanthal Ltd Electrical resistance heating elements
DE102008041815A1 (de) * 2008-09-04 2010-04-15 Carl Zeiss Nts Gmbh Verfahren zur Analyse einer Probe
WO2011146084A1 (en) * 2010-05-20 2011-11-24 California Institute Of Technology Method and system for 4d tomography and ultrafast scanning electron microscopy
KR101720533B1 (ko) * 2010-08-31 2017-04-03 삼성디스플레이 주식회사 다결정 실리콘층의 제조 방법, 상기 다결정 실리콘층 제조 방법을 포함하는 박막 트랜지스터의 제조 방법, 상기 방법에 의해 제조된 박막 트랜지스터, 및 상기 박막 트랜지스터를 포함하는 유기 발광 디스플레이 장치

Also Published As

Publication number Publication date
DE102012204399A1 (de) 2013-09-26
DE102012204399A8 (de) 2013-12-12
DE102012204399B4 (de) 2014-08-28

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