DE102012204399A8 - Materialprüfungsverfahren und Anordnung zur Materialprüfung sowie ein entsprechendes Computerprogramm und ein entsprechendes computerlesbares Speichermedium - Google Patents

Materialprüfungsverfahren und Anordnung zur Materialprüfung sowie ein entsprechendes Computerprogramm und ein entsprechendes computerlesbares Speichermedium Download PDF

Info

Publication number
DE102012204399A8
DE102012204399A8 DE102012204399A DE102012204399A DE102012204399A8 DE 102012204399 A8 DE102012204399 A8 DE 102012204399A8 DE 102012204399 A DE102012204399 A DE 102012204399A DE 102012204399 A DE102012204399 A DE 102012204399A DE 102012204399 A8 DE102012204399 A8 DE 102012204399A8
Authority
DE
Germany
Prior art keywords
corresponding computer
material testing
arrangement
storage medium
readable storage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE102012204399A
Other languages
English (en)
Other versions
DE102012204399B4 (de
DE102012204399B8 (de
DE102012204399A1 (de
Inventor
Gerd Nolze
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bruker Nano GmbH
Original Assignee
Bruker Nano GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bruker Nano GmbH filed Critical Bruker Nano GmbH
Priority to DE201210204399 priority Critical patent/DE102012204399B8/de
Publication of DE102012204399A1 publication Critical patent/DE102012204399A1/de
Publication of DE102012204399A8 publication Critical patent/DE102012204399A8/de
Publication of DE102012204399B4 publication Critical patent/DE102012204399B4/de
Application granted granted Critical
Publication of DE102012204399B8 publication Critical patent/DE102012204399B8/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/20058—Measuring diffraction of electrons, e.g. low energy electron diffraction [LEED] method or reflection high energy electron diffraction [RHEED] method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/05—Investigating materials by wave or particle radiation by diffraction, scatter or reflection
    • G01N2223/053—Investigating materials by wave or particle radiation by diffraction, scatter or reflection back scatter
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/40—Imaging
    • G01N2223/418—Imaging electron microscope
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/60—Specific applications or type of materials
    • G01N2223/605—Specific applications or type of materials phases

Landscapes

  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
DE201210204399 2012-03-20 2012-03-20 Materialprüfungsverfahren und Anordnung zur Materialprüfung Active DE102012204399B8 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE201210204399 DE102012204399B8 (de) 2012-03-20 2012-03-20 Materialprüfungsverfahren und Anordnung zur Materialprüfung

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE201210204399 DE102012204399B8 (de) 2012-03-20 2012-03-20 Materialprüfungsverfahren und Anordnung zur Materialprüfung

Publications (4)

Publication Number Publication Date
DE102012204399A1 DE102012204399A1 (de) 2013-09-26
DE102012204399A8 true DE102012204399A8 (de) 2013-12-12
DE102012204399B4 DE102012204399B4 (de) 2014-08-28
DE102012204399B8 DE102012204399B8 (de) 2014-11-27

Family

ID=49112160

Family Applications (1)

Application Number Title Priority Date Filing Date
DE201210204399 Active DE102012204399B8 (de) 2012-03-20 2012-03-20 Materialprüfungsverfahren und Anordnung zur Materialprüfung

Country Status (1)

Country Link
DE (1) DE102012204399B8 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107894433B (zh) * 2017-10-10 2021-02-19 首钢集团有限公司 一种定量表征复相材料主相组织晶粒尺寸的方法
US11114275B2 (en) * 2019-07-02 2021-09-07 Fei Company Methods and systems for acquiring electron backscatter diffraction patterns

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10354017A1 (de) * 2003-05-15 2004-12-02 Edax Inc. Chemische Vorfilterung für die Phasenunterscheidung mittels simultaner Energiedispersionsspektrometrie und Elektronenrückstreuungsbeugung
DE102008041815A1 (de) * 2008-09-04 2010-04-15 Carl Zeiss Nts Gmbh Verfahren zur Analyse einer Probe
US20110089161A1 (en) * 2008-06-06 2011-04-21 Sandvik Materials Technology Uk Limited Electrical Resistance Heating Element
US20110284744A1 (en) * 2010-05-20 2011-11-24 California Institute Of Technology Method and system for 4d tomography and ultrafast scanning electron microscopy
US20120049199A1 (en) * 2010-08-31 2012-03-01 Chung Yun-Mo Method of forming polycrystalline silicon layer, method of manufacturing thin film transistor including the method, thin-film transistor manufactured by using the method of manufacturing thin-film transistor, and organic light-emitting display device including the thin-film transistor

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10354017A1 (de) * 2003-05-15 2004-12-02 Edax Inc. Chemische Vorfilterung für die Phasenunterscheidung mittels simultaner Energiedispersionsspektrometrie und Elektronenrückstreuungsbeugung
US20110089161A1 (en) * 2008-06-06 2011-04-21 Sandvik Materials Technology Uk Limited Electrical Resistance Heating Element
DE102008041815A1 (de) * 2008-09-04 2010-04-15 Carl Zeiss Nts Gmbh Verfahren zur Analyse einer Probe
US20110284744A1 (en) * 2010-05-20 2011-11-24 California Institute Of Technology Method and system for 4d tomography and ultrafast scanning electron microscopy
US20120049199A1 (en) * 2010-08-31 2012-03-01 Chung Yun-Mo Method of forming polycrystalline silicon layer, method of manufacturing thin film transistor including the method, thin-film transistor manufactured by using the method of manufacturing thin-film transistor, and organic light-emitting display device including the thin-film transistor

Also Published As

Publication number Publication date
DE102012204399B4 (de) 2014-08-28
DE102012204399B8 (de) 2014-11-27
DE102012204399A1 (de) 2013-09-26

Similar Documents

Publication Publication Date Title
EP2884888A4 (de) Verfahren zur modellierung von verhaltens- und gesundheitsveränderungen
BR112013029958A2 (pt) método e aparelho para manuseio de uma mudança de célula
EP2941630A4 (de) Teststreifen und verfahren zum ablesen von teststreifen
HK1182788A1 (zh) 種回歸測試方法和系統
BR112014000766A2 (pt) método para fabricação de a esteira de sensibilidade de pressão; e método para testar uma esteira de sensibilidade de pressão
DE112012000441A5 (de) Testvorrichtung und Verfahren
HK1200529A1 (zh) 用於評估測試條的狀況的系統和方法
DE112012002363T8 (de) Luftfeuchtigkeitssensor und Verfahren zu dessen Fertigung
DE112012000144A5 (de) Testvorrichtung und Verfahren
EP2902764A4 (de) Defektanalysevorrichtung, defektanalyseverfahren und programm
EP2906776A4 (de) Verfahren und vorrichtung zum testen von lost-circulation-stoffen in einer permeabilitätsabdichtungsvorrichtung
DE112011105124A5 (de) Verfahren und Anordnung zur Kurz-Kohärenz-Holografie
CO6860311A1 (es) Aparato para confeccionar ramos y método
SG11201406969SA (en) Test probe and machining method thereof
GB2500998B (en) System and Method for Automated Integrity Testing
DE102014211515A8 (de) Wiegeverfahren, Anordnung zur Durchführung des Wiegeverfahrens sowie ein entsprechendes Computerprogramm und ein entsprechendes computerlesbares Speichermedium
FI20125877A (fi) Menetelmä ja laite jouston vähentämiseksi murskaimessa
HK1186877A1 (zh) 種併發測試方法及測試服務器
ZA201405802B (en) Method for determining the concentration of an element in a material
EP2816506A4 (de) Verfahren zur zeichenerkennung zeichenerkennungsvorrichtung sowie programm mit diesem verfahren
DK2679978T3 (da) Prøvetestanordning og -fremgangsmåde
EP2775396A4 (de) Programmausführungsverfahren und -vorrichtung
SG2013068986A (en) Probe card and manufacturing method thereof
EP2816504A4 (de) Verfahren zur zeichenextraktion und zeichenerkennungsvorrichtung sowie programm unter verwendung des verfahrens
SG11201500102PA (en) Integrity testing apparatus and related methods

Legal Events

Date Code Title Description
R012 Request for examination validly filed
R016 Response to examination communication
R016 Response to examination communication
R016 Response to examination communication
R016 Response to examination communication
R018 Grant decision by examination section/examining division
R020 Patent grant now final