DE102010038747A1 - Cooling unit of a continuous treatment plant for disc-shaped substrates comprises a substrate transport device, an upper cooling system having fins with front-end air outlet nozzles, and a lower cooling system having fins - Google Patents
Cooling unit of a continuous treatment plant for disc-shaped substrates comprises a substrate transport device, an upper cooling system having fins with front-end air outlet nozzles, and a lower cooling system having fins Download PDFInfo
- Publication number
- DE102010038747A1 DE102010038747A1 DE201010038747 DE102010038747A DE102010038747A1 DE 102010038747 A1 DE102010038747 A1 DE 102010038747A1 DE 201010038747 DE201010038747 DE 201010038747 DE 102010038747 A DE102010038747 A DE 102010038747A DE 102010038747 A1 DE102010038747 A1 DE 102010038747A1
- Authority
- DE
- Germany
- Prior art keywords
- transport device
- substrate transport
- cooling system
- fins
- supply air
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/541—Heating or cooling of the substrates
Abstract
Description
Die Erfindung betrifft eine Kühleinheit einer Durchlaufbehandlungsanlage für scheibenförmige Substrate, mit einer Substrattransporteinrichtung, mit einem oberen Kühlsystem oberhalb der Substrattransporteinrichtung, das Finnen mit stirnseitigen Luftaustrittsdüsen aufweist, die von einem oberen Zuluftkanal zu der Substrattransporteinrichtung gerichtet sind, und mit einem unteren Kühlsystem unterhalb der Substrattransporteinrichtung, das Finnen mit stirnseitigen Luftaustrittsdüsen aufweist, die von einem unteren Zuluftkanal zu der Substrattransporteinrichtung gerichtet sind.The invention relates to a cooling unit of a continuous-flow processing system for disk-shaped substrates, comprising a substrate transport device having an upper cooling system above the substrate transport device, which has fins with frontal air outlet nozzles, which are directed from an upper supply air channel to the substrate transport device, and with a lower cooling system below the substrate transport device, the fin having frontal air outlet nozzles, which are directed from a lower supply air duct to the substrate transport device.
Scheibenförmige Substrate, insbesondere Glasscheiben, werden in Vakuumbehandlungsanlagen verschiedenen Prozessschritten, zur modifizierenden, additiven und substraktiven Behandlung durchgeführt, d. h. Prozessschritte, bei denen das Substrat oder auf dem Substrat vorhandene Schichten strukturell oder energetisch verändert, Material auf dem Substrat abgeschieden oder vom Substrat entfernt wird. Neben der Substratbeschichtung mit verschiedenen Schichten und Schichtsystemen sind darunter beispielsweise Plasmabehandlungen oder Sputterätzen zu verstehen. Die Behandlung erfolgt dabei in einem Durchlauf und damit in Vakuumfolge, wobei verschiedene Behandlungen nacheinander in einem Durchlauf erforderlich sein können. Die Substrate werden dabei von einer Eingangsseite zu einer Ausgangsseite bewegt und dort über eine Ausgangsschleuse ausgegeben.Disc-shaped substrates, in particular glass panes, are carried out in vacuum treatment plants in various process steps, for modifying, additive and subtractive treatment, i. H. Process steps in which the substrate or layers present on the substrate changes structurally or energetically, material is deposited on the substrate or removed from the substrate. In addition to the substrate coating with different layers and layer systems, these include, for example, plasma treatments or sputter etching. The treatment is carried out in one pass and thus in a vacuum sequence, wherein different treatments can be required in succession in a single pass. The substrates are moved from an input side to an output side and output there via an output lock.
Für einige Anwendungsfälle, beispielsweise bei der Herstellung photovoltaischer Schichten ist erforderlich, die Behandlungen am heißen Substrat, d. h. am aktiv erhitzten oder durch den Behandlungsschritt erhitzten Substrat vorzunehmen.For some applications, for example in the manufacture of photovoltaic layers, the treatments on the hot substrate, i. H. to carry out actively heated or heated by the treatment step substrate.
Am Ende der Behandlung, d. h. am Ausgang einer Durchlaufbehandlungsanlage, insbesondere nach der Ausgangsschleuse einer Durchlauf-Vakuumbehandlungsanlage, ist es erforderlich, das Substrat zu kühlen. Da es sich bei den Substraten sehr häufig um Glassubstrate handelt, ist es erforderlich, bestimmte Rahmenbedingungen einzuhalten. So ist es beispielsweise erforderlich, das Substrat schnell einer Kühlung zuzuführen, es dann aber nach Möglichkeit langsam abkühlen zu lassen. Dabei kann die Kühlung in Transportrichtung des Substrats durchaus progressiv verlaufen, d. h. am Anfang wird weniger stark gekühlt als am Ende des Kühlprozesses. Außerdem ist ein Temperaturgradient zwischen Ober- und Unterseite des Substrats zu beachten. Dabei kann es erforderlich sein, dass kein Temperaturgradient auftritt, und beide Seiten in gleichem Maße gekühlt werden sollen. In anderen Anwendungsfällen kann ein Temperaturgradient gezielt eingestellt und ausgeglichen werden. In diesem Falle führt dies zu einem unterschiedlichen Kühlen zwischen Unter- und Oberseite.At the end of treatment, d. H. at the exit of a continuous treatment plant, in particular after the outlet lock of a continuous vacuum treatment plant, it is necessary to cool the substrate. Since the substrates are very often glass substrates, it is necessary to comply with certain conditions. Thus, for example, it is necessary to quickly supply the substrate to a cooling, but then let it slowly cool down if possible. The cooling in the transport direction of the substrate can be quite progressive, d. H. At the beginning, it is cooled less than at the end of the cooling process. In addition, a temperature gradient between the top and bottom of the substrate is observed. It may be necessary that no temperature gradient occurs, and both sides should be cooled to the same extent. In other applications, a temperature gradient can be set and compensated for. In this case, this leads to a different cooling between bottom and top.
In der
Eine solche Kühleinheit ist in der
Die Aufgabe der Erfindung besteht nun darin, eine Kühleinheit einer Durchlaufbehandlungsanlage für scheibenförmige Substrate anzugeben, die unter Beachtung eines definierten Temperaturgradienten zwischen Oberseite und Unterseite des Substrates eine unterschiedliche Kühlung realisieren lässt. Darüber hinaus soll die Kühleinheit wartungsfreundlich gestaltet werden.The object of the invention is therefore to provide a cooling unit of a continuous treatment plant for disc-shaped substrates, which can realize a different cooling under consideration of a defined temperature gradient between the top and bottom of the substrate. In addition, the cooling unit should be designed to be easy to maintain.
Die Aufgabe wird durch eine Kühleinheit mit den Merkmalen des Anspruches 1 gelöst. Darin ist vorgesehen, dass sowohl das obere als auch das untere Kühlsystem in mindestens je zwei Segmente geteilt ist, deren Luftdurchsatz jeweils getrennt einstellbar sind. Somit wird es möglich, dass die Kühlung des Substrats in Transportrichtung unterschiedlich, insbesondere progressiv eingestellt werden kann, d. h. am Anfang, nämlich bei Erreichen der in Transportrichtung gesehen vorderen Segmente des oberen und unteren Kühlsystems wird weniger stark gekühlt als am Ende des Kühlprozesses, nämlich bei Erreichen der in Transportrichtung gesehen hinteren Segmente des oberen und unteren Kühlsystems.The object is achieved by a cooling unit with the features of claim 1. It is provided that both the upper and the lower cooling system is divided into at least two segments, the air flow rate are each separately adjustable. Thus, it is possible that the cooling of the substrate in the transport direction can be set differently, in particular progressively, d. H. at the beginning, namely when reaching the front seen in the transport direction front segments of the upper and lower cooling system is less cooled than at the end of the cooling process, namely when reaching the transport direction seen in the rear segments of the upper and lower cooling system.
Die Erfindung wir hier anhand einer horizontalen Durchlaufbehandlungsanlage beschrieben, bei denen das Substrat horizontal auf der Substrattransporteinrichtung aufliegt. Sie kann aber durchaus auch bei vertikalen Durchlaufbehandlungsanlagen, bei denen das Substrat im wesentlichen senkrecht steht und durch geeignete Mittel, beispielsweise durch Carrier, gehalten wird, eingesetzt werden. Dann ist sinngemäß unter ”oben” die Seite neben der Substrattransporteinrichtung zu verstehen, auf der die Substrate an der Substrattransporteinrichtung anliegen und unter ”unten” dementsprechend die substratabgewandte Seite der Substrattransporteinrichtung.The invention will be described here with reference to a horizontal continuous treatment plant in which the substrate rests horizontally on the substrate transport device. But it can also quite in vertical continuous processing plants, in which the substrate is substantially is vertical and is held by suitable means, for example by carriers, are used. Then, mutatis mutandis, "top" is to be understood as the side next to the substrate transport device on which the substrates rest against the substrate transport device and, below "below", the substrate side facing away from the substrate transport device.
In den Ansprüchen 2 bis 5 sind Merkmale günstiger Ausgestaltungen der Erfindung angegeben.In
In einer Ausgestaltung der Erfindung ist vorgesehen, dass die Segmente der Kühlsysteme aus je einem Teil des jeweiligen Zuluftkanals mit den zugehörigen Finnen bestehen, wobei die Teile der Zuluftkanäle voneinander lufttechnisch getrennt sind und je eine eigene Zuluftsteuerung aufweisen. Diese Lösung ermöglicht es die Stärke der Kühlung der einzelnen Segmente unterschiedlich einzustellen, wobei eine Rückwirkung der Einstellung eines Segmentes auf die andere Segmente minimiert oder eliminiert ist.In one embodiment of the invention, it is provided that the segments of the cooling systems each consist of a part of the respective supply air duct with the associated fins, wherein the parts of the supply air ducts are separated from each other by air technology and each have their own supply air control. This solution makes it possible to set the intensity of the cooling of the individual segments differently, with the effect of minimizing or eliminating the effect of setting one segment on the other segments.
Weiterhin ist in einer Ausführung vorgesehen, dass zumindest ein Segment des oberen Kühlsystems in einer Richtung von der Substrattransporteinrichtung weg bewegbar ist. Insbesondere kann das Segment schwenkbar ausgebildet sein. Diese Lösung wird einerseits durch die Segmentierung möglich, da damit bewegbare handhabbare Einheiten geschaffen werden. Andererseits wird es dadurch möglich, die Substrattransporteinrichtung leichter zugänglich zu machen, beispielsweise bei Wartungsarbeiten oder beim Bruch von Substraten.Furthermore, it is provided in an embodiment that at least one segment of the upper cooling system is movable in a direction away from the substrate transport device. In particular, the segment can be designed to be pivotable. On the one hand, this solution is made possible by the segmentation, since this creates movable manageable units. On the other hand, this makes it possible to make the substrate transport device more easily accessible, for example during maintenance work or when substrates are broken.
Auch die Substrattransporteinrichtung kann segmentiert werden, indem es in mindestens zwei Segmente geteilt ist, deren Transportgeschwindigkeit jeweils getrennt einstellbar sind. So wird es möglich, das Substrat schnell einer Kühlung zuzuführen, indem es beispielsweise mit dem vorderen Transportsegment schnell aus der Ausgangsschleuse entnommen wird und es dann durch das hintere Segment langsam weiter zu transportieren.The substrate transport device can also be segmented by being divided into at least two segments whose transport speeds can each be set separately. This makes it possible to quickly supply the substrate to cooling, for example, by quickly removing it from the exit lock with the front transport segment and then slowly transporting it further through the rear segment.
Die Erfindung soll nachfolgend anhand eines Ausführungsbeispieles näher erläutert werden. In den zugehörigen Zeichnungen zeigtThe invention will be explained in more detail with reference to an embodiment. In the accompanying drawings shows
Wie in
Diese weist eine Substrattransporteinrichtung
Oberhalb der Substrattransporteinrichtung
Die Finnen
Die Finnen
Wie in
Die Substrattransporteinrichtung
Wie in
BezugszeichenlisteLIST OF REFERENCE NUMBERS
- 11
- Ausgangsschleuseexit lock
- 22
- Durchlauf-VakuumbehandlungsanlageContinuous vacuum treatment plant
- 33
- Substrat, GlasscheibeSubstrate, glass pane
- 44
- Kühleinheitcooling unit
- 55
- SubstrattransporteinrichtungSubstrate shuttle
- 66
- Transportrolletransport roller
- 77
- Rahmenframe
- 88th
- oberes Kühlsystemupper cooling system
- 99
- unteres Kühlsystemlower cooling system
- 1010
- Luftdüseair nozzle
- 1111
- Finnefin
- 1212
- unterer Zuluftkanallower supply air duct
- 1313
- oberer ZuluftkanalUpper supply air duct
- 1414
- vorderes Segment des oberen Kühlsystemsfront segment of the upper cooling system
- 1515
- hinteres Segment des oberen KühlsystemsRear segment of the upper cooling system
- 1616
- Transportrichtungtransport direction
- 1717
- vorderes Segment des unteren Kühlsystemsfront segment of the lower cooling system
- 1818
- hinteres Segment des unteren KühlsystemsRear segment of the lower cooling system
- 1919
- vorderer Teil des oberen Zuluftkanalsfront part of the upper supply air duct
- 2020
- hinterer Teil des oberen Zuluftkanalsrear part of the upper supply air duct
- 2121
- vorderer Teil des unteren Zuluftkanalsfront part of the lower supply air duct
- 2222
- hinterer Teil des unteren Zuluftkanalsrear part of the lower supply air duct
- 2323
- Zuluftsteuerung des oberen ZuluftkanalsSupply air control of the upper supply air duct
- 2424
- Zuluftsteuerung des oberen ZuluftkanalsSupply air control of the upper supply air duct
- 2525
- Zuluftsteuerung des unteren ZuluftkanalsSupply air control of the lower supply air duct
- 2626
- Zuluftsteuerung des unteren ZuluftkanalsSupply air control of the lower supply air duct
- 2727
- vorderes Segment der Substrattransporteinrichtungfront segment of the substrate transport device
- 2828
- mittleres Segment der Substrattransporteinrichtungmiddle segment of the substrate transport device
- 2929
- hinteres Segment der SubstrattransporteinrichtungRear segment of the substrate transport device
- 3030
- Schwenklagerpivot bearing
- 3131
- Gestellframe
- 3232
- flexibler Kanalflexible channel
ZITATE ENTHALTEN IN DER BESCHREIBUNG QUOTES INCLUDE IN THE DESCRIPTION
Diese Liste der vom Anmelder aufgeführten Dokumente wurde automatisiert erzeugt und ist ausschließlich zur besseren Information des Lesers aufgenommen. Die Liste ist nicht Bestandteil der deutschen Patent- bzw. Gebrauchsmusteranmeldung. Das DPMA übernimmt keinerlei Haftung für etwaige Fehler oder Auslassungen.This list of the documents listed by the applicant has been generated automatically and is included solely for the better information of the reader. The list is not part of the German patent or utility model application. The DPMA assumes no liability for any errors or omissions.
Zitierte PatentliteraturCited patent literature
- DE 2942738 [0005, 0006] DE 2942738 [0005, 0006]
Claims (5)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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DE102010038747.9A DE102010038747B4 (en) | 2010-07-30 | 2010-07-30 | Cooling unit of a continuous treatment plant for disc-shaped substrates |
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Application Number | Priority Date | Filing Date | Title |
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DE102010038747.9A DE102010038747B4 (en) | 2010-07-30 | 2010-07-30 | Cooling unit of a continuous treatment plant for disc-shaped substrates |
Publications (2)
Publication Number | Publication Date |
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DE102010038747A1 true DE102010038747A1 (en) | 2012-02-02 |
DE102010038747B4 DE102010038747B4 (en) | 2016-06-16 |
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DE102010038747.9A Expired - Fee Related DE102010038747B4 (en) | 2010-07-30 | 2010-07-30 | Cooling unit of a continuous treatment plant for disc-shaped substrates |
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2942738A1 (en) | 1978-10-25 | 1980-04-30 | Ppg Industries Inc | METHOD AND DEVICE FOR BENDING GLASS PANELS |
US4518411A (en) * | 1983-09-30 | 1985-05-21 | Ppg Industries, Inc. | Shaping glass sheets to complicated shapes using special lift mold |
DE10122310A1 (en) * | 2001-05-08 | 2002-11-28 | Ardenne Anlagentech Gmbh | Vacuum deposition device used for coating flat substrates comprises a coating module with coating sections lying in the transport direction, and a transport system over which a transport chamber for the substrate is located |
DE102005001334A1 (en) * | 2005-01-11 | 2006-07-20 | Von Ardenne Anlagentechnik Gmbh | Compartment system of a longitudinal vacuum coating system |
DE102005024180A1 (en) * | 2005-05-23 | 2006-11-30 | Von Ardenne Anlagentechnik Gmbh | Transfer chamber for a vacuum coating assembly, e.g. for coating glass panes by vacuum deposition, has horizontal transport rollers in a housing with a separate roller group in a pump chamber with vacuum pumps |
-
2010
- 2010-07-30 DE DE102010038747.9A patent/DE102010038747B4/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2942738A1 (en) | 1978-10-25 | 1980-04-30 | Ppg Industries Inc | METHOD AND DEVICE FOR BENDING GLASS PANELS |
US4518411A (en) * | 1983-09-30 | 1985-05-21 | Ppg Industries, Inc. | Shaping glass sheets to complicated shapes using special lift mold |
DE10122310A1 (en) * | 2001-05-08 | 2002-11-28 | Ardenne Anlagentech Gmbh | Vacuum deposition device used for coating flat substrates comprises a coating module with coating sections lying in the transport direction, and a transport system over which a transport chamber for the substrate is located |
DE102005001334A1 (en) * | 2005-01-11 | 2006-07-20 | Von Ardenne Anlagentechnik Gmbh | Compartment system of a longitudinal vacuum coating system |
DE102005024180A1 (en) * | 2005-05-23 | 2006-11-30 | Von Ardenne Anlagentechnik Gmbh | Transfer chamber for a vacuum coating assembly, e.g. for coating glass panes by vacuum deposition, has horizontal transport rollers in a housing with a separate roller group in a pump chamber with vacuum pumps |
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DE102010038747B4 (en) | 2016-06-16 |
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