DE102005054872A1 - Vertikales Leistungshalbleiterbauelement, Halbleiterbauteil und Verfahren zu deren Herstellung - Google Patents

Vertikales Leistungshalbleiterbauelement, Halbleiterbauteil und Verfahren zu deren Herstellung Download PDF

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Publication number
DE102005054872A1
DE102005054872A1 DE102005054872A DE102005054872A DE102005054872A1 DE 102005054872 A1 DE102005054872 A1 DE 102005054872A1 DE 102005054872 A DE102005054872 A DE 102005054872A DE 102005054872 A DE102005054872 A DE 102005054872A DE 102005054872 A1 DE102005054872 A1 DE 102005054872A1
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Prior art keywords
plating
thickness
semiconductor device
control electrode
power semiconductor
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DE102005054872A
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DE102005054872B4 (de
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Ralf Otremba
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Infineon Technologies AG
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Infineon Technologies AG
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Priority to DE102005054872A priority Critical patent/DE102005054872B4/de
Priority to US11/560,158 priority patent/US7659611B2/en
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    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
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    • H01L2924/1304Transistor
    • H01L2924/1306Field-effect transistor [FET]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10Details of semiconductor or other solid state devices to be connected
    • H01L2924/11Device type
    • H01L2924/13Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304Transistor
    • H01L2924/1306Field-effect transistor [FET]
    • H01L2924/13091Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/19Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
    • H01L2924/1901Structure
    • H01L2924/1904Component type
    • H01L2924/19043Component type being a resistor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/20Parameters
    • H01L2924/207Diameter ranges
    • H01L2924/20755Diameter ranges larger or equal to 50 microns less than 60 microns

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Electroplating Methods And Accessories (AREA)

Abstract

Ein vertikales Leistungshalbleiterbauelement (1) mit einer Oberseite (3) und einer Rückseite (4) wird vorgesehen. Die Oberseite (3) weist mindestens eine erste Elektrodenkontaktfläche (8) und mindestens eine Steuerungselektrodenoberfläche (9) auf und die Rückseite (4) weist eine zweite Elektrodenkontaktfläche (7) auf. Eine erste Metallisierung (10) mit einer Dicke a ist auf der ersten Elektrodenkontaktfläche (8) angeordnet. Eine zweite Metallisierung (11) mit einer Dicke b ist auf der Steuerungselektrodenfläche (9) angeordnet. Eine dritte Metallisierung (6) mit einer Dicke c ist auf der zweiten Elektrodenkontaktfläche (7) angeordnet. Die Dicke a der ersten Metallisierung (10) ist mindestens 10-fach dicker als die Dicke b der zweiten Metallisierung (11).
DE102005054872A 2005-11-15 2005-11-15 Vertikales Leistungshalbleiterbauelement, Halbleiterbauteil und Verfahren zu deren Herstellung Expired - Fee Related DE102005054872B4 (de)

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DE102005054872A DE102005054872B4 (de) 2005-11-15 2005-11-15 Vertikales Leistungshalbleiterbauelement, Halbleiterbauteil und Verfahren zu deren Herstellung
US11/560,158 US7659611B2 (en) 2005-11-15 2006-11-15 Vertical power semiconductor component, semiconductor device and methods for the production thereof

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US10109609B2 (en) 2014-01-13 2018-10-23 Infineon Technologies Austria Ag Connection structure and electronic component
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CN111052325A (zh) * 2017-09-04 2020-04-21 三菱电机株式会社 半导体模块以及电力转换装置
CN111052325B (zh) * 2017-09-04 2024-03-08 三菱电机株式会社 半导体模块以及电力转换装置
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