DE102005054872A1 - Vertikales Leistungshalbleiterbauelement, Halbleiterbauteil und Verfahren zu deren Herstellung - Google Patents
Vertikales Leistungshalbleiterbauelement, Halbleiterbauteil und Verfahren zu deren Herstellung Download PDFInfo
- Publication number
- DE102005054872A1 DE102005054872A1 DE102005054872A DE102005054872A DE102005054872A1 DE 102005054872 A1 DE102005054872 A1 DE 102005054872A1 DE 102005054872 A DE102005054872 A DE 102005054872A DE 102005054872 A DE102005054872 A DE 102005054872A DE 102005054872 A1 DE102005054872 A1 DE 102005054872A1
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- Prior art keywords
- plating
- thickness
- semiconductor device
- control electrode
- power semiconductor
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- Granted
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- 238000007747 plating Methods 0.000 title abstract 7
- 238000009792 diffusion process Methods 0.000 title abstract 2
- 239000004065 semiconductor Substances 0.000 title abstract 2
- 229910000679 solder Inorganic materials 0.000 title abstract 2
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
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- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
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- H01L2924/1306—Field-effect transistor [FET]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1306—Field-effect transistor [FET]
- H01L2924/13091—Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/181—Encapsulation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/1904—Component type
- H01L2924/19043—Component type being a resistor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/20—Parameters
- H01L2924/207—Diameter ranges
- H01L2924/20755—Diameter ranges larger or equal to 50 microns less than 60 microns
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electrodes Of Semiconductors (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Ein vertikales Leistungshalbleiterbauelement (1) mit einer Oberseite (3) und einer Rückseite (4) wird vorgesehen. Die Oberseite (3) weist mindestens eine erste Elektrodenkontaktfläche (8) und mindestens eine Steuerungselektrodenoberfläche (9) auf und die Rückseite (4) weist eine zweite Elektrodenkontaktfläche (7) auf. Eine erste Metallisierung (10) mit einer Dicke a ist auf der ersten Elektrodenkontaktfläche (8) angeordnet. Eine zweite Metallisierung (11) mit einer Dicke b ist auf der Steuerungselektrodenfläche (9) angeordnet. Eine dritte Metallisierung (6) mit einer Dicke c ist auf der zweiten Elektrodenkontaktfläche (7) angeordnet. Die Dicke a der ersten Metallisierung (10) ist mindestens 10-fach dicker als die Dicke b der zweiten Metallisierung (11).
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
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DE102005054872A DE102005054872B4 (de) | 2005-11-15 | 2005-11-15 | Vertikales Leistungshalbleiterbauelement, Halbleiterbauteil und Verfahren zu deren Herstellung |
US11/560,158 US7659611B2 (en) | 2005-11-15 | 2006-11-15 | Vertical power semiconductor component, semiconductor device and methods for the production thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102005054872A DE102005054872B4 (de) | 2005-11-15 | 2005-11-15 | Vertikales Leistungshalbleiterbauelement, Halbleiterbauteil und Verfahren zu deren Herstellung |
Publications (2)
Publication Number | Publication Date |
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DE102005054872A1 true DE102005054872A1 (de) | 2007-05-16 |
DE102005054872B4 DE102005054872B4 (de) | 2012-04-19 |
Family
ID=37982750
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DE102005054872A Expired - Fee Related DE102005054872B4 (de) | 2005-11-15 | 2005-11-15 | Vertikales Leistungshalbleiterbauelement, Halbleiterbauteil und Verfahren zu deren Herstellung |
Country Status (2)
Country | Link |
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US (1) | US7659611B2 (de) |
DE (1) | DE102005054872B4 (de) |
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DE102019108443A1 (de) * | 2019-04-01 | 2020-10-01 | Infineon Technologies Ag | Leistungshalbleitermodul und Verfahren zur Herstellung eines Leistungshalbleitermoduls |
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DE102019132230B4 (de) | 2019-11-28 | 2024-01-25 | Infineon Technologies Ag | Verfahren zur Herstellung einer Halbleitervorrichtung |
Also Published As
Publication number | Publication date |
---|---|
DE102005054872B4 (de) | 2012-04-19 |
US7659611B2 (en) | 2010-02-09 |
US20070145582A1 (en) | 2007-06-28 |
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