DD224448A1 - Device for photolithographic structural transmission - Google Patents

Device for photolithographic structural transmission Download PDF

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Publication number
DD224448A1
DD224448A1 DD26046084A DD26046084A DD224448A1 DD 224448 A1 DD224448 A1 DD 224448A1 DD 26046084 A DD26046084 A DD 26046084A DD 26046084 A DD26046084 A DD 26046084A DD 224448 A1 DD224448 A1 DD 224448A1
Authority
DD
German Democratic Republic
Prior art keywords
photosensitive layer
immersion liquid
projection lens
optically transparent
chamber
Prior art date
Application number
DD26046084A
Other languages
German (de)
Inventor
Rainer Hesse
Wolfgang Gaertner
Karl-Heinz Kuch
Original Assignee
Zeiss Jena Veb Carl
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Jena Veb Carl filed Critical Zeiss Jena Veb Carl
Priority to DD26046084A priority Critical patent/DD224448A1/en
Publication of DD224448A1 publication Critical patent/DD224448A1/en

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70341Immersion

Abstract

A device for photolithographic structural transmission by means of a projection objective is described. It is applicable to the production of semiconductor structures in a photosensitive layer of a semiconductor wafer according to the planar technology. The object of the invention is to increase the accuracy with high productivity of structural transmission. The object is to provide a device that avoids turbulence when using an immersion liquid and holds possible impurities outside the Schaerfiefiefebereiches of the test lens. The invention consists in that two chambers filled with immersion liquid are provided, one of which is assigned to the projection objective and the second to the substrate. Maximum dissolution is achieved if immersion liquid is also introduced between the optically transparent media closing off the chambers. Fig. 1

Description

Title of the invention

Device for photolithographic structure transfer

Field of application of the invention

The invention relates to a device for photolithographic structure transfer by means of a projection objective for producing an exposure pattern in a photosensitive layer of a substrate. It is particularly applicable to the production of a microstructure in a photosensitive layer of a semiconductor wafer for the production of semiconductor structures according to the planar technology.

Characteristics of the known technical solutions In the published European patent application E? No. 0 023 231 describes a method and a device for copying a pattern onto a semiconductor wafer which uses a liquid whose refractive index corresponds to that of the lacquer coating of the semiconductor plate between a projection objective and a semiconductor plate. The liquid is constantly exchanged and tempered and / or filtered. This device is intended to allow an enlargement of the numerical aperture without increasing the angle of incidence. This principle, which is also known from microscopy (compare Brockhaus, "ABC der Optik" Brockhaus Verlag Leipzig, 19, pp. 565 ff.), Is applicable in the field of micromachining.

4486

_ A 11 · - · -if. C I ~ *, P »/. Λ O Λ

lithography with disadvantages. A disadvantage is that turbulences are generated in the liquid whose volume is significant in the described method , between projection lens and semiconductor wafer in the production of large scale integrated circuits due to the necessary movement of the wafer located on a coordinate table. Therefore, you will end up with errors in today's productivity reasons high traversing speeds. in structure transfer, or to extend the time regime for each exposure step, the turbulence settling time, which in turn means sacrificing productivity.

Another disadvantage is the handling of the substrate to be exposed under Cleanrοom conditions. In the method according to the above-mentioned patent application, after each complete exposure of a semiconductor wafer, it must be brought out of the liquid and separated from the liquid. At first there is the danger that, for example, dust or other undesirable substances occupy the surface of the substrate. Furthermore, the surface of the substrate, for example, in preparation for a control step as a result of the numerous stages, ditches, elevations, etc. can be rid of the liquid only with great effort. Another disadvantage is the use of an open-topped container containing the liquid. The resulting large liquid surface thus offers opportunities for contamination of the liquid, which can be eliminated only after passing through a filter.

Object of the invention

The aim of the invention is to provide a highly productive and highly accurate device for photolithographic structure transfer.

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Explanation of the essence of the invention

The invention has for its object to develop a device for photolithographic structure transfer by means of a projection lens, in which a small volume immersion liquid is used, so that no disturbing turbulence appear in appearance and which is constructed so that possible impurities are outside the depth of field of the projection lens and so do not cause structuring errors. The substrate to be exposed should be so manageable that the photosensitive layer of the substrate is in no way impaired.

According to the invention the object is achieved in that in a device for photolithographic structure transfer by means of a projection lens for generating an exposure pattern in a photosensitive layer of a parallel to the image plane gradually moving and interchangeable substrate, wherein in the optical path between the photosensitive layer and this facing interface of the production lens an immersion liquid of approximately the same refractive index as the photosensitive layer is used, in the optical beam path between the projection lens and the photosensitive layer of the substrate two separate, sealed against the atmosphere, relatively movable and filled with immersion liquid chambers are provided, wherein the first chamber is fixedly connected to the projection lens, from the photosensitive layer facing the interface of the projection lens and v is bounded on an optically transparent medium, and the second chamber, which is connected to the substrate, is bounded by the photosensitive layer of the substrate and by another optically transparent medium.

4486

As optically transparent media, it is advantageous to use glass plates and / or foils.

To reduce the volume of moving immersion liquid and thus to reduce turbulence in the immersion liquid, it is advantageous if at least one chamber is connected to a device for changing the pressure of the immersion liquid and if the optically transparent medium of this chamber is movable perpendicular to the image plane is arranged.

To further increase the resolution of the projection lens and to reduce structural transmission errors can also introduce immersion liquid between the chambers bounding the optically transparent media.

embodiments

In the drawings, embodiments of the invention are shown, in which:

Pig. 1 shows an embodiment of the device according to the invention with two glass plates as the end of the chambers,

2 shows an exemplary embodiment with a glass plate movably arranged by means of a ring membrane, FIG. 3 shows an embodiment where the chamber is closed with a foil in front of the projection objective.

The device according to the invention consists of FIG. 1 of a frame-mounted projection lens 1. With the projection lens 1 is firmly connected to a chamber 2, which is completely filled with immersion liquid 3. The chamber 2 is sealed off from the atmosphere and is delimited in the optical beam path by the interface 4 of the projection lens 1 facing the photosensitive layer and by an optically transparent, plane-parallel glass plate 5. Furthermore, there is the

1Λ86

Device comprising a second chamber 6, which is connected to the substrate to be exposed, for example with a semiconductor wafer 7. This second chamber 6 is bounded, inter alia, by the photosensitive layer 8 of the semiconductor wafer 7 and by a further optically transparent, plane-parallel glass plate 9. The second chamber 6 including the glass plate 9 and the semiconductor wafer 7 are located on the table top 11 of a coordinate table, the movement of means 12 relative movement of the semiconductor wafer 7 parallel and perpendicular to the image plane 13th causes. To increase the resolution is between the two the chambers 2, 6 delimiting glass plates 5 and 9 more immersion liquid 14, the surface 15 is higher in a container 16, as the wafer facing surface 17 of the glass plate between the interface 4 of the projection lens 1 and Thus, the photosensitive layer 8 of the semiconductor wafer 7, the optical beam path only in media of approximately the same refractive power as that of the photosensitive layer, assuming that the refractive indices of Immersionsflüssigkeiten 3, 10 and 14 and the glass plates 5 and 9 approximately match. If you want to achieve a further reduction of the moving volume of Immersipnsflüssigkeit 14, that is also a reduction of the turbulence occurring therein, then you can interpret the distance between the two mutually moving chambers 2 and 6 minimal. Advantageously, glass panels 18, for example, can be used here on chamber 2, as in FIG. 2, which is arranged movably in the chamber by means of a ring membrane perpendicular to the image plane 13. The same purpose is to fulfill the film 20 in Figure 3. The chamber 2 is in these cases via a connecting piece 21 with a

4486

Device 22 for changing the pressure of the immersion liquid in conjunction. During the exposure of the photosensitive layer 8, the glass plate 18 is moved by an increased pressure in the chamber 2 in the direction of the image plane 13. During movement of the table top 11 to avoid damage to the glass plate 18 or film 20, the glass plate 18 or Polie 20 is moved away from the moving glass plate 9 by reducing the pressure of the immersion liquid 3 in chamber 2.

The device described in the exemplary embodiment can also be described without immersion liquid 14. In this case, no turbulence should be expected. The advantages of the device according to the invention are retained because the distance between the two chambers 2 and 6 can be kept to a minimum and the surfaces which are sensitive to contaminants (dust, etc.) are outside the depth of field of the projection objective 7.

Claims (4)

  1. Erfindungξanspruch
    1. A device for photolithographic structure transmission by means of a projection lens for generating an exposure pattern in a photosensitive layer of a parallel to the image plane gradually moving and interchangeable substrate, wherein in the optical beam path between the photosensitive layer and this facing interface of the projection lens an immersion liquid of approximately the same refractive power as the the photosensitive layer is used, characterized in that in the optical beam path between the projection lens and the photosensitive layer of the substrate two separate, sealed against the atmosphere, relatively movable and filled with immersion liquid chambers are provided, wherein the first chamber, with the projection lens is firmly connected, from the photosensitive layer facing the interface of the projection lens and of an optically transparent Me is limited and the second chamber, which is connected to the substrate, of the photosensitive layer of the substrate and of a v / eiteren optically transparent medium is limited.
  2. 2. Device according to item 1, characterized in that the optically transparent "media glass plates and / or films.
  3. 3. Device according to item 1 and 2, characterized in that at least one chamber is connected to a device for changing the pressure of the immersion liquid, and in that the optically transparent medium of this chamber is arranged perpendicular to the image plane movable.
  4. 4. Device according to item 1 to 3 »characterized in that between the chambers" limiting optically transparent media also Immersionsflüssigkeit is located »
    For this 3 sheets of drawings.
DD26046084A 1984-03-01 1984-03-01 Device for photolithographic structural transmission DD224448A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DD26046084A DD224448A1 (en) 1984-03-01 1984-03-01 Device for photolithographic structural transmission

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD26046084A DD224448A1 (en) 1984-03-01 1984-03-01 Device for photolithographic structural transmission

Publications (1)

Publication Number Publication Date
DD224448A1 true DD224448A1 (en) 1985-07-03

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Family Applications (1)

Application Number Title Priority Date Filing Date
DD26046084A DD224448A1 (en) 1984-03-01 1984-03-01 Device for photolithographic structural transmission

Country Status (1)

Country Link
DD (1) DD224448A1 (en)

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