DD126361A1 - - Google Patents

Info

Publication number
DD126361A1
DD126361A1 DD19261376A DD19261376A DD126361A1 DD 126361 A1 DD126361 A1 DD 126361A1 DD 19261376 A DD19261376 A DD 19261376A DD 19261376 A DD19261376 A DD 19261376A DD 126361 A1 DD126361 A1 DD 126361A1
Authority
DD
German Democratic Republic
Application number
DD19261376A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to DD19261376A priority Critical patent/DD126361A1/xx
Priority to DE19762650817 priority patent/DE2650817A1/de
Priority to HU77ZE454A priority patent/HU175322B/hu
Priority to JP4857377A priority patent/JPS52133756A/ja
Publication of DD126361A1 publication Critical patent/DD126361A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/30—Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polarising Elements (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
DD19261376A 1976-04-30 1976-04-30 DD126361A1 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DD19261376A DD126361A1 (fr) 1976-04-30 1976-04-30
DE19762650817 DE2650817A1 (de) 1976-04-30 1976-11-06 Verfahren zur herstellung einer phasenmaske mit amplitudenstruktur
HU77ZE454A HU175322B (hu) 1976-04-30 1977-02-03 Sposob izgotovlenija fazovoj maski s strukturoj amplitudnoj maski
JP4857377A JPS52133756A (en) 1976-04-30 1977-04-28 Method of manufacturing phase mask for amplification system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD19261376A DD126361A1 (fr) 1976-04-30 1976-04-30

Publications (1)

Publication Number Publication Date
DD126361A1 true DD126361A1 (fr) 1977-07-13

Family

ID=5504372

Family Applications (1)

Application Number Title Priority Date Filing Date
DD19261376A DD126361A1 (fr) 1976-04-30 1976-04-30

Country Status (4)

Country Link
JP (1) JPS52133756A (fr)
DD (1) DD126361A1 (fr)
DE (1) DE2650817A1 (fr)
HU (1) HU175322B (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0293643A2 (fr) * 1987-06-01 1988-12-07 International Business Machines Corporation Procédé lithographique à qualité d'image améliorée

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0090924B1 (fr) * 1982-04-05 1987-11-11 International Business Machines Corporation Procédé pour augmenter la résolution de l'image d'un photomasque et photomasque pour réaliser cette méthode
JPS62291660A (ja) * 1986-06-10 1987-12-18 Nec Corp 半導体装置の製造方法
US5234780A (en) * 1989-02-13 1993-08-10 Kabushiki Kaisha Toshiba Exposure mask, method of manufacturing the same, and exposure method using the same
JPH0763676A (ja) * 1993-08-27 1995-03-10 Mitsubishi Electric Corp 位相シフトレティクル性能検査装置及び性能検査方法
US5415953A (en) * 1994-02-14 1995-05-16 E. I. Du Pont De Nemours And Company Photomask blanks comprising transmissive embedded phase shifter

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5029939B2 (fr) * 1972-07-05 1975-09-27

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0293643A2 (fr) * 1987-06-01 1988-12-07 International Business Machines Corporation Procédé lithographique à qualité d'image améliorée
EP0293643A3 (en) * 1987-06-01 1990-10-31 International Business Machines Corporation Lithographic process having improved image quality

Also Published As

Publication number Publication date
JPS52133756A (en) 1977-11-09
DE2650817A1 (de) 1977-11-17
HU175322B (hu) 1980-06-28

Similar Documents

Publication Publication Date Title
FR2367312B1 (fr)
JPS557540B2 (fr)
JPS5357185U (fr)
DE2604219C2 (fr)
JPS5620525B2 (fr)
DE2608011C3 (fr)
FI772094A (fr)
DE2620434C3 (fr)
JPS5321624U (fr)
JPS5351306U (fr)
JPS5311061U (fr)
JPS5538959Y2 (fr)
JPS5440407B2 (fr)
JPS53334U (fr)
JPS534361U (fr)
JPS5321994U (fr)
JPS52123571U (fr)
JPS52113399U (fr)
JPS52169964U (fr)
CS192684B1 (fr)
JPS51148689U (fr)
DE2607848A1 (fr)
JPS52109039U (fr)
DD126204A1 (fr)
DD124077A1 (fr)