DD126361A1 - - Google Patents

Info

Publication number
DD126361A1
DD126361A1 DD19261376A DD19261376A DD126361A1 DD 126361 A1 DD126361 A1 DD 126361A1 DD 19261376 A DD19261376 A DD 19261376A DD 19261376 A DD19261376 A DD 19261376A DD 126361 A1 DD126361 A1 DD 126361A1
Authority
DD
German Democratic Republic
Application number
DD19261376A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to DD19261376A priority Critical patent/DD126361A1/xx
Priority to DE19762650817 priority patent/DE2650817A1/de
Priority to HU77ZE454A priority patent/HU175322B/hu
Priority to JP4857377A priority patent/JPS52133756A/ja
Publication of DD126361A1 publication Critical patent/DD126361A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
    • G03F1/30—Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Polarising Elements (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DD19261376A 1976-04-30 1976-04-30 DD126361A1 (cg-RX-API-DMAC7.html)

Priority Applications (4)

Application Number Priority Date Filing Date Title
DD19261376A DD126361A1 (cg-RX-API-DMAC7.html) 1976-04-30 1976-04-30
DE19762650817 DE2650817A1 (de) 1976-04-30 1976-11-06 Verfahren zur herstellung einer phasenmaske mit amplitudenstruktur
HU77ZE454A HU175322B (hu) 1976-04-30 1977-02-03 Sposob izgotovlenija fazovoj maski s strukturoj amplitudnoj maski
JP4857377A JPS52133756A (en) 1976-04-30 1977-04-28 Method of manufacturing phase mask for amplification system

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DD19261376A DD126361A1 (cg-RX-API-DMAC7.html) 1976-04-30 1976-04-30

Publications (1)

Publication Number Publication Date
DD126361A1 true DD126361A1 (cg-RX-API-DMAC7.html) 1977-07-13

Family

ID=5504372

Family Applications (1)

Application Number Title Priority Date Filing Date
DD19261376A DD126361A1 (cg-RX-API-DMAC7.html) 1976-04-30 1976-04-30

Country Status (4)

Country Link
JP (1) JPS52133756A (cg-RX-API-DMAC7.html)
DD (1) DD126361A1 (cg-RX-API-DMAC7.html)
DE (1) DE2650817A1 (cg-RX-API-DMAC7.html)
HU (1) HU175322B (cg-RX-API-DMAC7.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0293643A3 (en) * 1987-06-01 1990-10-31 International Business Machines Corporation Lithographic process having improved image quality

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3374452D1 (en) * 1982-04-05 1987-12-17 Ibm Method of increasing the image resolution of a transmitting mask and improved masks for performing the method
JPS62291660A (ja) * 1986-06-10 1987-12-18 Nec Corp 半導体装置の製造方法
US5234780A (en) * 1989-02-13 1993-08-10 Kabushiki Kaisha Toshiba Exposure mask, method of manufacturing the same, and exposure method using the same
JPH0763676A (ja) * 1993-08-27 1995-03-10 Mitsubishi Electric Corp 位相シフトレティクル性能検査装置及び性能検査方法
US5415953A (en) * 1994-02-14 1995-05-16 E. I. Du Pont De Nemours And Company Photomask blanks comprising transmissive embedded phase shifter

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5029939B2 (cg-RX-API-DMAC7.html) * 1972-07-05 1975-09-27

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0293643A3 (en) * 1987-06-01 1990-10-31 International Business Machines Corporation Lithographic process having improved image quality

Also Published As

Publication number Publication date
DE2650817A1 (de) 1977-11-17
JPS52133756A (en) 1977-11-09
HU175322B (hu) 1980-06-28

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