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Application filed by Dostal Jaroslav, Kuehnl Zbynek, Novak Miroslav, Novotny Milos, Frantisek Porazil, Jiri ZarubafiledCriticalDostal Jaroslav
Priority to CS844067ApriorityCriticalpatent/CS241666B1/en
Publication of CS406784A1publicationCriticalpatent/CS406784A1/en
Publication of CS241666B1publicationCriticalpatent/CS241666B1/en
CS844067A1984-05-301984-05-30Lusture agent for electrolytic deposition of lusture nickel coatings with thickness not more then 1%micrometers
CS241666B1
(en)