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Application filed by Dostal Jaroslav, Kuehnl Zbynek, Novak Miroslav, Novotny Milos, Frantisek Porazil, Antonin Sumperk Pospisil, Jiri ZarubafiledCriticalDostal Jaroslav
Priority to CS844066ApriorityCriticalpatent/CS241665B1/en
Publication of CS406684A1publicationCriticalpatent/CS406684A1/en
Publication of CS241665B1publicationCriticalpatent/CS241665B1/en
CS844066A1984-05-301984-05-30Lusture agent for electrolytic deposition of lustre nickel coatings with thickness not more then 5% micrometers
CS241665B1
(en)