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Application filed by Dostal Jaroslav, Kuehnl Zbynek, Novak Miroslav, Novotny Milos, Frantisek Porazil, Jiri ZarubafiledCriticalDostal Jaroslav
Priority to CS844064ApriorityCriticalpatent/CS241664B1/en
Publication of CS406484A1publicationCriticalpatent/CS406484A1/en
Publication of CS241664B1publicationCriticalpatent/CS241664B1/en
CS844064A1984-05-301984-05-30Lustre agent for electrolytic deposition of lustre nickel coatings with thickness not more then 25 micrometers
CS241664B1
(en)