CS266963B1 - Method of photographical materials' treatment device cleaning - Google Patents

Method of photographical materials' treatment device cleaning Download PDF

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Publication number
CS266963B1
CS266963B1 CS865532A CS553286A CS266963B1 CS 266963 B1 CS266963 B1 CS 266963B1 CS 865532 A CS865532 A CS 865532A CS 553286 A CS553286 A CS 553286A CS 266963 B1 CS266963 B1 CS 266963B1
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Czechoslovakia
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solution
minutes
water
cleaning
aqueous
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CS865532A
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Czech (cs)
Slovak (sk)
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CS553286A1 (en
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Peter Ing Trokan
Miroslav Ing Hlavaty
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Trokan Peter
Hlavaty Miroslav
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Priority to CS865532A priority Critical patent/CS266963B1/en
Publication of CS553286A1 publication Critical patent/CS553286A1/en
Publication of CS266963B1 publication Critical patent/CS266963B1/en

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Abstract

Riešenie sa týká spósobu čistenia zariadení pre spracovanie fotografických materiálov. Na znečistěné zariadenie sa pósobí 0,5 až 2,6 %-ným vodným roztokom manganistanu draselného a 1,0 až 2,5 %-ným vodným roztokom kyseliny sírovej počas 10 až 30 minút za cirkulácie. Po odstránení týchto roztokov a po vypláchnutí vodou 30 až 40 °C teplou sa na zariadenie pósobí dalších 10 až 30 minút 1,0 až 2,5 %-ným vodným roztokom kyseliny štavelovej. Zariadenie sa nakonieo dókladné vypláchne vodou.The solution relates to a method of cleaning equipment for processing photographic materials. It will act on the dirty equipment 0.5 to 2.6% aqueous permanganate solution potassium and 1.0 to 2.5% aqueous solution sulfuric acid over 10 to 30 minutes for circulation. After removing these solutions and after rinsing with water 30 to 40 ° C warm for 10 to 30 minutes 1.0 to 2.5% aqueous acid oxalic. The equipment is nakonieo dókladná rinse with water.

Description

Vynález sa týká spósobu čistenia zariadení pre spracovanie fotografických materiálov.The invention relates to a method for cleaning photographic materials processing equipment.

V zariadeniach pre spracovanie fotografických materiálov sa v priebehu spracovávania vytvárajú usadeniny, ktoré je potřebné odstraňovat. Je známe použitie zriedeného vodného roztoku kyseliny chlorovodíkovéj na čistenie vyvolávacích zariadení. Takýto spósob čistenia je však zdlhavý a náročný.In photo processing equipment, deposits form during processing that need to be removed. It is known to use dilute aqueous hydrochloric acid to clean developing devices. However, such a method of cleaning is lengthy and demanding.

Taktiež je známe použitie čistiaceho prostriedku na báze kyseliny chrómsírovej (Morvay, F. : Maskovacie metody v reprodukčnej fotografii, Alfa Bratislava, 173, 1968). Jeho nevýhodou je skutečnost, že po vyčistění nie je možné čistiaci kúpel vypustit do kanalizácie.It is also known to use a cleaning agent based on chromosulphuric acid (Morvay, F.: Masking methods in reproduction photography, Alfa Bratislava, 173, 1968). Its disadvantage is the fact that after cleaning it is not possible to drain the cleaning bath into the sewer.

Uvedené nedostatky odstraňuje spósob čistenia zariadení pre spracovanie fotografických materiálov podlá vynálezu.The method of cleaning the photographic material processing device according to the invention eliminates these drawbacks.

Podstata vynálezu spočívá v tom, že na znečistěné zariadenie sa pósobí 0,5 až 2,6 %-ným vodným roztokom manganistanu draselného a 1,0 až 2,5 %-ným vodným roztokom kyseliny sírovéj počas 10 až 30 minút za cirkulácie, po ich odstránení a vypláchnutí zariadenia vodou 30 až 40 °C teplou sa na zariadenie pósobí dalších 10 až 30 minút 1,0 až 2,5 %-ným vodným roztokom kyseliny štavelovej. Vyčištěné zariadenie sa nakoniec dokonale vypláchne vodou (dvakrát, 10 minút pri zapnutej cirkulácii) až do odstránenia zbytkov čistiacich roztokov.The essence of the invention is that the contaminated device is treated with a 0.5 to 2.6% aqueous solution of potassium permanganate and a 1.0 to 2.5% aqueous solution of sulfuric acid for 10 to 30 minutes with circulation, after after removing them and rinsing the apparatus with water at 30 DEG to 40 DEG C., the apparatus is treated for a further 10 to 30 minutes with a 1.0 to 2.5% aqueous solution of oxalic acid. Finally, the cleaned equipment is thoroughly rinsed with water (twice, 10 minutes with the circulation switched on) until the residual cleaning solutions are removed.

Výhodou spósobu čistenia zariadení pre spracovanie fotografických materiálov podlá vynálezu je predovšetkým jeho rýchlosť; okrem toho nedochádza k poškodzovaniu čištěných zariadení (vyvolávacie tanky ap.) a čistiaci kúpel je možné hned po vyčistění - bez úpravy - vypúšťať do kanalizácie.The advantage of the method of cleaning photographic material processing devices according to the invention is in particular its speed; in addition, the cleaned equipment (developing tanks, etc.) is not damaged and the cleaning bath can be discharged into the sewer immediately after cleaning - without treatment.

Příklad 1Example 1

Příprava čistiacich roztokovPreparation of cleaning solutions

Roztok A: 64 kg manganistanu draselného, do 1 000 ml vodaSolution A: 64 kg of potassium permanganate, to 1 000 ml of water

Roztok B; 10 ml koncentrovanéj kyseliny sírovej, do 1 000 ml vodaSolution B; 10 ml of concentrated sulfuric acid, to 1 000 ml of water

Roztok C: 100 g kyseliny štavelovej .2^0) , do 1 000 ml vodaSolution C: 100 g of oxalic acid (2.0 ml), to 1000 ml of water

Jednotlivé roztoky sa připravili rozpuštěním zložiek v 1 000 ml vody za stálého miešania .Individual solutions were prepared by dissolving the components in 1000 ml of water with stirring.

Příklad 2Example 2

Do znečistěného vyvolávacieho tanku sa nalialo 100 1 30 °C teplej vody, přidal sa 1 1 roztoku B. Pri zapnutej cirkulácii sa čistiaci kúpel nechal 10 minút pósobiť. Po 10 minutách sa znečistěný kúpel vypustil, tank sa vypláchol vodou 30 °C teplou, opať sa naplnil 100 1 30 °C teplej vody, do ktorej sa přidal 1 1 roztoku C. Tento čistiaci roztok sa opať nechal pri zapnutej cirkulácii pósobiť 10 minút.100 l of 30 [deg.] C. warm water were poured into the contaminated developing tank, 1 l of solution B was added. With the circulation switched on, the cleaning bath was left to act for 10 minutes. After 10 minutes, the contaminated bath was drained, the tank was rinsed with 30 ° C warm water, refilled with 100 L of 30 ° C warm water, to which 1 L of Solution C was added. This cleaning solution was again allowed to act for 10 minutes with the circulation on.

Po 10 minútach sa znečistěný roztok vypustil a vyčištěný vyvolávací tank sa dvakrát vypláchol vodou až do odstránenia zvyškov čistiaceho roztoku.After 10 minutes, the contaminated solution was drained and the cleaned developing tank was rinsed twice with water until residual cleaning solution was removed.

Příklad 3Example 3

Do silné znečistěného vyvolávacieho tanku (objem cca 25 1) sa nalialo 25 1 40 °C teplej vody, přidal sa 1 1 roztoku A, po premiešaní 1 1 roztoku B. Pri zapnutej cirkulácii sa čistiaci kúpel nechal 30 minút pósobiť. Po 30 minútach sa znečistěný kúpel vypustil, tank sa vypláchol vodou 40 °C teplou, opáť sa naplnil 25 1 40 °C teplej vody, do ktorej sa přidal 1 1 roztoku C. Tento čistiaci roztok sa nechal pri zapnutej cirkulácii pósobiť dalších 30 minút.25 l of 40 [deg.] C. warm water were poured into a heavily soiled developing tank (volume approx. 25 l), 1 l of solution A was added, after stirring 1 l of solution B. With the circulation switched on, the cleaning bath was left to act for 30 minutes. After 30 minutes, the contaminated bath was drained, the tank was rinsed with 40 ° C warm water, again filled with 25 L of 40 ° C warm water, to which 1 L of Solution C was added. This cleaning solution was allowed to act for another 30 minutes with the circulation on.

ii

CS 266 963 BlCS 266 963 Bl

Po 30 minútach sa znečistěný roztok vypustil a vyčištěný tank sa - pri zapnutej cirkulácii - dókladne vypláchol dvakrát vodou, až do odstránenia zvyškov čistiaceho roztoku.After 30 minutes, the contaminated solution was drained and the cleaned tank was thoroughly rinsed twice with water, with the circulation switched on, until the remnants of the cleaning solution were removed.

Claims (1)

CS 266 963 B1 3 Po 30 minútach sa znečistěný roztok vypustil a vyčištěný tank sa - pri zapnutej cirkulácii - dókladne vypláchol dvakrát vodou, až do odstránenia zvyškov čistiaceho roztoku. PREDMET VYNÁLEZU SpÓsob čistenia zariadení pre spracovanie fotografických materiálov vyznačujúci satým, že na znečistěné zariadenie sa pósobí 0,5 až 2,6 %-ným vodným roztokom manganistanudraselného a 1,0 až 2,5 %-ným vodným roztokom kyseliny sírovéj počas 10 až 30 minút za cirkulácie, po ich odstránení a po vypláchnutí vodou 30 až 40 °C teplou sa na zariadenie pósobídalších 10 až 30 minút 1,0 až 2,5 %-ným vodným roztokom kyseliny šťavelovej a zariadeniesa nakoniec dókladne vypláchne vodou.CS 266 963 B1 3 After 30 minutes, the contaminated solution was drained and the cleaned tank was rinsed thoroughly twice with water, with circulation turned on, until the cleaning solution was removed. DISCLOSURE OF THE INVENTION A method of cleaning photographic material processing equipment characterized in that the contaminated device is treated with 0.5 to 2.6% aqueous manganese potassium hydroxide solution and 1.0 to 2.5% aqueous sulfuric acid for 10 to 30%. minutes after circulation, after removing them and after rinsing with water from 30 to 40 ° C, the device is treated for an additional 10 to 30 minutes with 1.0 to 2.5% aqueous solution of oxalic acid and rinsed thoroughly with water.
CS865532A 1986-07-21 1986-07-21 Method of photographical materials' treatment device cleaning CS266963B1 (en)

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CS865532A CS266963B1 (en) 1986-07-21 1986-07-21 Method of photographical materials' treatment device cleaning

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CS865532A CS266963B1 (en) 1986-07-21 1986-07-21 Method of photographical materials' treatment device cleaning

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CS553286A1 CS553286A1 (en) 1989-06-13
CS266963B1 true CS266963B1 (en) 1990-01-12

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