CS266963B1 - A cleaning method for photographic material processing equipment - Google Patents

A cleaning method for photographic material processing equipment Download PDF

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Publication number
CS266963B1
CS266963B1 CS865532A CS553286A CS266963B1 CS 266963 B1 CS266963 B1 CS 266963B1 CS 865532 A CS865532 A CS 865532A CS 553286 A CS553286 A CS 553286A CS 266963 B1 CS266963 B1 CS 266963B1
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Czechoslovakia
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minutes
water
solution
cleaning
aqueous solution
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CS865532A
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Czech (cs)
Slovak (sk)
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CS553286A1 (en
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Peter Ing Trokan
Miroslav Ing Hlavaty
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Trokan Peter
Hlavaty Miroslav
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Priority to CS865532A priority Critical patent/CS266963B1/en
Publication of CS553286A1 publication Critical patent/CS553286A1/en
Publication of CS266963B1 publication Critical patent/CS266963B1/en

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Abstract

Riešenie sa týká spósobu čistenia zariadení pre spracovanie fotografických materiálov. Na znečistěné zariadenie sa pósobí 0,5 až 2,6 %-ným vodným roztokom manganistanu draselného a 1,0 až 2,5 %-ným vodným roztokom kyseliny sírovej počas 10 až 30 minút za cirkulácie. Po odstránení týchto roztokov a po vypláchnutí vodou 30 až 40 °C teplou sa na zariadenie pósobí dalších 10 až 30 minút 1,0 až 2,5 %-ným vodným roztokom kyseliny štavelovej. Zariadenie sa nakonieo dókladné vypláchne vodou.The solution relates to a method of cleaning equipment for processing photographic materials. The contaminated equipment is treated with a 0.5 to 2.6% aqueous solution of potassium permanganate and a 1.0 to 2.5% aqueous solution of sulfuric acid for 10 to 30 minutes with circulation. After removing these solutions and rinsing with water at a temperature of 30 to 40 °C, the equipment is treated with a 1.0 to 2.5% aqueous solution of oxalic acid for another 10 to 30 minutes. The equipment is then thoroughly rinsed with water.

Description

CS 266 963 BlCS 266 963 B1

Vynález sa týká spósobu čistenia zariadení pre spracovanie fotografických materiálov. V zariadeniach pre spracovanie fotografických materiálov sa v priebehu spracovávaniavytvárajú usadeniny, ktoré je potřebné odstraňovat. Je známe použitie zriedeného vodnéhoroztoku kyseliny chlorovodíkovéj na čistenie vyvolávacích zariadení. Takýto spósob čisteniaje však zdlhavý a náročný.The invention relates to a method for cleaning photographic material processing equipment. In the processing of photographic materials, deposits are formed during processing, which need to be removed. It is known to use a dilute aqueous solution of hydrochloric acid to purify developing devices. However, such a cleaning method is lengthy and difficult.

Taktiež je známe použitie čistiaceho prostriedku na báze kyseliny chrómsírovej (Morvay,F. : Maskovacie metody v reprodukčnej fotografii, Alfa Bratislava, 173, 1968). Jeho nevýhodouje skutočnosť, že po vyčistění nie je možné čistiaci kúpel vypustit do kanalizácie.It is also known to use a detergent based on chromosulphur (Morvay, F.: Masking Methods in Reproductive Photography, Alfa Bratislava, 173, 1968). Its disadvantage is the fact that after cleaning it is not possible to drain the cleaning bath into the sewer.

Uvedené nedostatky odstraňuje spósob čistenia zariadení pre spracovanie fotografickýchmateriálov podlá vynálezu.The aforementioned drawbacks are eliminated by the method of cleaning photographic material processing equipment according to the invention.

Podstata vynálezu spočívá v tom, že na znečistěné zariadenie sa pósobí 0,5 až 2,6 %-nýmvodným roztokom manganistanu draselného a 1,0 až 2,5 %-ným vodným roztokom kyseliny sírovéjpočas 10 až 30 minút za cirkulácie, po ich odstránení a vypláchnutí zariadenía vodou 30až 40 °C teplou sa na zariadenie pósobí dalších 10 až 30 mírnit 1,0 až 2,5 %-ným vodným roz-tokom kyseliny štavelovej. Vyčištěné zariadenie sa nakoniec dokonale vypláchne vodou (dva-krát, 10 minút pri zapnutej cirkulácii) až do odstránenia zbytkov čistiacich roztokov. Výhodou spósobu čistenia zariadení pre spracovanie fotografických materiálov podlávynálezu je predovšetkým jeho rýchlosť; okrem toho nedochádza k poškodzovaniu čištěnýchzariadení (vyvolávacie tanky ap.) a čistiaci kúpel je možné hned po vyčistění - bez úpravy -- vypúšťať do kanalizácie. Příklad 1 Příprava čistiacich roztokovSUMMARY OF THE INVENTION The contaminated device is treated with 0.5 to 2.6% aqueous potassium permanganate solution and 1.0 to 2.5% aqueous sulfuric acid solution for 10 to 30 minutes under circulation. and rinsing the apparatus with water at 30-40 ° C for a further 10-30 to moderate 1.0 to 2.5% aqueous oxalic acid on the apparatus. Finally, the cleaned equipment is thoroughly rinsed with water (two, 10 minutes with the circulation on) until the cleaning solutions are removed. The advantage of the method of cleaning the apparatus for processing photographic materials of the invention is in particular its speed; in addition, the cleaned equipment (developing tanks, etc.) is not damaged and the cleaning bath can be drained into the sewer immediately after cleaning - without modification. Example 1 Preparation of cleaning solutions

Roztok A: 64 kg manganistanu draselného, do 1 000 ml vodaSolution A: 64 kg of potassium permanganate, up to 1000 ml of water

Roztok B: 10 ml koncentrovanéj kyseliny sírovej, do 1 000 ml vodaSolution B: 10 mL of concentrated sulfuric acid to 1000 mL of water

Roztok C: 100 g kyseliny šťavelovej . 2^0) , do 1 000 ml vodaSolution C: 100 g oxalic acid. 2 ^ 0) to 1000 ml water

Jednotlivé roztoky sa připravili rozpuštěním zložiek v 1 000 ml vody za stálého mieša- nia. Příklad 2The individual solutions were prepared by dissolving the components in 1000 ml water while stirring. Example 2

Do znečistěného vyvolávacieho tanku sa nalialo 100 1 30 °C teplej vody, přidal sa 1 1roztoku B. Pri zapnutej cirkulácii sa čistiaci kúpel nechal 10 minút pósobiť. Po 10 minutáchsa znečistěný kúpel vypustil, tank sa vypláchol vodou 30 °C teplou, opat sa naplnil 100 130 °C teplej vody, do ktorej sa přidal 1 1 roztoku C. Tento čistiaci roztok sa opat nechalpri zapnutej cirkulácii pósobiť 10 minút.100 µl of 30 ° C warm water was poured into the contaminated developing tank, 1 l of solution B was added. With the circulation turned on, the cleaning bath was allowed to soak for 10 minutes. After 10 minutes the contaminated bath was discharged, the tank was rinsed with water at 30 ° C, the abbot was filled with 100 130 ° C warm water to which 1 L of solution C was added. This cleaning solution was treated with the circulation for 10 minutes.

Po 10 minútach sa znečistěný roztok vypustil a vyčištěný vyvolávací tank sa dvakrátvypláchol vodou až do odstránenia zvyškov čistiaceho roztoku. Přiklad 3After 10 minutes, the impure solution was drained and the purified developing tank was rinsed twice with water until the cleaning solution was removed. Example 3

Do silné znečistěného vyvolávacieho tanku (objem cca 25 1) sa nalialo 25 1 40 °C teplejvody, přidal sa 1 1 roztoku A, po premiešaní 1 1 roztoku B. Pri zapnutej cirkulácii sa čistiacikúpel nechal 30 minút pósobiť. Po 30 minútach sa znečistěný kúpel vypustil, tank sa vyplácholvodou 40 °C teplou, opSt sa naplnil 25 1 40 °C teplej vody, do ktorej sa přidal 1 1 roztokuC. Tento čistiaci roztok sa nechal pri zapnutej cirkulácii pósobiť dalších 30 minút.25 l of 40 ° C was poured into a strong contaminated evacuation tank (about 25 L), 1 L of solution A was added, after mixing 1 L of solution B. With circulation turned on, the cleanser was allowed to soak for 30 minutes. After 30 minutes, the contaminated bath was discharged, the tank was flushed out with 40 ° C warm, filled with 25 1 40 ° C warm water to which 1 L of solution C was added. This cleaning solution was allowed to react for a further 30 minutes while the circulation was switched on.

Claims (1)

PREDMET VYNÁLEZUOBJECT OF THE INVENTION SpÓsob čistenia zariadení pre spracovanie fotografických materiálov vyznačujúci sa tým, že na znečistěné zariadenie sa pósobí 0,5 až 2,6 %-ným vodným roztokom manganistanu draselného a 1,0 až 2,5 %-ným vodným roztokom kyseliny sírovéj počas 10 až 30 minút za cirkulácie, po ich odstránení a po vypláchnutí vodou 30 až 40 °C teplou sa na zariadenie pósobí dalších 10 až 30 minút 1,0 až 2,5 %-ným vodným roztokom kyseliny šťavelovej a zariadenie sa nakoniec dókladne vypláchne vodou.Method for cleaning photographic material processing equipment, characterized in that the contaminated equipment is treated with 0.5 to 2.6% aqueous solution of potassium permanganate and 1.0 to 2.5% aqueous solution of sulfuric acid for 10 to 30 minutes with circulation, after removing them and after rinsing with hot water at 30-40 DEG C., the device is treated for a further 10 to 30 minutes with a 1.0 to 2.5% aqueous solution of oxalic acid, and the device is finally rinsed thoroughly with water.
CS865532A 1986-07-21 1986-07-21 A cleaning method for photographic material processing equipment CS266963B1 (en)

Priority Applications (1)

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CS865532A CS266963B1 (en) 1986-07-21 1986-07-21 A cleaning method for photographic material processing equipment

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CS865532A CS266963B1 (en) 1986-07-21 1986-07-21 A cleaning method for photographic material processing equipment

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CS553286A1 CS553286A1 (en) 1989-06-13
CS266963B1 true CS266963B1 (en) 1990-01-12

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