JPS58167773A - Method for washing object to be subjected to etching treatment by water - Google Patents
Method for washing object to be subjected to etching treatment by waterInfo
- Publication number
- JPS58167773A JPS58167773A JP4944182A JP4944182A JPS58167773A JP S58167773 A JPS58167773 A JP S58167773A JP 4944182 A JP4944182 A JP 4944182A JP 4944182 A JP4944182 A JP 4944182A JP S58167773 A JPS58167773 A JP S58167773A
- Authority
- JP
- Japan
- Prior art keywords
- water
- washing
- caustic soda
- metal plate
- washed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【発明の詳細な説明】
本発明は、エツチング処理すべき物、例えば、アルミニ
ウム板などをエツチング処理後に水洗する場合の有利な
水洗方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an advantageous method for washing an object to be etched, such as an aluminum plate, with water after etching.
従来、アルミニウム板などの試験片をマクロエツチング
する場合には、試験片を苛性ソーダ水溶液に浸漬後水洗
、し、さらに、塩酸溶液で中和後に別の水で水洗してい
る。このため、水洗に使用した水は苛性ソーダおよび塩
酸のためにそれぞれアルカリ性、酸性の2種類の液とな
るので、これらの液をそれぞれ直接廃棄するといわゆる
公害問題が発生するおそれがある。そこで、廃棄時には
中和処理が必要となるので、煩雑であり、また、そのだ
めの費用がかかるなどの欠点がある。Conventionally, when macro-etching a test piece such as an aluminum plate, the test piece is immersed in an aqueous solution of caustic soda, washed with water, neutralized with a hydrochloric acid solution, and then washed with another water. For this reason, the water used for washing becomes two types of liquids, alkaline and acidic, due to caustic soda and hydrochloric acid, respectively, and if these liquids are directly disposed of, there is a risk of causing a so-called pollution problem. Therefore, since neutralization treatment is required at the time of disposal, there are drawbacks such as being complicated and expensive.
本発明は、このような事情にかんがみてなされたもので
あって、使用後の水を何ら不都合なしに廃棄することが
できる、被エツチング処理物の水洗方法を提供すること
を目的とする。The present invention has been made in view of the above circumstances, and it is an object of the present invention to provide a method for washing an object to be etched with water, in which the water after use can be disposed of without any inconvenience.
このだめ、本発明の水洗方法は、被エツチング処理物を
苛性ノーダ水溶液に浸漬エツチングし、水洗し、塩酸溶
液で中和し、ついで前記水洗に使用した水で再度水洗す
ることを特徴とする。Therefore, the water washing method of the present invention is characterized in that the object to be etched is immersed in a caustic Noda aqueous solution for etching, washed with water, neutralized with a hydrochloric acid solution, and then washed again with the water used for the washing.
以下、本発明の構成について詳しく説明する。Hereinafter, the configuration of the present invention will be explained in detail.
本発明においては、エツチング処理するアルミ、ニウム
などの金属板を、図に示されるように、まず、苛性ソー
ダ水溶液1に浸漬する。この場合の苛性ソーダ水溶液の
濃度や浸漬時間、浸漬温度等は特に限定されないが、こ
の浸漬は金属板の表面をエツチング処理するために行な
うので、このことを考慮して適宜・きめればよい。なお
、苛性ソーダ水溶液の濃度は10〜15チであることが
好ましい。In the present invention, a metal plate such as aluminum or nium to be etched is first immersed in a caustic soda aqueous solution 1, as shown in the figure. In this case, the concentration of the caustic soda aqueous solution, the immersion time, the immersion temperature, etc. are not particularly limited, but since this immersion is carried out to etch the surface of the metal plate, they may be determined appropriately taking this into consideration. Note that the concentration of the caustic soda aqueous solution is preferably 10 to 15%.
つぎに、金属板を水2に入れて十分に水洗する。これに
より水2は、金網板に付着していた苛性ソーダでアルカ
リ性となる。Next, the metal plate is placed in water 2 and thoroughly washed. As a result, the water 2 becomes alkaline due to the caustic soda adhering to the wire mesh plate.
水洗後の金属板には、若干の苛性ソーダが付着している
ので塩酸溶液3に入れてこれを中和する。したがって、
塩酸溶液6の濃度は、中和するに足る程度の希薄なもの
でよい。A small amount of caustic soda adheres to the metal plate after washing with water, so this is neutralized by placing it in hydrochloric acid solution 3. therefore,
The concentration of the hydrochloric acid solution 6 may be dilute enough to neutralize.
このように中和処理した金属板を、ついで、前記の水2
で再度水洗する。これにより、金属板に付着した塩酸が
水2中の苛性ソーダと反応して中和塩(NaC1) 4
を生成するので、水2は中性となる。したがって、この
水2をそのまま廃棄しても公害問題が生ずるおそれがな
い。The metal plate thus neutralized was then soaked in the water 2 described above.
Wash again with water. As a result, the hydrochloric acid adhering to the metal plate reacts with the caustic soda in the water 2 to form a neutralized salt (NaC1) 4
, water 2 becomes neutral. Therefore, even if this water 2 is disposed of as is, there is no risk of causing a pollution problem.
したがって、本発明によれば、従来技術におけるように
2種類の廃液が生ずることがなく、まだ、廃棄時に中和
処理を必要としないので水洗工程を簡素化できる。この
ため、同一容器内に水洗工程をコンパクトにまとめるこ
とが可能次に実施例を例示する。Therefore, according to the present invention, unlike in the prior art, two types of waste liquids are not generated, and neutralization treatment is not required at the time of disposal, so the washing process can be simplified. For this reason, it is possible to compactly consolidate the water washing process in the same container.Examples will be illustrated next.
実施例
アルミニウムの試験片(ICrrL×5cm×30c1
n)の溶接部の溶込み状態を観察するためこの試験片を
15%苛性ノーダ水溶液201に80’Cで3分間浸漬
し、501の水で水洗し、希塩酸溶液20eで中和処理
し、ついで前記水洗に使用した水で再度水洗した。この
水洗水のpl(は7であった。Example Aluminum test piece (ICrrL x 5cm x 30c1
In order to observe the state of penetration of the welded part (n), this test piece was immersed in a 15% caustic Noda aqueous solution 201 at 80'C for 3 minutes, washed with 501 water, neutralized with dilute hydrochloric acid solution 20e, and then It was washed again with the water used for the washing. The pl of this washing water was 7.
図は、本発明による水洗工程を示した説明図である。
1・・・苛性)−ダ水溶液、2・・・水、6・・・塩酸
溶液、4・・・中和塩。
代理人 弁理士 小 川 信 −
弁理士 野 口 賢 照
弁理士 斎 下 和 彦The figure is an explanatory diagram showing a water washing process according to the present invention. 1... Caustic)-da aqueous solution, 2... Water, 6... Hydrochloric acid solution, 4... Neutralized salt. Agent: Patent Attorney Makoto Ogawa − Patent Attorney: Ken Noguchi Patent Attorney: Kazuhiko Saishita
Claims (1)
し、塩酸溶液で中和し、ついで前記水洗に使用した水で
再度水洗することを特徴とする被エツチング処理物の水
洗方法。A method for washing an object to be etched with water, characterized by immersing the object to be etched in a caustic soda aqueous solution, washing with water, neutralizing with a hydrochloric acid solution, and then washing again with the water used for the washing.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4944182A JPS58167773A (en) | 1982-03-27 | 1982-03-27 | Method for washing object to be subjected to etching treatment by water |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4944182A JPS58167773A (en) | 1982-03-27 | 1982-03-27 | Method for washing object to be subjected to etching treatment by water |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS58167773A true JPS58167773A (en) | 1983-10-04 |
Family
ID=12831200
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4944182A Pending JPS58167773A (en) | 1982-03-27 | 1982-03-27 | Method for washing object to be subjected to etching treatment by water |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58167773A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1991003064A1 (en) * | 1989-08-24 | 1991-03-07 | Murata Manufacturing Co., Ltd. | Laminated capacitor and method of producing the same |
-
1982
- 1982-03-27 JP JP4944182A patent/JPS58167773A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1991003064A1 (en) * | 1989-08-24 | 1991-03-07 | Murata Manufacturing Co., Ltd. | Laminated capacitor and method of producing the same |
GB2242070A (en) * | 1989-08-24 | 1991-09-18 | Murata Manufacturing Co | Laminated capacitor and method of producing the same |
US5144527A (en) * | 1989-08-24 | 1992-09-01 | Murata Manufacturing Co., Ltd. | Multilayer capacitor and method of fabricating the same |
GB2242070B (en) * | 1989-08-24 | 1994-01-19 | Murata Manufacturing Co | Multilayer capacitor and method of fabricating the same |
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