CN86201075U - High-energy and broad beam divergent field koufmen ion gun for surface modification - Google Patents
High-energy and broad beam divergent field koufmen ion gun for surface modification Download PDFInfo
- Publication number
- CN86201075U CN86201075U CN 86201075 CN86201075U CN86201075U CN 86201075 U CN86201075 U CN 86201075U CN 86201075 CN86201075 CN 86201075 CN 86201075 U CN86201075 U CN 86201075U CN 86201075 U CN86201075 U CN 86201075U
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- CN
- China
- Prior art keywords
- ion source
- energy
- arc chamber
- insulator
- surface modification
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Abstract
The utility model relates to a high-energy and broad beam divergent field koufmen ion source for surface modification. The external portion of the electric discharge chamber is provided with insulator ceramics and a rear end plate which is in the positive high-potential; the divergent field can be obtained through controlling the length of inserting into the electric discharge chamber of the rear pole shoe and the cathode, and the extraction voltage of the ion source can be increased. The high-energy and broad beam divergent field koufmen ion source for surface modification has the advantages of compact structure, simple structure, and high efficiency. The ion can reach the required high energy for implanting through directly expediting; in the surface treatment of the material, the hardness, the wear resistance, the corrosion resistance, and the fatigue resistance of the metallic surface can be improved, and the external dimension of the basal body can not be obviously affected.
Description
The utility model belongs to the ion beam Surface Machining.
The Kaufman ion source has been widely used in space propultion, ion beam etching and sputter coating.But the beam-out energy in these sources is generally less than 3 kilo electron volts.When improving extraction system voltage, can cause discharge quenching and interpolar flashover, so limited the ionogenic application of Kaufman, especially can not be used for the surface modification of metal material.
The purpose of this utility model is improved the Kaufman ion source, improves its extraction voltage, is used for injection of large tracts of land high current ion and mixing, makes injection technology practicability.
Fig. 1 is the ionogenic structure chart of high-energy and broad beam Kaufman.1 is back shroud among the figure, the 2nd, and hold-down screw, the 3rd, arc chamber outer wall, the 4th, back pole shoe, the 5th, negative electrode, the 6th, anode, the 7th, preceding pole shoe, the 8th is drawn grid, the 9th, permanent magnet, the 10th, suppressor, the 11st, inner insulator, the 12nd, ceramic external insulation sleeve, the 13rd, ion source outlet(discharge) flange, the 14th, vaccum seal ring.
Fig. 2 is the inner insulator structure chart.15 is attachment screws, the 16th among the figure, packing ring, the 17th, and hold-doun nut, the 18th is drawn grid, the 19th, insulator body, the 20th, suppressor, the 21st, attachment screw.
Main points of the present utility model are that the outside in Kaufman source has insulating sleeve, be in back shroud and the ionogenic outlet(discharge) flange of positive high potential, it partly is 1/8～1/5 of arc chamber length overall that rear pole shoe puts in arc chamber, it partly is that 3/7～5/7 grid of arc chamber length overall adopts and to have the single hole extraction system that positive high voltage is drawn the negative high voltage suppressor of grid that negative electrode puts in arc chamber, the attachment screw of insulator will be placed in the insulator body, and with the insulator end one gap is arranged, pay distance between suppressor 20 and the insulator body and be 0＜Δ L＜10 millimeter, (L1×2+L
2) ×n＞2L。
Below with figure explanation principle of the present utility model.As can be seen from Figure 1, the back shroud 1 in source is in positive high potential, and hold-down screw 2 is fixed to arc chamber on the back shroud, and by it with the heat transferred of arc chamber to back shroud, back shroud is made by the good material of heat conduction.Back pole shoe 4 is made by soft iron or stainless steel, constitutes the part of magnetic circuit.Negative electrode 5 emitting electrons, its end and arc chamber outer wall are idiostatic, and negative electrode can adopt directly-heated type or open-core type negative electrode.Anode 6 is fixed on the arc chamber outer wall by insulator, and anode material is a magnetism-free stainless steel, and the potential difference between anode and the negative electrode equals discharge voltage.The preceding pole shoe of being made by soft iron or mild steel 7 constitutes external magnetic circuit with permanent magnet 9 and back pole shoe 4.Because it partly is 1/8～1/5 of arc chamber length overall that the back pole shoe puts in arc chamber, it partly is 3/7～5/7 of arc chamber length overall that negative electrode puts in arc chamber, so the arc chamber internal magnetic field becomes divergence form along the arc chamber axis, but near the pole shoe of front and back, stronger radial magnetic field is arranged.This Distribution of Magnetic Field can guided voltage into from zero discharge stability of maintenance during to 100,000 volts.Extraction pole 8, the centre is the ion beam fairlead, it is made by graphite or magnetism-free stainless steel.Suppressor 10 is in negative potential, and it works the electronic reflux that prevents from the ion source downstream simultaneously and arrive ionogenic effect as the low-potential electrode of extraction system.The size of voltage makes the fairlead central potential of grid keep enough negative to suppress the backflow electronics according to the line size.The function of inner insulator 11 is to isolate to draw grid and suppressor and play location and fixing suppressor simultaneously, and it can be made by boron nitride or pottery.Pottery external insulation sleeve 12 is isolated high potential and ground.Ion source outlet(discharge) flange 13 is in electronegative potential, and ion source is connected on the vacuum chamber.
See Fig. 2 now.Draw grid 18 and be in positive high potential, suppressor 20 is in negative potential, and the effect of insulator body is that isolated high voltage makes and do not take place between two grid to puncture or flashover.In one end of insulator body behind the hole metallization with attachment screw 15 welding, the bonding or screw of the other end and attachment screw 21 is connected.Wherein between attachment screw 21 and the insulator body 19 gap is arranged.Distance between suppressor 20 and the insulator body 19 is 0＜Δ L＜10 millimeter.The value of insulator body overall dimension should satisfy (L
1* 2+L
2) * n＞2L.The purpose that adopts this structure is the interface place that prevents at the different dielectric coefficient material, causes flashover between grid because the electronics of the cathode emission that the field intensity inequality causes arrives anode.
High-energy and broad beam high current Kaufman ion source structure compactness described in the utility model, simple, efficient is high.Directly speeding-up ion arrival ion injects needed high-energy.In material surface is handled, some ion is injected in the metal surface, can improve the hardness of metal surface, resistance to wear, performance such as corrosion resistance and antifatigue can be injected by normal temperature, does not influence substrate performance, and implanted layer and matrix form desirable metallurgical surface, but matrix overall dimension is not had obvious influence.Do not need to add cooling at educt beaming flow tens MAHs, can continuous operation not need to change any parts in up to a hundred hours.
Claims (5)
1. a surface modification is dispersed a Kaufman ion source with high-energy and broad beam and is made up of arc chamber, insulator and accelerating system, feature of the present utility model is that the outside in Kaufman source has insulating sleeve 12 to be in the back shroud 1 of positive high potential, ionogenic outlet(discharge) flange 13.
2. it is characterized by back pole shoe 4 by the described Kaufman ion source of claim 1, to put in arc chamber partly be 1/8～1/5 of arc chamber length overall, and it partly is 3/7～5/7 of arc chamber length overall that negative electrode 5 puts in arc chamber.
3. it is characterized by the grid employing by the described Kaufman ion source of claim 1 and have the single hole extraction system that positive high voltage is drawn grid 3 and negative high voltage suppressor.
4. the attachment screw 21 that it is characterized by insulator by the described Kaufman ion source of claim 1 will be placed in the insulator body, and with the insulator end one gap is arranged.
5. it is characterized by the distance of paying between suppressor 20 and the insulator body by claim 1,4 described Kaufman ion sources is 0＜Δ L＜10 millimeter, (L
1* 2+L
2) * n＞2L.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 86201075 CN86201075U (en) | 1986-03-01 | 1986-03-01 | High-energy and broad beam divergent field koufmen ion gun for surface modification |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 86201075 CN86201075U (en) | 1986-03-01 | 1986-03-01 | High-energy and broad beam divergent field koufmen ion gun for surface modification |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN86201075U true CN86201075U (en) | 1986-12-31 |
Family
ID=4804915
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 86201075 Expired - Lifetime CN86201075U (en) | 1986-03-01 | 1986-03-01 | High-energy and broad beam divergent field koufmen ion gun for surface modification |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN86201075U (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101017761B (en) * | 2006-12-08 | 2010-05-12 | 珠海市恩博金属表面强化有限公司 | Metal gas mixing ion injector |
| CN102867719A (en) * | 2011-07-05 | 2013-01-09 | 北京中科信电子装备有限公司 | Ion source insulation device |
| CN102941930A (en) * | 2012-11-25 | 2013-02-27 | 中国航天科技集团公司第五研究院第五一〇研究所 | Surface electrification simulation test system and method for satellite tail regions |
| CN104362065A (en) * | 2014-10-23 | 2015-02-18 | 中国电子科技集团公司第四十八研究所 | Large-caliber parallel beam ion source used for ion beam etcher |
| CN112908812A (en) * | 2019-12-03 | 2021-06-04 | 株式会社沙迪克 | Surface modification apparatus and surface modification method |
-
1986
- 1986-03-01 CN CN 86201075 patent/CN86201075U/en not_active Expired - Lifetime
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101017761B (en) * | 2006-12-08 | 2010-05-12 | 珠海市恩博金属表面强化有限公司 | Metal gas mixing ion injector |
| CN102867719A (en) * | 2011-07-05 | 2013-01-09 | 北京中科信电子装备有限公司 | Ion source insulation device |
| CN102941930A (en) * | 2012-11-25 | 2013-02-27 | 中国航天科技集团公司第五研究院第五一〇研究所 | Surface electrification simulation test system and method for satellite tail regions |
| CN104362065A (en) * | 2014-10-23 | 2015-02-18 | 中国电子科技集团公司第四十八研究所 | Large-caliber parallel beam ion source used for ion beam etcher |
| CN112908812A (en) * | 2019-12-03 | 2021-06-04 | 株式会社沙迪克 | Surface modification apparatus and surface modification method |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C15 | Extension of patent right duration from 15 to 20 years for appl. with date before 31.12.1992 and still valid on 11.12.2001 (patent law change 1993) | ||
| RN01 | Renewal of patent term | ||
| C17 | Cessation of patent right | ||
| CX01 | Expiry of patent term |