CN85101725B - Dual light beams optical system for monitoring the thickness of optical coating - Google Patents

Dual light beams optical system for monitoring the thickness of optical coating Download PDF

Info

Publication number
CN85101725B
CN85101725B CN 85101725 CN85101725A CN85101725B CN 85101725 B CN85101725 B CN 85101725B CN 85101725 CN85101725 CN 85101725 CN 85101725 A CN85101725 A CN 85101725A CN 85101725 B CN85101725 B CN 85101725B
Authority
CN
China
Prior art keywords
optical system
double
monitoring
light
diplopore
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CN 85101725
Other languages
Chinese (zh)
Other versions
CN85101725A (en
Inventor
王占青
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Changchun Institute of Optics Fine Mechanics and Physics of CAS
Original Assignee
Changchun Institute of Optics Fine Mechanics and Physics of CAS
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Changchun Institute of Optics Fine Mechanics and Physics of CAS filed Critical Changchun Institute of Optics Fine Mechanics and Physics of CAS
Priority to CN 85101725 priority Critical patent/CN85101725B/en
Publication of CN85101725A publication Critical patent/CN85101725A/en
Publication of CN85101725B publication Critical patent/CN85101725B/en
Expired legal-status Critical Current

Links

Images

Landscapes

  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

The present invention relates to a double-beam optical system for monitoring the thickness of optical coatings, which is the same as the existing monitoring optical system with a single collector and a single light path in form. The present invention is characterized in that an equal dual-perforation light grating is arranged behind an angle-variable light filter (or a monochrometer output slot), a single light beam is divided into a reference beam and a measurement beam, a modulating sector with double row holes can respectively modulate the two light beams, and then a fully symmetrical double-beam optical system double beam optical system is formed. With the present invention, an electronic system can easily solves the problems of flat base line, drift, noise, hybrid light signals and electric magnetic field signal interference, and the influence of a sputtered film at a window of the vacuum chamber can be completely eliminated.

Description

Dual light beams optical system for monitoring the thickness of optical coating
The double beam optical system of monitoring optical coating thickness is a kind of transmission type optical system of vacuum coating optical means Thickness Monitoring, the double beam optical system of the monitoring optical coating thickness that existing and the present invention approaches is the most reflective (US-PS3645623), and on February 29th, 1972 is open).Accompanying drawing 1 is its optical system diagram, (15) be the power supply of light source (16), condenser (17) is made up of two lens (18) and (19), it is imaged on light source (16) on the plane mirror (21) that is positioned at lens (22) focus, light hurdle (23) has two logical light mouths (24) and (25), by incident single beam be divided into measure and with reference to two-beam, each logical light mouth is made up of 50 grid holes of per inch, modulate respectively this two-beam with tuning-fork type modulator (Chopper), being directional light and the reduced image of light hurdle (23) become on monitoring substrate (10) from lens (22) outgoing, its incident angle is 85.5 °, make half (13) reflection of measuring beam from substrate (10), reference beam is reflected from second half (14), the effect of baffle plate (12) is to block evaporant not allow and be plated on (14), (11) be vacuum chamber bell jar, (26) and (22) with, (32) (comprise (19) and (18)) and (17) with, (31) be the net grid of fixing adjustable 50 lines of per inch, plane mirror (27) energy permeation parts light, (28) and (33) be receiver.
Optical coating is widely used the method for optical monitoring film thickness at present, the blooming of particularly monitoring regular film system is like this, and be widely used transmission-type single beam optical system, there is not yet transmission-type double beam optical system, above-mentioned quote what plunder the monitoring of reflective double beam optical system is film geometric thickness.So blooming of inapplicable monitoring regular film system, in addition because the monitoring substrate that glancing incidence requires is very large, general itself is exactly plated film part, be difficult to maybe can not rotate, affect film thickness uniformity, while placing substrate in addition, need to adjust position to light, so its use is restricted also very inconvenient, can not be applicable to the optical means of utilizing transmitted light monitoring film thickness of current widespread use.
For addressing the above problem, the present invention is plunderred reflective double beam optical system and is modified into vertical transmission-type double beam optical system aforementioned, and only uses a receiver.See accompanying drawing 2, its formation is: on angle variable filter (3) (or monochromator goes out slit) rearmounted first-class diplopore light hurdle (4) and the common centreline that makes its diplopore vertically by the rotation (optical axis) of angle variable filter (3).Angle variable filter (3) is a circular piece, can realize continuous spectrum scanning, so it is a beam splitter around the vertical rotation of the axis by its center.Deng the upper distribution double rectangle hole in diplopore light hurdle (4), the size of rectangular opening is L × W (length is taken advantage of wide), two rectangular opening centre distance are C, C > L, the size of C+L is fixed by angle variable filter (3) lighting area (or monochromator slit is high), and W is by the spectrally resolved calibration requiring.By mirror condenser (1), light source (2) is imaged in etc. to diplopore light hurdle (4) upper, by diplopore outgoing is respectively to measure and with reference to two-beam.The double-row hole modulating fan (5) of uniform scallop hole on the circumference of two circles that wait a rearmounted edge, diplopore light hurdle (4) take D ± C as diameter, modulation is measured and reference beam respectively.The rotation of double-row hole modulating fan (5) is intersected vertically with the common centreline that waits diplopore light hurdle (4).D is optional diameter, the size of its determining modulation fan, scallop hole on a circumference is on the central angle separated time that on another circumference, adjacent two scallop holes form, straight flange is respectively on diameter; arc limit respectively take D and D ± 2C on the circumference of three circles of diameter; the size of arc will be slightly less than 2 π/n radian, and the quantity that n is scallop hole is fixed by modulating frequency.To wait diplopore light hurdle (5) to image in the plane at monitoring piece (8) place by lens (6), and make the logical light monitoring piece (8) of light beam of measuring, reference beam is passed through from monitoring piece (8) side blank space, lens (9) focus of the light beam into receiver (10), and (7) are vacuum chamber bell jars.
The good effect of invention: this transmission-type double beam optical system has simplicity and the dirigibility of the transmission-type single beam optical system of current widespread use, and there are its all purposes, the present invention has advantages of that double beam optical system makes electronic system be easy to Photoelectric Signal Processing, easily the impact of drift, noise, veiling glare and the interference of electromagnetic field and vacuum vessel port sputtered film reduced to minimum so that eliminate, wherein have plenty of the transmission-type of using single beam optical system very difficult or at all insurmountable, thus the precision of utility transmitted light monitoring film thickness.
Optimum implementation: light source (2) is the tungsten lamp with hectowatt power, makees monochromator with angle variable filter (3), simple and compact for structure, is easy to spectrum rapid scanning.Be L × W=3 × 1 Deng diplopore light hurdle (4) rectangular opening, centre distance C=4, determines that the D of double-row hole modulating fan (5) size and the quantity n of scallop hole are required to determine by actual design.Condenser (6) magnification is 2, and monitoring piece (8) is φ 8.Obviously doing monitor with this complete symmetry double light path can realize by development twin-beam automatic spectrum photometer technology.

Claims (3)

1. monitor the double beam optical system of optical coating thickness for one kind, by light source, diplopore light hurdle, modulator, lens, monitoring piece and receiver composition, it is characterized in that: modulator is double-row hole modulating fan (5), light source (2) and etc. be equipped with angle variable filter (3) between diplopore light hurdle (4), double-row hole modulating fan (5), lens (6), monitoring piece (8) and receiver (10) be vertical with optical axis the diplopore light hurdle (4) such as is placed in afterwards successively, monitoring piece (8) is placed in vacuum chamber, be on the conjugated image surface position of lens (6) by the hole of measuring beam with waiting in diplopore light hurdle (4).
2. by a kind of double beam optical system of monitoring optical coating thickness claimed in claim 1, it is characterized in that waiting the common centreline of two rectangular openings and the optical axis of angle variable filter (3) on diplopore light hurdle (4) to intersect vertically, rectangular opening is long is L, and two hole centre distance are C.
3. by a kind of double beam optical system of monitoring optical coating thickness claimed in claim 1, the rotation that it is characterized in that double-row hole modulating fan (5) intersects vertically with the common centreline that waits diplopore light hurdle (4), and scallop hole is distributed on respectively on the circumference of two circles take D ± C as diameter.Scallop hole on a circumference is on circumference of another circle on the central angle separated time that forms of adjacent two scallop holes, straight flange respectively on the diameter of modulating fan, arc limit respectively take D and D ± 2C on the circumference of three circles of diameter.
CN 85101725 1985-04-01 1985-04-01 Dual light beams optical system for monitoring the thickness of optical coating Expired CN85101725B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 85101725 CN85101725B (en) 1985-04-01 1985-04-01 Dual light beams optical system for monitoring the thickness of optical coating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 85101725 CN85101725B (en) 1985-04-01 1985-04-01 Dual light beams optical system for monitoring the thickness of optical coating

Publications (2)

Publication Number Publication Date
CN85101725A CN85101725A (en) 1986-08-06
CN85101725B true CN85101725B (en) 1987-10-07

Family

ID=4792018

Family Applications (1)

Application Number Title Priority Date Filing Date
CN 85101725 Expired CN85101725B (en) 1985-04-01 1985-04-01 Dual light beams optical system for monitoring the thickness of optical coating

Country Status (1)

Country Link
CN (1) CN85101725B (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1038614C (en) * 1994-08-05 1998-06-03 电力工业部南京电力环境保护科学研究所 In-line monitoring method of gas turbidity and dusty concentration and its monitor
CN100371492C (en) * 2004-08-06 2008-02-27 台达电子工业股份有限公司 Filming system and its film thickness monitoring device
CN100365467C (en) * 2005-04-08 2008-01-30 中国科学院上海光学精密机械研究所 Optical film thickness monitoring system

Also Published As

Publication number Publication date
CN85101725A (en) 1986-08-06

Similar Documents

Publication Publication Date Title
US2338234A (en) Evaporation of transparent material on glass
US4024291A (en) Control of vapor deposition
US5115677A (en) Methods and devices for determining the contact angle of a drop of liquid placed on a substrate
US7321424B2 (en) Self-referencing instrument and method thereof for measuring electromagnetic properties
US3620814A (en) Continuous measurement of the thickness of hot thin films
JPH11241162A (en) Sputtering method capable of optically monitoring and device therefor
CN109115730A (en) Spectral transmittance test macro and method based on tunable laser
CN113776442B (en) Spectrum detection device, film thickness real-time monitoring method and system and vacuum coating machine
KR20120052270A (en) Optical film thickness meter and thin film forming apparatus provided with optical film thickness meter
US6275295B1 (en) Optical system for determining physical characteristics of a solar cell
CN103162831A (en) Broadband polarization spectrograph and optical measurement system
CN85101725B (en) Dual light beams optical system for monitoring the thickness of optical coating
US2936732A (en) Production of optical filters
WO2015004755A1 (en) Optical film thickness measurement device, thin film forming device, and method for measuring film thickness
CN109030360A (en) Optical path adjustment method
US2547545A (en) Means for measuring the optical properties of films
CN100365467C (en) Optical film thickness monitoring system
CN115031841B (en) Optical measurement equipment, installation method and application method
CN111024372A (en) Point source transmittance testing system and method for optical device
CN115786869A (en) Optical monitoring mechanism and film coating device
WO2021159861A1 (en) Laser coaxial ion excitation device
CN218521333U (en) Optical monitoring mechanism and film coating device
CN207632878U (en) Improve the device of X ray reflection mirror uniformity of film and production efficiency
RU72336U1 (en) ACOUSTOPTIC RADIO SIGNAL METER
CN219015240U (en) Laser optical adjusting device and warping measuring system

Legal Events

Date Code Title Description
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
PB01 Publication
C06 Publication
C13 Decision
GR02 Examined patent application
C14 Grant of patent or utility model
GR01 Patent grant
C19 Lapse of patent right due to non-payment of the annual fee
CF01 Termination of patent right due to non-payment of annual fee