CN103162831A - Broadband polarization spectrograph and optical measurement system - Google Patents

Abstract

The invention provides a broadband polarization spectrograph. The broadband polarization spectrograph comprises a first reflection unit, a first condensation unit, a second condensation unit, a polarizer, a first plane mirror, a first curved surface mirror, a second refection unit, and a detection unit. A vertical incidence broadband polarization spectrograph which comprises reference beams improves light flux efficiency of detection beams, and complete combination of non-detection beams which act as the reference beams and the detection beams after beam split is achieved at the front end of a detector. In addition, the detection beams can focus on the surface of a sample without chromatic aberration, and meanwhile a polarization state of the detection beams is further maintained, and the complexity of a system is lower compared with the prior art. The invention further provides an optical measurement system which comprises the broadband polarization spectrograph.

Description

Wideband polarization spectrometer and optical measuring system

Technical field

The present invention relates to optical field, particularly a kind of wideband polarization spectrometer and optical measuring system.

Background technology

Fast development along with semicon industry, the three-dimensional appearance that utilizes optical measuring technique to detect quickly and accurately thickness, material behavior and the periodic structure of semiconductive thin film is the production control process, the key link of boosting productivity is mainly used in integrated circuit, flat-panel monitor, hard disk, solar cell etc. and comprises in the industry of membrane structure.The film that utilizes different materials, different structure has different reflectivity at different wave length to the incident light of different polarization states, and its reflectance spectrum has uniqueness.Current advanced film and three-dimensional structure measuring equipment, as ellipsometer test and optics critical dimension measuring instrument (Optical Critical Dimension, be called for short OCD) require satisfied spectral measurement ability of trying one's best wide to increase measuring accuracy, be generally 190nm to 1000nm.In the situation that the membrane structure parameter is known, the light reflecting thin film spectrum can draw by calculated with mathematical model.When having the unknown structure parameter, film thickness for example, the Film Optics constant, surface three dimension structures etc. can be by regretional analysis, match measurement and analog computation spectrum, thus draw the unknown structure parameter.

In general, the optical measurement of semiconductive thin film there are two kinds of methods, absolute reflectance mensuration and ellipsometric measurement method usually.Described in Chinese patent application 201110032744.8, when using the absolute reflectance mensuration to measure, need first Application standard sample to measure, and the measurement result of record standard sample is as the reference value, and then measurement testing sample, and the measurement result of testing sample is compared with the reference value that standard model measures, thereby obtain the relative actual value of testing sample.Due to light source itself, in the actual measurement process, its spectral intensity may change (drift).The spectral intensity of generally supposing in theory light source is duplicate when measurement standard sample and testing sample, but in fact, due to testing sample and standard model can't be measured at synchronization, the spectral intensity of light source changes can affect measurement result.

In view of the foregoing, those skilled in the art has proposed to utilize reference beam to come regulation light source to rise and fall.Be about to the light that light source sends and be divided into two bundles, wherein the optical information of optical recording sample is surveyed in a branch of conduct, another bundle conduct is with reference to light, by the measurement to reference beam, the spectral intensity of light source in the time of can recording respectively witness mark sample and testing sample, thereby in correction measurement process, the spectral intensity of light source changes, and improves measuring accuracy.

Measuring equipment is divided into usually with respect to the optical system of sample surfaces vertical incidence with respect to the optical system of sample surfaces oblique incidence.The optical system of vertical incidence usually can be integrated with other process equipments because structure is compacter, realizes producing and integration and the Real-Time Monitoring measured.In prior art, utilize the implementation method of the vertical incidence spectrometer of reference beam calibration to mainly contain following two kinds:

(1) as shown in Figure 1, the diverging light of light source 101 outgoing is after lens 102, and the parallel optical splitter 103 that is incident to, the light after passing through through optical splitter 103 transmissions be as detecting light beam, and the light that is reflected by optical splitter 103 is as the reference light beam.Detecting light beam focuses to sample 105 surfaces after lens 104 are assembled, the reflected light on sample 105 surfaces after lens 104 reflections, vertical incidence optical splitter 103, detecting light beam after optical splitter 103 reflections, assemble through lens 107, be incident to detector 108, obtain the reflectance spectrum of sample surfaces; The reference beam vertical incidence is to plane mirror 106, vertical incidence optical splitter 103 after plane mirror 106 reflections, reference beam after optical splitter 103 transmissions is also assembled through lens 107, be incident to detector 108, acquisition comprises the reference spectra (for example, referring to U.S. Patent No. 7067818B2, No.7189973B2 and No.7271394B2, U.S. Patent Application Publication No.2005/0002037A1) of light source light spectrum feature.In this spectrometer, can utilize and control the light beam that diaphragm is selected required measurement.This method has following benefit: can rise and fall by regulation light source, but owing to having adopted optical splitter, also there is following problem in this spectrometer: 1. luminous flux is low, in a whole measurement process, light beam is needed through same optical splitter transmission and is reflected each once by light source, enters detector.Suppose optical splitter be transmissivity and reflectivity each 50%, the highlight flux ratio that detecting light beam and reference beam can reach is 25%; If 2. realize simultaneously high-quality hot spot and wider spectral range, need to solve the problem of dispersion, system complexity and cost are all higher.

(2) insert a plane mirror in light path, the light part that light source sends is incided on plane mirror, another part passes through from the edge of plane mirror.Light beam after the plane mirror reflection impinges perpendicularly on sample surfaces as surveying light, the light beam that passes through from the plane mirror edge is as the reference light beam, detecting light beam and reference beam enter respectively two different spectrometers and measure simultaneously (for example, referring to U.S. Patent No. 5747813 and No.6374967B1).This method has following benefit: detecting light beam and reference beam can be measured simultaneously in measuring process, have proofreaied and correct accurately spectrum and the Strength Changes of light source; In system the loss of light intensity is less, and utilization factor is high.But owing to having used two different spectrometers, its electricity conversion is not quite similar, Wavelength distribution and resolution also are not quite similar, be difficult for calibration system, can reduce measuring accuracy on the contrary, on the other hand, the light channel structure more complicated of this scheme, be difficult for regulating, and two spectrometer meeting increasing device volumes, equipment cost increased.

When detecting a general size and be the wafer of 150 millimeters, 200 millimeters or 300 millimeters, due to the reasons such as thin layer stress on wafer, wafer surface may be uneven.Therefore, when whole wafer is detected, for the measurement that realizes pinpoint accuracy with guarantee the Quick Measurement of semiconductor production line output, be the technology of a key wherein to each measurement point automatic focus.And those skilled in the art is known, and the broadband detecting light beam is focused into relatively undersized hot spot on sample surfaces be favourable, because the small size hot spot can be measured micro structured pattern, and the broadband detecting light beam can improve measuring accuracy.In this case, when adopting lens to focus on, there are the following problems in meeting: lens have aberration usually, and such aberration can cause the focal position of different wave length different, increases error, reduces measuring accuracy; And, be difficult to find whole banded wavelength ranges is all had good radioparent lens material.In view of the foregoing, those skilled in the art has proposed a kind of like this method, use curved reflector, as elliptical mirror, toroidal reflectors (toroidal mirror), off-axis parabolic mirrors etc. focus on (for example, referring to U.S. Patent No. 5608526 and No.7505133B1, U.S. Patent Application Publication No.2007/0247624A1 and the open No.101467306A of Chinese patent application) on sample surfaces with the broadband detecting light beam.This method has following benefit: on whole banded wavelength ranges, catoptron can not produce aberration, and catoptron can all have high reflectance in wider wavelength coverage.But light beam can change through single mirror reflects rear polarizer attitude.Here take an aluminum catoptron as example.Reflectivity Rs and the Rp of S and P polarized light in two kinds of incident angle situations shown in Fig. 2 a.The reflectivity Rs that two top curves are S polarized lights, the reflectivity Rp that two following curves are P polarized lights.Solid line is corresponding to the incident angle of 45 degree, and dotted line is corresponding to the incident angle of 50 degree.Hence one can see that, and the reflectivity of S or P polarized light is unequal, and changes along with the difference of incident angle.S after reflection shown in Fig. 2 b and the phase differential between the P polarized light, solid line are corresponding to the incident angle of 45 degree, and dotted line is corresponding to the incident angle of 50 degree.Hence one can see that, and the phase differential between the S after reflection and P polarized light changes, and changes along with the difference of incident angle, and relevant to wavelength.In a word, when broad band light beam after mirror reflects, because the polarization state S of polarization direction quadrature and P have not identical reflectivity and phase place changes separately, the polarization state of light beam changes, cause being difficult to control the polarization variations (for example, referring to U.S. Patent No. 6829049B1 and No.6667805) of light beam.

Spectrometer defines the range of application of spectrometer to the control ability of polarization.For example, be widely used in now the optics critical dimension equipment OCD of integrated circuit production line technology controlling and process by measuring polarized light at reflectance spectrum and the phase characteristic of sample surfaces, the match Numerical Simulation Results, thickness and the optical constant of critical dimension (CD), three-dimensional appearance and the multilayer material of measurement sample surfaces periodic patterns.Realize that the spectrometer that critical dimension is measured requires its focusing system must accomplish to control the polarization state of light beam in focusing and light signal collection process, thereby can measure exactly sample.

Summary of the invention

Technical matters to be solved by this invention is to provide a kind of no color differnece of realizing, keeps polarization characteristic, light logical efficient high and the wideband polarization spectrometer and the optical measuring system that are easy to realize.

According to an aspect of the present invention, provide a kind of wideband polarization spectrometer to comprise light source, the first reflector element, the first light focusing unit, the second light focusing unit, polarizer, the first plane mirror, first surface catoptron, the second reflector element, probe unit, wherein:

The light beam that described the first reflector element is used for described light source is sent is divided into detecting light beam and reference beam two parts, and this two parts light beam is incident to respectively described the first light focusing unit and described the second light focusing unit;

Described the second reflector element be used for receiving at the same time or separately from the sample reflection successively through the detecting light beam of described first surface catoptron, described the first plane mirror, described polarizer, described the first light focusing unit and the reference beam by described the second light focusing unit, and received light beam is incident to described probe unit;

Described the first light focusing unit is used for receiving described detecting light beam, is incident to described polarizer after making this light beam become parallel beam;

Described polarizer is arranged between described the first light focusing unit and described the first plane mirror, be used for making described parallel beam by and be incident to described plane mirror;

Described the first plane mirror is used for receiving described parallel beam and this parallel beam being reflexed to described first surface catoptron;

Described first surface catoptron is used for and described parallel beam is become convergent beam, and will vertically focus on sample after this convergent beam reflection;

Described the second light focusing unit is used for receiving described reference beam, and it is incident to described the second reflector element;

Described probe unit is used for surveying the light beam that is reflected by described the second reflector element.

According to another aspect of the present invention, provide a kind of optical measuring system to comprise described perpendicular incident broadband spectrometer.

The wideband polarization spectrometer that comprises reference beam provided by the invention has been realized the complete combination of the light beam after the light splitting, improved the logical efficient of light of detecting light beam, in addition, focus on sample surfaces with can also making the detecting light beam no color differnece, the polarization state that keeps simultaneously light beam, and the complexity of system is lower than prior art.

Description of drawings

Fig. 1 realizes light splitting and the schematic diagram that closes light by optical splitter in prior art.

Fig. 2 a is S and the reflectivity Rs of P polarized light and the schematic diagram of Rp in two kinds of incident angle situations.

Fig. 2 b illustrates S after reflection and the schematic diagram of the phase differential between the P polarized light.

Fig. 3 a to Fig. 3 c is for the basic principle schematic of explaining by the polarization characteristic of two plane mirrors or a plane mirror and an off-axis parabolic mirror maintenance polarized light.

Fig. 4 is the schematic diagram that the calculation level in the incident light xsect distributes.

Fig. 5 is that the measured value by first three diverse location (that is, A, B and C position) can draw by curve the schematic diagram of the peaked position of quafric curve.

Fig. 6 is the optical schematic diagram that Rochon prism polarizer (Rochon Polarizer) is shown, and in the figure, RP represents the Rochon prism polarizer, and A represents diaphragm, the S representative sample.

Fig. 7 a and 7b be in the present invention by two not the coplanar flat catoptron realize the schematic diagram of light splitting.

Fig. 8 be in the present invention by two not the coplanar flat catoptron realize closing the schematic diagram of light.

Fig. 9 a and Fig. 9 b close beam cross-section shape and light beam imaging after light by what simulation obtained.

Figure 10 is the periodically structural drawing of shallow trench of monocrystalline silicon.

Figure 11 is the monocrystalline silicon absolute reflectance spectrogram of shallow trench TE and TM periodically in the absolute reflectance mensuration.

Figure 12 a is the schematic diagram that illustrates according to the vertical incidence wideband polarization spectrometer of first embodiment of the invention.

Figure 12 b utilizes optical splitter and pattern identification system to the index path of sample surfaces and detecting light beam focal imaging in the present invention.

Figure 13 a and Figure 13 b are the patterns that arrives by the pattern identification systematic observation.

Figure 14 is the schematic diagram that illustrates according to the vertical incidence wideband polarization spectrometer of second embodiment of the invention.

Figure 15 is the schematic diagram that illustrates according to the vertical incidence wideband polarization spectrometer of third embodiment of the invention.

Embodiment

For problems of the prior art, the present invention proposes a kind of no color differnece of realizing, keep polarization characteristic, the high and vertical incidence wideband polarization spectrometer that utilizes the reference beam calibration that is easy to realize of light logical efficient.In this spectrometer, the highlight flux ratio of detecting light beam and reference beam can reach 50%, and, vertical incidence wideband polarization spectrometer of the present invention only comprises a spectrometer, therefore, the spectrometer measurement precision that the present invention proposes is higher, and complexity and equipment cost are lower than prior art simultaneously.In addition, this vertical incidence light belt spectrometer comprises a polarizer at least, thereby can accurately measure anisotropy or non-homogeneous sample, as comprises three-dimensional appearance and the material optical constant of the film of periodic structure.

Explain the ultimate principle of the polarization characteristic that passes through two plane mirrors or a plane mirror and an off-axis parabolic mirror maintenance polarized light below with reference to Fig. 3 a, 3b and 3c.

As shown in Fig. 3 a, suppose that S (or P) light beam take the M1 plane of incidence as reference is incident on the first plane mirror M1 with the incident angle that (90-θ) spends, and reflexed to the second plane mirror M2 by the first plane mirror M1.When the plane of incidence of the first plane mirror M1 mutually vertical with the plane of incidence of the second plane mirror M2, and when the M2 degree of tilt satisfies the reflected light make M1 and is incident to M2 with (90-θ) degree incident angle, change P (or S) polarized light take the M2 plane of incidence as reference into through the S take the M1 plane of incidence as reference (or P) polarized light of M1 reflection.

Now take direction of beam propagation for the propagation of the right hand reference frame analysis light beam of+Z orientation determination and the variation of polarization state.Said process is expressed with mathematical formulae:

$\left\{\begin{array}{c}\mathrm{Ex}=E_{1s}\\ \mathrm{Ey}=E_{1p}\end{array}\right.---\left(a\right).$

Polarized component E take the M1 plane of incidence as reference _1s, E _1pBe defined as respectively in right hand reference frame+X and+the Y-direction component.After the M1 reflection,

$\left\{\begin{array}{c}{E}_{1s}^{\′}=r_{1s}{E}_{1s}\\ E_{1p}^{\′}=r_{1p}{E}_{1p}\end{array}\right.---\left(b\right).$

E′ _1s, E ' _1pBe respectively the reflected light polarized component take the M1 plane of incidence as reference; Wherein, r _1sAnd r _1pThe S and the P light polarization component that are respectively take the M1 plane of incidence as reference are incident on the reflectivity of the first plane mirror M1 with the angle of (90-θ).And,

$\left\{\begin{array}{c}{E}_{2s}=E_{1p}^{\′}\\ E_{2p}=-E_{1s}^{\′}\end{array}\right.---\left(c\right).$

E ' after the M1 reflection _1s, E ' _1pBe respectively the incident polarization component-E take the M2 plane of incidence as reference _2p, E _2sAfter the M2 reflection,

$\left\{\begin{array}{c}{E}_{2s}^{\′}=r_{2s}{E}_{2s}\\ E_{2p}^{\′}=r_{2p}{E}_{2p}\end{array}\right.---\left(d\right).$

E′ _2s, E _2pBe respectively the reflected light polarized component take the M2 plane of incidence as reference, r _2sAnd r _2pThe S and the P light polarization component that are respectively take the M2 plane of incidence as reference are incident on the reflectivity of the second plane mirror M2 with the angle of (90-θ).

Due to the right-hand rule, the S light polarization direction take the M1 plane of incidence as reference is the P light negative direction take the M2 plane of incidence as reference.Be defined in that in the right hand reference frame take direction of beam propagation as+Z orientation determination, the S light polarization component take the M1 plane of incidence as reference is always+X-axis.This light beam is after the M2 reflection, and the P light polarization direction take the M2 plane of incidence as reference is the X-axis positive dirction; So obtain, the S light polarization direction take the M2 plane of incidence as reference is the Y-axis negative direction.Have:

$\left\{\begin{array}{c}{E}_{2p}^{\′}=E_x^{\′}\\ E_{2s}^{\′}=-E_y^{\′}\end{array}\right.---\left(e\right).$

E′ _x, E ' _yBe the emergent light polarized component.In the situation that M1 and M2 have identical reflecting material and coating structure:

$\left\{\begin{array}{c}{r}_{1s}=r_{2s}\\ r_{1p}=r_{2p}\end{array}\right.---\left(f\right).$

Comprehensive above formula has:

$\{\frac{E_x}{E_y}=\frac{E_x^{\′}}{E_y^{\′}}---\left(g\right).$

In above formula (a)-(g), all variablees are plural number.By formula (g) as can be known, emergent light polarized component ratio equals incident light polarization component ratio.Therefore, by above-mentioned two plane mirrors, can keep the polarization characteristic of polarized light.

According to above-mentioned formula (a)-(e), those skilled in the art will appreciate that as long as the first plane mirror M1 and the second plane mirror M2 satisfy r _2sr _1p=r _2pr _1sRelation, just can obtain the relation of formula (g).That is to say, if two catoptrons satisfy r _2sr _1p=r _2pr _1sRelation, by these two catoptrons, can keep the polarization characteristic of polarized light.Hence one can see that, and mutual system vertical and that the identical plane mirror of incident angle consists of can ideally keep polarization characteristic to incident light by two plane of incidences.

In the situation that above hypothesis, one of them in two plane mirrors substituted by the reflecting material off-axis parabolic mirror identical with coating structure, the situation of small value aperture (NA, numerical aperture) has been carried out analog computation.Although light beam is through having deviation on polarization characteristic after the system that is made of plane mirror and off-axis parabolic mirror, when parallel beam was realized focusing on little NA, the deviation of polarization characteristic was not enough to affect the accuracy of measurement.For the polarization requirement of harshness, can further utilize the numerical evaluation correcting measured results.

If first plane mirror M1 in above-mentioned two plane mirrors is replaced by off-axis parabolic mirror OAP, take Fig. 3 b as example, directional light is circularly polarized light before inciding off-axis parabolic mirror OAP, namely, Ex=Ey, and Phase (Ex)-Phase (Ey)=90 degree, wherein, Ex and Ey are respectively the amplitudes of light beam electric vector in the x and y direction, and Phase (Ex) and Phase (Ey) are respectively the phase places of light beam electric vector in the x and y direction.After off-axis parabolic mirror focused on, the cone half-angle that focused beam forms was 4.2 degree (NA=0.073).Lambda1-wavelength is 210nm, and the calculation level in the incident light xsect distributes as shown in Figure 4, altogether 29 points (part is demarcated, and for example, (0,3) is to (0,0)).After numerical evaluation, change in the Strength Changes of the polarization at focus place and phase place and listed by table 1.The polarization Strength Changes is defined as | and Ex/Ey|-1, phase place is changed to Phase (Ex)-Phase (Ey)-90.As can be seen from Table 1, with (0,0) become centrosymmetric light beam to have quite approaching complementarity aspect polarization intensity and phase place variation, so can further be offset by plane mirror M2, polarization deviation when off-axis parabolic mirror OAP1 returns when incident light vertical incidence to sample.

Table 1

If second plane mirror M2 in above-mentioned two plane mirrors replaced by off-axis parabolic mirror OAP1, take Fig. 4 c as example, after off axis paraboloid mirror OAP1 focusing mirror, the cone half-angle that focused beam forms is 6.3 degree (NA=0.109734) by the directional light after plane mirror M1 reflection.In other conditions situation identical with table 1, after numerical evaluation, change in the Strength Changes of the polarization at focus place and phase place and listed by table 2.As can be seen from the table, with (0,0) become centrosymmetric light beam to have the complementarity that quite approaches aspect polarization intensity and phase place variation, point (3 with polarization phase deviation maximum, 0) be example, after system through plane mirror and off-axis parabolic mirror formation, its phase deviation is 4.7508 degree, but when detecting light beam is returned by sample surfaces, this calculation level light beam is reflected onto point (3,0), the phase deviation of this point can obtain the quite counteracting of size (4.3325 degree).So when incident light vertical incidence to sample can further be offset by off-axis parabolic mirror OAP1, polarization deviation when plane mirror M1 returns.Be that the present invention can further offset the polarization impact that curved reflector causes on the whole.

Table 2

Therefore, adopt such system that is consisted of by off-axis parabolic mirror and plane mirror can realize that not only incident light is focusing at the sample surfaces no color differnece, and basically also can keep the polarization characteristic of polarized light.

The above has only enumerated the situation that substitutes one of above-mentioned two plane mirrors with the reflecting material off-axis parabolic mirror identical with coating structure.Those skilled in the art will be appreciated that, not only plane mirror and off-axis parabolic mirror, the curved reflector that comprises other, as toroidal reflectors, ellipsoidal mirror or non-quadric surface catoptron etc. interior, when any two kinds of catoptrons satisfy above-mentioned relation, can basically keep the polarization characteristic of polarized light.

In sum, if it is identical mutually vertical (in the error range that this area allows with plane of incidence that two catoptrons have approximately uniform reflecting material and approximately uniform coating structure and satisfy the incident angle of main beam, namely, include the approximate identical and approximate orthogonal situation of plane of incidence of firing angle) condition, random polarization light remains unchanged through its polarization characteristic after these two catoptrons.Example with catoptron of identical reflecting material and coating structure is to remain on the catoptron that obtains with homogeneous plated film in vacuum chamber.

in addition, those skilled in the art can know, when detecting light beam focuses at sample surfaces, in order to make detecting light beam obtain less spot size and better image quality at sample surfaces, the numerical aperture that makes the sample surfaces focused beam is more favourable more than or equal to the numerical aperture of pointolite place light beam, and for fixing distance, the numerical aperture of pointolite place light beam is larger, the actual light beam light flux of collecting is larger, therefore, adopt the focus method of Fig. 4 c can make detecting light beam obtain larger numerical aperture than Fig. 4 b, namely, can obtain larger luminous flux, improve measuring accuracy.

As described below, there are two kinds of methods to realize focusing in broadband light spectrometer of the present invention.

First method realizes focusing on for the catoptrical change in signal strength of collecting by observation.Than focus state, after the spectrograph slit position was through calibration, out of focus can cause the part light of hot spot periphery to lose in collection optical system.On the preliminary basis that focuses on, can obtain to focus on the most accurately by seeking the light signal maximal value.Mathematical method and the basic step of fast searching focus can be: near focus, the relation of light signal strength and out of focus distance is approximately the quafric curve type, that is and, parabola shaped: I=-A (x-x ₀) ²+ B, wherein, I is light signal strength, x ₀Be the focal position, A, B are coefficient.As shown in Figure 5, the measured value by first three diverse location (that is, A, B and C position) can draw quafric curve peaked position by curve; Take the measured value of this position as newly-increased numerical point, matched curve again; With the method iteration until satisfy in theory | x _n+1-x _n|＜σ, wherein x _nBe the position of the n time focusing, x _n+1Be the n+1 time position of focusing that simulates in the measured value situation that increases by the n time position of focusing, σ is the degree of accuracy that system adjusts.

Second method is for realizing focusing on by the imaging definition of observing sample surfaces in described pattern identification system.At desirable focus state, after the pattern identification alliance is through calibration, have when sample surfaces focuses on the most clearly as.In the situation that image resolution ratio is definite, the sharpness of image is determined by the acutance (Sharpness) of image.The contrast at acutance presentation video edge.Or rather, acutance is that brightness is for the derivative amplitude in space.(that is, sample surfaces can identify in described pattern identification system), can lead to adjusting focal length and synchronously calculate image definition on the preliminary basis that focuses on.So, mathematical method and the basic step in conjunction with above-mentioned fast searching focus can obtain to focus on the most accurately

For the polarizer that adopts in the present invention, can adopt Rochon prism polarizer RP as shown in Figure 6.The material of Rochon prism polarizer can be MgF ₂, a-BBO, kalzit, YVO ₄Or quartzy.The Rochon prism polarizer utilizes birefringece crystal (o light is different from the refractive index of e light) to make the outgoing that forms an angle during by the Rochon prism interface of two bundle polarized lights of incident beam orthogonal directions, wherein o light and incident direction are consistent, with the outgoing of linear polarization light state.Different materials has different transmitted spectrum scopes, MgF ₂Can reach the spectral range of 130-7000nm.Because different materials has different o light and e optical index, so the angle of the o light in transmitted light and e light is not identical yet.For example, for MgF ₂Or quartzy, the angle of o light and e light is 1 to 2 degree, yet, for a-BBO or YVO ₄, this angle can reach 8 to 14 degree.This angle also partly depends on the corner cut θ of Rochon prism.By after polarizer, o light vertically is incident to sample S when the detecting light beam transmission, and e light is incident to sample S obliquely with angle α; When the folded light beam of sample surfaces can enter in polarizer optical aperture scope, its e reflection of light light beam can reflex to polarizer equally, then enters detector when e light, thereby impact is measured.For the larger polarizer in e light drift angle, its e light is difficult for reentering polarizer at the reflected light of sample surfaces.In order to improve measuring accuracy, avoid the impact of e reflection of light light, the position that the o light above sample surfaces separates with e light can arrange diaphragm A (as shown in Figure 6), to avoid e light to be incident to sample surfaces or its reflected light is reflected back polarizer.

Describe below with reference to Fig. 7 a, Fig. 7 b and Fig. 8 that or not first reflector element and second reflector element of coplanar flat catoptron are not realized respectively light splitting and the process of closing light by respectively comprising two.

(1) realize light splitting: as shown in Figure 7a, suppose: from the divergent beams of pointolite, after the light source light focusing unit, as, toroidal reflectors (M6) (or achromat) forms convergent beam, and be incident to the first reflector element after deflecting in the plane of incidence.The first reflector element is comprised of two not coplanar plane mirror M4 and M5, plane mirror M4 contains a linear edge, and this linear edge is in the light path of above-mentioned convergent beam, half of this convergent beam, be incident on plane mirror M4, deflect in the plane of incidence after plane mirror M1 reflection, form convergent beam B1.Another part convergent beam passes through from the linear edge of plane mirror M1, is incident to plane mirror M5, deflects in the plane of incidence after plane mirror M5 reflection, forms convergent beam B2.The major axes orientation of plane mirror M5 tilts slightly with respect to plane mirror M4 in the plane of incidence, and convergent beam B1 after plane mirror M4 and M5 reflection and the main beam of B2 are first intersected, and then separates, as shown in Figure 7a; Perhaps, convergent beam B1 and B2 are directly separated, as shown in Figure 7b.Since then, through the first reflector element, namely being divided into after plane mirror M4 and M5 can be respectively as the two-beam of surveying light and reference light from the light of pointolite.Before and after light splitting, the key light of this two-beam is in same plane all the time, and the linear edge of plane mirror M5 is vertical with this plane.

In addition, if the emission light beam that pointolite sends is assembled (as toroidal reflectors or achromat) without light focusing unit, but directly incident through the first reflector element of plane mirror M5 and M6 composition, can realize the effect of above-mentioned light splitting equally.

(2) realize closing light: as shown in Figure 8, the detecting light beam after the sample reflection, Yan Yuanlu are back to reference beam institute planar the time, are convergent beam.The second reflector element is comprised of two not coplanar plane mirror M2 and M3, the detecting light beam and the reference beam that return from sample surfaces are incident to respectively on the plane mirror M2 and M3 that forms the second reflector element, plane mirror M2 contains a linear edge shape at least, and the main beam of this linear edge and detecting light beam intersects, detecting light beam is after plane mirror M2 reflection, and incident also focuses in spectrometer SP.This spectrometer SP is positioned over the focus place of the detecting light beam of this convergence.Reference beam in same plane,, deflects in the plane of incidence, and is incident in same spectrometer SP through plane mirror M2 reflection as becoming convergent beam after reflecting objective through lens L or other collective opticses.By rotation and/or along direction of light (or in the other direction) plane of motion mirror M 3, can change the direction of propagation and/or the inflection point of reference beam, thereby the main beam that makes reference beam overlaps with the main beam of surveying the light light beam, and reference beam and detecting light beam are independent of each other.The focal position of reference beam can be by regulating along reference beam direction of light (or in the other direction) mobile convergence lens L (not shown).That is, regulating plane mirror M3 and condenser lens L can make reference beam incident and focus in same spectrometer SP.Since then, but from the incident and focusing in same spectrometer SP after the second reflector element reflection of the detecting light beam of different directions and reference beam.

According to the photoreduction process that closes shown in Figure 8, beam cross section after the detecting light beam that simulation obtains and reference beam reflect through the second reflector element is as shown in Fig. 9 a, by suitable light path design, detecting light beam and reference beam incide in same spectrometer simultaneously to be surveyed, and in this process, their propagation each other that is independent of each other.Detecting light beam and reference beam focus on imaging as shown in Fig. 9 b on spectrometer, in Fig. 9 b, survey detecting light beam and reference beam formed focal beam spot on spectrometer and vary in size, and this is due to due to the magnification difference in the two-beam during focusing.In the actual detection process, need to be that spectrometer selects the suitably measurement window (entrance slit) of size, so that reference beam can be detected as much as possible, thereby improve the signal to noise ratio (S/N ratio) of reference beam spectrum, reach the purpose that improves measuring accuracy.

Because plane mirror self does not affect the converged state of incident light and does not produce aberration, so adopt catoptron can change the direction of propagation of light beam when guaranteeing the convergent beam quality.Detecting light beam and reference beam can focus in same spectrometer simultaneously through after above-mentioned two plane mirrors.On the other hand, plane mirror can be realized the high reflectance in the broadband spectral scope, very low on the light intensity impact, in the present invention, the design of a spectrometer does not reduce spectrometer to the detection efficiency of detecting light beam and reference beam, therefore, the present invention has realized the complete combination of the light beam after the light splitting by suitable light path design, thereby when having realized improving the logical efficient of light, the complexity of system is lower than prior art.

The present invention can adopt the absolute reflectance mensuration, namely measures the absolute reflectance of two polarization states of sample on orthogonal directions.If measure the absolute reflectance of a sample, should do as follows:

A. the dark numerical value I of measure spectrum instrument _d0, the reading of spectrometer when namely entering spectrometer without light signal;

B. load reference sample, for example, naked silicon wafer obtains spectrum numerical value I _Si, and before or after the witness mark sample spectrum numerical value I of witness mark light beam at once _R0

C. load and measure testing sample, obtain spectrum numerical value I, and before or after measuring testing sample the spectrum numerical value I of witness mark light beam at once _R

D. the dark numerical value I of measure spectrum instrument _d

In above-mentioned steps, step a and b only need operation once within a period of time, for example, and in one hour, in one day, in a week or several weeks.And step c and d should operate when each the measurement again.If environment temperature is constant, perhaps the dark numerical value of spectrometer does not change in time, I _dCan use I _d0Replace.

Like this, the reflectivity of sample is:

$R=\frac{{I-I}_d}{(I_{\mathrm{Si}}-I_{d0})f\left(r\right)}R\left(\mathrm{Si}\right)=\frac{{I-I}_d}{(I_{\mathrm{Si}}-I_{d0})\left(\frac{I_R-I_d}{I_{R0}-I_{d0}}\right)}R\left(\mathrm{Si}\right)$

Wherein R (Si) is the absolute reflectance of reference sample, and R (Si) can measure obtain from other, or logical property calculation to reference sample draws, and is generally the reflectivity of naked silicon chip;

That reference beam is to the correction of sample reflectivity.

For example periodically in shallow ditch groove structure, as shown in figure 10, two polarization directions of quadrature are defined as respectively perpendicular to the direction TM of linear structure and are parallel to the direction TE of linear structure.When period p is 100 nanometers, live width w is 50 nanometers, when gash depth t is 50 nanometer, its reflectivity as shown in figure 11, wherein dotted line is TE polarization direction reflectivity, solid line is TM polarization direction reflectivity.

After measuring TE, TM absolute reflectance, return calculating by relatively reaching numerical value with Numerical Simulation Results, can measure thickness and the optical constant of critical dimension, three-dimensional appearance and the multilayer material of sample surfaces periodic patterns.In this case, described perpendicular incident broadband spectrometer can also comprise computing unit, this computing unit is used for calculated with mathematical model and the curvilinear regression match by reflectivity, the optical constant of calculation sample material, film thickness and/or be used for critical dimension characteristic or the three-dimensional appearance of the periodic structure of analytic sample.Periodic structure electromagnetical analogies computing method commonly used are rigorous couple-wave analysis (Rigorous Coupled-Wave Analysis, RCWA) now, and regression algorithm is the Levenberg-Marquardt algorithm.In the present invention, except theoretical measuring method, measuring process also relates to the processing that has the variation that the polarization sensitivity causes for polarizer rotation etc., and problems can solve by numerical method, and more specifically content can be with reference to U.S. Patent No. 6522406B1 and U.S. Patent No. 6665070B1.In the present invention, the linear polarization direction of the light beam of process polarizer is by the decision of the polarizer anglec of rotation, and the light source that is incident to polarizer can be the light beam of random polarization state.Be linearly polarized light after the light process polarizer of sample reflection, be incident in the process of detector at this light beam, the reference sample reflected light all experiences identical polarization variations with measurement sample reflected light, thus do not require the maintenance polarization state, to the Polarization-Sensitive no requirement (NR) of optics.

Below take concrete embodiment as example, the present invention is described in detail.

Embodiment one

Shown in Figure 12 a according to the perpendicular incident broadband spectrometer of the first embodiment of the present invention.as shown in Figure 12 a, this perpendicular incident broadband spectrometer comprises broadband pointolite SO, the first reflector element (comprises plane mirror M4, M5), active catch tabula rasa D, diaphragm A, the first light focusing unit (off-axis parabolic mirror OAP2), polarizer P, the first plane mirror M1, the first off-axis parabolic mirror OAP1, the second light focusing unit (lens L), the second reflector element (comprises plane mirror M2, M3), broadband spectral meter SP, movably beam-splitter BS (its particular location can with reference to Figure 12 b) and the pattern identification IRS of system.This pattern identification IRS of system comprises lens L ', lighting source (not shown) and CCD imager (not shown).Broadband pointolite SO can launch the divergent beams that comprise broadband spectral, this broadband spectral usually at deep ultraviolet near infrared range (approximately 190nm to 1100nm wavelength coverage in).In practice, broadband pointolite SO can be xenon lamp, deuterium lamp, tungsten lamp, Halogen lamp LED, mercury lamp, comprise the composite broadband light source of deuterium lamp and tungsten lamp, comprise the composite broadband light source of tungsten lamp and Halogen lamp LED, the composite broadband light source that comprises the composite broadband light source of mercury lamp and xenon lamp and comprise the deuterium tungsten halogen lamp.The light beam of these wideband light sources can be natural light (that is, degree of polarization equals zero).But this broadband pointolite can be also to be zero natural light pointolite by the degree of polarization that depolariser produces.The example of broadband pointolite SO comprises the Ocean Optics product HPX-2000 of company, HL-2000 and DH2000, and the Hamamatsu product L11034 of company, L8706, L9841 and L10290.The broadband spectral meter can be charge-coupled image sensor (CCD) or photodiode array (PDA) broadband spectral meter, for example, and Ocean Optics QE65000 spectrometer or B﹠amp; W TeckCypher H spectrometer.The example of the IRS of pattern identification system comprises the EDMUND product NT59-839 of company, NT59-743, the SEIWA FVL-5X-120D-C of company, FVL-6X-120D-C, bright sharp product XF-T6X-110D of Optical Co., Ltd etc.

The divergent beams of broadband pointolite SO emission are incident to plane mirror M3 and M4 can be divided into two bundles, and wherein a branch of for surveying light, another bundle is reference light.As preferably, this embodiment also comprises light source light focusing unit (curved reflector M6), this curved reflector M5 is set to form convergent beam between pointolite SO and plane mirror M 3, M4, this convergent pencil of rays is divided into two bundles by plane mirror M3 and M4, wherein a branch of for surveying light, another bundle is reference light.The below introduces respectively the light path of this two-beam: (1) as surveying light, diaphragm A is placed in the focus place of this convergent beam through the convergent beam of light key light in surface level of plane mirror M4 reflection.again disperse through the detection light after diaphragm, and be incident to the first light focusing unit, be off-axis parabolic mirror OAP2, the focus of off-axis parabolic mirror OAP2 overlaps with the focus of these divergent beams, these divergent beams are by the rear parallel beam that forms along continuous straight runs of axle parabolic mirror OAP2 reflection, this parallel beam is incident to plane mirror M1 after polarizer P, plane mirror M1 makes this parallel beam be incident to the first off-axis parabolic mirror OAP1 after 90-degree rotation in surface level, the first off-axis parabolic mirror OAP1 makes this parallel beam half-twist degree in perpendicular, be key light convergent beam vertically by the light beam after off-axis parabolic mirror OAP1 reflection, this convergent beam vertical incidence and focusing on sample surfaces.The reflected light of sample surfaces is incident to the OAP2 plane at light beam place before for the first time through getting back to after the first off-axis parabolic mirror OAP1, the first plane mirror M1, polarizer P, off-axis parabolic mirror OAP2 successively, and formation convergent beam, this convergent beam is incident to broadband spectral meter SP after reflecting through plane mirror M2 straight up.This broadband spectral meter SP will be placed on the focus place of the detecting light beam of the convergence after plane mirror M2 reflection.(2) edge from plane mirror M4 passes through, through the light of plane mirror M5 reflection as reference light.Plane mirror M5 tilts slightly with respect to M4, separates immediately again after the reference light after plane mirror M5 reflection and the detection light that reflects through plane mirror M4 intersect.Reference light is assembled becomes divergent beams after a bit, and these divergent beams are incident to the second light focusing unit, namely form again convergent beam after condenser lens L, are incident to straight up broadband spectral meter SP after plane mirror M3.

Those skilled in the art can know, by adjusting and/or rotational plane mirror M 3, can make the reference beam vertical incidence to spectrometer SP; By along or against the position of the incident direction mobile focusing lens L2 of reference beam, focus in spectrometer SP after can making the reflection of reference beam through plane mirror M2.

In the embodiment of the present invention, before detecting light beam is emitted to arrival off-axis parabolic mirror OAP2 from wideband light source SO, and through leaving off axis paraboloidal mirror OAP2 after sample reflection before arrive broadband spectral meter SP, reference beam all is in same perpendicular P1 before being emitted to arrival broadband spectral meter SP from wideband light source SO.Detecting light beam through after plane mirror M4 reflection before arrive off-axis parabolic mirror OAP1, and through leaving off-axis parabolic mirror OAP1 after the sample reflection before arrive plane mirror M2, be in sample surfaces parallel plane.

In the present invention, the light that pointolite sends has been divided into detecting light beam and reference beam two-beam through the first reflector element (after being plane mirror M4 and M5 reflection), the detecting light beam that returns from sample surfaces and reference beam through the second reflector element (being plane mirror M2 and M3) after, synthesize again the light beam of beam cross-section shape as shown in Fig. 4 a, thereby realized the purpose of detecting light beam and the public spectrometer of reference beam.

In the present invention, shifting board D can control by automatic or manual mobile, cuts off reference light or/and survey light.And when shifting board D be in detection light/or the light path of reference light outside the time, on corresponding light path without any impact, light beam switch complete after, the light path that do not need to reset can be carried out spectral measurement.Therefore vertical incidence spectrometer of the present invention can be realized the quick switching between reference beam and detecting light beam in measuring process easily.

In the present invention, polarizer can be thin film polarizer, glan thompson prism polarizer, Rochon prism polarizer, Glan-Taylor prism polarizer, Glan Laser polarizers.Especially, described polarizer is preferably the Rochon prism polarizer, and its material is preferably magnesium fluoride (MgF ₂).In the present embodiment, beam-splitter BS and mirror M 2 and M4 are the plane reflection elements that contains at least a linear edge shape, as, semicircle plane mirror, or square reflector.Those skilled in the art can know, the linear edge of beam-splitter BS, plane mirror M2 and M4 is parallel, and the key light of this linear edge and light beam intersects.This linear edge is acute angle shape preferably, to avoid the reflection to reference beam.

In addition, vertical incidence wideband polarization spectrometer of the present invention can also comprise the polarizer rotating control assembly, is used for controlling polarizer and rotates to adjust the light beam polarization direction.This polarizer rotating control assembly can adopt the various automatic rotating devices (manually also can realize measuring) of Electric Machine Control, as Newport Precision Rotation Stage URS150.

The sample of measuring is placed on an adjustable sample stage usually, as X-Y-Z-Theta or R-Theta-Z worktable.At semicon industry, the size of sample is the wafer of diameter 8 inches (200 millimeters) or 12 inches (300 millimeters) normally.In the flat-panel monitor industry, sample has the size more than 1 meter usually.For wafer, due to the reasons such as thin layer stress on wafer, the surface may be uneven.For the large scale sample, the distortion of sample surfaces possibility, perhaps, example platform may be uneven.Therefore, when sample is detected, for the measurement that realizes pinpoint accuracy and the Quick Measurement that guarantees semiconductor production line output, can again focus on each measurement point.

In the present invention, for fear of the optically focused effect of off-axis parabolic mirror OAP1, CCD imager imaging definition in the pattern identification IRS of system is impacted, the pattern identification IRS of system and optical splitter BS are positioned between off-axis parabolic mirror OAP1 and sample.

Before measuring sample, need utilizing the pattern identification system that the measurement point of sample surfaces is identified, located, this process only needs optical splitter is needed to move in light path and can realize along direction as shown in arrow in Figure 12 b.Concrete operations are: removable beam-splitter is moved in the light path of described detecting light beam (the sample folded light beam that comprises detecting light beam), its non-reflecting surface covers detecting light beam fully, its reflecting surface is incident to sample surfaces with illuminating bundle, this moment, the pattern of sample surfaces can imaging in the CCD imaging system, by the surperficial imaging definition of calculation sample, take the pattern identification IRS of system that calibrates as benchmark, sample is focused, can be at the chip sample picture on surface that obtains in the CCD imaging system as shown in Figure 13 a, in figure, darker square region is measurement point.After measurement point identification is completed, beam-splitter partly can be shifted out the light path of described detecting light beam, its non-reflecting surface shaded portions detecting light beam, its reflecting surface can reflex to sample surfaces with illuminating bundle, detecting light beam and illuminating bundle with the sample surfaces reflection reflexes to the CCD imaging system simultaneously, and its light path is as shown in Figure 12 b.This moment, detecting light beam and sample surfaces pattern all can imagings in the CCD imaging system, thereby by example platform movably, can aim at hot spot and measurement point.To on time, the image that observes in the CCD imaging system is as shown in Figure 13 b when hot spot and measurement point, and bright spot of view-field center is become image by detecting light beam.After above step is completed, can implement to measure to measurement point.Need during measurement beam-splitter BS is shifted out light path in described detecting light beam (this moment CCD imaging system in without image) fully, make the detecting light beam Free propagation to sample surfaces, thereby carry out spectral measurement.

In addition, except the variation judgement by light intensity in the observation spectrum meter focused on, the present invention also had the another kind of determination methods that focuses on, that is, focus by the imaging definition of observing CCD imager in the described pattern identification IRS of system.And deposit two kinds of focusing systems and improved the degree of accuracy that equipment focuses on.And, can realize the function that sample surfaces detecting light beam hot spot is aimed at the sample surfaces pattern.

According to the present embodiment, those skilled in the art can know, if plane mirror M1 and off-axis parabolic mirror OAP1 have identical reflecting material and coating structure and satisfy the identical and orthogonal condition of plane of incidence of the incident angle of light beam, when propagating in the light path of detecting light beam between polarizer and sample surfaces, polarization characteristic when arriving sample surfaces remains unchanged when leaving polarizer, the reflected light of sample, be generally elliptically polarized light, the polarization characteristic when returning to polarizer also remains unchanged when leaving sample.That is, when light beam was propagated between polarizer and sample surfaces, its polarization characteristic only changed to some extent because of the reflection of sample.In the present invention namely, focusing system and focusing process do not affect light polarization, described twin-beam vertical incidence Intensity modulation can be measured anisotropic film sample or non-uniform film sample according to measuring method mentioned above, as measures thickness and the optical constant of critical dimension (CD), three-dimensional appearance and the multilayer material of surperficial periodic patterns.

In the present embodiment, the linear polarization direction of the detecting light beam of process polarizer is by the decision of the polarizer anglec of rotation, and the light that is incident to polarizer can be the light beam of random polarization state.Be linearly polarized light after the light process polarizer of sample reflection, be incident in the process of detector at this light beam, the reference sample reflected light all experiences identical polarization variations with measurement sample reflected light, thus do not require the maintenance polarization state, to the Polarization-Sensitive no requirement (NR) of optics.

Use the vertical incidence wideband polarization spectrometer of the present embodiment not only can realize focusing on sample surfaces with making the detecting light beam no color differnece, accurately control simultaneously the polarization variations of detecting light beam, namely, the effect that can keep random polarization polarisation of light characteristic, can also proofread and correct the measuring error that the spectrum change of wideband light source in absolute reflectance method measuring process causes by shirtsleeve operation, in addition, owing to only need with a spectrometer, not increasing cost.

Embodiment two

The index path of twin-beam perpendicular incident broadband spectrometer according to a second embodiment of the present invention shown in Figure 14.The twin-beam vertical incidence wideband polarization spectrometer of the light path element of the present embodiment and measuring method and the first embodiment is basic identical, but the light path feature is slightly different, for simplicity, only the light path light path is done concise and to the point the description.

The light beam of broadband pointolite SO emission is after curved reflector M6 reflection, form convergent beam, the first reflector element, be that plane mirror M4 and M5 are divided into detecting light beam and reference beam two bundles with light beam, the second reflector element is incident to same spectrometer SP after namely plane mirror M2 and M3 detecting light beam that light beam will be returned from sample surfaces again and reference beam are combined into light beam.Different from the first embodiment is, the light beam after the M4 reflection is reference light, and passes through from the edge of M4, and the light beam after the M5 reflection is for surveying light, and in the present embodiment, reference light and survey light through after two-face mirror through intersecting, but directly separate.Reference beam is assembled becomes divergent beams after a bit, and these divergent beams are incident to the second light focusing unit (condenser lens L), form again convergent beam, and vertical incidence is to broadband spectral meter SP after plane mirror M3 reflection.And pass through from the edge of M5, the light beam after the M4 reflection is for surveying light.Surveying light is the convergent beam of key light in surface level, and diaphragm A is placed in the focus place of this convergent beam.again disperse through the detection light after diaphragm, and be incident to the first light focusing unit (off-axis parabolic mirror OAP2), these divergent beams are rear at the plane of incidence (surface level) intrinsic deflection 90 degree by off-axis parabolic mirror OAP2 reflection, form the parallel beam of along continuous straight runs, this parallel beam is incident to plane mirror M1 after polarizer P, plane mirror M1 makes this parallel beam form convergent beam after surface level intrinsic deflection 90 degree, this convergent beam focuses on sample surfaces after reflecting through the first off axis paraboloidal mirror OAP1, and its key light is that vertical incidence is to sample surfaces.The reflected light of sample surfaces, be incident to for the first time before OAP2 plane, light beam place and form convergent beam through returning after the first off-axis parabolic mirror OAP1, the first plane mirror M1, polarizer P, off-axis parabolic mirror OAP2 successively, after this convergent beam reflects through plane mirror M2, at plane of incidence intrinsic deflection 90 degree, vertical incidence is to broadband spectral meter SP.This broadband spectral meter SP is placed on the focus place of the detecting light beam of the convergence after plane mirror M2 reflection.Those skilled in the art can know, by adjusting and/or rotational plane mirror M 3, can make the reference beam vertical incidence to spectrometer SP; By along or against the position of the incident direction mobile focusing lens L2 of reference beam, focus in spectrometer SP after can making the reflection of reference beam through plane mirror M3.

Identical with the first embodiment is, before detecting light beam is emitted to arrival off-axis parabolic mirror OAP2 from wideband light source SO, and through leaving the second off axis paraboloidal mirror OAP2 after sample reflection before arrive broadband spectral meter SP, reference beam all is in the same plane vertical with sample surfaces before being emitted to arrival broadband spectral meter SP from wideband light source SO.Detecting light beam through after plane mirror M4 reflection before arrive off-axis parabolic mirror OAP1, and through leaving off-axis parabolic mirror OAP1 after the sample reflection before arrive plane mirror M2, be in sample surfaces parallel plane.

The present embodiment also can increase the pattern identification system as the first embodiment.The present embodiment can be implemented the measurement identical with the first described measurement of embodiment.

Embodiment three

The twin-beam perpendicular incident broadband spectrometer of a third embodiment in accordance with the invention shown in Figure 15.The light path element of the present embodiment and measuring method and first and second embodiment are basic identical.For simplicity, the below only does concise and to the point the description to the light path of the present embodiment.

As shown in figure 15, the light beam of broadband pointolite SO emission is divided into two bundles by plane mirror M5 and M6 after curved reflector M6, and wherein a branch of for surveying light, another bundle is reference light.Survey light through diaphragm A, off-axis parabolic mirror OAP2 is incident to plane mirror M1 after polarizer P, off-axis parabolic mirror OAP1, and rear vertical incidence is to sample surfaces.Through the detection light of sample surfaces reflection, through off-axis parabolic mirror OAP1, plane mirror M1, polarizer P, be incident in spectrometer SP after off-axis parabolic mirror OAP2, plane mirror M2; Reference light is incident to after plane mirror M3 in spectrometer SP through lens L.Different from the first embodiment is, the plane of incidence of detecting light beam on plane mirror M1 is mutually vertical with the plane of incidence at off-axis parabolic mirror OAP2.

In addition, before detecting light beam is emitted to arrival off-axis parabolic mirror OAP2 from wideband light source SO, and through leaving plane mirror M1 after sample reflection before arrive broadband spectral meter SP, reference beam all is in the same plane vertical with sample surfaces before being emitted to arrival broadband spectral meter SP from wideband light source SO.In the time of in the light path of detecting light beam between off-axis parabolic mirror OAP2 and off-axis parabolic mirror OAP1, be in the plane parallel with sample surfaces.

The present embodiment also can increase the pattern identification system as the first embodiment.The present embodiment can be implemented the measurement identical with the first described measurement of embodiment.

Described vertical incidence wideband polarization spectrometer also comprises a diaphragm between described polarizer and described sample in the above-described embodiments, be used for avoiding being incident to sample surfaces through the e light that produces after described polarizer, and/or its reflected light is reflected back polarizer.In addition, all diaphragm can be set in any one section light path in above-described embodiment, this diaphragm is in and diaphragm vertical with key light center by the position of key light, to regulate the actual numerical value aperture of surveying light.

In addition, vertical incidence wideband polarization spectrometer of the present invention can also comprise computing unit, and this computing unit is used for the optical constant of calculation sample material and/or is used for critical dimension characteristic or the three-dimensional appearance of the periodic micro structure of analytic sample material.

In above embodiment, the first off-axis parabolic mirror OAP1 can also can move against direction of light along direction of light, thereby can measure the different point of sample.

Please note, instruction according to this instructions, those skilled in the art will should be appreciated that, vertical incidence wideband polarization spectrometer of the present invention is not limited to disclosed concrete form in above-described embodiment, as long as under general plotting of the present invention, can carry out various distortion to broadband light spectrometer of the present invention.Broadband light spectrometer of the present invention can be applied to the thickness, optical constant of probing semiconductor film, optical mask, metallic film, thin dielectric film, glass (or plated film), laser mirror, organic film etc. and critical dimension and the three-dimensional appearance of the periodic structure that these materials consist of, and especially can be applied to measure whole yardsticks of the formed three-dimensional structure that planar has a peacekeeping two-dimensional and periodic of multilayer film and the optical constant of layers of material.In addition, adopt broadband light spectrometer of the present invention, can realize automatic focus, also can realize Manual focusing.

It should be noted last that, above embodiment is only unrestricted in order to technical scheme of the present invention to be described, although with reference to example, the present invention is had been described in detail, those of ordinary skill in the art is to be understood that, can modify or be equal to replacement technical scheme of the present invention, and not breaking away from the spirit and scope of technical solution of the present invention, it all should be encompassed in the middle of claim scope of the present invention.

Claims (27)

1. a wideband polarization spectrometer, is characterized in that, comprises light source, the first reflector element, the first light focusing unit, the second light focusing unit, polarizer, the first plane mirror, first surface catoptron, the second reflector element, probe unit, wherein:

The light beam that described the first reflector element is used for described light source is sent is divided into detecting light beam and reference beam two parts, and this two parts light beam is incident to respectively described the first light focusing unit and described the second light focusing unit;

Described the first light focusing unit is used for receiving described detecting light beam, is incident to described polarizer after making this light beam become parallel beam;

Described polarizer is arranged between described the first light focusing unit and described the first plane mirror, be used for making described parallel beam by and be incident to described the first plane mirror;

Described the first plane mirror is used for receiving described parallel beam and this parallel beam being reflexed to described first surface catoptron;

Described first surface catoptron is used for and described parallel beam is become convergent beam, and will vertically focus on sample after this convergent beam reflection;

Described the second reflector element be used for receiving at the same time or separately from the sample reflection successively through the detecting light beam of described first surface catoptron, described the first plane mirror, described polarizer, described the first light focusing unit and the reference beam by described the second light focusing unit, and received light beam is incident to described probe unit;

Described the second light focusing unit is used for receiving described reference beam, and it is incident to described the second reflector element;

Described probe unit is used for surveying the light beam that is reflected by described the second reflector element.

2. wideband polarization spectrometer according to claim 1, is characterized in that, described vertical incident broadband light spectrometer also comprises:

Light source light focusing unit, described light source light focusing unit are arranged between described light source and described the first reflector element, and the light that is used for described light source is sent becomes convergent beam.

3. wideband polarization spectrometer according to claim 2, is characterized in that, described light source light focusing unit comprises:

At least one lens and/or at least one curved reflector.

4. wideband polarization spectrometer according to claim 1, is characterized in that, described perpendicular incident broadband spectrometer also comprises:

Movably optical splitter and pattern identification system;

Described optical splitter and pattern identification system are between described first surface catoptron and sample;

Described pattern identification system comprises lens, lighting source and CCD imager;

Described movably optical splitter is used for the sample illuminating bundle that described pattern identification system provides is reflexed to sample surfaces and the folded light beam of sample surfaces is reflexed to described CCD imager; And light intensity that can be by observing described probe unit in described perpendicular incident broadband spectrometer and/or focus by the sharpness of observing the image in described pattern identification system.

5. according to claim 4 described wideband polarization spectrometer is characterized in that:

Described movably optical splitter is the plane mirror with at least one linear edge, and this plane mirror can be in fully, part is in or is not in fully in the light path of described detecting light beam.

6. wideband polarization spectrometer according to claim 1, is characterized in that, described perpendicular incident broadband spectrometer also comprises:

Be used for switching the light beam switch unit of described detecting light beam and described reference beam.

7. wideband polarization spectrometer according to claim 6 is characterized in that:

Described light beam switch unit is the movably light barrier that is arranged between described the first reflector element and the second reflector element, and described light barrier can be respectively or blocked simultaneously detecting light beam and reference beam.

8. wideband polarization spectrometer according to claim 1, is characterized in that, described perpendicular incident broadband spectrometer also comprises:

The adjustable example platform that is used for the carrying sample.

9. wideband polarization spectrometer according to claim 2, is characterized in that, described perpendicular incident broadband spectrometer also comprises:

Diaphragm, described diaphragm are placed in any one section light path of whole optical system.

10. wideband polarization spectrometer according to claim 9, is characterized in that, described perpendicular incident broadband spectrometer also comprises:

At least one diaphragm, described diaphragm are placed in the detecting light beam focus place that the convergent beam that formed by described light source light focusing unit is told.

11. wideband polarization spectrometer according to claim 1 is characterized in that, described perpendicular incident broadband spectrometer also comprises:

At least one diaphragm, described diaphragm are used for avoiding being incident to sample surfaces and/or its reflected light is reflected back described polarizer through the e light that produces after described polarizer between described polarizer and described sample.

12. wideband polarization spectrometer according to claim 1 is characterized in that, described perpendicular incident broadband spectrometer also comprises:

The polarizer rotating control assembly, this polarizer rotating control assembly is used for controlling the polarization direction of described polarizer.

13. wideband polarization spectrometer according to claim 1 is characterized in that, described perpendicular incident broadband spectrometer also comprises:

Computing unit, this computing unit are used for optical constant, the film thickness of calculation sample material and/or are used for critical dimension characteristic or the three-dimensional appearance of the periodic structure of analytic sample.

14. according to claim 1-13 described wideband polarization spectrometers of any one is characterized in that:

Described the first plane mirror and described first surface catoptron have identical reflecting material and coating structure, and satisfy identical or the approximate identical and plane of incidence of the incident angle of key light vertical or approximately perpendicular condition mutually.

15. wideband polarization spectrometer according to claim 14 is characterized in that:

The main beam of described detecting light beam differs in the incident angle on described the first plane mirror and incident angle on described first surface catoptron and is no more than 5 degree;

The orthogonal error of plane of incidence of the plane of incidence of described the first plane mirror incident beam and described first surface catoptron incident beam is less than 5 degree.

16. according to claim 1-13 described wideband polarization spectrometers of any one is characterized in that:

Described the first reflector element is made of at least two plane mirrors, and wherein, the key light that has at least a catoptron to have at least one linear edge and this edge line and light path intersects.

17. according to claim 1-13 described wideband polarization spectrometers of any one is characterized in that:

Described the first light focusing unit is off-axis parabolic mirror or toroidal reflectors.

18. according to claim 1-13 described wideband polarization spectrometers of any one is characterized in that:

Described the second light focusing unit is lens, lens combination, off-axis parabolic mirror or toroidal reflectors.

19. according to claim 1-13 described wideband polarization spectrometers of any one is characterized in that:

Described polarizer is the Rochon prism polarizer.

20. according to claim 1-13 described wideband polarization spectrometers of any one is characterized in that:

Described first surface catoptron is off-axis parabolic mirror or toroidal reflectors.

21. according to claim 1-13 described wideband polarization spectrometers of any one is characterized in that:

The angle of inclination of described the first plane mirror and/or locus are adjustable.

22. wideband polarization spectrometer according to claim 21 is characterized in that:

Described the first plane mirror moves along the direction of propagation of the key light of described convergent beam.

23. according to claim 1-13 described wideband polarization spectrometers of any one is characterized in that:

Described the second reflector element is made of at least two plane mirrors, consists of in the plane mirror of described the second reflector element, and the key light that has at least a catoptron to have at least one linear edge and this edge line and light path intersects.

24. according to claim 1-13 described wideband polarization spectrometers of any one is characterized in that:

Described probe unit is spectrometer.

25. according to claim 1-13 described wideband polarization spectrometers of any one is characterized in that:

Described light source is the light source that comprises multi-wavelength.

26. according to claim 1-13 described wideband polarization spectrometers of any one is characterized in that:

Described light source is xenon lamp, deuterium lamp, tungsten lamp, Halogen lamp LED, mercury lamp, comprise the composite broadband light source of deuterium lamp and tungsten lamp, comprise tungsten lamp and Halogen lamp LED the composite broadband light source, comprise the composite broadband light source of mercury lamp and xenon lamp or comprise the composite broadband light source of deuterium tungsten halogen, perhaps, described light source is to be zero natural light pointolite by the degree of polarization that depolariser produces.

27. an optical measuring system comprises according to claim 1-13 described wideband polarization spectrometers of any one.

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