CN2777752Y - Carriage for removing adhesive film on semiconductor wafer - Google Patents

Carriage for removing adhesive film on semiconductor wafer Download PDF

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Publication number
CN2777752Y
CN2777752Y CN 200520002339 CN200520002339U CN2777752Y CN 2777752 Y CN2777752 Y CN 2777752Y CN 200520002339 CN200520002339 CN 200520002339 CN 200520002339 U CN200520002339 U CN 200520002339U CN 2777752 Y CN2777752 Y CN 2777752Y
Authority
CN
China
Prior art keywords
substrate
mucous membrane
semiconductor wafer
disk
utility
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN 200520002339
Other languages
Chinese (zh)
Inventor
饶俊龙
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kingpak Technology Inc
Original Assignee
Kingpak Technology Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kingpak Technology Inc filed Critical Kingpak Technology Inc
Priority to CN 200520002339 priority Critical patent/CN2777752Y/en
Application granted granted Critical
Publication of CN2777752Y publication Critical patent/CN2777752Y/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

The utility model relates to a carrier for removing adhesive films on semiconductor wafers, and provides an auxiliary device for semiconductor manufacture, which has the advantages of convenient operation, simple structure and low production cost. The utility model comprises a base plate and an adsorbing structure, wherein the base plate is provided with an upper surface on which a wafer with adhesive films is arranged upward, a lower surface and a plurality of guiding pores which penetrate from the upper surface to the lower surface. The adsorbing structure is arranged at the lower surface of the base plate, is communicated with and absorbs the wafer through a plurality of guiding pores on the base plate.

Description

Remove mucous membrane carrier on the semiconductor wafer
Technical field
The utility model belongs to semiconductor manufacturing servicing unit, mucous membrane carrier on particularly a kind of removal semiconductor wafer.
Background technology
As shown in Figure 1, disk must grind 10, cutting 12, encapsulation 13 and test processing procedures such as 14 after finishing electronic circuit and making.Yet when wafer grinding, the electronic circuit on the protection disk must stick disk one deck mucous membrane usually, lives disk with protection.And after grinding is finished, again disk is placed on the mucous membrane removal board mucous membrane is removed automatically.But it is costly that mucous membrane is removed board, makes manufacturing cost improve relatively.And the mucous membrane in existing manufactory is removed the mucous membrane removal that board is only applicable to 8 disks, and along with the density of manufacture of semiconductor improves, 12 wafer design have become trend.But for existing manufactory, then must purchase the board that is fit to the production of 12 disks separately, it is millions of easily to comprise that mucous membrane is removed board, and real is huge expenditure of manufactory.Therefore, when 8 disks are converted to 12 disks, how to reduce purchasing of board, reduce production costs, real is the important topic that present manufactory must solve.
Summary of the invention
The purpose of this utility model provides mucous membrane carrier on a kind of easy and simple to handle, simple in structure, removal semiconductor wafer of reducing production costs.
The utility model comprises substrate and adsorption structure; Substrate is provided with upper surface for mucous membrane disk setting up, lower surface and connects several guide holes to lower surface by upper surface; Adsorption structure is arranged at the lower surface of substrate, and several guide holes are communicated with and adsorb disk on substrate.
Wherein:
Adsorption structure is for adsorbing into base lower surface the evacuator of vacuum state.
Because the utility model comprises substrate and adsorption structure; Substrate is provided with upper surface for mucous membrane disk setting up, lower surface and connects several guide holes to lower surface by upper surface; Adsorption structure is arranged at the lower surface of substrate, and several guide holes are communicated with and adsorb disk on substrate.During use, the disk that will adhere to mucous membrane is arranged on the upper surface of substrate, makes the top of mucous membrane towards substrate.When adsorption structure starts, several guide holes on the substrate adsorb into vacuum with the lower surface of substrate, and the disk that will be positioned on the upper surface of base plate adsorbs, can easily mucous membrane be removed, suitable facility in operation, needn't purchase the expensive board that removes separately, can effectively reduce production costs.And the utility model structure is quite simple, can effectively reduce production costs.Not only easy and simple to handle, and simple in structure, reduce production costs, thereby reach the purpose of this utility model.
Description of drawings
Fig. 1, be existing semiconductor manufacture flow path figure.
Fig. 2, be the utility model structural representation front view.
Fig. 3, be the utility model user mode schematic diagram.
Embodiment
As shown in Figure 2, the utility model comprises substrate 20 and adsorption structure 30.
Substrate 20 is provided with upper surface 22, lower surface 24 and connects several guide holes 26 to lower surface 24 by upper surface 22.
Adsorption structure 30 is arranged at the lower surface 24 of substrate 20, and adsorption structure 30 is so as to the lower surface 24 of substrate 20 being adsorbed into the evacuator of vacuum state.
As shown in Figure 3, during use, the disk 34 that will adhere to mucous membrane 32 is arranged on the upper surface 22 of substrate 20, makes the top of mucous membrane 32 towards substrate 20.When adsorption structure 30 starts, several guide holes 26 on the substrate 20 adsorb into vacuum with the lower surface 24 of substrate 20, and the disk 34 that will be positioned at the upper surface 22 of substrate 20 adsorbs, can easily mucous membrane 32 be removed, suitable facility in operation, needn't purchase the expensive board that removes separately, can effectively reduce production costs.And the utility model structure is quite simple, can effectively reduce production costs.

Claims (2)

1, mucous membrane carrier on a kind of removal semiconductor wafer is characterized in that it comprises substrate and adsorption structure; Substrate is provided with upper surface for mucous membrane disk setting up, lower surface and connects several guide holes to lower surface by upper surface; Adsorption structure is arranged at the lower surface of substrate, and several guide holes are communicated with and adsorb disk on substrate.
2, mucous membrane carrier on the removal semiconductor wafer according to claim 1 is characterized in that described adsorption structure is for adsorbing into base lower surface the evacuator of vacuum state.
CN 200520002339 2005-02-04 2005-02-04 Carriage for removing adhesive film on semiconductor wafer Expired - Fee Related CN2777752Y (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 200520002339 CN2777752Y (en) 2005-02-04 2005-02-04 Carriage for removing adhesive film on semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN 200520002339 CN2777752Y (en) 2005-02-04 2005-02-04 Carriage for removing adhesive film on semiconductor wafer

Publications (1)

Publication Number Publication Date
CN2777752Y true CN2777752Y (en) 2006-05-03

Family

ID=36745129

Family Applications (1)

Application Number Title Priority Date Filing Date
CN 200520002339 Expired - Fee Related CN2777752Y (en) 2005-02-04 2005-02-04 Carriage for removing adhesive film on semiconductor wafer

Country Status (1)

Country Link
CN (1) CN2777752Y (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107539596A (en) * 2017-09-29 2018-01-05 常熟市荣达电子有限责任公司 A kind of chip packaging box and its operating method
CN110790007A (en) * 2019-10-14 2020-02-14 湖北光安伦科技有限公司 Stripping and transferring device and method for Bar-shaped Bar of semiconductor laser

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107539596A (en) * 2017-09-29 2018-01-05 常熟市荣达电子有限责任公司 A kind of chip packaging box and its operating method
CN110790007A (en) * 2019-10-14 2020-02-14 湖北光安伦科技有限公司 Stripping and transferring device and method for Bar-shaped Bar of semiconductor laser

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Legal Events

Date Code Title Description
C14 Grant of patent or utility model
GR01 Patent grant
C17 Cessation of patent right
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20060503