CN221019124U - Integrated two-photon polymerization processing equipment - Google Patents
Integrated two-photon polymerization processing equipment Download PDFInfo
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- CN221019124U CN221019124U CN202320995866.5U CN202320995866U CN221019124U CN 221019124 U CN221019124 U CN 221019124U CN 202320995866 U CN202320995866 U CN 202320995866U CN 221019124 U CN221019124 U CN 221019124U
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Abstract
The utility model belongs to the technical field of material processing equipment, and particularly relates to integrated two-photon polymerization processing equipment. The integrated two-photon polymerization processing equipment can process a macroscopic structure and a microstructure, and has the advantage of high processing efficiency.
Description
Technical Field
The utility model belongs to the technical field of material processing equipment, and particularly relates to integrated two-photon polymerization processing equipment.
Background
The two-photon polymerization processing technology is a micro-nano manufacturing technology developed based on the two-photon absorption principle. The technology has the processing characteristics of true three-dimension, high resolution and the like, and is widely applied to multiple fields of micro-optics, micro-machinery, cell and tissue engineering, metamaterial and the like.
Although the technology can break through the optical diffraction limit to realize micro-nano resolution, the problems of low processing efficiency, limited processing size and the like exist, mainly because a high-power oil immersion objective lens is often adopted in the two-photon polymerization processing technology to achieve higher structural resolution, but the high-power oil immersion objective lens has short working distance and small field of view range, so that the longitudinal height and transverse width of the dimension of a processed structure are limited, and the processing efficiency of the structure is lower. How to achieve cross-scale-high precision structure fabrication is a challenge. A common objective lens can be used to expand the working distance and field width, thereby increasing the size and processing efficiency of the structure, but reducing the resolution of the processed structure. The method for manufacturing the large-size planar structure often adopts a splicing method, but has higher requirements on the precision of a moving platform, but the existing two-photon polymerization processing equipment cannot effectively and controllably combine macroscopic processing and microscopic processing, so that the industrialized application of the two-photon polymerization processing technology is limited.
Disclosure of utility model
The utility model aims to avoid the defects in the prior art and provide an integrated two-photon polymerization processing device which has the advantages of processing a macroscopic structure and a fine structure, but has high processing efficiency.
In order to achieve the above purpose, the present utility model provides the following technical solutions:
the integrated two-photon polymerization processing equipment is characterized in that: comprising
The laser optical path system comprises a laser, a shutter, a beam expander, a reflecting mirror, a scanning galvanometer and an objective lens component which are sequentially arranged along the output direction of a laser beam, wherein the objective lens component comprises an oil immersion objective lens and a common focusing objective lens, the oil immersion objective lens and the common focusing objective lens are switched to align the laser beam, the laser beam passing through the oil immersion objective lens scans a first processing structure for processing a material to be processed, the laser beam scanning mirror passing through the common focusing object processes a second processing structure for processing the material to be processed, and the structural resolution processed through the oil immersion objective lens is greater than that processed through the common focusing objective lens;
The motion system comprises a motion platform for placing a material to be processed, wherein the motion platform is an xyz three-dimensional motion platform, and the scanning galvanometer is an xy two-dimensional scanning galvanometer;
The motion control system is connected with the motion platform and the scanning galvanometer and is used for controlling xyz-axis three-dimensional motion of the motion platform and xy-plane scanning of the scanning galvanometer;
The laser controller is connected with the laser path system and used for controlling the on-off of the laser beam and adjusting the laser power;
The CCD visual positioning system is used for monitoring laser focus positioning and processing conditions at a focus;
The machine tool body system comprises a machine body and a cabinet, and the laser light path system, the motion platform, the motion control system and the CCD visual positioning system are arranged on the machine body.
In some embodiments, the laser is a fiber femtosecond laser.
In some embodiments, the motion platform is an air-bearing nano motion platform.
In some embodiments, the motion platform is connected with a Z-direction motion module.
In some embodiments, the parameters of the motion platform are: the stroke of XY is less than or equal to 50mm; the XY positioning precision is +/-200 nm; XY repeated positioning accuracy is +/-50 nm; z-axis travel is less than or equal to 20mm; z positioning accuracy is +/-200 nm; z repeated positioning accuracy is +/-100 nm; XYZ moving step is more than or equal to 0.3 mu m; the rotation angle of the A axis is less than or equal to 3 degrees; the rotation step of the A axis is less than or equal to 0.01 degrees; the bearing of the motion platform is 2KG.
In some embodiments, the immersion objective has a parameter of 60x, na1.35; the parameter of the common focusing objective lens is 40X and NA0.6.
The integrated two-photon polymerization processing equipment has the beneficial effects that:
(1) The integrated two-photon polymerization processing equipment has the objective lens component provided with the oil immersion objective lens and the common focusing objective lens, wherein the oil immersion objective lens can realize higher-precision micro-nano resolution processing, the common focusing objective lens can increase the structural size of a material to be processed, the processing efficiency is improved, the structural size can be macroscopically increased by switching the oil immersion objective lens and the common focusing objective lens, and a finer structure can be prepared on the basis of a macrostructure, so that the processing precision and the processing efficiency are simultaneously provided.
(2) The integrated two-photon polymerization processing equipment integrates a laser light path system, a motion system and a motion control system
The control system of the laser controller and the CCD visual positioning system and the numerical control equipment structure can realize industrialization of the two-photon polymerization processing technology, and are suitable for large-scale production and application.
(3) The integrated two-photon polymerization processing equipment is provided with the xy two-dimensional scanning galvanometer and the xyz three-axis motion platform, and the scanning galvanometer can rapidly scan in the xy plane, so that the manufacturing efficiency is improved; the motion platform has the advantages that the motion range is large, the motion precision is high, the splicing error of a manufacturing structure can be reduced, the manufacturing structure area of a material to be processed is increased, the combination of the scanning galvanometer and the xyz triaxial motion platform can improve the processing precision and the processing efficiency, and the structure with large structure range and high size precision can be manufactured.
Drawings
Fig. 1 is a schematic structure of an integrated two-photon polymerization processing apparatus in an embodiment.
Fig. 2 is a schematic flow chart of a composite superposition processing of a macrostructure and a microstructure of a material to be processed in the specific embodiment.
Detailed Description
Preferred embodiments of the present utility model will be described in more detail below with reference to the accompanying drawings. While the preferred embodiments of the present utility model are shown in the drawings, it should be understood that the present utility model may be embodied in various forms and should not be limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the utility model to those skilled in the art.
The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the utility model. As used in this specification and the appended claims, the singular forms "a", "an", and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. It should also be understood that the term "and/or" as used herein refers to and encompasses any or all possible combinations of one or more of the associated listed items.
It should be understood that although the terms "first," "second," "third," etc. may be used herein to describe various information, these information should not be limited by these terms. These terms are only used to distinguish one type of information from another. For example, first information may also be referred to as second information, and similarly, second information may also be referred to as first information, without departing from the scope of the utility model. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include one or more such feature. In the description of the present utility model, the meaning of "a plurality" is two or more, unless explicitly defined otherwise.
Example 1
The integrated two-photon polymerization processing device of this embodiment, as shown in fig. 1, includes a laser light path system, where the laser light path system includes a laser, a shutter, a beam expander, a reflector, a scanning galvanometer and an objective lens assembly sequentially disposed along a laser beam output direction, where the objective lens assembly includes an immersion objective lens and a normal focusing objective lens, the immersion objective lens and the normal focusing objective lens are switched to align with the laser beam, the laser beam passing through the immersion objective lens scans a first processing structure of a material to be processed, the laser beam scanning mirror passing through the normal focusing object processes a second processing structure of the material to be processed, and a structural resolution of the immersion objective lens is greater than a structural resolution of the normal focusing objective lens, so that the first processing structure processed by the immersion objective lens is a microstructure with respect to the second processing structure, and the second processing structure is a macrostructure.
The motion system comprises a motion platform for placing materials to be processed, wherein the motion platform is an xyz three-dimensional motion platform, and the splicing of processed structures is realized through high motion precision.
The scanning galvanometer is an xy two-dimensional scanning galvanometer.
The motion control system is connected with the motion platform and the scanning galvanometer and is used for controlling xyz-axis three-dimensional motion of the motion platform and xy-plane scanning of the scanning galvanometer;
The laser controller is connected with the laser light path system, and is provided with laser control software which can be software used for controlling the laser processing process on the market and is used for controlling the on-off of a laser beam, adjusting parameters such as laser power and the like.
And the CCD visual positioning system is used for monitoring the laser focus positioning and the processing condition at the focus, generating a processing program according to the information acquired by a CCD camera of the CCD visual positioning system, and automatically processing according to the program.
The machine tool body system comprises a machine tool body and a machine cabinet, wherein the laser light path system, the motion platform, the motion control system and the CCD visual positioning system are arranged on the machine tool body, the machine tool body is arranged to be a marble Dan Chuangshen, and the machine tool body plays a supporting role.
The integrated two-photon polymerization processing equipment has the objective lens component provided with the oil immersion objective lens and the common focusing objective lens, wherein the oil immersion objective lens can realize higher-precision micro-nano resolution processing, the common focusing objective lens can increase the structural size of a material to be processed, the processing efficiency is improved, the structural size can be macroscopically increased by switching the oil immersion objective lens and the common focusing objective lens, and a finer structure can be prepared on the basis of a macrostructure, so that the processing precision and the processing efficiency are simultaneously provided. The system integrates a laser path system, a motion control system, a laser controller of the motion control system, a control system of the CCD vision positioning system and a numerical control equipment structure, can realize industrialization of a two-photon polymerization processing technology, and is suitable for mass production and application. The scanning galvanometer and the xyz triaxial motion platform are arranged, so that the scanning galvanometer can rapidly scan in an xy plane, and the manufacturing efficiency is improved; the motion platform has the advantages of large motion range and high motion precision, can reduce splicing errors of the manufacturing structure, and increases the area of the manufacturing structure of the material to be processed. Therefore, the combination of the scanning galvanometer and the xyz triaxial moving platform can improve the machining precision and the machining efficiency, and can manufacture a structure with large structure range and high size precision.
As shown in fig. 1, the laser optical path system includes a laser, a shutter, a beam expander, a reflector and a galvanometer sequentially arranged along the laser output direction, and by using the laser optical path system, parameters of the laser and the trend of an optical path can be easily determined, and complex optical paths such as collimation and shaping of light beams are designed in the optical path transmission process between the scanning galvanometer and the focusing objective lens of an optical element, so that the laser light beam can be focused smoothly through the combination of the scanning galvanometer and the objective lens.
In this embodiment, the galvanometer includes a planar scan in an X direction and a planar scan in a Y direction.
The XYZ three-axis motion platform is matched with the vibrating mirror scanned in the XY plane, and the multi-motion-axis combined scanning processing can effectively improve the processing efficiency and increase the size of the manufacturing structure.
In this embodiment, the motion platform is an air-floating nano motion platform. The air-floating nanometer motion platform is an existing product, can be obtained in the market, can realize nanometer precision movement in the XYZ direction, and has higher machining precision. The air-floatation nanometer motion platform is provided with a Z-axis module, and can better drive the air-floatation nanometer motion platform to move on a Z axis.
In this embodiment, the laser is a femto-second laser, and the parameters of the immersion objective lens are 60x, na1.35; the parameter of the common focusing objective lens is 40X and NA0.6.
When the femtosecond laser is used, the power of the femtosecond laser is 2W, the common two-photon polymerization power is in mw level, the parameters of the common focusing objective lens are 60X, NA1.35 and 40X and NA0.6 in combination, so that the laser power can be improved, and the material reduction processing of the photosensitive material can be realized. In practice, the parameters of these optical elements can be adjusted according to the actual situation.
The machine tool is also matched with parts, and the parts can be key parts such as an adsorption platform, a pneumatic element, an electric appliance fitting, a water chiller and the like.
In this embodiment, the parameters of the laser and the optical components are preferably as shown in table 1:
TABLE 1
Example 2
The processing method of the integrated two-photon polymerization processing equipment disclosed in the embodiment adopts the integrated two-photon polymerization processing equipment disclosed in the embodiment 1, and comprises the following steps:
Placing a material to be processed on a motion platform, starting an optical path assembly, and processing the material to be processed, wherein when a first processing structure is processed, switching the oil immersion objective lens, focusing an optical path to the material to be processed through the oil immersion objective lens, and when a second processing structure is processed, switching the common focusing objective lens, and focusing the optical path to the material to be processed through the common focusing objective lens, so as to process; and simultaneously, controlling the motion path of the motion platform on the XYZ three axes to enable the laser focus to focus on the material to be processed on the motion platform. After a laser focus focuses on a material to be processed on a motion platform, scanning a vibrating mirror to perform two-dimensional scanning processing on the structure, and moving the motion platform downwards along a Z axis, and scanning successively until the required structure is completed; then, after the motion platform moves in the xy plane by a required distance under the instruction, repeating the steps again to finish the splicing processing of the large-area structure.
The processing method is as shown in fig. 2, wherein a layer of macrostructure is manufactured by switching a common focusing objective, a layer of microstructure is manufactured by switching a high-power oil immersion objective, and then the microstructure is manufactured by reciprocally staggering and laminating the two layers, and finally the integral structure is formed.
Wherein, the position of the material to be processed is controlled by the motion platform.
In this embodiment, the material to be processed is mainly a photosensitive resin material, and the prepared structure is applied to the fields of metamaterial and the like.
Example 3
To further illustrate the utility model, embodiments of the processing method of the integrated two-photon polymerization processing equipment are further described below: the laser adopted in the case is an infrared femtosecond laser, the laser wavelength is 1030nm, the repetition frequency is 50MHz, the pulse width is 300fs, and the average power is 2W. The nanometer motion platform and the scanning galvanometer are equipped to realize the motion in the xyz three-dimensional space.
The material to be processed adopted in the case is an Ormocer photoresist, belongs to organic modified ceramics, is optically transparent in the wavelength range of 400 nm-1600 nm, and has good physical properties and low shrinkage.
The pretreatment step before processing the material to be processed comprises the following steps: the glass substrate was cleaned in absolute ethanol and then removed for wiping, the Ormocer photoresist was uniformly coated on the glass substrate, and then heated in an oven to cure the photoresist, the oven temperature was set to 90 °, and the baking time was 10 minutes.
The method for processing the Ormocer photoresist comprises the following steps of: the poisson oil is coated in the objective lens to obtain an oil immersion objective lens, as shown in fig. 2, and then the oil immersion objective lens is processed under femtosecond laser, after focusing processing is finished under a common focusing objective lens, the oil immersion objective lens is switched to high-power oil immersion objective lens for further processing on the basis of the upper layer until the preparation of the whole structure is finished. And after the processing is finished, the material is taken down, the oil liquid is removed, and then the material is put into an oven to be heated for 15 minutes for further curing. And finally, removing redundant unprocessed materials from the developing solution to obtain the processed Ormocer photoresist.
The relative arrangement of the components and steps, numerical expressions and numerical values set forth in these embodiments do not limit the scope of the present application unless it is specifically stated otherwise. Meanwhile, it should be understood that the sizes of the respective parts shown in the drawings are not drawn in actual scale for convenience of description. Techniques, methods, and apparatus known to one of ordinary skill in the relevant art may not be discussed in detail, but should be considered part of the specification where appropriate. In all examples shown and discussed herein, any specific values should be construed as merely illustrative, and not a limitation. Thus, other examples of the exemplary embodiments may have different values. It should be noted that: like reference numerals and letters denote like items in the following figures, and thus once an item is defined in one figure, no further discussion thereof is necessary in subsequent figures.
In the description of the present application, it should be understood that the azimuth or positional relationships indicated by the azimuth terms such as "front, rear, upper, lower, left, right", "lateral, vertical, horizontal", and "top, bottom", etc., are generally based on the azimuth or positional relationships shown in the drawings, merely to facilitate description of the present application and simplify the description, and these azimuth terms do not indicate and imply that the apparatus or elements referred to must have a specific azimuth or be constructed and operated in a specific azimuth, and thus should not be construed as limiting the scope of protection of the present application; the orientation word "inner and outer" refers to inner and outer relative to the contour of the respective component itself.
Spatially relative terms, such as "above … …," "above … …," "upper surface on … …," "above," and the like, may be used herein for ease of description to describe one device or feature's spatial location relative to another device or feature as illustrated in the figures. It will be understood that the spatially relative terms are intended to encompass different orientations in use or operation in addition to the orientation depicted in the figures. For example, if the device in the figures is turned over, elements described as "above" or "over" other devices or structures would then be oriented "below" or "beneath" the other devices or structures. Thus, the exemplary term "above … …" may include both orientations "above … …" and "below … …". The device may also be positioned in other different ways (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.
In addition, the terms "first", "second", etc. are used to define the components, and are only for convenience of distinguishing the corresponding components, and the terms have no special meaning unless otherwise stated, and therefore should not be construed as limiting the scope of the present application.
The above description is only of the preferred embodiments of the present utility model and is not intended to limit the present utility model, but various modifications and variations can be made to the present utility model by those skilled in the art. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present utility model should be included in the protection scope of the present utility model.
Claims (6)
1. An integrated two-photon polymerization processing device, characterized in that: comprising
The laser optical path system comprises a laser, a shutter, a beam expander, a reflecting mirror, a scanning galvanometer and an objective lens component which are sequentially arranged along the output direction of a laser beam, wherein the objective lens component comprises an oil immersion objective lens and a common focusing objective lens, the oil immersion objective lens and the common focusing objective lens are switched to align the laser beam, the laser beam passing through the oil immersion objective lens scans a first processing structure for processing a material to be processed, the laser beam scanning mirror passing through the common focusing object processes a second processing structure for processing the material to be processed, and the structural resolution processed through the oil immersion objective lens is greater than that processed through the common focusing objective lens;
The motion system comprises a motion platform for placing a material to be processed, wherein the motion platform is an xyz three-dimensional motion platform, and the scanning galvanometer is an xy two-dimensional scanning galvanometer;
The motion control system is connected with the motion platform and the scanning galvanometer and is used for controlling xyz-axis three-dimensional motion of the motion platform and xy-plane scanning of the scanning galvanometer;
The laser controller is connected with the laser path system and used for controlling the on-off of the laser beam and adjusting the laser power;
The CCD visual positioning system is used for monitoring laser focus positioning and processing conditions at a focus;
The machine tool body system comprises a machine body and a cabinet, and the laser light path system, the motion platform, the motion control system and the CCD visual positioning system are arranged on the machine body.
2. The integrated two-photon polymerization process kit of claim 1, wherein: the laser is an optical fiber femtosecond laser.
3. The integrated two-photon polymerization process kit of claim 1, wherein: the motion platform is an air floatation nanometer motion platform.
4. An integrated two-photon polymerization process kit according to claim 3, characterized in that: the motion platform is connected with a Z-direction motion module.
5. The integrated two-photon polymerization process kit of claim 1, wherein: the parameters of the motion platform are as follows: the stroke of XY is less than or equal to 50mm; the XY positioning precision is +/-200 nm; XY repeated positioning accuracy is +/-50 nm; z-axis travel is less than or equal to 20mm; z positioning accuracy is +/-200 nm; z repeated positioning accuracy is +/-100 nm; XYZ moving step is more than or equal to 0.3 mu m; the rotation angle of the A axis is less than or equal to 3 degrees; the rotation step of the A axis is less than or equal to 0.01 degrees; the bearing of the motion platform is 2KG.
6. The integrated two-photon polymerization process kit of claim 1, wherein: the parameters of the immersion oil objective lens are 60X and NA1.35; the parameter of the common focusing objective lens is 40X and NA0.6.
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| Application Number | Priority Date | Filing Date | Title |
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| CN202320995866.5U CN221019124U (en) | 2023-04-27 | 2023-04-27 | Integrated two-photon polymerization processing equipment |
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| Application Number | Priority Date | Filing Date | Title |
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| CN202320995866.5U CN221019124U (en) | 2023-04-27 | 2023-04-27 | Integrated two-photon polymerization processing equipment |
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| CN221019124U true CN221019124U (en) | 2024-05-28 |
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| CN202320995866.5U Active CN221019124U (en) | 2023-04-27 | 2023-04-27 | Integrated two-photon polymerization processing equipment |
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