CN220696377U - Micro-nano bubble water manufacturing system - Google Patents
Micro-nano bubble water manufacturing system Download PDFInfo
- Publication number
- CN220696377U CN220696377U CN202322273822.4U CN202322273822U CN220696377U CN 220696377 U CN220696377 U CN 220696377U CN 202322273822 U CN202322273822 U CN 202322273822U CN 220696377 U CN220696377 U CN 220696377U
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- Prior art keywords
- water
- micro
- buffer tank
- nano bubble
- gas
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 136
- 239000002101 nanobubble Substances 0.000 title claims abstract description 50
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 22
- 238000001914 filtration Methods 0.000 claims abstract description 11
- 239000007788 liquid Substances 0.000 claims description 31
- 239000000725 suspension Substances 0.000 claims description 10
- 230000005540 biological transmission Effects 0.000 claims description 7
- 238000000034 method Methods 0.000 abstract description 32
- 235000012431 wafers Nutrition 0.000 abstract description 12
- 238000004140 cleaning Methods 0.000 abstract description 11
- 239000007789 gas Substances 0.000 description 43
- 239000008367 deionised water Substances 0.000 description 7
- 229910021641 deionized water Inorganic materials 0.000 description 7
- 239000002245 particle Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000001179 sorption measurement Methods 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000009423 ventilation Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02W—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO WASTEWATER TREATMENT OR WASTE MANAGEMENT
- Y02W10/00—Technologies for wastewater treatment
- Y02W10/10—Biological treatment of water, waste water, or sewage
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The utility model discloses a system for manufacturing micro-nano bubble water, which comprises: a buffer tank; the mixing module is connected with the buffer tank, an external air source and an external water source, mixes air provided by the air source and water provided by the water source to form micro-nano bubble water, and conveys the micro-nano bubble water to the buffer tank; the filtering module is connected with the buffer tank, and is used for filtering the micro-nano bubble water and outputting the micro-nano bubble water; and the control module is electrically connected with the mixing module and used for controlling the transportation of water flow and gas. The utility model can produce micro-nano bubble water with different sizes, the gas source type is variable, the gas consumption is small, and the utility model is suitable for cleaning process of various wafers.
Description
Technical Field
The utility model relates to the technical field of semiconductors, in particular to a micro-nano bubble water manufacturing system.
Background
In a wafer-oriented processing process, cleaning is one of the very important processes. The cleaning objects are organic matters, metals and particles on the wafer, wherein the washing mode using water as a medium has major advantages in terms of reliability and operation convenience. The micro-nano bubble water is a method which does not damage the wafer substrate and has a good prospect in the single wafer spin cleaning process.
In the prior art, the methods for manufacturing micro-nano bubble water mainly comprise the following six methods, namely an electrolytic method, a solution replacement method, a cavitation method, a pressure solution gas method, a hydraulic shearing method and a porous membrane adsorption ventilation method, and the following two methods are adopted in the semiconductor field:
cavitation, i.e. the process of forming cavities, growing and eventually collapsing by gas in the liquid and at the solid-liquid interface when the local pressure in the liquid is reduced. For example, ultrasonic wave/megasonic wave is adopted, the principle is that a high-frequency oscillation current is sent out by a sonic power supply, and converted into mechanical vibration waves through a transducer to be transmitted into a cleaning medium, so that cavitation and sonic flow phenomena are generated in liquid, and particles attached to the surface of a wafer are removed under the resultant force of the cavitation and sonic flow phenomena. When the vibration frequency of the transducer is lower, the size of bubbles is larger, the impact force generated during the breaking is larger, the capability of removing particles is stronger, and the damage to the surface of the wafer is larger. In recent years, a method of dissolving hydrogen gas in pure water and adding megasonic waves has been used for cleaning the wafer surface, but as the line width of the chip pattern becomes narrower and the aspect ratio becomes larger, a phenomenon of breaking the pattern by the megasonic waves occurs, resulting in a decrease in the production yield.
The porous membrane adsorption gas permeation method is a method of dissolving gas by using a liquid bath. The porous breathable film is used as a separating medium of liquid and gas, the porous breathable film is immersed in deionized water, high-purity gas is introduced into the porous breathable film, and the high-purity gas is separated out from micropores on the breathable film to generate microbubbles. The bubbles generated by the method are mainly micro bubbles and large bubbles, cannot be suitable for chip manufacturing processes with smaller line width, and have larger consumption.
Disclosure of Invention
According to an embodiment of the present utility model, there is provided a micro-nano bubble water manufacturing system, including:
a buffer tank;
the mixing module is connected with the buffer tank, an external air source and an external water source, mixes air provided by the air source and water provided by the water source to form micro-nano bubble water, and conveys the micro-nano bubble water to the buffer tank;
the filtering module is connected with the buffer tank, and is used for filtering the micro-nano bubble water and outputting the micro-nano bubble water;
and the control module is electrically connected with the mixing module and used for controlling the transportation of water flow and gas.
Further, the mixing module includes:
the gas transmission assembly is connected with the top of the buffer tank and the gas source and used for transmitting gas into the buffer tank;
the mixing piece is provided with a first air inlet, a first water inlet and a first water outlet, and the first air inlet and the first water outlet are connected with the top of the buffer tank;
the water delivery assembly is connected with the first water inlet and the water source and is used for delivering water to the mixing piece;
the control module is electrically connected with the water delivery assembly and the gas delivery assembly and controls the delivery of water flow and gas.
Further, the gas delivery assembly comprises: a pressure valve and a gas line;
two ends of the gas transmission pipeline are respectively connected with the gas source and the top of the buffer tank;
the pressure valve is arranged on the gas pipeline and is electrically connected with the control module.
Further, the mixing element is an ejector.
Further, the water delivery assembly comprises: a water pipe and a magnetic suspension centrifugal pump;
two ends of the water pipe are respectively connected with the water source and the mixing piece;
the magnetic suspension centrifugal pump is arranged on the water conveying pipeline and is electrically connected with the control module.
Further, the filtration module comprises: a filter and a check valve;
the filter is provided with a second water inlet, a second water outlet and an exhaust port, and the second water inlet is connected with the bottom of the buffer tank;
two ends of the check valve are respectively connected with the top of the buffer tank and the exhaust port;
the filter filters the micro-nano bubble water and returns unqualified gas to the buffer tank.
Further, the method further comprises the following steps: and the two ends of the continuous liquid level sensor are respectively connected with the top and the bottom of the buffer tank and are electrically connected with the control module, and the continuous liquid level sensor detects liquid level information in the buffer tank and feeds back the liquid level information to the control module.
According to the manufacturing system of the micro-nano bubble water, micro-nano bubble water with different sizes can be generated, the air source type is variable, the air consumption is low, and the manufacturing system is suitable for cleaning processes of various wafers.
It is to be understood that both the foregoing general description and the following detailed description are exemplary and are intended to provide further explanation of the technology claimed.
Drawings
Fig. 1 is a schematic diagram of a system for manufacturing micro-nano bubble water according to an embodiment of the utility model.
Detailed Description
The preferred embodiments of the present utility model will be described in detail below with reference to the attached drawings, which further illustrate the present utility model.
First, a system for manufacturing micro-nano bubble water according to an embodiment of the present utility model will be described with reference to fig. 1, and the system is used for manufacturing micro-nano bubble water and has a wide application range.
As shown in fig. 1, a system for manufacturing micro-nano bubble water according to an embodiment of the present utility model includes: a buffer tank 1; a mixing module, a filtering module and a control module 4.
Specifically, as shown in fig. 1, in this embodiment, the mixing module is connected to the buffer tank 1, an external air source 21, and an external water source 22, where the water source 22 is usually deionized water with a conductivity of 18Ω·m or more, and the air source 21 may be ammonia, hydrogen or carbon dioxide; the mixing module mixes the gas provided by the gas source 21 and the water flow provided by the water source 22 to form micro-nano bubble water, and conveys the micro-nano bubble water to the buffer tank 1; the filtering module is connected with the buffer tank 1, and filters micro-nano bubble water and outputs the micro-nano bubble water; the control module 4 is electrically connected with the mixing module and controls the transportation of water flow and gas. The device can integrally generate micro-nano bubble water with different sizes, the type of the air source 21 of the system is variable, the air consumption is small, and the system is suitable for cleaning processes of various wafers.
Further, as shown in fig. 1, in the present embodiment, the mixing module includes: the gas transmission component is connected with the top of the buffer tank 1 and the gas source 21 and is used for transmitting gas into the buffer tank 1; the mixing element 23, the mixing element 23 has a first air inlet, a first water inlet and a first water outlet, the first air inlet and the first water outlet are connected with the top of the buffer tank 1, in this embodiment, the mixing element 23 is an ejector, the ejector can generate a siphoning effect, gas at the top of the buffer tank 1 is introduced into deionized water to form gas-liquid turbulence and generate micro-nano bubble water, the unordered movement of the gas and the liquid can cause a large number of micro-nano bubbles to be generated, and the formed micro-nano bubble water enters the buffer tank 1 from the top of the buffer tank 1 through the first water outlet; the water delivery assembly is connected with the first water inlet and the water source 22 and delivers water to the mixing piece 23; the control module 4 is electrically connected with the water delivery assembly and the gas delivery assembly and controls the delivery of water flow and gas.
Further, as shown in fig. 1, in the present embodiment, the gas delivery assembly includes: a pressure valve 24 and a gas line 25; two ends of the gas pipeline 25 are respectively connected with the gas source 21 and the top of the buffer tank 1; the pressure valve 24 is disposed on the gas pipeline 25 and electrically connected to the control module 4, and the pressure valve 24 is used for controlling the pressure in the buffer tank 1, and is electrically linked with the control module 4 to ensure that the pressure in the buffer tank 1 is maintained to operate under a given pressure condition.
Further, as shown in fig. 1, in the present embodiment, the water delivery assembly includes: a water pipe 26 and a magnetic suspension centrifugal pump 27; two ends of the water pipe 26 are respectively connected with the water source 22 and the mixing piece 23; the magnetic suspension centrifugal pump 27 is arranged on the water conveying pipeline 26 and is electrically connected with the control module 4, and the magnetic suspension centrifugal pump 27 is used for pressurizing water flow, so that the pressure of the pressurized water is greater than that of the buffer tank 1, firstly, the water source 22 power capable of generating siphonage is provided for the ejector, and secondly, the gas in the buffer tank 1 is ensured not to flow backwards.
Further, as shown in fig. 1, in the present embodiment, the filtering module includes: a filter 31 and a check valve 32; the filter 31 is provided with a second water inlet, a second water outlet and an exhaust port, and the second water inlet is connected with the bottom of the buffer tank 1; both ends of the check valve 32 are respectively connected with the top of the buffer tank 1 and the exhaust port; the filter 31 filters the micro-nano bubble water and returns the reject gas to the buffer tank 1. The generated micro-nano bubble water flows out from the bottom of the buffer tank 1, wherein bubbles larger than 50nm are filtered by the filter 31 and returned to the top of the buffer tank 1 from an exhaust port at the top of the filter 31; bubbles smaller than 50nm are delivered to a downstream stage as process water for cleaning the wafer after passing through the filter 31, and a check valve 32 is used to prevent gas from flowing into the filter 31 from the top of the buffer tank 1.
Further, as shown in fig. 1, in this embodiment, the method further includes: the continuous liquid level sensor 5, the both ends of continuous liquid level sensor 5 link to each other with buffer tank 1 top and bottom respectively to with control module 4 electrical connection, continuous liquid level sensor 5 detects the liquid level information in the buffer tank 1 and feeds back to control module 4, continuous liquid level sensor 5 continuously monitors the liquid level variation of buffer tank 1, can acquire the flow difference of intaking and play water according to the information of liquid level variation, control module 4 in time adjusts the rotational speed and the pressure valve 24 of magnetic suspension centrifugal pump 27 according to the liquid level information of continuous liquid level sensor 5 feedback, control the rivers and the gas flow size that get into in the buffer tank 1.
Working principle: after deionized water introduced from a factory system enters the system, the pressure of the deionized water is increased to a certain pressure by a magnetic suspension centrifugal pump 27, and the pressure of the pressurized water is higher than that of the buffer tank 1, firstly, a water source 22 power capable of generating siphonage is provided for an ejector, and secondly, the gas in the buffer tank 1 is ensured not to flow backwards; after the pressurized deionized water enters the ejector, the ejector can generate a siphon effect to suck the gas in the buffer tank 1 and mix the gas with the deionized water; at this time, disordered movement of the gas and liquid may result in the generation of a large number of micro-nano bubbles; micro-nano bubble water formed in the ejector falls into the buffer tank 1 from the top of the buffer tank 1; after the high-purity gas introduced from the factory system enters the system, the pressure is stably conveyed into the buffer tank 1 under the control of the pressure valve 24, and the pressure in the buffer tank 1 is maintained stable; the continuous liquid level sensor 5 continuously monitors the liquid level change of the buffer tank 1, and can acquire the flow difference value of the inlet water and the outlet water according to the information of the liquid level change; the control module 4 timely adjusts the rotating speed of the magnetic suspension centrifugal pump 27 according to the liquid level information fed back by the continuous liquid level sensor 5, and controls the flow entering the buffer tank 1; the generated micro-nano bubble water flows out from the bottom of the buffer tank 1, wherein bubbles larger than 50nm are filtered by the filter 31 and returned to the top of the buffer tank 1 from an exhaust port at the top of the filter 31; the bubbles smaller than 50nm are transferred to a downstream machine as process water for cleaning the wafer after passing through the filter 31.
In the above, the system for manufacturing micro-nano bubble water according to the embodiment of the utility model is described with reference to fig. 1, which can generate micro-nano bubble water with different sizes, has variable types of air sources 21 and small air consumption, and is suitable for cleaning processes of various wafers.
It should be noted that in this specification the terms "comprises," "comprising," or any other variation thereof, are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements does not include only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising … …" does not exclude the presence of additional identical elements in a process, method, article, or apparatus that comprises an element.
While the present utility model has been described in detail through the foregoing description of the preferred embodiment, it should be understood that the foregoing description is not to be considered as limiting the utility model. Many modifications and substitutions of the present utility model will become apparent to those of ordinary skill in the art upon reading the foregoing. Accordingly, the scope of the utility model should be limited only by the attached claims.
Claims (7)
1. A system for manufacturing micro-nano bubble water, which is characterized by comprising:
a buffer tank;
the mixing module is connected with the buffer tank, an external air source and an external water source, mixes air provided by the air source and water provided by the water source to form micro-nano bubble water, and conveys the micro-nano bubble water to the buffer tank;
the filtering module is connected with the buffer tank, and is used for filtering the micro-nano bubble water and outputting the micro-nano bubble water;
and the control module is electrically connected with the mixing module and used for controlling the water flow and the gas delivery.
2. The micro-nano bubble water manufacturing system according to claim 1, wherein the mixing module comprises:
the gas transmission assembly is connected with the top of the buffer tank and the gas source and used for transmitting the gas into the buffer tank;
the mixing piece is provided with a first air inlet, a first water inlet and a first water outlet, and the first air inlet and the first water outlet are connected with the top of the buffer tank;
the water delivery assembly is connected with the first water inlet and the water source and is used for delivering the water to the mixing piece;
the control module is electrically connected with the water delivery assembly and the gas delivery assembly and controls the water flow and the gas delivery.
3. The micro-nano bubble water manufacturing system according to claim 2, wherein the gas transmission assembly comprises: a pressure valve and a gas line;
two ends of the gas transmission pipeline are respectively connected with the gas source and the top of the buffer tank;
the pressure valve is arranged on the gas transmission pipeline and is electrically connected with the control module.
4. The micro-nano bubble water manufacturing system according to claim 2, wherein the mixing element is an ejector.
5. The micro-nano bubble water manufacturing system according to claim 2, wherein the water delivery assembly comprises: a water pipe and a magnetic suspension centrifugal pump;
two ends of the water conveying pipeline are respectively connected with the water source and the mixing piece;
the magnetic suspension centrifugal pump is arranged on the water conveying pipeline and is electrically connected with the control module.
6. The micro-nano bubble water manufacturing system according to claim 1, wherein the filtering module comprises: a filter and a check valve;
the filter is provided with a second water inlet, a second water outlet and an exhaust port, and the second water inlet is connected with the bottom of the buffer tank;
two ends of the check valve are respectively connected with the top of the buffer tank and the exhaust port;
the filter filters the micro-nano bubble water and returns the unqualified gas to the buffer tank.
7. The micro-nano bubble water manufacturing system according to claim 1, further comprising: the continuous liquid level sensor is connected with the top and the bottom of the buffer tank respectively at two ends and is electrically connected with the control module, and the continuous liquid level sensor detects liquid level information in the buffer tank and feeds back the liquid level information to the control module.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202322273822.4U CN220696377U (en) | 2023-08-23 | 2023-08-23 | Micro-nano bubble water manufacturing system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202322273822.4U CN220696377U (en) | 2023-08-23 | 2023-08-23 | Micro-nano bubble water manufacturing system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN220696377U true CN220696377U (en) | 2024-04-02 |
Family
ID=90446972
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202322273822.4U Active CN220696377U (en) | 2023-08-23 | 2023-08-23 | Micro-nano bubble water manufacturing system |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN220696377U (en) |
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2023
- 2023-08-23 CN CN202322273822.4U patent/CN220696377U/en active Active
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