CN220675161U - Heating element, atomizing device and atomizing equipment - Google Patents

Heating element, atomizing device and atomizing equipment Download PDF

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Publication number
CN220675161U
CN220675161U CN202321904398.2U CN202321904398U CN220675161U CN 220675161 U CN220675161 U CN 220675161U CN 202321904398 U CN202321904398 U CN 202321904398U CN 220675161 U CN220675161 U CN 220675161U
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slits
heat
generating body
slit
substrate
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CN202321904398.2U
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唐立恒
江志钧
彭晓峰
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Shanghai Kunwei Technology Co ltd
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Shanghai Kunwei Technology Co ltd
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Abstract

The application discloses heat-generating body, atomizing device and atomizing equipment. The heating body comprises a substrate and a heating film, and the heating film is arranged on the substrate; the heating element is formed with a slit penetrating the substrate and the heating film in the thickness direction of the heating film. In the heating element of the embodiment of the application, the width of the slit is smaller, so that the temperature difference between the width center of the slit and the atomized substrate at the edge of the slit is smaller, and the atomized substrate can be atomized more uniformly.

Description

Heating element, atomizing device and atomizing equipment
Technical Field
The application relates to the field of atomization technology, and more particularly relates to a heating element, an atomization device and atomization equipment.
Background
Currently, atomizing devices are increasingly used. The atomizing device may heat the atomized substrate by heating such that the atomized substrate atomizes to form an aerosol. In the related art, the atomizing device comprises a heating body, and the heating body is provided with circular holes which are arranged in an array manner and can convey an atomized substrate. However, there is room for improvement in the uniformity of heating by this type of heating element.
Disclosure of Invention
The embodiment of the application provides a heating element, an atomizing device and atomizing equipment.
The heating body of the embodiment of the application comprises a substrate and a heating film, wherein the heating film is arranged on the substrate; the heating body is formed with a slit penetrating the substrate and the heating film in a thickness direction of the heating film.
In the heating element of the embodiment of the application, the width of the slit is smaller, so that the temperature difference between the width center of the slit and the atomized substrate at the edge of the slit is smaller, and the atomized substrate can be atomized more uniformly.
In certain embodiments, the substrate comprises a glass substrate.
In certain embodiments, the ratio between the length and width of the slit is greater than 2.
In certain embodiments, the width of the slit ranges from 5 μm to 200 μm.
In certain embodiments, the slit has a length in the range of 10 μm to 4000 μm.
In certain embodiments, the slit is linear or curvilinear.
In certain embodiments, the number of slits is a plurality, and the slits are substantially the same shape and/or size.
In some embodiments, a center line of the slit in the depth direction is substantially straight, and an extending direction of the center line is substantially coincident with a thickness direction of the heating element.
In some embodiments, the number of the slits is a plurality, and the slits are linearly arranged along the width direction of the slits.
In some embodiments, the distance between any two adjacent slits is equal, or the distance between the slits in the middle region of the heating element is smaller than the distance between the slits in the other regions of the heating element.
In some embodiments, the distance between two adjacent slits is in the range of 10 μm to 100 μm.
In some embodiments, the ends of the plurality of slits are disposed flush along the width of the slits.
In some embodiments, the slits are arranged in a plurality of rows along a first direction of the heat-generating body, each row of slits including a plurality of the slits arranged at intervals along a second direction of the heat-generating body, the first direction being perpendicular to the second direction.
In some embodiments, in two adjacent rows of slits, the slits in one row of slits are offset from the slits in the other row of slits along the first direction.
In some embodiments, the end of the slit is semicircular, and in two adjacent rows of slits, the center of the end of one slit in one row of slits and the center of the end of two adjacent slits in the other row of slits enclose an equilateral triangle.
In some embodiments, the heating element includes a middle portion provided with the slit and an edge portion connected to the middle portion, the edge portion being provided with a through hole having a cross-sectional circumference smaller than that of the slit.
An atomization device according to an embodiment of the present application includes a housing and the heating element according to any one of the above embodiments, the heating element being provided in the housing.
The atomizing device of the embodiment of the application comprises a host and the atomizing device, wherein the atomizing device is connected with the host.
Additional aspects and advantages of the application will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the application.
Drawings
The foregoing and/or additional aspects and advantages of the present application will become apparent and readily appreciated from the following description of the embodiments, taken in conjunction with the accompanying drawings, in which:
fig. 1 is a schematic perspective view of an atomizing apparatus according to an embodiment of the present application;
fig. 2 is a schematic perspective view of an atomizing device according to an embodiment of the present disclosure;
FIG. 3 is a schematic cross-sectional view of the atomizing device of FIG. 2 taken in the direction III-III;
FIG. 4 is a partial schematic perspective view of an atomizing device according to an embodiment of the present disclosure;
FIG. 5 is a schematic perspective view of a heat-generating body according to an embodiment of the present application;
FIG. 6 is a schematic cross-sectional view of a heat-generating body according to an embodiment of the present application;
FIG. 7 is a schematic layout view of slits of a heating element according to an embodiment of the present application;
FIG. 8 is a partial schematic view of the slit of FIG. 7;
FIG. 9 is another arrangement schematic view of slits of a heat-generating body of the embodiment of the present application;
FIG. 10 is a schematic view showing still another arrangement of slits of the heat-generating body of the embodiment of the present application;
FIG. 11 is a partial schematic view of the slit of FIG. 10;
FIG. 12 is a schematic plan view of a heat-generating body according to an embodiment of the present application;
FIG. 13 is another schematic plan view of the heat-generating body of the embodiment of the present application.
Main labeling description:
the atomizing apparatus 1000, the main unit 200, the atomizing device 100, the housing 10, the liquid storage chamber 11, the side wall 111, the atomizing core 20, the mount 21, the lower liquid passage 211, the mist outlet passage 213, the heat generating body 22, the base 221, the heat generating film 222, the slit 223, the central axis 224, the central axis 225, the intermediate portion 226, the edge portion 227, the through hole 228, the first seal 30, the base 40, the second seal 50, the post 60.
Detailed Description
Embodiments of the present application are described in detail below, examples of which are illustrated in the accompanying drawings, wherein the same or similar reference numerals refer to the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the drawings are exemplary only for the purpose of explaining the present application and are not to be construed as limiting the present application.
In this application, unless expressly stated or limited otherwise, a first feature "above" or "below" a second feature may include both the first and second features being in direct contact, and may also include the first and second features not being in direct contact but being in contact with each other by way of additional features therebetween. Moreover, a first feature being "above," "over" and "on" a second feature includes the first feature being directly above and obliquely above the second feature, or simply indicating that the first feature is higher in level than the second feature. The first feature being "under", "below" and "beneath" the second feature includes the first feature being directly under and obliquely below the second feature, or simply means that the first feature is less level than the second feature.
The following disclosure provides many different embodiments or examples for implementing different structures of the present application. In order to simplify the disclosure of the present application, the components and arrangements of specific examples are described below. Of course, they are merely examples and are not intended to limit the present application. Furthermore, the present application may repeat reference numerals and/or letters in the various examples, which are for the purpose of brevity and clarity, and which do not in themselves indicate a relationship between the various embodiments and/or settings discussed. In addition, the present application provides examples of various specific processes and materials, but one of ordinary skill in the art may recognize the application of other processes and/or the use of other materials.
Referring to fig. 1, an atomization apparatus 1000 is disclosed in an embodiment of the present application, where the atomization apparatus 1000 is an apparatus for forming an aerosol from an atomized substrate by heating or the like. The atomizing apparatus 1000 includes a host computer 200 and an atomizing device 100. The atomizing device 100 is connected to a host 200. The host 200 may provide power to the aerosolization device 100. It should be noted that the atomizing substrate used in the embodiments of the present application may be an aerosol-forming liquid. In addition, the nebulized matrix may also be a medical nebulizing agent or other type of nebulized matrix. Embodiments of the present application are not limited to a particular type of nebulized substrate. The user can inhale the atomized aerosol through oral inhalation or nasal inhalation and the like.
The nebulized matrix of embodiments of the present application may be a high viscosity nebulized matrix, which may have a viscosity of greater than 10000cps at ambient temperature (25 ℃). In an embodiment of the present application, the viscosity measurement method is as follows: GBT 17473.5-1998 thick film microelectronics was viscometric using noble metal paste testing.
Referring to fig. 2-3, an atomizing device 100 according to an embodiment of the present disclosure includes a housing 10 and an atomizing core 20, the atomizing core 20 being mounted within the housing 10. In particular, the housing 10 is also a basic component of the atomizing device 100, and the housing 10 may carry other parts of the atomizing device 100. The housing 10 is formed with a liquid storage chamber 11, and the atomized substrate is accommodated in the liquid storage chamber 11. The atomizing core 20 is a component for forming an aerosol from an atomized matrix. The atomizing core 20 may atomize the atomizing substrate to form a mist by heating.
Referring to fig. 3-4, in some embodiments, the atomizing core 20 includes a mounting base 21 and a heat generating body 22, the heat generating body 22 being disposed on the mounting base 21. Specifically, the mounting seat 21 is a component for fixing the heating element 22, and the mounting seat 21 has the functions of bearing the heating element 22, blocking the liquid storage chamber 11, and the like. The heat generating body 22 is a component for generating heat and atomizing the atomized substrate.
As shown in fig. 4, the mount 21 is provided with a lower liquid passage 211 and a mist outlet passage 213, the lower liquid passage 211 being a passage through which the atomized substrate flows from the liquid storage chamber 11 to the heat generating body 22. The atomized substrate enters the lower liquid channel 211 from one end of the lower liquid channel 211 and flows to the heating element 22 from the other end of the lower liquid channel 211 under the action of gravity, air pressure and the like.
The mist outlet passage 213 is a passage for guiding out the mist such as the aerosol formed by atomizing the atomized substrate heated by the heating element 22 to the outside of the mount 21, or the aerosol formed by atomizing the substrate can flow out of the mount 21 through the mist outlet passage 213.
The mist outlet duct 213 and the lower liquid duct 211 are disposed to intersect and be isolated from each other, for example, the lower liquid duct 211 is disposed on a first side of the mount 21, the mist outlet duct 213 is disposed on a second side of the mount 21, and the first side and the second side are perpendicular. As shown in the orientation of fig. 4, the liquid discharge passages 211 are provided on the left and right sides of the mount 21, and the mist discharge passages 213 are provided on the front and rear sides of the mount 21.
It will be appreciated that the mounting base 21 and the heating element 22 are both mounted within the housing 10.
Referring to fig. 5 and 6, in some embodiments, the heat generating body 22 includes a substrate 221 and a heat generating film 222 disposed on the substrate 221. The heat generating body 22 is formed with a slit 223 penetrating the substrate 221 and the heat generating film 222 in the thickness direction of the heat generating film 222.
As such, the width of the slit 223 is smaller, so that the temperature difference of the atomized substrate respectively located at the center of the width of the slit 223 and the edge of the slit 223 is smaller, and the atomized substrate can be atomized more uniformly.
Specifically, the substrate 221 may serve as a carrier for the heat generating film 222. The substrate 221 may be made of glass, dense ceramic, or the like, or the substrate 221 may include a glass substrate 221, a ceramic substrate 221. The specific materials of the substrate 221 are not further limited in this application.
In the case where the substrate 221 is made of glass, the substrate 221 has insulation properties to prevent the entire heat generating body 22 from generating heat to atomize the entire atomized matrix in the liquid storage chamber 11. In addition, the glass substrate 221 is low in material cost and easy to mold, and the manufacturing cost of the heating element 22 can be reduced. The substrate 221 may have a square sheet shape, an oval shape, or the like. In the case where the substrate 221 is in the form of a square sheet, the length and width of the substrate 221 may be 6mm by 3mm, respectively.
The heat generating film 222 is used to convert electric energy into heat energy. The heat generating film 222 may be made of a material which is conductive and easily generates heat, such as metal, alloy, or the like. For example, the material of the heat generating film 222 may be gold, silver, platinum, palladium-copper alloy, gold-silver-platinum alloy, gold-silver alloy, titanium-zirconium alloy, palladium-silver alloy, gold-platinum alloy, stainless steel, or the like. The heating film 222 may be disposed on the surface of the substrate 221 by printing, electroplating, pasting, sputtering, or the like. The slit 223 may be formed by laser processing, etching, or the like.
The cross section referred to herein refers to a plane perpendicular to the thickness of the heat-generating body 22, and the cross sectional area is an area surrounded by the outline of an object or feature in the cross section.
Referring to fig. 7 and 8, in some embodiments, the ratio (L/W) between the length L and the width W of the slit 223 is greater than 2. For example, the aspect ratio of the slit 223 is a number of 3, 10, 50, 100, 200, or the like. Thus, the length L of the slit 223 is much longer than the width W, and in the slit 223 and the circular hole having the same cross-sectional area, the circumference of the slit 223 is longer, so that the atomized substrate is more easily transported to the surface of the heat generating film 222 through the slit 223.
Note that the length L of the slit 223 is the maximum size of the slit 223 in the extended state of the slit 223, and the width W of the slit 223 is the size perpendicular to the central axis 224 of the slit 223.
Referring to fig. 8, in some embodiments, the width of the slit 223 ranges from 5 μm to 200 μm. For example, the width of the slit 223 may range from 5 μm to 150 μm, from 5 μm to 50 μm, from 30 μm to 100 μm, from 50 μm to 80 μm, or the like. As another example, the width W of the slit 223 may be 5 μm, 15 μm, 50 μm, 100 μm, 150 μm, 200 μm, etc. in size.
In the case where the width W of the slit 223 is less than 5 μm, the slit 223 is difficult to form, the heat-generating body 22 is difficult to manufacture, and the atomized substrate is difficult to pass through the slit 223; in the case where the width W of the slit 223 is greater than 200 μm, the width of the slit 223 is large, and the temperature of the center of the width of the slit 223 is easily uneven with the temperature of the edge, and therefore, in the case where the width W of the slit 223 is 5 μm to 200 μm, the slit 223 is not only easy to manufacture, but also the temperature difference of the atomized substrate respectively located at the center of the width of the slit and the edge of the slit can be made small, and the atomized substrate can be atomized more uniformly.
Note that in the same slit 223, the width of the slit 223 may be set to be an equal shape everywhere, and the slit 223 may be set to be an unequal width shape.
Referring to fig. 7 and 8, in some embodiments, the slit 223 has a length in the range of 10 μm to 4000 μm. For example, the slit 223 may have a length ranging from 10 μm to 4000 μm, 500 μm to 3500 μm, 800 μm to 3000 μm, 1000 μm to 2000 μm, or 1200 μm to 1500 μm, etc. For another example, the length L of the slit 223 may be 10 μm, 200 μm, 500 μm, 1000 μm, 2000 μm, 3000 μm, 4000 μm, etc.
In the case where the length L of the slit 223 is less than 10 μm, the liquid discharging ability of the heat-generating body 22 may be insufficient, and the atomized substrate is difficult to be transported to the atomized surface of the heat-generating body 22; if the length L of the slit 223 is larger than 4000 μm, the size of the heating element 22 is required to be large, which tends to increase the overall size of the atomizing device 100, and is disadvantageous in downsizing the atomizing device 100. Therefore, in the case where the length L of the slit 223 is 10 μm to 4000 μm, the liquid discharging ability of the heat generating body 22 is strong, and the size of the heat generating body 22 can be made appropriate, which is advantageous in downsizing the atomizing device 100.
In some embodiments, slit 223 is linear or curvilinear. In the example shown in fig. 7, the slit 223 is in a linear shape, and the linear slit 223 makes the pattern on the surface of the heating film 222 regular, so that the atomized liquid flowing onto the surface of the heating film 222 is more uniform, which is beneficial to improving the uniformity of atomization of the heating body 22. In the example shown in fig. 9, the slit 223 is curved, and the curved slit 223 can adjust the resistance of the heating film 222 and optimize the current path, so that the heating film 222 heats more uniformly, and the uniformity of atomization of the heating body 22 is improved.
Referring to fig. 8, the slit 223 is linear or curved and is defined based on the central axis 224 of the slit 223, and if the central axis 224 of the slit 223 is linear, and if the central axis 224 of the slit 223 is curved, the slit 223 is curved. The curve may be wavy, curved, etc., and the application is not limited to the specific shape of the curve.
In certain embodiments, the number of slits 223 is a plurality, and the shape and/or size of slits 223 are substantially the same. For example, the shape of any two slits 223 is substantially the same; as another example, the dimensions of any two slits 223 are substantially the same; for another example, the shape and size of any two slits 223 are the same. In this way, the uniformity of the arrangement structure of the plurality of slits 223 is better, so that the atomized liquid flowing to the surface of the heating film 222 is more uniform, which is beneficial to improving the uniformity of the atomization of the heating body 22.
As in the example of fig. 7, all slits 223 are rectilinear and have the same dimensions of length, width, etc. As in the example of fig. 9, all slits 223 are curved and have the same dimensions of length, width, etc.
Of course, in some embodiments, the shape of any two slits 223 may be different. For example, the partial slit 223 is linear, and the partial slit 223 is curved. In some embodiments, the dimensions of any two slits 223 may be different. For example, the length of the partial slit 223 is longer, and the length of the partial slit 223 is shorter.
Referring to fig. 6, in some embodiments, a center line 225 of the slit 223 in the depth direction is substantially straight, and the extending direction of the center line 225 is substantially identical to the thickness direction of the heating element 22. In this way, the transport path of the atomized liquid is shorter, and the atomized liquid more easily reaches the surface of the heat generating film 222 through the slit 223 and is atomized.
Of course, in other embodiments, the extending direction of the center line 225 may be inclined with respect to the thickness direction of the heating element 22.
As shown in fig. 7 and 8, in some embodiments, the number of slits 223 is plural, and the plural slits 223 are linearly arranged along the width direction of the slits 223. In this way, the plurality of slits 223 are regularly arranged, so that the atomized liquid flowing to the surface of the heating film 222 is more uniform, which is beneficial to improving the uniformity of atomization of the heating body 22. The number of slits 223 may be determined according to the width of each slit 223, the spacing distance, and the overall size of the heat-generating body 22, and the present application does not limit the specific number of slits 223. Of course, in other embodiments, the plurality of slits 223 may be arranged in an irregular shape.
Referring to fig. 7-9, in some embodiments, the distance between any two adjacent slits 223 is equal. Thus, the amount of the atomized substrate at each position of the heat generating film 222 can be made substantially the same, which is advantageous for improving the uniformity of atomization of the heat generating body 22. Of course, in other embodiments, the distance between any two adjacent slits 223 may not be equal.
In some embodiments, the distance between slits 223 in the middle region of heat-generating body 22 is smaller than the distance between slits 223 in other regions of heat-generating body 22. Thus, the atomization capability of different areas of the heating element 22 can be matched with the slits 223 with different intervals, so that the atomization of the heating element 22 is more uniform.
Referring to fig. 8, in some embodiments, the distance between two adjacent slits 223 is in the range of 10 μm to 100 μm. For example, the distance between two adjacent slits 223 ranges from 10 μm to 100 μm, from 10 μm to 90 μm, from 20 μm to 80 μm, from 30 μm to 75 μm, from 50 μm to 60 μm, etc. For another example, the distance D between two adjacent slits 223 may be 10 μm, 15 μm, 50 μm, 80 μm, 100 μm, or the like.
In the case where the size of the distance D is less than 10 μm, the adjacent slits 223 are easily communicated with each other, so that the heat-generating body 22 is not easily manufactured; in the case where the size of the distance D is more than 100 μm, the distance between the adjacent two slits 223 is excessively large, which easily results in difficulty in transporting the atomized substrate to each position of the heat generating film 222, and reduces the uniformity of atomization of the heat generating body 22. In this way, in the case where the distance D is 10 μm to 100 μm, not only the heat-generating body 22 is made easy, but also the uniformity of atomization of the heat-generating body 22 can be improved.
The distance D between two adjacent slits 223 is the distance between the width centers of the two adjacent slits 223 or the distance between the corresponding edges of the two adjacent slits 223.
Referring to fig. 7 and 9, in some embodiments, the ends of the plurality of slits 223 are disposed flush along the width direction of the slits 223. In this way, the plurality of slits 223 are regularly arranged, so that the atomized liquid flowing to the surface of the heating film 222 is more uniform, which is beneficial to improving the uniformity of atomization of the heating element 22, and further reducing the possibility of dry heating of the heating element 22. Of course, in other embodiments, the ends of the plurality of slits 223 may be disposed unevenly along the width direction of the slits 223.
Referring to fig. 10, in some embodiments, the slits 223 are arranged in a plurality of columns along a first direction x of the heating body 22, and each column of slits 223 includes a plurality of slits 223 arranged at intervals along a second direction y of the heating body 22, the first direction x being perpendicular to the second direction y.
Thus, the slits 223 are arranged in a multi-row and multi-column mode, the situation that the length of a single slit 223 is too long to be difficult to process can be avoided, the consistency of each slit 223 can be improved, the liquid discharging capacity of each position of the heating body 22 is basically the same, the resistance of the heating film 222 can be adjusted, the current path is optimized, the heating film 222 heats more uniformly, and the atomization uniformity of the heating body 22 can be improved. As in the example of fig. 10, the slit 223 arrangement may be arranged in 12 columns, and the number of rows formed by the slit 223 arrangement is greater than the number of columns.
Referring to fig. 10 and 11, in some embodiments, in two adjacent rows of slits 223, the slits 223 in one row of slits 223 are offset from the slits 223 in the other row of slits 223 along the first direction x. In this way, the probability of the end portions of the slits 223 penetrating each other can be reduced, and the production yield of the heating element 22 can be improved. In addition, the atomized substrate supplied to the surface of the heating film 222 can be distributed more uniformly by this arrangement, which is advantageous in improving the uniformity of atomization of the heating element 22.
Referring to fig. 10 and 11, in some embodiments, the end of the slit 223 is semicircular, and in two adjacent rows of slits 223, the center of the end of one slit 223 in one row of slits 223 and the center of the end of two adjacent slits 223 in the other row of slits 223 enclose an equilateral triangle. In this way, the distances between the adjacent slits 223 are approximately equal, and the atomized substrates are uniformly distributed on the surface of the heating film 222, so that the uniformity of atomization of the heating body 22 can be improved, and the probability of dry heating at a certain position of the heating film 222 can be reduced.
Referring to fig. 12 and 13, in some embodiments, the heat-generating body 22 includes a middle portion 226 and an edge portion 227 connected to the middle portion 226, the middle portion 226 is provided with a slit 223, the edge portion 227 is provided with a through hole 228, and the cross-sectional circumference of the through hole 228 is smaller than the cross-sectional circumference of the slit 223. In this way, the middle portion 226 is provided with the slit 223, and the edge portion 227 is provided with the through hole 228, so that more atomized substrate can pass through the middle portion 226 and be atomized, thereby improving the uniformity of atomization of the heat-generating body 22 and reducing the probability of dry heating of the heat-generating body 22.
Specifically, the number of slits 223 in the middle portion 226 may be plural, and specific features of the slits 223 are referred to the specific description of the above embodiments, and are not repeated herein. The through hole 228 may be a circular hole. The number of the through holes 228 is plural, and the through holes 228 may be regularly distributed or irregularly distributed. The size of the through hole 228 may be specifically set according to the requirement, so long as the through hole 228 can not only smoothly drain under the condition that a negative pressure is formed on one side of the heating film 222, but also lock under the condition that the air pressure on one side of the heating film 222 is normal.
In some embodiments, the thickness of the heater 22 ranges from 0.4mm to 1mm. In the case where the thickness of the heat-generating body 22 is less than 0.4mm, insufficient strength of the heat-generating body 22 and insufficient depth of the slit 223 may be caused, so that the heat-generating body 22 is insufficient in liquid locking ability to cause a liquid leakage or other adverse phenomenon; in the case where the thickness of the heat-generating body 22 is greater than 1mm, the depth of the slit 223 may be too deep to cause the atomized substrate to smoothly pass through the heat-generating body 22 to be atomized, and too thick of the heat-generating body 22 is also disadvantageous in the manufacturing process of the slit 223. Therefore, in the case where the thickness of the heat generating body 22 is in the above size range, the heat generating body 22 is made to have good liquid-guiding and liquid-locking properties and to be easy to manufacture.
Referring again to fig. 3 and 4, in some embodiments, the atomizing device 100 may further include a first seal 30, a base 40, a second seal 50, and a post 60, the first seal 30 sealing a gap between the mounting seat 21 and a sidewall of the reservoir chamber 11. The base 40 is inserted in the housing 10, and the second seal 50 seals the gap between the base 40 and the side wall of the liquid storage chamber 11. The pole 60 is mounted on the base 40 and contacts the heating film 222 of the heating body 22, and the pole 60 can transfer the power of the main unit 200 to the heating body 22 to heat the heating body 22.
In the description of embodiments of the present application, the terms "first," "second," and the like are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defining "a first" or "a second" may explicitly or implicitly include one or more of the described features. In the description of the embodiments of the present application, the meaning of "a plurality" is two or more, unless explicitly defined otherwise.
In the description of the present specification, reference to the terms "one embodiment," "some embodiments," "illustrative embodiments," "examples," "specific examples," or "some examples," etc., means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present application. In this specification, schematic representations of the above terms do not necessarily refer to the same embodiments or examples. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
While embodiments of the present application have been shown and described above, it will be understood that the above embodiments are illustrative and not to be construed as limiting the present application, and that variations, modifications, alternatives, and variations may be made to the above embodiments by one of ordinary skill in the art within the scope of the present application.

Claims (18)

1. A heat-generating body, characterized by comprising:
a substrate;
a heat generating film disposed on the substrate;
the heating body is formed with a slit penetrating the substrate and the heating film in a thickness direction of the heating film.
2. A heat-generating body as described in claim 1, wherein the substrate comprises a glass substrate.
3. A heat-generating body as described in claim 1, wherein a ratio between a length and a width of the slit is more than 2.
4. A heat-generating body as described in claim 1, wherein the width of the slit ranges from 5 μm to 200. Mu.m.
5. A heat-generating body as described in claim 1, wherein the slit has a length in the range of 10 μm to 4000. Mu.m.
6. A heat-generating body as described in claim 1, wherein the slit is linear or curved.
7. A heat-generating body as described in claim 1, wherein the number of the slits is plural, and the shape and/or the size of the slits are substantially the same.
8. A heat-generating body as described in claim 1, wherein a center line in a depth direction of the slit is substantially straight, and an extending direction of the center line is substantially coincident with a thickness direction of the heat-generating body.
9. A heat-generating body according to claim 1, wherein the number of the slits is plural, and the plural slits are arranged linearly in the width direction of the slits.
10. A heat-generating body according to claim 9, wherein a distance between any two adjacent slits is equal, or a distance between the slits in an intermediate region of the heat-generating body is smaller than a distance between the slits in other regions of the heat-generating body.
11. A heat-generating body as described in claim 9, wherein a distance between two adjacent slits is in the range of 10 μm to 100 μm.
12. A heat-generating body according to claim 9, wherein the end portions of the plurality of slits are arranged flush in the width direction of the slits.
13. A heat-generating body according to claim 1, wherein the slits are arranged in a plurality of rows in a first direction of the heat-generating body, each row of slits including a plurality of the slits arranged at intervals in a second direction of the heat-generating body, the first direction being perpendicular to the second direction.
14. A heat-generating body according to claim 13, wherein in two adjacent rows of the slits, the slits in one row of slits are offset from the slits in the other row of slits in the first direction.
15. A heat-generating body according to claim 14, wherein the end portions of the slits are semicircular, and in two adjacent rows of the slits, the center of the end portion of one of the rows of slits and the center of the end portion of two adjacent rows of slits enclose an equilateral triangle.
16. A heat-generating body according to claim 1, wherein the heat-generating body includes a middle portion provided with the slit and an edge portion connected to the middle portion, the edge portion being provided with a through hole having a cross-sectional circumference smaller than that of the slit.
17. An atomizing device, comprising:
a housing; and
a heat-generating body as described in any one of claims 1 to 16, which is provided in the casing.
18. An atomizing apparatus, comprising:
a host; and
the atomizing device of claim 17, wherein the atomizing device is coupled to the host.
CN202321904398.2U 2023-07-18 2023-07-18 Heating element, atomizing device and atomizing equipment Active CN220675161U (en)

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