CN220585205U - Carrier transport system, carrier for substrate and apparatus for vacuum treatment of substrate - Google Patents

Carrier transport system, carrier for substrate and apparatus for vacuum treatment of substrate Download PDF

Info

Publication number
CN220585205U
CN220585205U CN202090001218.8U CN202090001218U CN220585205U CN 220585205 U CN220585205 U CN 220585205U CN 202090001218 U CN202090001218 U CN 202090001218U CN 220585205 U CN220585205 U CN 220585205U
Authority
CN
China
Prior art keywords
carrier
transport system
magnetic unit
compensation
passive magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202090001218.8U
Other languages
Chinese (zh)
Inventor
克里斯蒂安·沃尔夫冈·埃曼
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Application granted granted Critical
Publication of CN220585205U publication Critical patent/CN220585205U/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67709—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations using magnetic elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67712—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations the substrate being handled substantially vertically

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Non-Mechanical Conveyors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

The present disclosure provides a carrier transport system for transporting a carrier 100 within a vacuum chamber, a carrier for a carrier transport system, a method of transporting a carrier, and an apparatus for vacuum processing of a substrate. The carrier transport system comprises: a track assembly, the track assembly having: -a first passive magnetic unit a (410) configured to counteract a first partial weight (a) of the carrier (100); -a second passive magnetic unit a (610) configured to counteract a second weight (B) of the carrier (100); -a roller transport track (200, 200a, 200 b) having a plurality of rollers (210, 210a, 210 b) configured to support a third partial weight (R) of the carrier (100); and at least one compensation magnet unit (700) disposed in a compensation region along the track assembly and configured to provide a compensation force (F, fa, fb) to the carrier (100). By providing the carrier with a compensating force (F, fa, fb), in particular in the vicinity of the gap transition (300), the roll load can be reduced, leading to an improved lifetime of the roll and reduced particle generation.

Description

Carrier transport system, carrier for substrate and apparatus for vacuum treatment of substrate
Technical Field
Embodiments of the present disclosure relate to an apparatus for transporting a carrier, in particular a carrier for carrying a large area substrate. More particularly, embodiments of the present disclosure relate to an apparatus for transporting carriers that can be employed in processing equipment for vertical substrate processing (e.g., deposition of material on large area substrates for display production). In particular, embodiments of the present disclosure relate to carrier transport systems, carriers for carrying substrates, and vacuum processing apparatuses.
Background
For processing the substrate, an inline (in-line) arrangement of processing modules may be used. The in-line processing system includes a plurality of subsequent processing modules, such as deposition modules, and optionally additional processing modules, such as cleaning modules and/or etching modules, wherein processing aspects are subsequently performed in the processing modules such that a plurality of substrates may be processed in the in-line processing system continuously or quasi-continuously.
The substrate is typically carried by a carrier (i.e. a carrier means for carrying the substrate). The carrier is typically transported through a vacuum system using a carrier transport system. The carrier transport system may be configured to transport carriers carrying substrates along one or more transport paths.
In order to obtain high quality devices, technical challenges related to substrate processing need to be addressed. In particular, it is challenging to accurately and smoothly transport the carrier through the vacuum system. For example, particle generation due to wear of moving parts may cause degradation of the manufacturing process. Accordingly, there is a need to transport carriers in vacuum deposition systems to reduce or minimize particle generation. A further challenge is to provide a robust, simple and compact carrier transport system for high temperature vacuum environments, for example, at low cost.
Typically, the carrier may be guided by the rollers, and the stronger the load on the rollers, the greater the risk of particle generation and the shorter the life of the rollers. Completely contactless floating carrier transport systems are complex and expensive. Magnetic levitation systems with permanent magnets are difficult to implement. At least one degree of freedom must be mechanically stabilized or stabilized with a guiding element to overcome the enshao theorem.
In particular, in the transition areas where the carrier is transported through the lock valve or the door, carrier transport components may be restricted to be placed in these transition areas, and there may be gaps in carrier transport. As the carrier is transported across the gap and through the lock valve or gate, the load on the rollers may increase to support the carrier cantilevered across the gap. In addition, additional support from the various magnetic support elements of the carrier transport may not be possible in these transition regions, even further increasing the load on the rollers near the transition regions.
Accordingly, a simple and compact arrangement for guiding a carrier, in particular a vertically oriented carrier, to compensate for gravity to minimize forces on the mechanical elements as much as possible would be beneficial. In particular, carrier transport that compensates for gravity in the transition region would be beneficial as the carrier passes through the gap in carrier transport. Minimizing forces on the mechanical element may reduce particle generation during carrier transport and may improve the lifetime of the mechanical element.
Accordingly, it would be beneficial to provide improved apparatus and methods for transporting carriers in vacuum chambers.
Disclosure of Invention
In view of the above, a carrier transport system for transporting a carrier in a vacuum chamber, an apparatus for vacuum processing, and a method of transporting a carrier in a vacuum chamber according to the independent claims are provided. Further aspects, advantages and features are evident from the dependent claims, the description and the drawings.
According to a first aspect of the present disclosure, a carrier transport system for transporting a carrier within a vacuum chamber is provided. The carrier transport system comprises: a track assembly extending in a transport direction, the track assembly comprising: a first passive magnetic unit a disposed at a first vertical coordinate and extending in the transport direction, wherein the first passive magnetic unit a is configured to offset a first partial weight of the carrier; a second passive magnetic unit a disposed at a second vertical coordinate and extending in the transport direction, wherein the second passive magnetic unit a is configured to counteract a second weight of the carrier; a roller transport track disposed at a third vertical coordinate and comprising a plurality of rollers configured to support a third partial weight of the carrier, and at least one compensating magnet unit disposed in a compensation zone along the track assembly and configured to provide a compensating force to the carrier.
The carrier transport system of the first aspect may further comprise a gap transition where the carrier is configured to traverse a gap in the track assembly, wherein the compensation region is near the gap transition, the at least one compensation magnet unit being disposed in the compensation region.
The carrier transport system of the first aspect, the compensation zone may be within 500mm of the gap transition.
The carrier transport system of the first aspect, the at least one compensation magnet unit may comprise a first compensation magnet unit on a first side of the gap transition and a second compensation magnet unit on a second side of the gap transition.
The carrier transport system of the first aspect, the compensation magnet unit may be configured to perform at least one of the group consisting of: an attractive force is applied to the element of the carrier 100 comprising a ferromagnetic material or a magnetic material, and a repulsive force is applied to the element of the carrier 100 comprising a magnetic material.
The carrier transport system of the first aspect, the at least one compensation magnet unit may be disposed at least one selected from the group consisting of: the first, second and third vertical coordinates
The carrier transport system of the first aspect, the at least one compensating magnet unit may be disposed at the third vertical coordinate.
The carrier transport system according to the first aspect, the at least one compensating magnetic unit may be an electromagnetic actuator or an electro-permanent magnet.
The carrier transport system of the first aspect may further comprise a drive assembly having a set of active magnets extending in the transport direction and configured to provide a driving force in the transport direction.
The carrier transport system of the first aspect may be configured for transporting the carrier in a vertical or near vertical orientation.
The carrier transport system of the first aspect, the first partial weight may be at least 20% of the weight of the carrier, the second partial weight may be at least 60% of the weight of the carrier, and the compensation force may be at least 10% of the weight of the carrier.
The carrier transport system according to the first aspect, the compensation force may act in a direction opposite to the direction of gravity to compensate for an under-compensated carrier, or the compensation force may act in the direction of gravity to compensate for an over-compensated carrier.
The carrier transport system of the first aspect, the poles of the first and second passive magnetic units a, a may be further configured for lateral guidance of the carrier.
According to a second aspect of the present disclosure, there is provided a carrier for a substrate to be processed in an apparatus for vacuum processing of a substrate. The carrier comprises: a first passive magnetic unit B disposed at a first vertical coordinate; a second passive magnetic unit B disposed at a second vertical coordinate; a first rail configured to contact at least one top surface of a plurality of rollers disposed at a third vertical coordinate; and a second rail configured to be in contact with at least one bottom surface of the plurality of rollers, wherein at least one of the first rail and the second rail comprises a ferromagnetic material or a magnetic material.
The carrier according to the second aspect, the carrier being configured for transport by the carrier transport system according to the first aspect.
According to a third aspect of the present disclosure, an apparatus for vacuum processing of a substrate is provided. The apparatus comprises: at least one vacuum chamber; the carrier transport system according to the first aspect; and a carrier according to the second aspect.
The apparatus for vacuum processing of a substrate of the third aspect, the first passive magnetic unit a of the track assembly may be configured to be coupled with the first passive magnetic unit B of the carrier at a top of the carrier; and the second passive magnetic unit a of the track assembly may be configured to couple with the second passive magnetic unit B of the carrier at a side of the carrier.
The apparatus for vacuum processing of a substrate according to the third aspect, the at least one compensation magnetic unit being capable of providing the compensation force to the carrier by magnetic interaction with at least one selected from the group consisting of: the first passive magnetic unit B of the carrier, the second passive magnetic unit B of the carrier, the first rail and the second rail.
Aspects and embodiments of the present disclosure allow for at least partially compensating for loads applied to one or more rollers of a track assembly, particularly in areas where a carrier traverses a gap transition. In particular, the carrier transport system allows for reduced roller load, resulting in reduced particle generation and improved roller life in the vacuum processing system.
Drawings
So that the manner in which the above recited features of the present disclosure can be understood in detail, a more particular description of the disclosure, briefly summarized above, may be had by reference to embodiments. The drawings relate to embodiments of the present disclosure and are described below:
FIG. 1 shows a schematic end view of a carrier transport system;
fig. 2 shows a schematic side view of the carrier transport system when transporting the carrier;
FIG. 3 shows a schematic side view of the carrier transport system as the carrier is transported across the gap transition;
fig. 4a shows a detailed side view of a carrier transport system according to an embodiment of the present disclosure;
FIG. 4b shows a detailed end view of a carrier transport system according to an embodiment of the present disclosure;
fig. 5a shows a detailed side view of a carrier transport system according to an embodiment of the present disclosure; and is also provided with
Fig. 5b shows an illustration of a carrier transport system according to an embodiment of the present disclosure.
Detailed Description
Reference will now be made in detail to the various embodiments of the disclosure, one or more examples of which are illustrated in each figure. In the following description of the figures, like reference numerals refer to like parts. Only the differences with respect to the individual embodiments are described. Each example is provided by way of explanation of the disclosure and is not intended as a limitation of the disclosure. Additionally, features illustrated or described as part of one embodiment can be used on or in conjunction with other embodiments to yield yet a further embodiment. The description is intended to include such modifications and variations.
The carrier transport system is configured for transporting carriers in a vacuum environment, in particular in a vacuum chamber or in a vacuum system comprising a plurality of vacuum chambers arranged adjacent to each other (e.g. in a linear array). The carrier transport system may provide one, two or more transport paths along which carriers may be moved or transported in a transport direction.
The carrier transport system described herein may be part of a vacuum processing system, particularly a vacuum deposition system configured for depositing material on a substrate carried by a carrier. The carrier transport system may be configured to displace or transport the carrier.
The carrier transport system may be configured to transport the carrier by counteracting the weight of the carrier, in particular up to 100% of the weight of the carrier, with magnetic levitation. Furthermore, the magnetic levitation is configured to guide or stabilize the carrier in the transverse direction Z. The transverse direction can be understood as a direction perpendicular to the vertical direction Y and perpendicular to the transport direction X.
Referring first to fig. 1, fig. 1 shows a schematic end view of a carrier transport system and carrier 100 for a vacuum processing apparatus. The carrier transport system is provided with a track assembly comprising a roller transport track 200 with a plurality of rollers 210 and a carrier 100 for transport by the carrier transport system in a transport direction X. The roller transport track 200 may be arranged at the bottom of the carrier 100, and the carrier 100 may be oriented in a vertical or near vertical (near-vertical) orientation.
Some embodiments described herein relate to the concept that the carrier 100 is transported in a "vertical or near vertical orientation". In the context of the present disclosure, a vertical orientation of the carrier 100 means that the carrier 100 is aligned to extend in a direction substantially parallel to the direction of gravity, i.e. in a direction substantially parallel to the vertical direction Y. A near vertical orientation may be defined as an orientation that deviates from a perfectly vertical (perfectly vertical being defined by gravity) by an angle of up to 15 degrees. In a vertical or near vertical orientation, the carrier 100 may support the substrate S in a vertical standing or near vertical standing orientation.
In the context of the present disclosure, and as shown in the figures, the carrier 100 is configured to support the substrate S, however, the present disclosure is not limited thereto. Alternatively, the carrier 100 may be configured to support a mask. According to some embodiments, which may be combined with other embodiments described herein, the carrier 100 may be configured to support a substrate or a mask in a vacuum processing apparatus.
The carrier 100 has a carrier body 110 and is provided with a first rail 120 and a second rail 122 such that the first rail 120 and the second rail 122 are configured to contact a plurality of rollers 210 of the roller transport track 200. The first rail 120 and the second rail 122 may be flat contact surfaces for contacting cylindrical rollers. Cylindrical rolls achieve low friction, low wear and low cost. However, the cylindrical rollers are not provided for guiding the carrier 100 in the transverse direction Z. Additional components for guiding the carrier 100 in the transverse direction Z may be implemented.
Alternatively, the roller contact surfaces of the first rail 120 and the second rail 122 may be convex contact surfaces for contacting the concave rollers. For example, the first rail 120 and the second rail 122 may be rods having a circular cross-section, wherein the arcuate contact surfaces are configured to contact similarly shaped concave rollers. In addition to the support in the vertical direction Y, such a roller arrangement also allows guiding the carrier 100 in the lateral direction Z, however, such rollers may have higher friction and higher wear than flat contact surfaces with cylindrical rollers. Alternatively, the roller contact surfaces of the first rail 120 and the second rail 122 may be V-shaped contact surfaces for contacting V-grooved rollers.
The carrier transport system further comprises an upper guide rail 400 arranged at the top of the carrier 100, said upper guide rail being configured for maintaining the carrier 100 in a vertical or near vertical direction. The upper guide rail 400 includes a first passive magnetic unit a 410 that is part of the rail assembly and a first passive magnetic unit B130 that is part of the carrier 100. The polarity of the first passive magnetic unit a 410 of the track assembly is arranged opposite to the polarity of the first passive magnetic unit B130 of the carrier 100 such that the magnetic attraction force guides the carrier 100 in the lateral direction Z without contact.
The carrier transport system may further comprise a lower guide rail 600 arranged at the bottom of the carrier 100. Similar to the upper guide rail 400, the lower guide rail 600 may be configured to guide the carrier 100 in the lateral direction Z. The lower guide rail 600 may include a second passive magnetic unit a 610 as part of the rail assembly and a second passive magnetic unit B140 as part of the carrier 100. The polarity of the second passive magnetic unit a 610 of the track assembly is arranged opposite to the polarity of the second passive magnetic unit B140 of the carrier 100 such that the magnetic attraction force guides the carrier 100 in the lateral direction Z without contact.
As exemplarily shown in the figures, the upper guide rail 400 and the lower guide rail 600 are shown as having transverse magnetization. In other words, opposite polarities of each of the first and second passive magnetic units a 410 and B130 and each of the second and second passive magnetic units a 610 and B140 are arranged in the lateral direction Z, and the respective passive magnetic units are arranged to face each other in the vertical direction Y. However, the present disclosure is not limited thereto, and at least one of the upper guide rail 400 and the lower guide rail 600 may be arranged in vertical magnetization. In other words, the opposite polarity of each of the first and second passive magnetic units a 410 and B130 and/or each of the second and second passive magnetic units a 610 and B140 may alternatively be arranged in the vertical direction Y, and the respective passive magnetic units are arranged to face each other in the vertical direction Y.
Since the magnetic attractive force is applied to the carrier 100, the upper guide rail 400 and the lower guide rail 600 may be further configured to support at least a portion of the weight W of the carrier 100. Although the primary function of the upper and lower guide rails 400, 600 is to provide guidance in the lateral direction Z, magnetic force may be used to offset some of the weight W of the carrier 100 so that the supporting weight W of the carrier 100 borne by the roller transport rail 200 may be reduced, resulting in a reduction in roller load and roller wear.
The carrier transport system further includes a drive assembly 500. As exemplarily shown, the drive assembly 500 may comprise a linear motor having a set of active magnets 510, and the carrier 100 may comprise at least a magnetic drive element 150. The active magnet 510 is configured to induce a magnetic force in the magnetic drive element 150 such that the carrier 100 is driven along the roller transport system in the transport direction X. The exemplary illustrated embodiment has a drive assembly 500 disposed at the bottom end of the carrier 100. However, the drive assembly 500 may alternatively be arranged at the top end of the carrier 100. Similar to the non-contact magnetic guide assemblies of the upper guide rail 400 and the lower guide rail 600, the non-contact magnetic drive assembly 500 is advantageous in a vacuum processing apparatus because particle generation is avoided.
Alternatively, the track assembly may comprise a plurality of driven rollers configured to rotate along the track assembly and drive the carrier 100 by contacting a surface of the carrier 100. For example, some of the plurality of rollers 210 may be driven rollers.
According to a preferred architecture, as exemplarily shown in the figures, the carrier transport system comprises a track assembly extending in a transport direction X, said track assembly comprising a first vertical coordinate Y 1 A first passive magnetic unit A410 located at and extending in the transport direction X, arranged at a second vertical coordinate Y 2 A second passive magnetic unit A610 located at and extending in the transport direction X, and a third vertical coordinate Y 3 A roller transport track 200 at and including a plurality of rollers 210, wherein at a first vertical coordinate Y 1 With a second vertical coordinate Y 2 The first vertical distance therebetween is greater than at the second vertical coordinate Y 2 With a third vertical coordinate Y 3 A second distance therebetween. The track assembly may also include a drive assembly 500, the drive assembly 500 disposed at a fourth vertical coordinate Y 4 And extends in the transport direction X. In particular, a first vertical coordinate Y 1 May be disposed at the top of the carrier 100, a fourth vertical coordinate Y 4 May be disposed at the bottom of the carrier 100, a second vertical coordinate Y 2 And a third vertical coordinate Y 3 Can be arranged at a first vertical coordinate Y 1 With the fourth vertical coordinate Y 4 Between them.
The carrier 100 is provided, in particular for a substrate S to be processed in an apparatus for vacuum processing of the substrate S. The carrier 100 comprises a first vertical coordinate Y 1 A first passive magnetic unit B130 and a second magnetic unit B arranged at a second vertical coordinate Y 2 A second passive magnetic element B140. The first rail 120 and the second rail 122 are provided for at a third vertical coordinate Y 3 At least one roller 210 contacting the roller transport track 200, wherein in a first vertical coordinate Y 1 With a second vertical coordinate Y 2 The first vertical distance therebetween is greater than at the second vertical coordinate Y 2 With a third vertical coordinate Y 3 A second distance therebetween.
Referring now to fig. 2, fig. 2 shows the carrier transport system of fig. 1 in a schematic side view, wherein the carrier 100 is transported in a steady state in the transport direction X. The weight W of the carrier 100 is supported and/or offset by the components of the carrier transport system. The first partial weight a of the carrier 100 is counteracted by the first passive magnetic unit a 410 of the track assembly by acting on the corresponding first passive magnetic unit B130 of the carrier 100. The second weight B of the carrier 100 is counteracted by the second passive magnetic unit a 610 of the track assembly by acting on the corresponding second passive magnetic unit B140 of the carrier 100. Finally, each of the plurality of rollers 210 in contact with the carrier 100 supports a third partial weight R of the carrier 100.
The carrier transport system may include a drive assembly 500 having a set of active magnets 510. In particular, the carrier transport system may include a drive assembly 500, the drive assembly 500 having a drive assembly disposed at a fourth vertical coordinate Y 4 A set of active magnets 510. In this case, each of the active magnets 510 applies a force in the transport direction X in order to drive the carrier 100 along the track assembly in the transport direction X. However, each of the active magnets 510 also applies a downward attractive force C to the carrier 100. In this case, the total downward attractive force C is further compensated by one or both of the first passive magnetic unit a 410 and the first passive magnetic unit B130 and the second passive magnetic unit a 610 and the second passive magnetic unit B140, so that the remaining force acting on each of the plurality of rollers 210 is minimized.
As an example, for a carrier 100 having a weight W that is transported in a steady state and having a total downward attractive force C that is equal to a portion of the weight W of the carrier 100 (e.g., 10%, 20%, or 40% of the weight W of the carrier 100), balancing may be achieved by compensating the same portion of the weight W of the carrier 100 by the first passive magnetic unit a 410 and the first passive magnetic unit B130 and compensating 90% of the weight W of the carrier 100 by the second passive magnetic unit a 610 and the second passive magnetic unit B140, leaving 10% of the weight W distributed to each of the plurality of rollers 210 in contact with the carrier 100.
In the context of the present disclosure, the terms "overcompensation" of the carrier and "undercompensation" of the carrier may be understood to refer to the case of overcompensation of the weight W of the carrier 100 by the carrier transport system or undercompensation of this weight by the carrier transport system, respectively.
In the case where the carrier is "overcompensated", the combined compensation provided by the first passive magnetic unit a 410 and the first passive magnetic unit B130 and the second passive magnetic unit a 610 and the second passive magnetic unit B140 is higher than the compensation for counteracting the weight W of the carrier 100 and the total downward attractive force C of the active magnet 510. Thus, the carrier 100 is lifted such that the first rail 120 is no longer in contact with the upper surfaces of the plurality of rollers 210, but the second rail 122 is in contact with the lower surfaces of the plurality of rollers 210. This will result in reversal of the plurality of rollers 210 and corresponding friction between the rollers, potentially leading to particle generation by increasing wear of the plurality of rollers 210 and the first and second rails 120, 122.
In the case of a carrier that is "under-compensated", the combined compensation provided by the first passive magnetic unit a 410 and the first passive magnetic unit B130 and the second passive magnetic unit a 610 and the second passive magnetic unit B140 is lower than the compensation for counteracting the weight W of the carrier 100 and the total downward attractive force C of the active magnet 510. Therefore, the third partial weight R of the carrier 100 supported by the plurality of rollers 210 is excessively large, so that particle generation may be caused by increasing wear of the plurality of rollers 210.
Many factors may change the distribution of the compensation provided, and thus the portion of the weight W of the carrier 100 supported by each of the first passive magnetic unit a 410 and the first passive magnetic unit B130, the second passive magnetic unit a 610 and the second passive magnetic unit B140, and the plurality of rollers 210. For example, the carrier 100 may be configured to carry substrates having different weights (e.g., different sized substrates or substrates that have been deposited with different amounts of material), thereby causing the carrier 100 to support substrates S that may have different combined weights W. The carrier 100 supporting the lighter substrate S may be overcompensated by the carrier transport system, while the carrier 100 supporting the heavier substrate S may be undercompted by the carrier transport system.
The carrier 100 may also be configured to carry other objects than substrates. For example, the carrier 100 may carry a mask. In a typical application, different types of masks are used for the various stages of deposition, and the different types of masks may each have different weights. As a further example, carrier 100 may carry a pre-sputter plate onto which a layer of material is deposited during a pre-sputter process performed prior to deposition on one or more substrates. The pre-sputter plate is typically a metal plate, which is much heavier than the glass substrate. The different weights of the various objects carried by the carrier 100 may cause overcompensation or undercompensation of the carrier 100.
Another factor that may alter the compensation profile is when the carrier 100 undergoes a temperature change causing thermal expansion or contraction. The gap between the first passive magnetic element a 410 and the first passive magnetic element B130 may increase or decrease, resulting in a different amount of compensation provided by the first passive magnetic element a 410 and the first passive magnetic element B130. The carrier 100 subjected to thermal expansion may be overcompensated by the carrier transport system, while the carrier 100 subjected to thermal contraction may be undercompensated by the carrier transport system.
Another situation in which the compensation profile can be changed is when the carrier traverses the gap. In the present example of steady state transport of the carrier 100, the first and second passive magnetic units a 410 and B130 and a 610 and B140 compensate for the weight W of the carrier and the downward attractive force C of the active magnet 510 to minimize the third partial weight R supported by the plurality of rollers 210. However, in a typical vacuum processing apparatus, the carrier 100 may be transported from a first vacuum chamber to a second chamber. Problems arise when the carrier 100 is transported across a gap transition, in particular between vacuum chambers of a vacuum processing apparatus.
A further situation in which the compensation distribution can be changed is in the region affected by the magnetic disturbance. For example, magnetic means (such as large magnetic motors) may be present in the deposition apparatus near the carrier transport system, resulting in a change in the compensation profile applied to the carrier 100, which may result in under-or over-compensation of the carrier 100.
In the above case, the apparatus and method of the present disclosure may provide additional compensation to overcome these variations in the compensation distribution and to overcome the problems of overcompensation or undercompensation of the carrier 100.
Referring now to fig. 3, a carrier transport system is shown transporting carriers 100 across a gap transition 300, e.g., left to right. In the region of the gap transition 300, one or more elements of the carrier transport system are absent. In particular, the roller transport rail 200 is divided into a roller transport rail 200a on a first side of the gap transition 300 and a roller transport rail 200b on a second side of the gap transition. Similarly, the first and second passive magnetic units a 410 and a 610 are divided into respective first and second passive magnetic units a 410a and a 610a on the first side of the gap transition 300 and respective first and second passive magnetic units a 410b and a 610b on the second side of the gap transition 300. Thus, the magnetic compensation provided by the first and second passive magnetic units a 410, a 610 varies across the gap transition 300. Furthermore, the carrier 100 is cantilevered over the last roller 210a of the roller transport track 200a on a first side of the gap transition 300 a distance and has not yet been in contact with the first roller 210b of the roller transport track 200b on a second side of the gap transition 300.
Carrier 100 becomes under-compensated due to the reduced magnetic compensation and carrier 100 cantilevers across gap transition 300. In other words, the third partial weight R to be supported by the roller transportation rail 200a, in particular the last roller 210a on the first side of the gap transition 300, increases significantly. The increased load on the rollers, particularly the last roller 210a, results in reduced roller life and increased particle generation.
In the context of the present disclosure, the term "gap transition" may be defined as a portion of a carrier transport system in the absence of some or all of the magnetic elements. The term "gap transition" may further include a portion of a carrier transport system in the absence of some or all of the transport rail components, although the disclosure is not so limited. This results in the term "crossing the gap transition" not necessarily defining a transport track that is completely absent by all elements, but rather that the carrier passes through an area where some or all of the magnetic elements are absent, and that a subsequent reduced, altered or compromised magnetic compensation of the weight W of the carrier 100 occurs. In particular, in the gap transition, the carrier 100 may become under-compensated.
A "gap transition" may be defined as the distance between the end point of one magnetic element on a first side of the gap transition and the start point of another magnetic element on a second side of the gap transition. In particular, a "gap transition" may be defined as the distance between the end of the first passive magnetic element a 410a on a first side of the gap transition and the start of the first passive magnetic element a 410b on a second side of the gap transition. Similarly, a "gap transition" may be defined as the distance between the end of the second passive magnetic element a 610a on a first side of the gap transition and the start of the second passive magnetic element a 610b on a second side of the gap transition.
Alternatively, a "gap transition" may be defined as the distance between the last roller 210a of the roller transport track 200a on a first side of the gap transition and the first roller 210b of the roller transport track 200b on a second side of the gap transition. More particularly, a "gap transition" may be defined as the distance between the central axis of the last roller 210a of the roller transport track 200a on a first side of the gap transition and the central axis of the first roller 210b of the roller transport track 200b on a second side of the gap transition.
Reference will now be made to fig. 4a and 4b, fig. 4a and 4b show detailed side and end views of a carrier transport system according to the present disclosure. According to an embodiment of the present disclosure, a carrier transport system for transporting a carrier 100 within a vacuum chamber is provided. The carrier transport system comprises: track assembly, the track assembly extends in the transportation direction X, the track assembly includes: a first passive magnetic unit A410 disposed at a first vertical coordinate Y 1 And extends in the transport direction X, wherein the first passive magnetic unit a 410 is configured to counteract a first partial weight a of the carrier 100; a second passive magnetic unit A610 disposed at a second vertical coordinate Y 1 And extends in the transport direction X, wherein the second passive magnetic unit a610 is configured toCounteracting the second weight B of the carrier 100; roller transport rails 200, 200a, 200b arranged at a third vertical coordinate Y 3 And includes a plurality of rollers 210, 210a, 210b configured to support a third partial weight R of the carrier 100, and at least one compensating magnet unit 700 disposed in a compensating region along the track assembly and configured to provide a compensating force F to the carrier 100.
At least one compensating magnetic unit 700 is provided to compensate for variations in magnetic compensation provided by the carrier transport system, in particular for a reduction in magnetic compensation. In other words, at least one compensating magnetic unit 700 is provided to compensate for either the overcompensated carrier 100 or the undercompensated carrier 100. For example, at least one compensation magnetic unit 700 may be disposed along the track assembly at a compensation region in which the magnetic compensation provided by the first and second passive magnetic units a610, a 410 changes, decreases, or compromises. As described above, such a situation may occur in areas where there is a potential magnetic disturbance (such as in the vicinity of a large electric motor), where thermal expansion of the carrier 100 may change, or where other magnetic transport challenges may occur.
One particular case of a magnetic compensation tradeoff is at the gap transition 300, where the carrier 100 may become under-compensated. By applying an upward compensation force F to the carrier 100, the reduced magnetic compensation of the carrier transport system may revert to a normal level that exists at the area not affected by the gap transition 300, and further magnetic compensation may be provided to account for other effects, such as the carrier 100 cantilevering across the gap transition 300. By providing such compensation, the compensating magnetic unit 700 allows the carrier 100 to pass through the gap transition 300 without causing additional loads on the rollers 210, particularly on the last roller 210a before the gap transition 300, resulting in improved roller life and reduced particle generation.
The compensating magnetic element 700 may be an active or passive magnetic element. For example, if the compensating magnetic cell 700 is to apply a known amount of compensation, a permanent magnet may be provided to apply an attractive or repulsive force to the elements of the carrier 100 to produce a fixed compensating force F. However, a preferred embodiment of the present disclosure includes at least one compensating magnet unit 700 in the form of an electromagnetic actuator or an electro-permanent magnet, which can be controlled. As exemplarily shown in the drawings, the compensating magnet unit 700 may include a coil 710 and a ferromagnetic yoke 720. The shape of the ferromagnetic yoke 720, which may include ferromagnetic or magnetic materials, may be such that a magnetic circuit is formed with the second rail 122 of the carrier 100. As the carrier 100 is transported through the compensation zone in which the compensation magnet unit 700 is placed, an upward attractive force is applied to the second rail 122. By controlling the current through the coil 710, the compensation force F applied to the carrier 100 can be controlled.
However, the present disclosure is not limited to the compensating magnetic cell 700 providing an upward attractive force to the second rail 122. At least one of the first rail 120 and the second rail 122 may include a ferromagnetic material or a magnetic material such that an attractive force may be applied to the at least one of the first rail 120 and the second rail 122. The compensation magnet unit 700 may be configured for at least one of: providing an upward attractive force to the second rail 122 or providing a downward attractive force to the first rail 120. According to embodiments, which may be combined with other embodiments described herein, the compensation forces F, fa, fb act in a direction opposite to the direction of gravity to compensate for the under-compensated carrier 100, or the compensation forces F, fa, fb act in the direction of gravity to compensate for the over-compensated carrier 100.
In alternative embodiments, the compensating magnetic cell 700 may be configured to apply a repulsive force to the elements of the carrier 100. For example, the compensating magnetic unit 700 may be positioned above or below one of the first or second passive magnetic units B130, B140 of the carrier 100, which one of the first or second passive magnetic units B130, B140 may comprise a magnetic material, in particular a number of permanent magnets, in order to apply a repulsive force to the one of the first or second passive magnetic units B130, B140 in an upward or downward direction. Alternatively, one of the first rail 120 and the second rail 122 may comprise a magnetic material, in particular a number of permanent magnets, and the compensating magnetic cell 700 may be positioned such that a repulsive force is applied to the one of the first rail 120 and the second rail 122. More generally, the carrier 100 may be provided with a magnetic element, in particular a number of permanent magnets, configured for exerting a repulsive force by the compensating magnetic cell 700. In these cases, the compensating magnetic cell 700 may be controllable to provide an attractive or repulsive force depending on the direction of the current applied to the coil 710 of the compensating magnetic cell 700.
By applying the compensation forces F, fa, fb in an upward or downward direction, the compensation profile of the carrier 100 can be controlled, thereby avoiding overcompensation or undercompensation of the carrier 100. In particular, the compensating magnetic cell 700 may be provided not only for compensating the carrier 100 traversing the gap transition 300, but also for compensating the carrier 100 which has been compensated or under-compensated in any of the cases described herein.
In order to optimally compensate for the reduced or altered magnetic compensation at the gap transition 300, at least one compensating magnetic unit 700 may be placed as close to the gap transition as possible in the transport direction X. However, the distance from the bucking magnet unit 700 to the gap transition 300 may depend on the size of the carrier 100, in particular the length of the carrier 100 in the transport direction X. According to embodiments that may be combined with other embodiments described herein, the carrier transport system further comprises a gap transition 300 at which the carrier 100 traverses the gap in the track assembly, wherein the compensation zone (in which the at least one compensation magnet unit 700 is provided) is in the vicinity of the gap transition 300. Preferably, the at least one compensating magnetic cell 700 is disposed within 500mm of the gap transition 300, more preferably within 200mm of the gap transition 300. In particular, such a position refers to the relative position of the at least one compensating magnet unit 700 and the gap transition 300 in the transport direction X. As exemplarily shown in the drawings, at least one compensating magnet unit 700 may be placed between the last two rollers 210a of the roller transportation rail 200a, but the present disclosure is not limited thereto. For example, at least one compensating magnetic unit 700 may be placed after the last roller 210a and before the end of the first passive magnetic unit a 410 and/or the second passive magnetic unit a 610.
Depending on the length of the carrier 100 in the transport direction X, a sufficient compensation can be achieved by providing at least one compensation magnet unit 700 only on the first side of the gap transition 300. However, if at least one compensating magnetic cell 700 is provided on each side of the gap transition 300, improved performance may be obtained, particularly in the case of shorter carriers. Such an embodiment is exemplarily shown in fig. 5a, fig. 5a showing a carrier transport system with a first compensating magnet unit 700a on a first side of the gap transition 300 and a second compensating magnet unit 700b on a second side of the gap transition 300. The first compensating magnet unit 700a provides a first compensating force Fa to the carrier 100, and the second compensating magnet unit 700b provides a second compensating force Fb to the carrier 100. Such an arrangement of the compensating magnetic units 700a, 700b allows for magnetic compensation to be applied as the carrier 100 enters the gap transition 300 and continues to be applied as the carrier 100 exits the gap transition 300. The load on the rollers 210 of the roller transportation track 210b on the second side of the gap transition 300 may be reduced in the same manner as the rollers 210 of the roller transportation track 210a on the first side of the gap transportation 300.
In the embodiment exemplarily shown in the drawings, the at least one compensating magnet unit 700 is disposed at a third vertical coordinate Y corresponding to the vertical coordinate of the roller transportation rail 200 3 Where it is located. This vertical position is convenient because it allows the compensation force F to be applied to the second rail 122 by the compensation magnet unit 700 and as such is a preferred embodiment of the present disclosure. However, the present disclosure is not limited thereto. According to embodiments, which may be combined with other embodiments described herein, the at least one compensating magnet unit 700, 700a, 700b may be arranged at a third vertical coordinate Y 3 Second vertical coordinate Y 2 And a first vertical coordinate Y 1 At least one of the following. For example, the compensating magnet 700 may be disposed at a first vertical coordinate Y 1 Where the compensation force F is applied to the first passive magnetic unit B130 of the carrier 100, or may be set at a second vertical coordinate Y 2 At which the compensation force F is applied to the second passive magnetic unit B140 of the carrier 100. Alternatively, the combination of compensating magnet units 700 may be arranged at a plurality of vertical coordinates in order to provide a larger, more dispersed compensating force F to the carrier 100 at a position as close as possible to the gap transition 300. For example, providing compensating magnetic units 700 at the top and bottom of carrier 100 may allow magnetic compensation, which reduces the induction in carrier 100Possibility of instability.
As discussed above, the amount of magnetic compensation may be distributed between each of the first passive magnetic unit a 410 and the first passive magnetic unit B130 and the second passive magnetic unit a 610 and the second passive magnetic unit B140. Depending on the amount of magnetic compensation that has been changed, removed, or compromised (i.e., whether the carrier 100 is overcompensated or undercompensated), the compensation force F may be configured to reduce or minimize the resulting third fractional weight R to be supported by the rollers 210, 210a, 210 b.
According to embodiments that may be combined with other embodiments described herein, the first weight fraction a may be at least 20% of the weight W of the carrier 100, the second weight fraction B may be at least 60% of the weight W of the carrier 100, and the compensating forces F, fa, fb may be at least 10% of the weight W of the carrier 100. By correspondingly distributing the magnetic compensation, the resulting third partial weight R to be supported by the roller 210 may be at most 10% of the weight of the carrier 100.
Where the drive assembly 500 includes a set of active magnets 510, the downward attractive force applied to the carrier 100 by the active magnets 510 causes a different distribution of magnetic compensation than a non-magnetic drive assembly. In particular, the downward attractive force exerted by the active magnet 510 on the carrier 100 may correspond to 10%, 20% or at most 40% of the weight W of the carrier 100. In a preferred embodiment, the second passive magnetic unit a 610 may be configured such that the second weight a is equivalent to the sum of the downward attractive force applied to the carrier 100 by the active magnet and at least 60% of the weight W of the carrier 100. As discussed above, using the second passive magnetic unit a 610 to magnetically compensate for a greater proportion of the load reduces the impact on magnetic compensation due to thermal expansion effects of the carrier 100, as opposed to the first passive magnetic unit a 410.
In the context of the present disclosure, the compensation forces F, fa, fb may be controllable and/or adjustable in magnitude and direction such that the distribution of the magnetic compensation is controlled. For example, the target of the resulting third fractional weight R may be set, and the compensating magnet 700 may be adjusted and/or controlled so as not to exceed the target. In other words, the distribution of the first partial weight a, the second partial weight B and the compensating forces F, fa, fb may be configured such that the resulting third partial weight R to be supported by the plurality of rollers 210, 210a, 210B is at most 10% of the weight W of the carrier 100. In addition, the compensating magnet unit 700 may be adjusted and/or controlled so as to maintain a minimum third partial weight R to be supported by the plurality of rollers 210, 210a, 210b, e.g., more than 0% of the weight W of the carrier 100, such that the carrier 100 is not lifted from the plurality of rollers 210, 210a, 210 b.
The carrier transport system may further comprise at least one input signal for controlling the at least one compensating magnet unit 700, 700a, 700b based on the at least one input signal. For example, the carrier transport system may be provided with a carrier position sensor which can detect a carrier position X along the track assembly in the transport direction X c So that it can be based on the carrier position X c To control at least one of the compensating magnet units 700, 700a, 700b. As a further example, the carrier transport system may be provided with at least one roller load sensor that may measure the load applied to the at least one roller 210, 210a, 210b, such that the at least one compensating magnet unit 700, 700a, 700b may be controlled based on the load applied to the at least one roller 210, 210a, 210 b.
One such example of controlling the compensating magnet units 700, 700a, 700b is exemplarily shown in fig. 5 b. The first compensating magnetic cell 700a is disposed on a first side of the gap transition 300 and the second compensating magnetic cell 700b is disposed on a second side of the gap transition 300. Each respective compensating magnet unit 700a, 700b applies a compensating force Fa, fb to the carrier 100 and is based on the carrier position X c To control the compensation forces Fa, fb. The compensation force response is configured in three phases, corresponding to the introduction phase T 1 Transition stage T 1 And export stage T 3 。
In the introduction phase T 1 The compensation force Fa applied by the first compensation magnet unit 700a is ramped up (ramp up) to first compensate for the reduced magnetic compensation due to the lack of the first and second passive magnet units a 410, a 610 in the gap transition 300, and also to compensate for the cantilevered extension of the carrier 100 from the last roller 210a of the roller transport track 200a on the first side of the gap transition 300.
Once the carrier 100 has begun to traverse the cellThe gap transition 300 and having been in contact with the first roller 210b of the roller transport track 200b on the second side of the gap transition 300, then in the transition phase T 2 The compensation forces Fa, fb are adjusted. Here, as the carrier passes through the gap transition 300, the compensation force Fa gradually decreases and the compensation force Fb gradually increases, so that a constant total compensation force F is applied to the carrier 100.
Finally, when the carrier 100 loses contact with the last roller 210a of the roller transport track 200a on the first side of the gap transition 300, the carrier 100 is again cantilevered. Similar to the lead-in stage T 1 The compensation force Fb during the derivation phase T 3 To compensate for the reduced magnetic compensation due to the lack of the first and second passive magnetic units a 410, a 610 in the gap transition 300, and also to compensate for the cantilevered extension of the carrier 100 from the first roller 210b of the roller transport track 200b on the first side of the gap transition 300.
Accordingly, the present disclosure further relates to a carrier 100 for a substrate S to be processed in an apparatus for vacuum processing of the substrate S. In particular, the present disclosure further relates to a carrier 100, the carrier 100 to be transported by a carrier transport system according to embodiments of the present disclosure. The carrier 100 includes: a first passive magnetic unit B130 disposed at a first vertical coordinate Y 1 A place; a second passive magnetic unit B140 disposed at a second vertical coordinate Y 2 A place; a first rail 120 configured to be disposed at a third vertical coordinate Y 3 At least one top surface of the plurality of rollers 210, 210a, 210 b; and a second rail 122 configured to contact at least one bottom surface of the plurality of rollers 210, 210a, 210b, wherein at least one of the first rail 120 and the second rail 122 comprises a ferromagnetic material or a magnetic material.
According to another aspect of the present disclosure, a method for transporting a carrier 100 along a track assembly within an apparatus for vacuum processing of a substrate S is provided. The method comprises the following steps: the first partial weight a of the carrier 100 is counteracted using the first passive magnetic unit a 410 of the track assembly and the first passive magnetic unit B130 of the carrier 100; the second weight B of the carrier 100 is counteracted using the second passive magnetic element a 610 of the track assembly and the second passive magnetic element B140 of the carrier; supporting a third partial weight R of the carrier 100 using at least one of the plurality of rollers 210, 210a, 210b of the track assembly; transporting the carrier 100 along the track assembly in a transport direction X and through the compensation zone; and providing the compensation forces F, fa, fb to the carrier 100 using at least one compensation magnet unit 700, 700a, 700b arranged in the compensation zone.
In the context of the present disclosure, a compensation zone is defined as a zone or location along the track assembly in the transport direction X where the compensation magnet units 700, 700a, 700b are provided. The carrier 100 may pass through a compensation zone, or may cross a compensation zone, in which at least one compensation magnet unit 700, 700a, 700b is positioned, when transported by the carrier transport system. In particular, the compensation zone is near the gap transition 300, where the carrier 100 traverses the gap in the track assembly. It is noted that in the context of the present disclosure, as discussed above, the term "gap transition" may refer to an area in which reduced, altered, or compromised magnetic compensation is provided by the magnetic elements of the track assembly. Accordingly, a compensation force F is provided in the compensation region near the gap transition 300 to compensate for reduced, altered, or compromised magnetic compensation that would otherwise be provided by the magnetic elements of the track assembly.
According to a further embodiment of the method described above, the carrier position X of the carrier 100 in the transport direction X may be based on c Or adjust the compensation forces F, fa, fb based on a roller load measured on at least one of the plurality of rollers 210, 210a, 210 b.
According to an aspect of the present disclosure, there is provided an apparatus for vacuum processing of a substrate S. The apparatus comprises at least one vacuum chamber, a carrier transport system according to embodiments described herein, and a carrier 100 according to embodiments described herein. The carrier transport system is configured to transport the carrier 100 into and out of at least one vacuum chamber. In particular, the carrier transport system is configured to transport the carrier 100 across a gap transition, for example, at an input/output valve of at least one vacuum chamber.
In a preferred embodiment, which may be combined with other embodiments described herein, the first passive magnetic unit a 410 of the track assembly is configured to couple with the first passive magnetic unit B130 of the carrier 100 at the top of the carrier 100, and the second passive magnetic unit a 610 of the track assembly is configured to couple with the second passive magnetic unit B140 of the carrier at the side of the carrier 100. In another preferred embodiment, the at least one compensating magnetic cell 700, 700a, 700B provides the compensating force F, fa, fb to the carrier 100 by magnetic interaction with at least one of the first passive magnetic cell B130 of the carrier 100, the second passive magnetic cell B140 of the carrier 100, the first rail 120 and/or the second rail 122.
The apparatus for vacuum processing of the substrate S may further comprise a processing device. In particular, the processing means is typically arranged in at least one vacuum chamber, and the processing means may be selected from the group consisting of: deposition sources, evaporation sources, and sputtering sources.
The term "vacuum" may be understood in the sense of a technical vacuum having a vacuum pressure of less than, for example, 10 mbar. Typically, the pressure in at least one vacuum chamber as described herein may be at 10 -5 Millibars and about 10 -8 Between millibars, more typically at 10 -5 Millibars and 10 -7 Between millibars, and even more typically about 10 -6 Millibars and about 10 -7 Between millibars. The pressure in the at least one vacuum chamber may be considered as the partial pressure of the vaporized material within the at least one vacuum chamber or as the total pressure (both may be approximately the same when only vaporized material is present as a component to be deposited in the at least one vacuum chamber). The total pressure in the at least one vacuum chamber may be about 10 -4 Millibars to about 10 -7 In the range of millibars, especially in the presence of a second component (such as a process gas or the like) other than the evaporated material in the at least one vacuum chamber. Accordingly, the at least one vacuum chamber may be a "vacuum deposition chamber", i.e. a vacuum chamber configured for vacuum deposition.
The apparatus for vacuum processing of the substrate S may further comprise at least one valve for transporting the carrier 100 into and out of the at least one vacuum chamber. In the context of the present disclosure, a valve may be considered to be equivalent to a gap transition 300 across which the carrier 100 is to be transported. The valve may comprise, for example, a sealable sliding door configured to isolate the environment inside one vacuum chamber from the environment of an adjacent vacuum chamber. The valve may be included in a load lock chamber configured to load the carrier 100 and/or the substrate S from an atmosphere different from the atmosphere in the at least one vacuum chamber into an apparatus for vacuum processing of the substrate S.
According to embodiments described herein, the vacuum chamber may include at least one carrier transport system. At least one carrier transport system may be configured for bi-directional transport of the carrier 100 in both a forward transport direction and a reverse transport direction. Alternatively, a second carrier transport system may be provided, wherein the first carrier transport system is configured for operation in one direction and the other carrier transport system is configured for operation in the other direction.
Embodiments described herein may be used to transport a carrier carrying at least one of a large area substrate, a glass substrate, a wafer, a semiconductor substrate, a mask, a shield, and other objects. The carrier being capable of carrying a single object, e.g. having a length of 1m 2 Or greater, especially 5m 2 Or 10m 2 Or larger sized large area substrates, or may carry multiple objects (e.g., multiple semiconductor wafers) having smaller sizes. The carrier may comprise a holding device configured to hold the object at the carrier, such as a magnetic chuck, an electrostatic chuck or a mechanical chuck device.
During transport, the carrier may have a substantially vertical orientation (e.g., +/-10 ° vertical). In particular, the vacuum processing system may be configured for vertical substrate processing.
While the foregoing is directed to embodiments, other and further embodiments may be devised without departing from the basic scope thereof, and the scope thereof is determined by the claims that follow.

Claims (20)

1. A carrier transport system for transporting a carrier (100) within a vacuum chamber, comprising:
a track assembly extending in a transport direction (X), the track assembly comprising:
a first passive magnetic unit a (410) disposed at a first vertical coordinate (Y 1 ) And extending in the transport direction (X), wherein the first passive magnetic unit a (410) is configured to counteract a first partial weight (a) of the carrier (100);
a second passive magnetic unit a (610) disposed at a second vertical coordinate (Y 2 ) And extending in the transport direction (X), wherein the second passive magnetic unit a (610) is configured to counteract a second weight (B) of the carrier (100);
roller transport rails (200, 200a, 200 b) arranged at a third vertical coordinate (Y 3 ) And comprising a plurality of rollers (210, 210a, 210 b) configured to support a third partial weight (R) of the carrier (100), and
at least one compensating magnet unit (700) disposed in a compensation region along the track assembly and configured to provide a compensating force (F, fa, fb) to the carrier (100).
2. The carrier transport system of claim 1, further comprising a gap transition (300) at which the carrier (100) is configured to traverse a gap in the track assembly, wherein the compensation region is proximate the gap transition (300) and the at least one compensation magnet unit (700) is disposed in the compensation region.
3. Carrier transport system according to claim 2, characterized in that the compensation zone is within 500mm of the gap transition (300).
4. The carrier transport system of claim 1, further comprising a gap transition (300) at which the carrier (100) is configured to traverse a gap in the track assembly, wherein the at least one compensating magnetic unit (700) comprises a first compensating magnetic unit (700 a) on a first side of the gap transition (300) and a second compensating magnetic unit (700 b) on a second side of the gap transition (300).
5. The carrier transport system according to claim 1, characterized in that the compensation magnet unit (700) is configured to perform at least one of the group comprising: an attractive force is applied to the magnetic material-containing element of the carrier (100), and a repulsive force is applied to the magnetic material-containing element of the carrier (100).
6. Carrier transport system according to claim 1, characterized in that the at least one compensating magnet unit (700) is arranged at least one selected from the group consisting of: said first vertical coordinate (Y 1 ) Said second vertical coordinate (Y 2 ) And the third vertical coordinate (Y 3 )。
7. Carrier transport system according to claim 1, characterized in that the at least one compensating magnet unit (700) is arranged at the third vertical coordinate (Y 3 ) Where it is located.
8. Carrier transport system according to claim 1, characterized in that the at least one compensating magnetic unit (700) is an electromagnetic actuator or an electro-permanent magnet.
9. Carrier transport system according to claim 1, characterized in that the carrier transport system further comprises a drive assembly (500) having a set of active magnets (510) extending in the transport direction (X) and configured to provide a driving force in the transport direction (X).
10. Carrier transport system according to claim 2, characterized in that the carrier transport system further comprises a drive assembly (500) having a set of active magnets (510) extending in the transport direction (X) and configured to provide a driving force in the transport direction (X).
11. Carrier transport system according to claim 1, characterized in that the carrier transport system is configured for transporting the carrier (100) in a vertical or near vertical orientation.
12. The carrier transport system according to claim 2, characterized in that the carrier transport system is configured for transporting the carrier (100) in a vertical or near vertical orientation.
13. Carrier transport system according to claim 1, characterized in that the first partial weight (a) is at least 20% of the weight (W) of the carrier (100), the second partial weight (B) is at least 60% of the weight (W) of the carrier (100), and the compensating force (F, fa, fb) is at least 10% of the weight (W) of the carrier (100).
14. Carrier transport system according to claim 1, characterized in that the compensation forces (F, fa, fb) act in a direction opposite to the direction of gravity to compensate for an under-compensated carrier (100) or the compensation forces (F, fa, fb) act in the direction of gravity to compensate for an over-compensated carrier (100).
15. The carrier transport system of claim 1, characterized in that the poles of the first passive magnetic unit a (410) and the second passive magnetic unit a (610) are further configured for lateral guiding of the carrier (100).
16. A carrier (100) for a substrate (S) to be processed in an apparatus for vacuum processing of the substrate (S), characterized by comprising:
A first passive magnetic unit B (130) disposed at a first vertical coordinate (Y 1 ) A place;
a second passive magnetic unit B (140) disposed at a second vertical coordinate (Y 2 ) A place;
a first rail (120) configured to be aligned with a first vertical coordinate (Y 3 ) At least one top surface of the plurality of rollers (210, 210a, 210) is in contact; and
a second rail (122) configured to contact at least one bottom surface of the plurality of rollers (210, 210a, 210 b),
wherein at least one of the first rail (120) and the second rail (122) comprises a magnetic material.
17. The carrier (100) according to claim 16, characterized in that the carrier (100) is configured for transport by a carrier transport system according to any one of claims 1 to 15.
18. An apparatus for vacuum processing of a substrate (S), characterized by comprising:
at least one vacuum chamber;
the carrier transport system according to any one of claims 1 to 15; and
the carrier (100) according to claim 16.
19. The apparatus for vacuum processing of a substrate (S) according to claim 18, characterized in that the first passive magnetic unit a (410) of the track assembly is configured to be coupled with the first passive magnetic unit B (130) of the carrier (100) at the top of the carrier (100); and is also provided with
The second passive magnetic unit a (610) of the track assembly is configured to couple with the second passive magnetic unit B (140) of the carrier (100) at a side of the carrier (100).
20. Apparatus for vacuum processing of a substrate (S) according to claim 18, characterized in that the at least one compensating magnetic unit (700) provides the compensating force (F, fa, fb) to the carrier (100) by magnetic interaction with at least one selected from the group consisting of: -the first passive magnetic unit B (130) of the carrier (100), -the second passive magnetic unit B (140) of the carrier (100), -the first rail (120) and-the second rail (122).
CN202090001218.8U 2020-10-06 2020-10-06 Carrier transport system, carrier for substrate and apparatus for vacuum treatment of substrate Active CN220585205U (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2020/077995 WO2022073588A1 (en) 2020-10-06 2020-10-06 Carrier transport system, carrier therefor, vacuum processing apparatus, and method of transportation of a carrier in a vacuum chamber

Publications (1)

Publication Number Publication Date
CN220585205U true CN220585205U (en) 2024-03-12

Family

ID=72752933

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202090001218.8U Active CN220585205U (en) 2020-10-06 2020-10-06 Carrier transport system, carrier for substrate and apparatus for vacuum treatment of substrate

Country Status (2)

Country Link
CN (1) CN220585205U (en)
WO (1) WO2022073588A1 (en)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4632091B2 (en) * 2005-08-30 2011-02-16 株式会社ダイフク Goods transport equipment
KR101288599B1 (en) * 2007-05-29 2013-07-22 엘지디스플레이 주식회사 Apparatus for transferring substrates
KR101271112B1 (en) * 2011-02-01 2013-06-04 (주)이루자 Vaccum processing apparatus
KR102090645B1 (en) * 2018-08-27 2020-03-18 엘지전자 주식회사 Conveying apparatus

Also Published As

Publication number Publication date
WO2022073588A1 (en) 2022-04-14

Similar Documents

Publication Publication Date Title
KR102161185B1 (en) Apparatus for vacuum processing of substrates, system for vacuum processing of substrates, and method for transport of substrate carriers and mask carriers in vacuum chambers
US11377310B2 (en) Magnetic levitation system, base of a magnetic levitation system, vacuum system, and method of contactlessly holding and moving a carrier in a vacuum chamber
KR20170106464A (en) Semiconductor process equipment
WO2017198298A1 (en) Apparatus and method for transport
KR101146915B1 (en) Horizontal type contactless deposition apparatus
US12119173B2 (en) Magnetic levitation system, base and carrier of a magnetic levitation system, and method of levitating a carrier
WO2020200443A1 (en) Carrier transport system, vacuum deposition system, and method of transporting a carrier in a vacuum chamber
WO2020001751A1 (en) Magnetic levitation system for transporting a carrier, carrier for a magnetic levitation system, apparatus for transportation of a carrier, processing system for vertically processing a substrate, and method of switching a transport path of a carrier
CN220585205U (en) Carrier transport system, carrier for substrate and apparatus for vacuum treatment of substrate
KR20190087984A (en) Apparatus for transporting carriers, systems for vacuum processing substrates, and methods for transporting carriers in vacuum chambers
KR20210104134A (en) Magnetic levitation system, carrier for magnetic levitation system, vacuum system, and method of transporting carrier
CN109983154B (en) Carrier for contactless transport in a deposition system, device for transport of a carrier, and method for transporting a carrier
JPS60261302A (en) Article conveyor in high vacuum
CN218069804U (en) Magnetic levitation system for transporting a carrier, base structure therefor and vacuum deposition system
KR20190047658A (en) System for non-contact transport of carriers and method for contactless transport of carriers in a deposition system
KR20190087985A (en) Apparatus for transferring a carrier in a vacuum chamber, and method for transferring a carrier in a vacuum chamber
CN220887670U (en) Carrier transport system for transporting carriers and apparatus for vacuum treatment of substrates
KR20180109835A (en) Carrier for use in a vacuum system, system for vacuum processing, and method for vacuum processing of a substrate
KR102430391B1 (en) A magnetic levitation system for transporting a carrier, a carrier for a magnetic levitation system, a processing system for vertically processing a substrate, and a method of transporting the carrier
KR102690850B1 (en) Magnetic levitation system and method of levitating the carrier
KR102545664B1 (en) Apparatus for transporting a carrier, processing system for vertically processing a substrate, and method for switching a transport path of a carrier
KR20230154081A (en) Carrier for transporting objects in a vacuum chamber, method of manufacturing the carrier, carrier transport system, and vacuum processing device
US20220393618A1 (en) Magnetic levitation system, processing system, and method of transporting a carrier
WO2022100857A1 (en) Carrier transport system, magnetic stabilization unit, carrier, and method for contactlessly transporting a carrier
WO2021197586A1 (en) Carrier transportation apparatus, carrier transport system, processing system and method of transporting a carrier

Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant