CN220252384U - Mirror surface cleaning jig for mask plate - Google Patents
Mirror surface cleaning jig for mask plate Download PDFInfo
- Publication number
- CN220252384U CN220252384U CN202321707093.2U CN202321707093U CN220252384U CN 220252384 U CN220252384 U CN 220252384U CN 202321707093 U CN202321707093 U CN 202321707093U CN 220252384 U CN220252384 U CN 220252384U
- Authority
- CN
- China
- Prior art keywords
- mask plate
- mask
- jig
- mirror
- mirror surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 33
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 20
- 230000000903 blocking effect Effects 0.000 claims description 10
- 230000001681 protective effect Effects 0.000 claims description 10
- 230000002093 peripheral effect Effects 0.000 claims description 6
- 210000001503 joint Anatomy 0.000 claims 1
- 239000007788 liquid Substances 0.000 abstract description 11
- 238000000034 method Methods 0.000 description 5
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
- 230000002159 abnormal effect Effects 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000005856 abnormality Effects 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- 241000755266 Kathetostoma giganteum Species 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 238000012858 packaging process Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 150000003071 polychlorinated biphenyls Chemical class 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
The utility model discloses a mirror surface cleaning jig for a mask plate, which comprises a jig body, wherein a station groove is formed in the upper part of the jig body and is used for adaptively mounting the mask plate, positioning edges are arranged on the periphery of the station groove corresponding to the mask plate, and the positioning edges are in abutting connection with the edge of the mask plate; the lower part of the jig body is provided with a rotary shaft sleeve which is used for being connected with the driving end of the motor. When the mirror surface is polluted after mask film pasting, a prying film is not needed; the mirror surface is cleaned quickly by using a PVA circular brush, cleaning liquid and deionized pure water by being arranged on a cleaning jig; the film picking and re-sticking are avoided, and the cost is reduced; meanwhile, the aim of improving the cleaning efficiency is fulfilled, and the service requirements of customers are responded quickly.
Description
Technical Field
The utility model relates to the technical field of semiconductor production equipment, in particular to a mirror surface cleaning jig for a mask.
Background
A lithographic mask (also called a photomask, english is mask), which is a graphic master mask used in a common lithographic process of micro-nano processing technology. A mask pattern structure is formed on a transparent substrate by an opaque light-shielding film, and pattern information is transferred to a product substrate through an exposure process. The mask to be processed consists of a glass/quartz substrate, a chromium layer and a photoresist layer. The pattern structure can be obtained by plate making process, and the common processing equipment is direct writing lithography equipment, such as laser direct writing lithography machine, electron beam lithography machine, etc. Masks are widely used, and in fields related to photolithography processes, masks such as ICs (integrated circuits), FPDs (flat panel displays), PCBs (printed circuits), MEMS (MicroElectroMechanical Systems), and the like are required.
In order to prolong the service life of the mask, the defects of ash falling, dirty points falling, scratches and the like on the graph of the mask are avoided, and the yield of the production line wafer is affected, so that a layer of protective film is required to be attached to the mask. As shown in fig. 1, one surface of the mask 10 is a mirror surface 11, the other surface is a chrome surface 12 with a pattern, the chrome surface 12 of the mask 10 is attached with a protective film 13 (Pellicle), which is a colorless organic polymer film stretched and laid on a frame, the frame (film frame) 14 around the protective film 13 is specially designed for the mask 10, and the mask 10 is attached after the mask 10 is manufactured and cleaned.
For example, 6025 film masks are the most widely used mainstream products with the greatest yields at present, and the following drawbacks exist during use:
1. after the 6025 film-sticking mask is used for a period of time on a production line, the mirror surface (glass surface) has the abnormalities such as dust fall, dirty marks, gum cover marks and the like, so that the subsequent use of the 6025 film-sticking mask is affected. At this time, the abnormal 6025 film mask is required to be pried and then cleaned and re-adhered.
2. When 6025 mask is pasted, in the AOI (automatic optical inspection) detection process after clamping and pasting and in the packaging process, the mirror surface (glass surface) has the abnormal phenomena of dust fall, dirty marks, gum cover imprinting and the like. Once 6025 mask film sticking occurs, the mirror surface is polluted, and the mirror surface can be cleaned and then re-stuck after film picking.
Once the abnormal condition that the mirror surface is polluted after the film is pasted on the 6025 mask, the mirror surface can be treated only by the modes of picking up the film, cleaning and pasting the film again; the cost is high, and after the film is pried, part of adhesive marks on the film frame remain on the mask plate and are difficult to clean, so that the machine time of the cleaning machine is lost, and a large amount of chemical liquid (sulfuric acid, hydrogen peroxide, ammonia water and cleaning liquid) is lost, and the dominant cost is obviously increased; and meanwhile, the hidden cost of waste liquid treatment is increased.
Disclosure of Invention
The utility model aims to solve the technical problem of mirror surface cleaning after mask pasting, and provides a mirror surface cleaning jig for a mask.
In order to solve the technical problems, the technical scheme of the utility model is as follows:
the utility model provides a mirror surface cleaning jig for a mask plate, which comprises a jig body, wherein a station groove is formed in the upper part of the jig body and is used for adaptively mounting the mask plate, positioning edges are arranged on the periphery of the station groove corresponding to the mask plate, and the positioning edges are in abutting connection with the edge of the mask plate; the lower part of the jig body is provided with a rotary shaft sleeve which is used for being connected with the driving end of the motor.
Further, supporting blocks are uniformly arranged at the edge positions of the inner sides of the station grooves, and the edges of the lower parts of the mirror surfaces of the mask plates are matched with the supporting blocks, so that the peripheral side edges of the mirror surfaces are mutually matched with the positioning edges.
Specifically, four apex angle positions in the station groove are respectively provided with a supporting block, and four apex angles in the lower part of a mirror surface of the mask are matched with the supporting blocks, so that the peripheral side edges of the mirror surface are mutually matched with the positioning edges.
Further, the upper portion of the jig body surrounds the station groove to form a plurality of drainage inclined planes around, the top of each drainage inclined plane is connected with the corresponding locating edge in a continuous mode, and the inclination angle of each drainage inclined plane is 5-15 degrees.
Further, guiding grooves are formed in the periphery of the inner side of the station groove, the guiding grooves correspond to the connecting positions between the positioning edges and the mask plate, drain holes are uniformly formed in the bottoms of the guiding grooves, and the drain holes are communicated with the lower portion of the jig body.
Further, a water blocking block is further arranged in the station groove around the diversion trench, and after the mask plate is placed on the supporting block, the lower surface of the mask plate is mutually abutted with the upper surface of the water blocking block.
Further, a positioning groove is formed in the middle of the water blocking block, and the positioning groove is matched with the protective film of the mask plate.
Further, a fastening screw hole is formed in the rotary shaft sleeve and fixedly connected with the output end of the motor through a fastening screw.
By adopting the technical scheme, the mirror surface cleaning jig for the mask disclosed by the embodiment of the utility model does not need to pry the film when the mirror surface is polluted after the mask is pasted with the film; the mirror surface is cleaned quickly by using a PVA round brush, cleaning liquid and DIW (deionized pure water) by being arranged on a cleaning jig; the film picking and re-sticking are avoided, and the cost is reduced; meanwhile, the aim of improving the cleaning efficiency is fulfilled, and the service requirements of customers are responded quickly.
Drawings
In order to more clearly illustrate the embodiments of the utility model or the technical solutions of the prior art, the drawings which are used in the description of the embodiments or the prior art will be briefly described, it being obvious that the drawings in the description below are only some embodiments of the utility model, and that other drawings can be obtained according to these drawings without inventive faculty for a person skilled in the art.
FIG. 1 is a diagram of a prior art reticle structure;
FIG. 2 is a top view of a mirror cleaning tool for a reticle according to an embodiment of the present utility model;
FIG. 3 is a cross-sectional view taken along line A-A of FIG. 2;
FIG. 4 is a partially enlarged structural view of the portion B in FIG. 3;
wherein, the mask plate is 10-, the mirror surface is 11-, the chromium surface is 12-, the protective film is 13-and the film frame is 14-;
20-a mirror surface cleaning jig for a mask, 21-a jig body, 22-a station groove, 23-a positioning edge, 24-a supporting block, 25-a drainage inclined plane, 26-a diversion trench, 27-a drainage hole, 28-a water retaining block, 29-a positioning groove, 210-a rotary shaft sleeve and 211-a fastening screw hole.
Detailed Description
The following describes the embodiments of the present utility model further with reference to the drawings. The description of these embodiments is provided to assist understanding of the present utility model, but is not intended to limit the present utility model. In addition, the technical features of the embodiments of the present utility model described below may be combined with each other as long as they do not collide with each other.
Example 1
As shown in fig. 2-4, an embodiment of the present utility model provides a mirror cleaning jig 20 for a mask 10, including a jig body 21, wherein a station slot 22 is provided at an upper portion of the jig body 21, the station slot 22 is used for adapting and installing the mask 10, positioning edges 23 are provided around the station slot 22 corresponding to the mask 10, and the positioning edges 23 are abutted with edges of the mask 10; the lower part of the jig body 10 is provided with a rotary shaft sleeve 210 for connection with the driving end of the motor. Specifically, a tight clearance fit is formed between the positioning edge 23 and the mask 10, so that water and liquid are prevented from flowing into the jig to the greatest extent, and the mask is convenient to take and place.
As shown in fig. 2 and 3, the inner edge of the station slot 22 is uniformly provided with a supporting block 24, and the lower edge of the mirror 11 of the mask 10 is matched with the supporting block 24, so that the peripheral side edges of the mirror 11 are mutually matched with the positioning edges 23. Specifically, the four vertex angles on the inner side of the station groove 22 are respectively provided with a supporting block 24, and the four vertex angles on the lower portion of the mirror 11 of the mask 10 are matched with the supporting blocks 24, so that the four peripheral sides of the mirror 11 are mutually matched with the positioning edges 23. Optionally, the size of the supporting block 24 is 3×3mm, so as to reduce the contact area with the mask plate 10 and avoid residual imprinting in the product control area.
As shown in fig. 2 and 3, the upper part of the jig body 21 surrounds the station slot 22 to form a plurality of drainage inclined planes 25, the top of the drainage inclined planes 25 is connected with the positioning edge 23, and the inclination angle of the drainage inclined planes 25 is 5-15 °. Preferably, the inclined plane is processed into 10 degrees, so that water and liquid can be conveniently and rapidly discharged out of the surface of the jig.
As shown in fig. 2 and 3, the periphery of the inner side of the station groove 22 is provided with a diversion groove 26, the diversion groove 26 corresponds to the connection position between the positioning edge 23 and the mask 10, drain holes 27 are uniformly formed in the bottom of the diversion groove 26, and the drain holes 27 are communicated with the lower portion of the jig body 21. The diversion trench 26 is used for preventing micro water from entering the inside of the jig, entering the diversion trench along the inner wall and being discharged through the drainage holes 27, specifically, the drainage holes 27 with phi 2mm are drilled at intervals of 10mm at the bottom of the diversion trench 26 on the four walls, and water and liquid are quickly drained.
As shown in fig. 2 and 3, a water blocking block 28 is further disposed in the station slot 22 around the diversion trench 26, and after the reticle 10 is placed on the supporting block 24, the lower surface of the reticle 10 is abutted against the upper surface of the water blocking block 28.
Optionally, a positioning groove 29 is formed in the middle of the water blocking block 28, and the positioning groove 29 is adapted to the protection film 13 of the mask 10. The water blocking block 28 prevents the water liquid slightly entering the inside of the jig from further entering the inside of the protective film 13Pellicle positioning groove of the mask plate 10, so as to avoid polluting the protective film Pellicle.
Specifically, the rotary shaft sleeve 210 is provided with a fastening screw hole 211, and is fixedly connected with the output end of the motor through a fastening screw. The shaft sleeve of the jig is internally provided with 1 flat-head inner hexagonal screw with M8 x 8, the surface of the screw is tightly connected with the motor rotating shaft by utilizing the adjusting function of the screw, and when the motor rotates, the jig is prevented from vibrating, so that the abnormal occurrence of wrinkles on the surface of the protective film Pellicle is avoided.
When the mask is used, the mask is placed in a station groove, and a PVA circular brush, cleaning liquid and DIW (deionized pure water) are utilized to rapidly clean the mirror surface of the mask after 6025 film pasting; meanwhile, during spin-drying, the acceleration and deceleration of the motor is set to be 1rpm, and the motor is slowly accelerated or decelerated, so that vibration of the jig is avoided, and the occurrence of abnormality such as damage or wrinkling of the protective film is avoided.
According to the mirror surface cleaning jig for the mask plate, when the mirror surface is polluted after the mask plate is pasted with the film, the film does not need to be prized; the mirror surface is cleaned quickly by using a PVA round brush, cleaning liquid and DIW (deionized pure water) by being arranged on a cleaning jig; the film picking and re-sticking are avoided, and the cost is reduced; meanwhile, the aim of improving the cleaning efficiency is fulfilled, and the service requirements of customers are responded quickly.
The embodiments of the present utility model have been described in detail above with reference to the accompanying drawings, but the present utility model is not limited to the described embodiments. It will be apparent to those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the utility model, and yet fall within the scope of the utility model.
Claims (8)
1. The mirror surface cleaning jig for the mask plate is characterized by comprising a jig body, wherein a station groove is formed in the upper part of the jig body and is used for adaptively mounting the mask plate, positioning edges are arranged on the periphery of the station groove corresponding to the mask plate, and the positioning edges are in butt joint with the edge of the mask plate; the lower part of the jig body is provided with a rotary shaft sleeve which is used for being connected with the driving end of the motor.
2. The mirror cleaning jig for a mask according to claim 1, wherein supporting blocks are uniformly arranged at the inner side edge positions of the station grooves, and the lower edge of the mirror of the mask is matched with the supporting blocks, so that the peripheral side edges of the mirror are mutually matched with the positioning edges.
3. The mirror surface cleaning jig for a mask plate according to claim 1, wherein four vertex angle positions inside the station groove are respectively provided with a supporting block, and four vertex angles at the lower part of the mirror surface of the mask plate are matched with the supporting blocks, so that the peripheral side edges of the mirror surface are mutually matched with the positioning edges.
4. The mirror cleaning jig for a reticle of claim 1, wherein the jig body upper portion forms a plurality of drain slopes around the station groove, the top of the drain slope is continuous with the positioning edge, and an inclination angle of the drain slope is 5-15 °.
5. The mirror cleaning jig for a mask plate according to claim 2, wherein diversion trenches are formed around the inner side of the station trench, the diversion trenches correspond to connection positions between the positioning edges and the mask plate, drain holes are uniformly formed in the bottoms of the diversion trenches, and the drain holes are communicated with the lower portion of the jig body.
6. The mirror cleaning jig for a reticle of claim 5, wherein a water blocking block is further provided in the station groove around the periphery of the diversion trench, and after the reticle is placed on the supporting block, the lower surface of the reticle is abutted against the upper surface of the water blocking block.
7. The mirror cleaning jig for a reticle of claim 6, wherein a positioning groove is formed in the middle of the water blocking block, and the positioning groove is matched with the protective film of the reticle.
8. The mirror cleaning jig for a reticle of claim 1, wherein the rotating shaft sleeve is provided with a fastening screw hole fixedly connected with an output end of the motor through a fastening screw.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202321707093.2U CN220252384U (en) | 2023-06-30 | 2023-06-30 | Mirror surface cleaning jig for mask plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202321707093.2U CN220252384U (en) | 2023-06-30 | 2023-06-30 | Mirror surface cleaning jig for mask plate |
Publications (1)
Publication Number | Publication Date |
---|---|
CN220252384U true CN220252384U (en) | 2023-12-26 |
Family
ID=89226577
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202321707093.2U Active CN220252384U (en) | 2023-06-30 | 2023-06-30 | Mirror surface cleaning jig for mask plate |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN220252384U (en) |
-
2023
- 2023-06-30 CN CN202321707093.2U patent/CN220252384U/en active Active
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US5938860A (en) | Reticle cleaning without damaging pellicle | |
US8002899B2 (en) | Method and apparatus for mask pellicle adhesive residue cleaning | |
US7300526B2 (en) | Method and system for removal of contaminates from phaseshift photomasks | |
EP1892570B1 (en) | Method for cleaning photo mask | |
JP2011139102A (en) | Lithography system | |
US20080264441A1 (en) | Method for removing residuals from photomask | |
CN111105992B (en) | Method of cleaning substrate, method of manufacturing photomask, and method of cleaning photomask | |
KR20130024878A (en) | Photomask unit and method of manufacturing same | |
CN220252384U (en) | Mirror surface cleaning jig for mask plate | |
JP2006024706A (en) | Aligner, protective method of optical surface and device manufacturing method | |
JP2006091667A (en) | Photomask, and method and device for cleaning the same | |
KR20070039910A (en) | Mask blank, manufacturing method thereof and transfer plate manufacturing method | |
KR20130141025A (en) | Method for fabricating of pellicle | |
Mulkens et al. | Defects, overlay, and focus performance improvements with five generations of immersion exposure systems | |
EP1310827B1 (en) | Photomask with dust-proofing device and exposure method using the same | |
JPS6344824Y2 (en) | ||
KR101963996B1 (en) | Glass reprocessing method, remade glass substrate, and photo mask blank and photo mask employing same | |
CN112230511A (en) | Method for removing contamination particles on surface of photomask protective film | |
KR20080001469A (en) | Method for reworking pellicle of photo mask | |
JP2005107340A (en) | Photomask plate and its making method | |
CN215032060U (en) | Belt cleaning device suitable for high generation mask version packing box | |
KR200149834Y1 (en) | Mask with pellicle | |
Handa et al. | Cleaning technology of PSM for sub-quarter-micron devices | |
JP2004219509A (en) | Photomask with dust-proofing device and exposure method, inspection method and correction method | |
JP2004241740A (en) | Dust-proofing device, stencil mask with dust-proofing device, exposure method, inspection method and defect correcting method |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
GR01 | Patent grant | ||
GR01 | Patent grant |