CN219873433U

CN219873433U - Quartz boat, quartz boat assembly and diffusion furnace

Info

Publication number: CN219873433U
Application number: CN202321189851.6U
Authority: CN
Inventors: 朱合意; 贾钊; 窦志珍; 胡恒广
Original assignee: Hebei Guangxing Semiconductor Technology Co Ltd; Beijing Yuanda Xinda Technology Co Ltd
Current assignee: Qingdao Xuxin Internet Technology Research And Development Co ltd; Tunghsu Technology Group Co Ltd
Priority date: 2023-05-17
Filing date: 2023-05-17
Publication date: 2023-10-20
Anticipated expiration: 2033-05-17

Abstract

The utility model provides a quartz boat, quartz boat subassembly and diffusion furnace, quartz boat include inlet end lateral wall and give vent to anger the end lateral wall, are equipped with a plurality of gas flow holes on inlet end lateral wall and the end lateral wall that gives vent to anger. The method and the device can reduce or avoid forming turbulent airflow near the side wall of the quartz boat, improve the uniformity and stability of the airflow, and further improve the uniformity and stability of diffusion doping.

Description

Quartz boat, quartz boat assembly and diffusion furnace

Technical Field

The present disclosure relates to the field of semiconductor manufacturing technology, and in particular, to a quartz boat, a quartz boat assembly, and a diffusion furnace.

Background

In the chip diffusion doping process, diffusion doping uniformity needs to be ensured. Diffusion doping uniformity is mainly related to temperature stability and airflow stability. In terms of temperature stability, the prior art ensures that the temperature error in the process is not more than +/-1 ℃ by adopting a serial pole temperature control means and an automatic temperature pulling zone technology. In the aspect of airflow stability, airflow flow in the diffusion furnace can be roughly divided into five areas, namely a furnace tail turbulent flow area, a furnace tail laminar flow area, a process constant flow area, a furnace mouth laminar flow area and a furnace mouth discharge area, and is limited by the influence of the size of a machine table, and the gas generally reaches the process constant flow area to react with a sheet source without forming the furnace tail laminar flow, so that the sheet source is influenced by turbulent flow. In the prior art, various technical schemes for reducing the influence of turbulent airflow on diffusion doping uniformity and stability exist.

In some solutions of the prior art, the influence of turbulence on the sheet source is reduced by increasing the length of the furnace body, however, the floor space of the machine equipment is increased, which is not beneficial to the layout of the machine in a limited workshop. In other arrangements, turbulent air flow is prevented from directly acting on the regular sheet area by placing dummy sheets on either side of the sheet source, which however affects the regular sheet output efficiency. In still other arrangements, a flow homogenizing plate is provided outside the quartz boat, however, blockage of the side walls of the quartz boat still results in turbulent air flow near the side walls. Based on this, there is still room for further improvement in the prior art.

Disclosure of Invention

One technical problem to be solved by the present disclosure is: the blockage of the quartz boat sidewall results in turbulent airflow near the sidewall.

In order to solve the above technical problems, an embodiment of the present disclosure provides a quartz boat, which includes an air inlet side wall and an air outlet side wall, wherein a plurality of gas flow holes are provided on the air inlet side wall and the air outlet side wall.

In some embodiments, the plurality of gas flow holes on the gas inlet side wall are in one-to-one opposition to the plurality of gas flow holes on the gas outlet side wall along the length of the quartz boat.

In some embodiments, the diameter of the gas flow holes is 6-8 mm.

In some embodiments, the gas inlet side wall and the gas outlet side wall have a hole distribution area, and the plurality of gas flow holes are disposed in the hole distribution area, and the area of the hole distribution area of the gas inlet side wall or the gas outlet side wall is larger than the area of the silicon wafer to be carried.

In some embodiments, the shape of the hole distribution area of the gas inlet end side wall or the gas outlet end side wall is matched with the shape of the silicon wafer to be carried.

In some embodiments, the method further comprises connecting two side rails between the inlet end side wall and the outlet end side wall and at least one intermediate rail between and below the two side rails.

In some embodiments, a plurality of clamping grooves for fixing a plurality of silicon wafers are formed on the side cross bars and/or the middle cross bar.

The embodiment of the disclosure also provides a quartz boat assembly, comprising: the quartz boat and the flow homogenizing plate according to any one of the above embodiments, wherein the flow homogenizing plate is disposed outside the inlet end side wall or outside the outlet end side wall.

The embodiment of the disclosure also provides a diffusion furnace, comprising: a diffusion furnace body; the quartz boat according to any of the above embodiments, wherein the quartz boat is disposed within the diffusion furnace body when diffusion is performed.

In some embodiments, a flow-homogenizing plate is further included, the flow-homogenizing plate being disposed outside the inlet end side wall or outside the outlet end side wall.

Through above-mentioned technical scheme, the quartz boat that this disclosure provided can reduce or avoid forming the turbulent air current near quartz boat lateral wall, can improve homogeneity and the stability of air current to promote diffusion doping's homogeneity and stability, and this disclosure can not need to increase diffusion stove length, need not to change the board size, still can reduce or avoid adopting the false piece, therefore can promote output efficiency.

Drawings

In order to more clearly illustrate the embodiments of the present disclosure or the technical solutions in the prior art, the drawings that are required in the embodiments or the description of the prior art will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present disclosure, and other drawings may be obtained according to these drawings without inventive effort to a person of ordinary skill in the art.

Fig. 1 is a schematic structural view of a diffusion furnace shown in an exemplary embodiment of the present disclosure;

FIG. 2 is a schematic view of the sidewall of the inlet end of a quartz boat shown in an exemplary embodiment of the present disclosure;

FIG. 3 is a schematic view of the airflow distribution at the inlet end of a quartz boat shown in an exemplary embodiment of the present disclosure;

FIG. 4 is a schematic view of the sidewall of the inlet end of a prior art quartz boat;

fig. 5 is a schematic view of the air flow distribution at the air inlet end of a prior art quartz boat.

Reference numerals illustrate:

1. a silicon wafer; 10. a sidewall of the air inlet end; 12. a sidewall of the air outlet end; 14. a gas flow hole; 16. a hole distribution region; 20. side cross bars; 22. a middle cross bar; 100. a quartz boat; 200. a diffusion furnace; 210. a diffusion furnace body; x, length direction of quartz boat.

Detailed Description

Embodiments of the present disclosure are described in further detail below with reference to the drawings and examples. The following detailed description of the embodiments and the accompanying drawings are provided to illustrate the principles of the disclosure and not to limit the scope of the disclosure, which may be embodied in many different forms and not limited to the specific embodiments disclosed herein, but rather to include all technical solutions falling within the scope of the claims.

The present disclosure provides these embodiments in order to make the present disclosure thorough and complete, and fully convey the scope of the disclosure to those skilled in the art. It should be noted that: the relative arrangement of parts and steps, the composition of materials, numerical expressions and numerical values set forth in these embodiments should be construed as exemplary only and not limiting unless otherwise specifically stated.

In the description of the present disclosure, unless otherwise indicated, the meaning of "plurality" is greater than or equal to two; the terms "upper," "lower," "left," "right," "inner," "outer," and the like indicate an orientation or positional relationship merely for convenience of describing the present disclosure and simplifying the description, and do not indicate or imply that the devices or elements being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus are not to be construed as limiting the present disclosure. When the absolute position of the object to be described is changed, the relative positional relationship may be changed accordingly.

Furthermore, the use of the terms first, second, and the like in this disclosure do not denote any order, quantity, or importance, but rather are used to distinguish one element from another. The "vertical" is not strictly vertical but is within the allowable error range. "parallel" is not strictly parallel but is within the tolerance of the error. The word "comprising" or "comprises" and the like means that elements preceding the word encompass the elements recited after the word, and not exclude the possibility of also encompassing other elements.

It should also be noted that, in the description of the present disclosure, unless explicitly specified and limited otherwise, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be either fixedly connected, detachably connected, or integrally connected, for example; can be directly connected or indirectly connected through an intermediate medium. The specific meaning of the terms in the present disclosure may be understood as appropriate by those of ordinary skill in the art. When a particular device is described as being located between a first device and a second device, there may or may not be an intervening device between the particular device and either the first device or the second device.

All terms used in the present disclosure have the same meaning as understood by one of ordinary skill in the art to which the present disclosure pertains, unless specifically defined otherwise. It will be further understood that terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning that is consistent with their meaning in the context of the relevant art and will not be interpreted in an idealized or overly formal sense unless expressly so defined herein.

Techniques, methods, and apparatus known to one of ordinary skill in the relevant art may not be discussed in detail, but where appropriate, the techniques, methods, and apparatus should be considered part of the specification.

Referring to fig. 1 and 2, the embodiment of the present disclosure provides a quartz boat 100, which includes an inlet side wall 10 and an outlet side wall 12, and a plurality of gas flow holes 14 are provided in the inlet side wall 10 and the outlet side wall 12.

Referring to fig. 3, the present disclosure can reduce or avoid forming turbulent air flow near the side wall of the quartz boat by forming a plurality of air flow holes 14 on the side wall 10 of the air inlet end and the side wall 12 of the air outlet end, and can improve uniformity and stability of air flow, thereby improving uniformity and stability of diffusion doping, and can reduce or avoid using dummy plates without increasing the length of the diffusion furnace and changing the size of the machine, thereby improving output efficiency.

In contrast, in the prior art arrangements shown in fig. 4 and 5, the blockage of the inlet side wall 10 will cause the gas flow to flow upward and over the inlet side wall 10 and then downward, resulting in intermixing of the different gas flow layers adjacent the inlet side wall 10 to form turbulent gas flow, which will affect the diffusion doping uniformity and stability of the wafers 1 disposed adjacent the inlet end of the quartz boat 100. Similar problems are faced near the exit end of the quartz boat 100.

Based on such recognition, the present disclosure takes the technical approach of forming a plurality of gas flow holes 14 in the gas inlet end side wall 10 and the gas outlet end side wall 12 to reduce or avoid the formation of turbulent gas flows near the gas inlet end and the gas outlet end of the quartz boat 100. The plurality of gas flow holes 14 can enable the gas flow to pass smoothly, so that the gas flow can flow in layers more stably, and turbulent gas flow caused by mixing of different gas flow layers is reduced or avoided. The inlet end side wall 10 and the outlet end side wall 12, in which the plurality of gas flow holes 14 are formed, may function to uniformly distribute the gas flow like a uniform flow plate. Under the condition of ensuring the stable air flow near the air inlet end side wall 10 and the air outlet end side wall 12, the false sheets near the air inlet end side wall 10 and the air outlet end side wall 12 can be reduced or avoided, thereby reducing the waste of productivity, and the length of the diffusion furnace can be not lengthened.

In some embodiments, the plurality of gas flow holes 14 on the gas inlet side wall 10 are in one-to-one opposition to the plurality of gas flow holes 14 on the gas outlet side wall 12 along the length direction X of the quartz boat 100. In this way, it is further ensured that the air flow is layered more stably within the quartz boat 100. The shape, size, and arrangement of the plurality of gas flow holes 14 in the gas inlet side wall 10 and the gas outlet side wall 12 may be identical. The gas flow holes 14 may be circular or other shapes, the plurality of gas flow holes 14 may be uniformly distributed, the plurality of gas flow holes 14 may be layered, and the plurality of gas flow holes 14 may be arranged in a shape such as a triangle.

In some embodiments, the diameter of the gas flow holes 14 is 6-8 mm, so that the uniformity of the gas flow can be well ensured and the diffusion process is prevented from being affected by too large a hole diameter. The hole spacing of adjacent two gas flow holes 14 may be larger than the hole diameter.

In some embodiments, the gas inlet side wall 10 and the gas outlet side wall 12 have a hole distribution area 16, and the plurality of gas flow holes 14 are disposed in the hole distribution area 16, and the area of the hole distribution area 16 of the gas inlet side wall 10 or the gas outlet side wall 12 is larger than the area of the silicon wafer 1 to be carried. Thereby ensuring that the air flow acting on the whole area of the silicon wafer 1 is uniform and stable, and fully and comprehensively improving the uniformity and stability of diffusion doping.

In some embodiments, the shape of the hole distribution area 16 of the gas inlet end side wall 10 or the gas outlet end side wall 12 matches the shape of the silicon wafer 1 to be carried. "matching" may mean that the shape of the hole distribution region 16 is the same as or similar to the shape of the silicon wafer 1 to be carried at least in a partial region. For example, when the shape of the silicon wafer 1 is circular, the shape of the hole distribution region 16 may be at least a part of a circle or a quasi-circle, or the hole distribution region 16 may have a size gradually shrinking in the height direction. By such an arrangement, it is ensured that the plurality of gas flow holes 14 adaptively and precisely adjust the uniformity and stability of the gas flow in the region where the silicon wafer 1 extends.

In some embodiments, the quartz boat 100 further includes two side rails 20 and at least one intermediate rail 22 connected between the inlet end side wall 10 and the outlet end side wall 12, the intermediate rail 22 being located between the two side rails 20 and below the two side rails 20. The two side rails 20 and the at least one intermediate rail 22 form a carrying frame for carrying the silicon wafer 1, the at least one intermediate rail 22 may be used for carrying a bottom edge of the silicon wafer 1, and the two side rails 20 may respectively support opposite sides of the silicon wafer 1. In some embodiments, a plurality of clamping grooves for fixing a plurality of silicon wafers 1 are formed on the side rails 20 and/or the middle rail 22 so as to firmly fix the silicon wafers 1 from falling.

The embodiment of the disclosure also provides a quartz boat assembly, comprising: according to the quartz boat 100 and the flow-homogenizing plate of any one of the above embodiments, the flow-homogenizing plate is disposed outside the inlet end side wall 10 or outside the outlet end side wall 12. By combining the arrangement of the plurality of gas flow holes 14 and the arrangement of the uniform flow plates, the uniformity and stability of the gas flow can be more sufficiently adjusted, and a better adjusting effect can be obtained.

The disclosed embodiments also provide a diffusion furnace 200, comprising: a diffusion furnace body 210; according to the quartz boat 100 of any of the above embodiments, the quartz boat 100 is placed in the diffusion furnace body 210 when diffusion is performed. The inlet end side wall 10 faces the inlet of the diffusion furnace body 210 and the outlet end side wall 12 faces the outlet of the diffusion furnace body 210.

In some embodiments, the diffusion furnace 200 further comprises a flow-homogenizing plate disposed outside the inlet end side wall 10 or outside the outlet end side wall 12.

In summary, through the technical scheme of the disclosure, the surface airflow of the wafer source at the edge position of the quartz boat can be ensured to be in a stable state, and the doping uniformity of the wafer source at the edge position is improved; the dummy plates are not required to be placed on the two sides of the quartz boat, and more formal plates can be placed at the vacated positions; the size of the machine is not changed, and the stability and uniformity of the air flow at the two ends of the constant flow area in the furnace tube are improved under the condition that the output quantity is not influenced in a limited space range.

Thus, various embodiments of the present disclosure have been described in detail. In order to avoid obscuring the concepts of the present disclosure, some details known in the art are not described. How to implement the solutions disclosed herein will be fully apparent to those skilled in the art from the above description.

Although some specific embodiments of the present disclosure have been described in detail by way of example, it should be understood by those skilled in the art that the above examples are for illustration only and are not intended to limit the scope of the present disclosure. It will be understood by those skilled in the art that the foregoing embodiments may be modified and equivalents substituted for elements thereof without departing from the scope and spirit of the disclosure. In particular, the technical features mentioned in the respective embodiments may be combined in any manner as long as there is no structural conflict.

Claims

1. The quartz boat (100) is characterized by comprising an air inlet end side wall (10) and an air outlet end side wall (12), wherein a plurality of gas flow holes (14) are formed in the air inlet end side wall (10) and the air outlet end side wall (12).

2. The quartz boat according to claim 1, wherein the plurality of gas flow holes (14) on the gas inlet side wall (10) are in one-to-one correspondence with the plurality of gas flow holes (14) on the gas outlet side wall (12) along the length direction (X) of the quartz boat (100).

3. The quartz boat according to claim 1, wherein the diameter of the gas flow holes (14) is 6-8 mm.

4. The quartz boat according to claim 1, wherein the inlet end side wall (10) and the outlet end side wall (12) have a hole distribution region (16), a plurality of the gas flow holes (14) are provided in the hole distribution region (16), and an area of the hole distribution region (16) of the inlet end side wall (10) or the outlet end side wall (12) is larger than an area of a silicon wafer (1) to be carried.

5. The quartz boat according to claim 4, characterized in that the shape of the hole distribution area (16) of the inlet end side wall (10) or the outlet end side wall (12) matches the shape of the silicon wafer (1) to be carried.

6. The quartz boat according to claim 1, further comprising two side rails (20) and at least one intermediate rail (22) connected between the inlet end side wall (10) and the outlet end side wall (12), the intermediate rail (22) being located between the two side rails (20) and below the two side rails (20).

7. The quartz boat according to claim 6, wherein a plurality of clamping grooves for fixing a plurality of silicon wafers (1) are formed on the side rails (20) and/or the middle rail (22).

8. A quartz boat assembly, comprising: the quartz boat (100) according to any of claims 1-7, and a flow-homogenizing plate disposed outside the inlet end side wall (10) or outside the outlet end side wall (12).

9. A diffusion furnace (200), characterized by comprising:

a diffusion furnace body (210);

the quartz boat (100) of any of claims 1-7, the quartz boat (100) being disposed within the diffusion furnace body (210) when diffusion is performed.

10. The diffusion furnace according to claim 9, further comprising a flow-homogenizing plate arranged outside the inlet end side wall (10) or outside the outlet end side wall (12).