CN219824347U - Angle adjusting device and corresponding physical vapor deposition device - Google Patents
Angle adjusting device and corresponding physical vapor deposition device Download PDFInfo
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- CN219824347U CN219824347U CN202321207806.9U CN202321207806U CN219824347U CN 219824347 U CN219824347 U CN 219824347U CN 202321207806 U CN202321207806 U CN 202321207806U CN 219824347 U CN219824347 U CN 219824347U
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- 238000005240 physical vapour deposition Methods 0.000 title claims abstract description 31
- 238000000429 assembly Methods 0.000 claims abstract description 19
- 230000000712 assembly Effects 0.000 claims abstract description 19
- 230000001105 regulatory effect Effects 0.000 claims abstract description 15
- 238000007789 sealing Methods 0.000 claims description 59
- 239000000758 substrate Substances 0.000 claims description 32
- 230000007246 mechanism Effects 0.000 claims description 24
- 239000011553 magnetic fluid Substances 0.000 claims description 23
- 239000013077 target material Substances 0.000 claims description 3
- 238000000034 method Methods 0.000 description 11
- 230000008569 process Effects 0.000 description 10
- 230000000694 effects Effects 0.000 description 6
- 238000007747 plating Methods 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 238000001755 magnetron sputter deposition Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- -1 argon ions Chemical class 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000010849 ion bombardment Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000003116 impacting effect Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
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- Physical Vapour Deposition (AREA)
Abstract
The utility model relates to an angle adjusting device and a corresponding physical vapor deposition device, wherein the angle adjusting device comprises a fixed flange, a movable flange and a plurality of adjusting bolt assemblies; the fixed flange is used for connecting a fixed part of the equipment to be regulated, and the movable flange is used for connecting a part to be regulated of the equipment to be regulated; the fixed flange and the movable flange are respectively provided with a plurality of bolt connecting holes, the fixed flange and the movable flange are arranged oppositely, and the plurality of adjusting bolt assemblies are respectively used for connecting the corresponding bolt connecting holes on the fixed flange and the movable flange so as to realize the connection of the fixed flange and the movable flange, and the relative included angle between the fixed flange and the movable flange can be adjusted by adjusting the relative positions of the adjusting bolt assemblies and the corresponding bolt connecting holes on the fixed flange and the movable flange. The angle adjusting device and the physical vapor deposition device comprising the angle adjusting device have the characteristics of simple structure, easy adjustment, good performance and wide adaptability.
Description
Technical Field
The utility model relates to the field of machinery, in particular to the technical field of equipment adjustment, and specifically relates to an angle adjusting device and a corresponding physical vapor deposition device.
Background
As some devices in the prior art tend to be miniaturized and refined, the fineness of the related processing equipment is also higher and higher, and meanwhile, in some application fields, the same equipment may need to process different parts, so that one equipment may need to have a certain degree of adjustability to meet the requirements.
For example, vacuum plating technology is widely used in real production as a technology for producing a specific film layer. In order to improve the processing precision in the film plating process, the prior art usually rotates the base material to solve the problem of poor film plating uniformity of the substrate caused by the problems of uneven angle and magnetic field distribution between the target and the substrate. However, the application proves that the prior art has certain effect, but the effect is still quite unsatisfactory. Because there is a certain manufacturing error in the part processing, there is also a certain assembly error in the assembly. These are factors that cause non-parallelism of the poles and the substrate, thereby having a serious effect on the uniformity of the coating film on the substrate.
This results in a need in the art for a convenient, flexibly adjustable adjustment device that solves the above-mentioned problems.
Disclosure of Invention
In view of the above-mentioned drawbacks of the prior art, the present utility model provides an angle adjusting device and a corresponding physical vapor deposition device, which are convenient to operate, have good performance and good practicality.
In order to achieve the above object, the angle adjusting device and the corresponding physical vapor deposition device of the present utility model are as follows:
the angle adjusting device is mainly characterized by comprising a fixed flange, a movable flange and a plurality of adjusting bolt assemblies;
the fixed flange is used for connecting a fixed part of equipment to be adjusted, and the movable flange is used for connecting the part to be adjusted of the equipment to be adjusted;
the adjustable flange comprises a movable flange and is characterized in that a plurality of bolt connecting holes are formed in the movable flange, the movable flange is opposite to the fixed flange, a plurality of adjusting bolt assemblies are used for connecting the fixed flange and the corresponding bolt connecting holes in the movable flange respectively, so that the fixed flange and the movable flange are connected, and the relative included angle between the fixed flange and the movable flange can be adjusted by adjusting the relative positions of the adjusting bolt assemblies and the corresponding bolt connecting holes in the fixed flange and the movable flange.
The angle adjusting device comprises an adjusting bolt assembly, a connecting rod and a connecting rod, wherein each adjusting bolt assembly comprises a double-end stud and two supporting nuts;
the first end of the double-end stud is in threaded connection with a corresponding bolt connecting hole in the fixed flange;
the second end of the double-end stud penetrates through the corresponding bolt connecting hole in the movable flange, and two supporting nuts which are connected to the double-end stud through threads are clamped on two sides of the corresponding bolt connecting hole in the movable flange.
According to the angle adjusting device, one end of the supporting nut is in an arc shape, and one of the two arc-shaped surfaces of the supporting nut connected to the double-end stud is oppositely clamped at two sides of the movable flange corresponding to the bolt connecting hole.
The angle adjusting device further comprises two lock nuts, wherein the two lock nuts are in threaded connection with the double-end stud, and the two lock nuts are respectively abutted against one surface, which is not in an arc shape, of the two support nuts.
The angle adjusting device further comprises an elastic sealing sleeve, the elastic sealing sleeve is arranged between the fixed flange and the movable flange, and two ends of the elastic sealing sleeve are respectively fixed on two opposite surfaces of the fixed flange and the movable flange.
The angle adjusting device is characterized in that the elastic sealing sleeve is formed by a corrugated pipe.
The angle adjusting device is characterized in that a first sealing ring is arranged at a position, which is used for being contacted with the fixed part of the equipment to be adjusted, in the fixed flange;
and a second sealing ring is arranged at the position, which is used for being in contact with the part to be regulated, of the equipment to be regulated in the movable flange.
The physical vapor deposition device is mainly characterized by comprising a cavity, a substrate platform, a motor, a magnetic fluid sealing mechanism, magnetic poles, a target material and the angle adjusting device;
the cavity comprises an upper cover cavity part and a lower cavity part, wherein the upper cover cavity part is covered on the lower cavity part, and a hollow cavity is formed between the upper cover cavity part and the lower cavity part;
the upper cover cavity part forms a fixing part of the equipment to be adjusted, and the fixing flange is fixed on the upper cover cavity part;
the magnetic fluid sealing mechanism forms a part to be regulated of the equipment to be regulated, the fixed end of the magnetic fluid sealing mechanism is fixed on the movable flange, and the magnetic pole connecting end of the magnetic fluid sealing mechanism sequentially penetrates through the through hole on the movable flange, the through hole on the fixed flange and the through hole on the cavity of the upper cover to be connected with the magnetic pole positioned in the cavity;
the substrate platform is arranged at the position of the lower cavity part, which is opposite to the magnetic pole;
the target is positioned between the magnetic pole and the substrate platform and is fixed on the upper cover cavity part;
the motor is fixed on the fixed end of the magnetic fluid sealing mechanism.
The physical vapor deposition device is characterized in that the fixed flange is fixed on the cavity of the upper cover through a corresponding first bolt;
the fixed end of the magnetic fluid sealing mechanism is fixed on the movable flange through a corresponding second bolt.
The physical vapor deposition device is characterized in that a first sealing ring mounting groove is formed in one surface, in contact with the cavity part of the upper cover, of the fixing flange, and a first sealing ring is arranged in the first sealing ring mounting groove.
The physical vapor deposition device is characterized in that a second sealing ring mounting groove is formed in one surface of the movable flange, which is in contact with the fixed end of the magnetic fluid sealing mechanism, and a second sealing ring is arranged in the second sealing ring mounting groove.
The angle adjusting device and the corresponding physical vapor deposition device have the following beneficial effects:
the angle adjusting device can utilize the plurality of adjusting bolt assemblies to adjust the relative included angle between the fixed flange and the movable flange, so that the to-be-adjusted part of the to-be-adjusted equipment is driven to adjust the relative included angle relative to the fixed part of the to-be-adjusted equipment, the adjusting process is very convenient, the operation is easy, and the angle adjusting device is particularly suitable for adjusting the micro angle. The physical vapor deposition device adopting the angle adjusting device can conveniently adjust the relative included angle between the magnetic pole and the substrate platform by using the angle adjusting device, is quite convenient to operate, effectively meets the requirement of fine production, and ensures the uniformity of substrate coating operation. The angle adjusting device and the corresponding physical vapor deposition device have the characteristics of simple structure, easy adjustment, good performance and wide adaptability.
Drawings
The conception, specific structure, and technical effects of the present utility model will be further described with reference to the accompanying drawings to fully understand the objects, features, and effects of the present utility model.
Fig. 1 is a schematic diagram showing the relative positions of a fixed flange, a movable flange and an elastic sealing sleeve in an angle adjusting device according to an embodiment of the present utility model.
Fig. 2 is a schematic structural view of a support nut in the angle adjusting apparatus of the present utility model in one embodiment.
FIG. 3 is a schematic view of a stud in an angle adjustment device of the present utility model in one embodiment.
FIG. 4 is a schematic diagram of a PVD apparatus according to an embodiment of the utility model.
FIG. 5 is a cross-sectional view of a PVD apparatus according to one embodiment of the utility model.
Reference numerals
1. Fixing flange
11. First bolt connecting hole
12 first seal ring mounting groove
2. Movable flange
21. Second bolt connecting hole
22 second sealing ring mounting groove
3. Adjusting bolt assembly
31. Double-end stud
32 support nut
33 lock nut
4. Elastic sealing sleeve
51. First sealing ring
52 second sealing ring
61 cavity body
611 upper cover cavity
612 lower cavity portion
62 substrate platform
63 motor
64 magnetic fluid sealing mechanism
65 magnetic pole
66 target material
71 first bolt
72 second bolt
8 substrate
Detailed Description
The utility model is further described with reference to the following detailed description in order to make the technical means, the inventive features, the achieved objects and the effects of the utility model easy to understand. The present utility model is not limited to the following examples.
It should be understood that the structures, proportions, sizes, etc. shown in the drawings are for illustration purposes only and should not be construed as limiting the utility model to the extent that it can be practiced, since modifications, changes in the proportions, or otherwise, used in the practice of the utility model, are not intended to be critical to the essential characteristics of the utility model, but are intended to fall within the spirit and scope of the utility model.
As shown in fig. 1 to 5 (the oblique lines uniformly distributed in fig. 5 are cross-sectional lines), in one embodiment, the angle adjusting device includes a fixed flange 1, a movable flange 2, and a plurality of adjusting bolt assemblies 3;
the fixed flange 1 is used for connecting a fixed part of equipment to be adjusted, and the movable flange 2 is used for connecting the part to be adjusted of the equipment to be adjusted;
the fixing flange 1 and the movable flange 2 are respectively provided with a plurality of bolt connection holes (for convenience of explanation and understanding, in this embodiment, the bolt connection holes on the fixing flange 1 are named as first bolt connection holes 11, the bolt connection holes on the movable flange 2 are named as second bolt connection holes 21), the fixing flange 1 is opposite to the movable flange 2, and the adjusting bolt assemblies 3 are respectively used for connecting the fixing flange 1 and the corresponding bolt connection holes on the movable flange 2, so as to realize connection between the fixing flange 1 and the movable flange 2, and the relative included angle between the fixing flange 1 and the movable flange 2 can be adjusted by adjusting the relative positions of the adjusting bolt assemblies 3 and the corresponding bolt connection holes on the fixing flange 1 and the movable flange 2.
In the concrete implementation, at least three groups of adjusting bolt assemblies 3 can be adopted to connect the fixed flange 1 and the movable flange 2, and the groups of adjusting bolt assemblies 3 can be uniformly distributed. Four sets of adjusting bolt assemblies 3 are provided in the angle adjusting device in the physical vapor deposition apparatus shown in fig. 4.
In this embodiment, each of the adjusting bolt assemblies 3 includes a stud 31 and two support nuts 32;
the first end of the stud 31 is in threaded connection with a corresponding bolt connection hole in the fixed flange 1;
the second end of the stud 31 passes through the corresponding bolt connection hole in the movable flange 2, and two support nuts 32 screwed on the stud 31 are clamped on two sides of the corresponding bolt connection hole in the movable flange 2.
Wherein, the size of the first bolt connecting hole 11 is matched with the size of the first end of the stud 31 so as to ensure the fixed connection between the first bolt connecting hole 11 and the first end of the stud 31; the second bolt connecting hole 21 is larger than the second end of the stud 31 in size, so that a certain movable space exists in the second bolt connecting hole 21 at the second end of the stud 31, and the relative included angle between the fixed flange 1 and the movable flange 2 can be better adjusted. At the same time, the diameter of the second screw connection hole 21 should be smaller than the diameter of the largest dimension of the support nuts 32, so as to ensure that the two support nuts 32 can well fix the movable flange 2.
The structure of the stud 31 can be shown in fig. 3, where the threads on the stud 31 are not drawn, but in practical application, the stud 31 should be provided with threads to realize threaded connection, and meanwhile, a hexagonal end face is provided in the middle of the stud in the embodiment, so that a user can control and rotate the stud more conveniently and install the stud at multiple angles.
In this embodiment, one end of the support nut 32 is in a circular arc shape, and one of the two support nuts 32 connected to the stud 31 is oppositely disposed at two sides of the movable flange 2 corresponding to the bolt connection hole. The shape of the nut can be shown as shown in fig. 2, the main body of the nut is still in the shape of a hexagonal nut, but one surface of the nut is in the shape of an arc, and the arrangement of the structure ensures that when the angle of the movable flange 2 is adjusted, when the movable flange 2 is inclined to a certain angle, the two surfaces of the movable flange 2 can still be well attached to the arc surfaces of the two nuts, so that the arc surfaces of the two nuts can be used for well supporting the movable flange 2, and the stability of the device in the operation process is ensured.
In this embodiment, the adjusting bolt assembly 3 further includes two lock nuts 33, where the two lock nuts 33 are screwed on the stud 31, and the two lock nuts 33 respectively abut against one surface of the two support nuts 32 that is not in a circular arc shape.
In this embodiment, the angle adjusting device further includes an elastic sealing sleeve 4, the elastic sealing sleeve 4 is disposed between the fixed flange 1 and the movable flange 2, and two ends of the elastic sealing sleeve 4 are respectively fixed on two opposite sides of the fixed flange 1 and the movable flange 2.
In this embodiment, the elastic sealing sleeve 4 is constituted by a bellows. The elastic sealing sleeve 4 has a certain elasticity, so that even if the relative angle and distance between the fixed flange 1 and the movable flange 2 change within a certain range, the position where the elastic sealing sleeve 4 is sleeved still has a certain tightness.
The relative positional relationship of the elastic sealing sleeve 4, the fixed flange 1 and the movable flange 2 can be seen in fig. 1.
In this embodiment, a first sealing ring 51 is provided in the fixing flange 1 at a position for contacting with a fixing portion of the device to be adjusted;
a second sealing ring 52 is arranged at a position in the movable flange 2, which is used for being contacted with a part to be regulated of the equipment to be regulated.
The angle adjusting device in the above embodiment can be applied to a physical vapor deposition device (i.e., PVD apparatus).
The physical vapor deposition device is usually processed by adopting a magnetron sputtering process, and the magnetron sputtering process belongs to one of vacuum deposition processes. The method has the advantages of low deposition temperature, good film quality, good uniformity, high deposition speed, capability of preparing large-area uniform and compact hard films and the like, and is widely applied to industrial film plating.
The magnetron sputtering process is to use a magnetic field to control the behavior of charged ion particles during the magnetron sputtering deposition process. This process requires a high vacuum chamber to create a low pressure environment for sputtering. A gas containing a plasma (typically argon) is then introduced into the chamber. Next, a high negative voltage is applied between the sputtered target (cathode) and anode to initiate ionization of the inert gas. At this point, positive argon ions from the plasma collide with the negatively charged target, each collision of energetic particles causes atoms or molecules in the target to be ejected into the vacuum environment and propelled onto the substrate surface, while the strong magnetic field increases the deposition rate and prevents damage to the substrate by ion bombardment by confining electrons near the target surface (target). Wherein the strong magnetic field may be provided by a magnetic pole.
As shown in fig. 4 and 5, the physical vapor deposition device comprises a cavity 61, a substrate platform 62, a motor 63, a magnetic fluid sealing mechanism 64, a target 66, a magnetic pole 65 and the angle adjusting device;
the cavity comprises an upper cover cavity 611 and a lower cavity 612, wherein the upper cover cavity 611 covers the lower cavity 612, and a hollow cavity is formed between the upper cover cavity 611 and the lower cavity 612;
the upper cover cavity 611 forms a fixing part of the equipment to be adjusted, and the fixing flange 1 is fixed on the upper cover cavity 611;
the magnetic fluid sealing mechanism 64 forms a part to be regulated of the equipment to be regulated, the fixed end of the magnetic fluid sealing mechanism 64 is fixed on the movable flange 2, and the magnetic pole connecting end of the magnetic fluid sealing mechanism 64 sequentially penetrates through the through hole on the movable flange 2, the through hole on the fixed flange 1 and the through hole on the upper cover cavity 611 to be connected with the magnetic pole 65 positioned in the cavity;
the substrate stage 62 is disposed at the lower cavity portion 612 at a position opposite to the magnetic pole 65;
the target 66 is located between the magnetic pole 65 and the substrate stage, and the target 66 is fixed on the upper cover cavity 611;
the motor 63 is fixed to the fixed end of the magnetic fluid seal mechanism 64.
The substrate stage 62 is for carrying a substrate 8.
In this embodiment, the fixing flange 1 is fixed to the upper cover cavity portion 611 of the cavity 61 by corresponding first bolts 71;
the fixed end of the magnetic fluid sealing mechanism 64 is fixed on the movable flange 2 through a corresponding second bolt 72.
In this embodiment, a first seal ring 51 mounting groove 12 is provided on a surface of the fixing flange 1 contacting the upper cover cavity 611, and a first seal ring 51 is provided in the first seal ring 51 mounting groove 12.
In this embodiment, a second seal ring 52 mounting groove 22 is provided on a surface of the movable flange 2 contacting the fixed end of the magnetic fluid sealing mechanism 64, and a second seal ring 52 is provided in the second seal ring 52 mounting groove 22.
The physical vapor deposition device can utilize the angle adjusting device to adjust the angle of the magnetic pole 65 in the cavity 61, and when the physical vapor deposition device is implemented, the angle between the magnetic pole 65 and the substrate can be effectively adjusted by adjusting the adjusting bolt assembly 3, so that the problem of poor uniformity of the substrate plating film caused by uneven angle and magnetic field distribution between the magnetic pole 65 and the substrate is solved.
In operation, positive argon ions of the plasma in the chamber collide with the negatively charged target, each collision of energetic particles causing atoms of the target of interest to be ejected into the vacuum environment and propelled onto the substrate surface. The magnetic field of the magnetic pole increases the deposition rate and prevents the damage of ion bombardment to the substrate by confining electrons near the target; the physical vapor deposition device in the embodiment can influence the position of the magnetic field of the magnetic pole by adjusting the angle of the magnetic pole in the cavity so as to achieve the purpose of indiscriminately impacting the outer surface of the target and enabling atoms of the target to be uniformly deposited on the surface of the substrate.
The physical vapor deposition apparatus in the above embodiment has the following features:
1. the function of adjusting the angle between the magnetic pole and the substrate is realized, and the function of horizontally adjusting the movable flange in the angle adjusting device is realized by adjusting the positions of the upper supporting round head nuts and the lower supporting round head nuts on the four studs, so that the adjustment of the relative angle between the magnetic pole and the substrate is realized;
2. the cavity belongs to a vacuum sealing cavity by utilizing the design of the elastic sealing sleeve and the plurality of sealing rings, and the tightness of the cavity is ensured by the cooperation of each structure in the magnetic fluid sealing mechanism and the angle adjusting device;
3. the corrugated pipe is of a flexible structure, the adjusting bolt component provides assembly rigidity for the whole mechanism, and the hexagonal end face in the middle of the stud in FIG. 3 realizes multi-angle installation of the stud;
4. one end of the supporting nut is designed into a semicircular arc structure, so that the supporting nut is in line contact with a bolt connecting hole on the movable flange, the rear end of the circular head angle-adjusting nut is a hexagonal end face, and the multi-angle adjustable function of the nut is realized; the lock nut 33 is designed during implementation, and the corresponding support nut is further fixed, so that the stability of connection is ensured.
Therefore, the problems in the prior art are effectively overcome, and the serious influence on the uniformity of the coating film of the base material due to the non-parallel factors of the magnetic poles and the substrate is avoided.
The angle adjusting device in the embodiment can be applied to other equipment, and can adjust the relative included angle between the fixed flange and the movable flange by utilizing the plurality of adjusting bolt assemblies, so that the to-be-adjusted part of the to-be-adjusted equipment is driven to adjust the relative included angle relative to the fixed part of the to-be-adjusted equipment, the adjusting process is very convenient and easy to operate, and the angle adjusting device is particularly suitable for adjusting small angles. The physical vapor deposition device adopting the angle adjusting device can conveniently adjust the relative included angle between the magnetic pole and the substrate platform by using the angle adjusting device, is quite convenient to operate, effectively meets the requirement of fine production, and ensures the uniformity of substrate coating operation. The angle adjusting device and the corresponding physical vapor deposition device have the characteristics of simple structure, easy adjustment, good performance and wide adaptability.
The foregoing describes in detail preferred embodiments of the present utility model. It should be understood that numerous modifications and variations can be made in accordance with the concepts of the utility model without requiring creative effort by one of ordinary skill in the art. Therefore, all technical solutions which can be obtained by logic analysis, reasoning or limited experiments based on the prior art by the person skilled in the art according to the inventive concept shall be within the scope of protection defined by the claims.
Claims (10)
1. The angle adjusting device is characterized by comprising a fixed flange, a movable flange and a plurality of adjusting bolt assemblies;
the fixed flange is used for connecting a fixed part of equipment to be adjusted, and the movable flange is used for connecting the part to be adjusted of the equipment to be adjusted;
the adjustable flange comprises a movable flange and is characterized in that a plurality of bolt connecting holes are formed in the movable flange, the movable flange is opposite to the fixed flange, a plurality of adjusting bolt assemblies are used for connecting the fixed flange and the corresponding bolt connecting holes in the movable flange respectively, so that the fixed flange and the movable flange are connected, and the relative included angle between the fixed flange and the movable flange can be adjusted by adjusting the relative positions of the adjusting bolt assemblies and the corresponding bolt connecting holes in the fixed flange and the movable flange.
2. The angle adjustment device of claim 1, wherein each of the adjustment bolt assemblies comprises a stud and two support nuts;
the first end of the double-end stud is in threaded connection with a corresponding bolt connecting hole in the fixed flange;
the second end of the double-end stud penetrates through the corresponding bolt connecting hole in the movable flange, and two supporting nuts which are connected to the double-end stud through threads are clamped on two sides of the corresponding bolt connecting hole in the movable flange.
3. The angle adjusting device according to claim 2, wherein one end of the support nut is in a circular arc shape, and one of the two support nuts connected to the stud is oppositely clamped at two sides of the corresponding bolt connection hole in the movable flange.
4. The angle adjustment device of claim 3, wherein the adjustment bolt assembly further comprises two lock nuts, wherein the two lock nuts are both in threaded connection with the stud, and the two lock nuts respectively abut against one surface of the two support nuts which is not in a circular arc shape.
5. The angle adjusting device according to claim 1, further comprising an elastic sealing sleeve, wherein the elastic sealing sleeve is arranged between the fixed flange and the movable flange, and two ends of the elastic sealing sleeve are respectively fixed on two opposite surfaces of the fixed flange and the movable flange.
6. The angle adjustment device of claim 4, wherein the elastic sealing sleeve is formed of a bellows.
7. The angle adjusting device according to claim 1, wherein a first seal ring is provided in the fixing flange at a position for contacting with a fixing portion of the apparatus to be adjusted;
and a second sealing ring is arranged at the position, which is used for being in contact with the part to be regulated, of the equipment to be regulated in the movable flange.
8. A physical vapor deposition device, characterized in that the physical vapor deposition device comprises a cavity, a substrate platform, a motor, a magnetic fluid sealing mechanism, a magnetic pole, a target material and the angle adjusting device of any one of claims 1 to 7;
the cavity comprises an upper cover cavity part and a lower cavity part, wherein the upper cover cavity part is covered on the lower cavity part, and a hollow cavity is formed between the upper cover cavity part and the lower cavity part;
the upper cover cavity part forms a fixing part of the equipment to be adjusted, and the fixing flange is fixed on the upper cover cavity part;
the magnetic fluid sealing mechanism forms a part to be regulated of the equipment to be regulated, the fixed end of the magnetic fluid sealing mechanism is fixed on the movable flange, and the magnetic pole connecting end of the magnetic fluid sealing mechanism sequentially penetrates through the through hole on the movable flange, the through hole on the fixed flange and the through hole on the cavity of the upper cover to be connected with the magnetic pole positioned in the cavity; the substrate platform is arranged at the position of the lower cavity part, which is opposite to the magnetic pole;
the target is positioned between the magnetic pole and the substrate platform and is fixed on the upper cover cavity part;
the motor is fixed on the fixed end of the magnetic fluid sealing mechanism.
9. The physical vapor deposition apparatus of claim 8, wherein the fixing flange is fixed to the upper cover cavity portion by a corresponding first bolt;
the fixed end of the magnetic fluid sealing mechanism is fixed on the movable flange through a corresponding second bolt.
10. The physical vapor deposition device according to claim 8, wherein a first seal ring mounting groove is formed in a surface, which is in contact with the upper cover cavity, of the fixing flange, and a first seal ring is arranged in the first seal ring mounting groove;
and a second sealing ring mounting groove is formed in one surface of the movable flange, which is contacted with the fixed end of the magnetic fluid sealing mechanism, and a second sealing ring is arranged in the second sealing ring mounting groove.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321207806.9U CN219824347U (en) | 2023-05-18 | 2023-05-18 | Angle adjusting device and corresponding physical vapor deposition device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202321207806.9U CN219824347U (en) | 2023-05-18 | 2023-05-18 | Angle adjusting device and corresponding physical vapor deposition device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN219824347U true CN219824347U (en) | 2023-10-13 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202321207806.9U Active CN219824347U (en) | 2023-05-18 | 2023-05-18 | Angle adjusting device and corresponding physical vapor deposition device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN219824347U (en) |
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2023
- 2023-05-18 CN CN202321207806.9U patent/CN219824347U/en active Active
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