CN219772248U - Novel hot filament chemical vapor deposition device - Google Patents
Novel hot filament chemical vapor deposition device Download PDFInfo
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- CN219772248U CN219772248U CN202321365424.9U CN202321365424U CN219772248U CN 219772248 U CN219772248 U CN 219772248U CN 202321365424 U CN202321365424 U CN 202321365424U CN 219772248 U CN219772248 U CN 219772248U
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- 238000004050 hot filament vapor deposition Methods 0.000 title claims abstract description 21
- 238000000151 deposition Methods 0.000 claims abstract description 212
- 230000008021 deposition Effects 0.000 claims abstract description 203
- 230000005855 radiation Effects 0.000 claims abstract description 6
- 230000000149 penetrating effect Effects 0.000 claims description 6
- 229910003460 diamond Inorganic materials 0.000 abstract description 16
- 239000010432 diamond Substances 0.000 abstract description 16
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 abstract description 5
- 229910052796 boron Inorganic materials 0.000 abstract description 5
- 239000007789 gas Substances 0.000 description 10
- 239000012495 reaction gas Substances 0.000 description 5
- 238000001816 cooling Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 230000004075 alteration Effects 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 238000003487 electrochemical reaction Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000010865 sewage Substances 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
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- Chemical Vapour Deposition (AREA)
Abstract
The utility model relates to the technical field of hot wire chemical vapor deposition, in particular to a novel hot wire chemical vapor deposition device, which comprises a deposition chamber, wherein an air inlet pipe is fixed at the bottom end of the deposition chamber, an air outlet pipe is fixed at the top end of the deposition chamber, an upper hot wire group and a lower hot wire group are fixed in the inner cavity of the deposition chamber, a deposition workpiece is fixed in the middle part of the inner cavity of the deposition chamber, a chamber door through hole is formed in the side wall of the deposition chamber, the chamber door through hole is divided into an upper chamber door through hole and a lower chamber door through hole through a horizontal deposition chamber arc belt, a chamber door is hinged on the side wall of the deposition chamber, and a heat radiation reflection film layer is coated on the inner side wall of the deposition chamber; the deposition workpiece comprises a deposition workpiece I, a deposition workpiece II and a deposition workpiece III, wherein the deposition workpiece I, the deposition workpiece II and the deposition workpiece III all comprise horizontal base rings, and longitudinal grid rods are fixed in the horizontal base rings; solves the problems of poor quality of finished products and low heat utilization rate of the prior deposition equipment when depositing the boron doped diamond film.
Description
Technical Field
The utility model relates to the technical field of hot wire chemical vapor deposition, in particular to a novel hot wire chemical vapor deposition device.
Background
When the HFCVD device is used for depositing the boron-doped diamond film, firstly, an annular clamp fixed on a table base is used for clamping a deposition workpiece on the table base, then the table base passes through a hot wire group positioned at the lower side from the bottom of a deposition chamber, so that the deposition workpiece is positioned between an upper hot wire group and a lower hot wire group, then double-sided deposition of the boron-doped diamond film is carried out, boron doping is carried out during deposition, and meanwhile, circulating cooling water is also needed to cool the table base during the deposition process.
However, practice shows that the prior HFCVD apparatus has the following problems when depositing boron doped diamond films: the uniformity of the temperature field, the concentration field and the speed field in the existing deposition chamber is poor, the thermal efficiency is low, and the rejection rate is high; meanwhile, the heat energy loss in the deposition chamber is large in the process of cooling the table base, and the heat energy utilization rate is low; in addition, the uniformity difference is not obvious when the prior HFCVD device is used for preparing the small-area boron-doped diamond film, but the quality of the boron-doped diamond film is unqualified due to the non-uniformity of a temperature field, an airflow field and the like when the prior HFCVD device is used for preparing the large-area boron-doped diamond film.
Therefore, a novel hot filament chemical vapor deposition device is needed to solve the above problems.
Disclosure of Invention
The utility model provides a novel hot wire chemical vapor deposition device for solving the problems of poor quality of finished products and low heat energy utilization rate of the existing deposition equipment when a boron-doped diamond film is deposited.
The utility model is realized by adopting the following technical scheme:
the novel hot wire chemical vapor deposition device comprises a cylindrical deposition chamber, wherein an air inlet pipe in the shape of an inverted cone is fixed at the bottom end of the deposition chamber, an air outlet pipe in the shape of a cone is fixed at the top end of the deposition chamber, an upper hot wire group and a lower hot wire group which are distributed up and down are fixed in the inner cavity of the deposition chamber, a deposition workpiece positioned between the upper hot wire group and the lower hot wire group is fixed in the middle of the inner cavity of the deposition chamber, a chamber door through hole is formed in the side wall of the deposition chamber, the chamber door through hole is divided into an upper chamber door through hole and a lower chamber door through hole through a horizontal deposition chamber arc belt which is integrally arranged with the deposition chamber, a chamber door which covers the chamber door through hole is hinged to the side wall of the deposition chamber, and the inner side wall of the chamber door is flush with the inner wall of the deposition chamber; the inner side wall of the deposition chamber is coated with a heat radiation reflection film layer;
the deposition workpiece comprises a deposition workpiece I, a deposition workpiece II and a deposition workpiece III, wherein the deposition workpiece I, the deposition workpiece II and the deposition workpiece III all comprise horizontal base rings, and a plurality of longitudinal grid rods distributed left and right are fixed in the horizontal base rings; the distance between two adjacent longitudinal grid rods is larger than the diameter of the longitudinal grid rods.
Further, two blind holes which are positioned at the same elevation and provided with internal threads are formed in the side wall of the inner cavity of the deposition chamber, a supporting screw rod is screwed in each blind hole, a conical clamping block is integrally fixed at the end part of each supporting screw rod far away from the blind hole, and a supporting nut which is tightly clung to the side wall of the deposition chamber is screwed on each supporting screw rod; the side wall of the arc belt of the horizontal deposition chamber is provided with a through hole which is matched with the position of the blind hole and is provided with an internal thread, a fastening screw rod is penetrated and screwed in the through hole, a conical fastening block which is positioned in the inner cavity of the deposition chamber is integrally fixed at the end part of the fastening screw rod far away from the through hole, a fastening nut which is tightly attached to the inner side wall of the deposition chamber is screwed on the fastening screw rod, and a straight slot is formed in the surface of the fastening screw rod far away from the outer side wall of the deposition chamber; three conical abutting grooves matched with the clamping blocks and the fastening blocks are formed in the side wall of the deposition workpiece; the distance between the two supporting screws is equal to the distance between the supporting screws and the fastening screw.
Further, three mounting seats distributed up and down are fixed on the left part of the outer side wall of the deposition chamber, mounting holes penetrating up and down are formed in each mounting seat, three mounting lug plates matched with the three mounting seats are fixed at the left end of the chamber door, and pin shafts are jointly arranged on each mounting lug plate and the matched mounting holes in a penetrating mode; the right part of the outer side wall of the deposition chamber is fixedly provided with three horizontal locking seats which are distributed up and down, the end part of each horizontal locking seat, which is far away from the deposition chamber, is integrally provided with two locking forks which are distributed up and down, the right end of the chamber door is hinged with a longitudinal screw rod which is matched with the horizontal locking seats in position, the rear end of each longitudinal screw rod is positioned between the two locking forks, and the rear end of each longitudinal screw rod is screwed with a locking nut which is tightly clung to the rear surface of the locking fork.
Further, the upper surface of the longitudinal grating rod in the deposition workpiece I is flush with the upper surface of the horizontal base ring, and the lower surface of the longitudinal grating rod is flush with the lower surface of the horizontal base ring; the upper surface of the longitudinal grating rod in the deposition workpiece II upwards exceeds the upper surface of the horizontal base ring, and the lower surface of the longitudinal grating rod is flush with the lower surface of the horizontal base ring; the upper surface of the longitudinal grating rod in the deposition workpiece III is flush with the upper surface of the horizontal base ring, and the lower surface of the longitudinal grating rod downwards exceeds the lower surface of the horizontal base ring; the longitudinal grid bars in the deposition workpiece II and the longitudinal grid bars in the deposition workpiece III are staggered, and the deposition workpiece II is embedded with the deposition workpiece III.
Further, gaskets are arranged between each support nut and the inner side wall of the deposition chamber and between the fastening nuts and the inner side wall of the deposition chamber.
Further, a mounting flange is fixed at the bottom end of the deposition chamber, a plurality of fixing holes uniformly distributed along the circumferential direction are formed in the surface of the mounting flange, a plurality of mounting holes uniformly distributed along the circumferential direction are formed in the surface of the outer side, an air inlet flange is fixed at the upper end of the air inlet pipe, and the air inlet flange is fixedly connected with the mounting flange through the fixing holes; an air outlet flange is fixed at the top end of the deposition chamber, an air outlet flange I is fixed at the bottom end of the air outlet pipe, and the air outlet flange I is fixedly connected with the air outlet flange.
Further, a gasket I is clamped between the chamber door and the outer side wall of the deposition chamber; and gaskets II are respectively arranged between the air inlet flange and the mounting flange and between the air outlet flange I and the air outlet flange.
The utility model has reasonable and reliable structural design, and achieves the aim that the improved deposition chamber can improve the quality of the finished product of the boron-doped diamond film; meanwhile, the prior mode of conveying the deposited workpiece between the upper hot wire group and the lower hot wire group by using the table base is abandoned, a circulating water cooling system is omitted, the heat loss in the deposition chamber is reduced, and the heat energy utilization rate in the deposition chamber is improved; further, uniformity and consistency of gas concentration and gas flow rate in the deposition chamber are ensured, and deposition quality of the boron-doped diamond film is effectively improved.
Drawings
Fig. 1 is a schematic structural view of the present utility model.
Fig. 2 is a schematic top view of the present utility model.
FIG. 3 is a schematic view of the structure of the deposition chamber according to the present utility model.
FIG. 4 is a schematic side view of a deposition chamber of the present utility model.
FIG. 5 is a schematic top view of a deposition chamber of the present utility model.
Fig. 6 is a schematic top view of a chamber door of the present utility model.
Fig. 7 is a schematic top view and a schematic side view of a deposition workpiece I according to the present utility model.
Fig. 8 is a schematic top view and a schematic side view of a deposition workpiece II according to the present utility model.
Fig. 9 is a schematic top view and a schematic side view of a deposition workpiece III according to the present utility model.
Fig. 10 is a schematic view of the structure of the supporting screw in the present utility model.
Fig. 11 is a schematic view of the structure of the fastening screw in the present utility model.
FIG. 12 is a schematic view of the structure of the longitudinal screw of the present utility model.
In the figure: the device comprises a 1-deposition chamber, a 2-air inlet pipe, a 3-air outlet pipe, a 4-upper hot wire set, a 5-lower hot wire set, a 6-deposition workpiece, a 7-horizontal deposition chamber arc belt, an 8-upper chamber door through hole, a 9-lower chamber door through hole, a 10-chamber door, an 11-heat radiation reflection film layer, a 12-deposition workpiece I, a 13-deposition workpiece II, a 14-deposition workpiece III, a 15-horizontal base ring, a 16-longitudinal grid rod, a 17-blind hole, a 18-supporting screw, a 19-clamping block, a 20-supporting nut, a 21-through hole, a 22-fastening screw, a 23-fastening block, a 24-fastening nut, a 25-straight slot, a 26-abutting slot, a 27-mounting seat, a 28-mounting lug plate, a 29-pin shaft, a 30-locking fork, a 31-longitudinal screw, a 32-locking nut, a 33-gasket, a 34-mounting flange, a 35-fixing hole, a 36-mounting hole, a 37-air inlet flange, a 38-air outlet flange, a 39-outlet flange I, a 40-gasket I, and 41-gasket II.
Detailed Description
A novel hot wire chemical vapor deposition device is shown in the accompanying drawings 1-9, and comprises a cylindrical deposition chamber 1, wherein an air inlet pipe 2 in the shape of an inverted cone is fixed at the bottom end of the deposition chamber 1, an air outlet pipe 3 in the shape of a cone is fixed at the top end of the deposition chamber 1, an upper hot wire group 4 and a lower hot wire group 5 which are distributed up and down are fixed in the inner cavity of the deposition chamber 1, a deposition workpiece 6 positioned between the upper hot wire group 4 and the lower hot wire group 5 is fixed in the middle of the inner cavity of the deposition chamber 1, a chamber door through hole is formed in the side wall of the deposition chamber 1, the chamber door through hole is divided into an upper chamber door through hole 8 and a lower chamber door through hole 9 through a horizontal deposition chamber arc belt 7 which is integrally arranged with the deposition chamber 1, a chamber door 10 covering the chamber door through hole is hinged on the side wall of the deposition chamber 1, and the inner side wall of the chamber door 10 is flush with the inner wall of the deposition chamber 1; the inner side wall of the deposition chamber 1 is coated with a heat radiation reflection film layer 11;
the deposition workpiece 6 comprises a deposition workpiece I12, a deposition workpiece II13 and a deposition workpiece III14, wherein the deposition workpiece I12, the deposition workpiece II13 and the deposition workpiece III14 comprise horizontal base rings 15, and a plurality of longitudinal grid rods 16 distributed along the left and right direction are fixed in the horizontal base rings 15; the distance between two adjacent longitudinal bars 16 is greater than the diameter of the longitudinal bars 16.
According to the utility model, the deposition chamber 1 is cylindrical, the air inlet pipe 2 and the air outlet pipe 3 are coaxial with the deposition chamber 1, and according to the fluid mechanics principle, when the gas flows along the axial direction of the cylinder, the boundary influence is small, so that the uniformity and consistency of the gas concentration and the gas flow rate in the deposition chamber 1 are ensured; meanwhile, due to the structural design that the air inlet pipe 2 is positioned at the bottom end of the deposition chamber 1 and the air outlet pipe 3 is positioned at the top end of the deposition chamber 1, when the reaction gas slowly flows through the deposition workpiece 6 from bottom to top, under the comprehensive actions of factors such as air pressure difference, gas concentration difference, molecular thermal motion, gravity and the like, the uniformity of the gas concentration and the gas flow rate in the deposition chamber 1 is further ensured, and the deposition quality of the boron-doped diamond film is effectively improved;
the structural design of the heat radiation reflective film layer 11 coated on the inner side wall of the deposition chamber 1 not only reduces the heat conduction loss in the deposition chamber 1, but also improves the uniformity of a thermal field in the deposition chamber 1 and greatly improves the heat energy utilization rate in the deposition chamber 1;
the structural design of the chamber door 10 is convenient for the installation and the disassembly of the upper hot wire set 4, the lower hot wire set 5 and the deposition workpiece 6, and the inner side wall of the chamber door 10 is flush with the inner side wall of the deposition chamber 1, so that the uniformity and consistency of the gas concentration and the gas flow rate in the deposition chamber 1 are not affected;
the mode of fixing the deposition workpiece 6 and the inner side wall of the deposition chamber 1 is adopted, the existing mode of conveying the deposition workpiece between the upper hot wire group and the lower hot wire group by using a table base is abandoned, a circulating water cooling system is omitted, the heat loss in the deposition chamber 1 is reduced, and the heat energy utilization rate in the deposition chamber 1 is improved.
During operation, the air inlet pipe 2 and the air outlet pipe 3 are respectively fixed at the bottom end and the top end of the deposition workpiece 6, then the air inlet pipe 2 is communicated with reaction gas through an air inlet pipeline (an air inlet valve is arranged on the air inlet pipeline), the air outlet pipe 3 is communicated with a vacuum pump, then the chamber door 10 is opened, then the upper hot wire group 4 and the lower hot wire group 5 are arranged, the upper hot wire group 4 and the lower hot wire group 5 are connected with an external power supply, then the deposition workpiece 6 is fixedly connected with the inner side wall of the deposition chamber 1, so that the deposition workpiece 6 is positioned between the upper hot wire group 4 and the lower hot wire group 5, and the chamber door 10 is closed;
then starting a vacuum pump to pump out air in the deposition chamber 1, so that a deposition workpiece 6 is in a vacuum environment, starting an external power supply, starting heating of the upper hot wire set 4 and the lower hot wire set 5, opening an air inlet valve when the temperatures of the upper hot wire set 4 and the lower hot wire set 5 reach preset values, enabling reaction gas to flow into the deposition chamber 1 from bottom to top at a constant speed, decomposing the reaction gas at a high temperature and generating a series of chemical reactions, forming nuclei on the surface of the deposition workpiece 6, growing a diamond film, and carrying vapor of a boron-containing substance into the deposition chamber 1 through carrier gas bubbling and reacting with the reaction gas in the process of forming the diamond film to obtain a boron-doped diamond film, thereby completing preparation of the boron-doped diamond film; the method solves the problems of poor quality of finished products and low heat utilization rate of the prior deposition equipment when depositing the boron doped diamond film.
As shown in fig. 2, 10 and 11, two blind holes 17 with internal threads and located at the same elevation are formed in the side wall of the inner cavity of the deposition chamber 1, a supporting screw rod 18 is screwed in each blind hole 17, a conical clamping block 19 is integrally fixed at the end part of each supporting screw rod 18 far away from the blind hole 17, and a supporting nut 20 tightly attached to the inner side wall of the deposition chamber 1 is screwed on the supporting screw rod 18; the side wall of the arc belt 7 of the horizontal deposition chamber is provided with a through hole 21 which is matched with the position of the blind hole 17 and is provided with an internal thread, a fastening screw rod 22 is penetrated and screwed in the through hole 21, a fastening block 23 which is positioned in the inner cavity of the deposition chamber 1 and is conical is integrally fixed at the end part of the fastening screw rod 22 away from the through hole 21, a fastening nut 24 which is tightly attached to the inner side wall of the deposition chamber 1 is screwed on the fastening screw rod 22, and a linear groove 25 is formed on the surface of the fastening screw rod 22 away from the outer side wall of the deposition chamber 1; three conical abutting grooves 26 matched with the clamping blocks 19 and the fastening blocks 23 are formed in the side wall of the deposition workpiece 6; the distance between the two support screws 18 is equal to the distance between the support screws 18 to the tightening screw 22.
The two supporting screws 18 and the fastening screw 22 fix the deposition workpiece 6 on the inner side wall of the deposition chamber 1, so that a circulating water cooling system is omitted, and the heat loss in the deposition chamber 1 is reduced;
when the screw is fixed, the two support screws 18 are respectively screwed in the two blind holes 17, the fastening screw 22 is screwed in the through hole 21, and the two support nuts 20 are respectively screwed on the two support screws 18, so that the stability of the support screws 18 is enhanced; simultaneously, the fastening nut 24 is screwed on the fastening screw rod 22 but not screwed, then an operator puts the deposition workpiece 6 into the deposition chamber 1, and three abutting grooves 26 are respectively abutted with the two clamping blocks 19 and one fastening block 23, then the fastening screw rod 22 is screwed by utilizing the straight groove 25, so that the fastening block 23 abuts in the abutting groove 26, and finally the fastening nut 24 is screwed, thereby completing the fixed connection of the deposition workpiece 6 and the deposition chamber 1.
As shown in fig. 2-6 and 12, three mounting seats 27 distributed up and down are fixed on the left part of the outer side wall of the deposition chamber 1, mounting holes penetrating up and down are formed in each mounting seat 27, three mounting lugs 28 matched with the three mounting seats 27 are fixed on the left end of the chamber door 10, and pin shafts 29 are arranged on each mounting lug 28 and the matched mounting holes in a penetrating mode; the right part of the outer side wall of the deposition chamber 1 is fixedly provided with three horizontal locking seats which are distributed up and down, the end part of each horizontal locking seat far away from the deposition chamber 1 is integrally provided with two locking forks 30 which are distributed up and down, the right end of the chamber door 10 is hinged with a longitudinal screw rod 31 which is matched with the position of the horizontal locking seats, the rear end of each longitudinal screw rod 31 is positioned between the two locking forks 30, and the rear end of each longitudinal screw rod 31 is screwed with a locking nut 32 which is tightly attached to the rear surface of the locking fork 30.
The structural design of the mounting seat 27, the mounting lug plate 28 and the pin shaft 29 realizes the hinging of the left end of the chamber door 10 and the deposition chamber 1, and the structural design of the horizontal locking seat, the locking fork 30, the longitudinal screw 31 and the locking nut 32 realizes the fixed connection of the right end of the chamber door 10 and the deposition chamber 1;
when the door 10 is closed, the longitudinal screw 31 is first turned so that the longitudinal screw 31 is located between the two locking forks 30, and then the locking nut 32 is tightened so that the longitudinal screw 31 is fixedly connected with the locking forks 30; when the door 10 is opened, the lock nut 32 is unscrewed, so that the friction between the lock nut 32 and the lock fork 30 is suddenly reduced, and then the vertical screw 31 is rotated, and the vertical screw 31 pulls the door 10 open.
As shown in fig. 7 to 9, the upper surface of the longitudinal grating 16 in the deposition workpiece I12 is flush with the upper surface of the horizontal base ring 15, and the lower surface of the longitudinal grating 16 is flush with the lower surface of the horizontal base ring 15; the upper surface of the longitudinal grating bar 16 in the deposition workpiece II13 is upwards beyond the upper surface of the horizontal base ring 15, and the lower surface of the longitudinal grating bar 16 is flush with the lower surface of the horizontal base ring 15; the upper surface of the longitudinal grating bar 16 in the deposition workpiece III14 is flush with the upper surface of the horizontal base ring 15, and the lower surface of the longitudinal grating bar 16 extends downwards beyond the lower surface of the horizontal base ring 15; the longitudinal bars 16 of the deposition work piece II13 and the longitudinal bars 16 of the deposition work piece III14 are arranged in a staggered manner, and the deposition work piece II13 is embedded with the deposition work piece III 14.
When the deposition workpiece II13 and the deposition workpiece III14 are embedded to form a combined electrode, the combined electrode is used as an anode in water treatment equipment, and the electrochemical reaction sites are more and the current is large due to the large specific surface area, so that the sewage treatment efficiency is improved.
In the specific implementation process, the deposited workpiece II13 is turned 180 degrees to be the deposited workpiece III14, so that when the deposited workpiece II13 and the deposited workpiece III14 are manufactured, only the deposited workpiece II13 is required to be manufactured, and when the combined electrode is used, one deposited workpiece II13 is turned 180 degrees and is embedded with the other deposited workpiece II13, thereby forming the combined electrode.
As shown in fig. 2, a spacer 33 is interposed between each of the support nuts 20 and the inner sidewall of the deposition chamber 1, and between the fastening nut 24 and the inner sidewall of the deposition chamber 1.
As shown in fig. 1, a mounting flange 34 is fixed at the bottom end of the deposition chamber 1, a plurality of fixing holes 35 uniformly distributed along the circumferential direction are formed on the surface of the mounting flange 34 positioned at the inner side, a plurality of mounting holes 36 uniformly distributed along the circumferential direction are formed on the surface of the outer side, an air inlet flange 37 is fixed at the upper end of the air inlet pipe 2, and the air inlet flange 37 is fixedly connected with the mounting flange 34 through the fixing holes 35; an air outlet flange 38 is fixed at the top end of the deposition chamber 1, an air outlet flange I39 is fixed at the bottom end of the air outlet pipe 3, and the air outlet flange I39 is fixedly connected with the air outlet flange 38.
The mounting holes 36 are used to fix the deposition chamber 1 to other equipment.
As shown in fig. 1, a gasket I40 is sandwiched between the chamber door 10 and the outer side wall of the deposition chamber 1; gaskets II41 are respectively arranged between the air inlet flange 37 and the mounting flange 34 and between the air outlet flange I39 and the air outlet flange 38.
In the description of the present utility model, it should be understood that the orientation or positional relationship indicated is based on the orientation or positional relationship shown in the drawings, and is merely for convenience in describing the present utility model and simplifying the description, and does not indicate or imply that the apparatus or element referred to must have a specific orientation, be configured and operated in a specific orientation, and thus should not be construed as limiting the present utility model.
Although embodiments of the present utility model have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made therein without departing from the principles and spirit of the utility model, the scope of which is defined in the appended claims and their equivalents.
Claims (7)
1. The utility model provides a novel hot filament chemical vapor deposition device which characterized in that: the device comprises a cylindrical deposition chamber (1), wherein an air inlet pipe (2) in the shape of an inverted cone is fixed at the bottom end of the deposition chamber (1), an air outlet pipe (3) in the shape of a cone is fixed at the top end of the deposition chamber (1), an upper hot wire group (4) and a lower hot wire group (5) which are distributed up and down are fixed in the inner cavity of the deposition chamber (1), a deposition workpiece (6) positioned between the upper hot wire group (4) and the lower hot wire group (5) is fixed in the middle of the inner cavity of the deposition chamber (1), a chamber door through hole is formed in the side wall of the deposition chamber (1), the chamber door through hole is divided into an upper chamber door through hole (8) and a lower chamber door through hole (9) through a horizontal deposition chamber arc belt (7) which is integrally arranged with the deposition chamber (1), a chamber door (10) covering the chamber door through hole is hinged on the side wall of the deposition chamber (1), and the inner side wall of the chamber door (10) is flush with the inner wall of the deposition chamber (1); the inner side wall of the deposition chamber (1) is coated with a heat radiation reflection film layer (11);
the deposition workpiece (6) comprises a deposition workpiece I (12), a deposition workpiece II (13) and a deposition workpiece III (14), wherein the deposition workpiece I (12), the deposition workpiece II (13) and the deposition workpiece III (14) all comprise horizontal base rings (15), and a plurality of longitudinal grid rods (16) distributed along the left and right direction are fixed in the horizontal base rings (15); the distance between two adjacent longitudinal bars (16) is larger than the diameter of the longitudinal bars (16).
2. The novel hot filament chemical vapor deposition device according to claim 1, wherein: two blind holes (17) which are positioned at the same elevation and provided with internal threads are formed in the side wall of the inner cavity of the deposition chamber (1), supporting screws (18) are screwed in each blind hole (17), conical clamping blocks (19) are integrally fixed at the end part, far away from the blind holes (17), of each supporting screw (18), and supporting nuts (20) which are tightly clung to the inner side wall of the deposition chamber (1) are screwed on the supporting screws (18); the side wall of the horizontal deposition chamber arc belt (7) is provided with a through hole (21) which is matched with the position of the blind hole (17) and is provided with an internal thread, a fastening screw (22) is penetrated and screwed in the through hole (21), the end part of the fastening screw (22) far away from the through hole (21) is integrally fixed with a fastening block (23) which is positioned in the inner cavity of the deposition chamber (1) and is conical, the fastening screw (22) is screwed with a fastening nut (24) which is tightly attached to the inner side wall of the deposition chamber (1), and the surface of the fastening screw (22) far away from the outer side wall of the deposition chamber (1) is provided with a straight slot (25); three conical abutting grooves (26) matched with the clamping blocks (19) and the fastening blocks (23) are formed in the side wall of the deposition workpiece (6); the distance between the two support screws (18) is equal to the distance between the support screws (18) and the fastening screw (22).
3. The novel hot filament chemical vapor deposition device according to claim 1, wherein: three mounting seats (27) distributed up and down are fixed at the left part of the outer side wall of the deposition chamber (1), mounting holes penetrating up and down are formed in each mounting seat (27), three mounting lug plates (28) matched with the three mounting seats (27) are fixed at the left end of the chamber door (10), and pin shafts (29) are jointly arranged on each mounting lug plate (28) and the matched mounting holes in a penetrating mode; the right part of the outer side wall of the deposition chamber (1) is fixedly provided with three horizontal locking seats which are distributed up and down, the end part of each horizontal locking seat, which is far away from the deposition chamber (1), is integrally provided with two locking forks (30) which are distributed up and down, the right end of the chamber door (10) is hinged with a longitudinal screw rod (31) which is matched with the position of the horizontal locking seats, the rear end of each longitudinal screw rod (31) is positioned between the two locking forks (30), and the rear end of each longitudinal screw rod (31) is screwed with a locking nut (32) which is tightly attached to the rear surface of the locking fork (30).
4. The novel hot filament chemical vapor deposition device according to claim 1, wherein: the upper surface of the longitudinal grating rod (16) in the deposition workpiece I (12) is flush with the upper surface of the horizontal base ring (15), and the lower surface of the longitudinal grating rod (16) is flush with the lower surface of the horizontal base ring (15); the upper surface of the longitudinal grating rod (16) in the deposition workpiece II (13) upwards exceeds the upper surface of the horizontal base ring (15), and the lower surface of the longitudinal grating rod (16) is flush with the lower surface of the horizontal base ring (15); the upper surface of the longitudinal grating rod (16) in the deposition workpiece III (14) is flush with the upper surface of the horizontal base ring (15), and the lower surface of the longitudinal grating rod (16) downwards exceeds the lower surface of the horizontal base ring (15); the longitudinal bars (16) in the deposition workpiece II (13) and the longitudinal bars (16) in the deposition workpiece III (14) are arranged in a staggered manner, and the deposition workpiece II (13) is embedded with the deposition workpiece III (14).
5. The novel hot filament chemical vapor deposition device according to claim 2, wherein: gaskets (33) are respectively arranged between each support nut (20) and the inner side wall of the deposition chamber (1) and between the fastening nuts (24) and the inner side wall of the deposition chamber (1).
6. The novel hot filament chemical vapor deposition device according to claim 1, wherein: the bottom end of the deposition chamber (1) is fixedly provided with a mounting flange (34), a plurality of fixing holes (35) which are uniformly distributed along the circumferential direction are formed in the surface of the mounting flange (34) positioned on the inner side, a plurality of mounting holes (36) which are uniformly distributed along the circumferential direction are formed in the surface of the outer side, the upper end of the air inlet pipe (2) is fixedly provided with an air inlet flange (37), and the air inlet flange (37) is fixedly connected with the mounting flange (34) through the fixing holes (35); an air outlet flange (38) is fixed at the top end of the deposition chamber (1), an air outlet flange I (39) is fixed at the bottom end of the air outlet pipe (3), and the air outlet flange I (39) is fixedly connected with the air outlet flange (38).
7. The novel hot filament chemical vapor deposition device according to claim 6, wherein: a gasket I (40) is clamped between the chamber door (10) and the outer side wall of the deposition chamber (1); gaskets II (41) are respectively arranged between the air inlet flange (37) and the mounting flange (34) and between the air outlet flange I (39) and the air outlet flange (38).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
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