CN219730782U - Annealing furnace for quartz glass production and processing - Google Patents
Annealing furnace for quartz glass production and processing Download PDFInfo
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- CN219730782U CN219730782U CN202320725964.7U CN202320725964U CN219730782U CN 219730782 U CN219730782 U CN 219730782U CN 202320725964 U CN202320725964 U CN 202320725964U CN 219730782 U CN219730782 U CN 219730782U
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- 238000000137 annealing Methods 0.000 title claims abstract description 67
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 50
- 238000012545 processing Methods 0.000 title claims abstract description 24
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 11
- 238000010438 heat treatment Methods 0.000 claims description 38
- 238000001816 cooling Methods 0.000 claims description 11
- 238000007789 sealing Methods 0.000 claims description 6
- 238000005192 partition Methods 0.000 claims description 5
- 239000003973 paint Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 abstract description 3
- 239000011248 coating agent Substances 0.000 abstract description 2
- 239000011521 glass Substances 0.000 abstract description 2
- 238000000926 separation method Methods 0.000 abstract 1
- 235000012431 wafers Nutrition 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 239000002019 doping agent Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000005336 cracking Methods 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000008439 repair process Effects 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
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- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
Abstract
The utility model discloses an annealing furnace for quartz glass production and processing, and relates to the technical field of glass production. According to the utility model, the support plate is pulled out from the fixed slide rail by pulling the handle to drive the support plate to move outwards along the inner side of the fixed slide rail, and simultaneously, the handle II is pulled alone to drive the pull plate to move outwards along the clamping groove at the top of the support plate, and the pull plate drives the rear retaining plate to move synchronously, so that the quartz glass placed on the pull plate is pulled out from the inside of the placing groove arranged between the separation plates through the pull plate by combining the protection of the anti-skid wear-resistant coating on the pull plate and the rear retaining plate, thereby facilitating the quartz glass to be taken out from the inside of the annealing furnace body, reducing the labor intensity of workers and improving the treatment efficiency.
Description
Technical Field
The utility model relates to the technical field of glass production, in particular to an annealing furnace for quartz glass production and processing.
Background
An annealing furnace is a process used in the manufacture of semiconductor devices that includes heating a plurality of semiconductor wafers to affect their electrical properties. The heat treatment is designed for different effects. The wafer may be heated to activate the dopants, convert the film to a film or convert the film to a wafer substrate interface, cause a densely deposited film, change the state of the grown film, repair implanted damage, move dopants or transfer dopants from one film to another film or from a film into the wafer substrate. The lehr may be integrated into other furnace processing steps, such as oxidation, or may be self-processing. Annealing furnaces are accomplished by equipment specifically designed for heating semiconductor wafers. The following problems exist in the prior art:
1. when annealing operation is carried out on the quartz glass, one side of the existing annealing furnace for producing and processing the quartz glass can only carry out annealing treatment on single quartz glass, and after annealing is finished, the quartz glass is collected, more time is consumed for taking the quartz glass out of the annealing furnace by workers, so that the labor intensity of the workers is increased, and the working efficiency is reduced;
2. the existing annealing furnace for producing and processing quartz glass can generate the phenomenon of cracking in the use process of the quartz glass, so that the service life of the quartz glass is reduced, the operation of annealing treatment of the quartz glass is extremely important, the service life of the quartz glass can be intuitively improved, but each piece of quartz glass can not be uniformly ensured to be pushed to be fire-processed when the existing annealing furnace for producing and processing the quartz glass is used, and meanwhile, the quality of annealing operation is easily reduced due to poor control of the temperature.
Disclosure of Invention
In order to solve the technical problems, the utility model adopts the following technical scheme:
the utility model provides an annealing stove is used in quartz glass production processing, includes the annealing stove body, the front side of annealing stove body articulates installs the sealing door, the equal fixed slide rail of lower extreme of the inside left and right sides of annealing stove body, the inside movable joint of fixed slide rail has the backup pad, the top fixed mounting of backup pad has the division board, separate between the division board has the standing groove, the draw-in groove has been seted up at the top of backup pad, the inside movable joint of draw-in groove has the pull board, the pull board sets up under the standing groove, the rear side fixedly connected with back butt plate of pull board, the middle-end fixed mounting of backup pad front side has the handle one, the front side fixed mounting of pull board has the handle two.
The technical scheme of the utility model is further improved as follows: the annealing furnace comprises an annealing furnace body, and is characterized in that a mounting plate is fixedly mounted in the annealing furnace body, an electrode heating plate is fixedly mounted at the bottom of the mounting plate, the electrode heating plates are respectively located at the left side and the right side of a placing groove, a heating control device is fixedly mounted at the top of the mounting plate, a control panel is fixedly mounted at the middle end of the top of the annealing furnace body, a temperature sensor is fixedly mounted at the upper left end of the rear side of the annealing furnace body, and cooling holes are formed in the lower end of the rear side of the annealing furnace body at equal intervals.
The technical scheme of the utility model is further improved as follows: the top of the drawing plate and the front side of the rear retaining plate are both provided with anti-skid wear-resistant paint.
The technical scheme of the utility model is further improved as follows: the support plate can slide along the fixed slide rail for a distance of half the length of the fixed slide rail, and the drawing plate can draw forward for a distance of two thirds along the inside of the clamping groove.
The technical scheme of the utility model is further improved as follows: the front side of the closed door is fixedly provided with an observation window.
The technical scheme of the utility model is further improved as follows: the heating control device and the temperature sensor are electrically connected with the control panel, and an adjusting button is arranged at the top of the control panel.
The technical scheme of the utility model is further improved as follows: the inside of thermovent is provided with frequency conversion radiator fan, electric connection between frequency conversion radiator fan and the control panel.
By adopting the technical scheme, compared with the prior art, the utility model has the following technical progress:
1. the utility model provides an annealing furnace for quartz glass production and processing, which is provided with a fixed slide rail, a support plate, a division plate, a placing groove and the like, wherein a sealing door is opened downwards, then a first handle is pulled to drive the support plate to move outwards along the inner side of the fixed slide rail, so that the support plate is pulled out of the inner side of the fixed slide rail, and simultaneously, a second handle is independently pulled to drive a pull plate to move outwards along a clamping groove at the top of the support plate, and the pull plate drives a rear retaining plate to move synchronously, and the protection of anti-skid wear-resistant coatings on the pull plate and the rear retaining plate is combined, so that quartz glass placed on the pull plate is pulled out of the placing groove arranged between the division plates through the pull plate, so that the quartz glass is taken out of the annealing furnace body more conveniently, the labor intensity of workers is reduced, and the processing efficiency is improved.
2. The utility model provides an annealing furnace for quartz glass production and processing, which is provided with electrode heating plates, a heating control device, a control panel, a temperature sensor and the like, wherein quartz glass is positioned between the electrode heating plates, the electrode heating plates are driven and heated by the heating control device to maintain the temperature of the quartz glass, the heating control device is controlled by the operation control panel, the electrode heating plates are controlled by the heating control device to slowly cool, meanwhile, the temperature sensor is used for monitoring the temperature change rate in an annealing furnace body and transmitting an electric signal to the control panel to control and cooperate with the use of a variable-frequency cooling fan arranged in a cooling port, so that the temperature of the quartz glass is gradually reduced to be cooled at a proper speed, the annealing treatment quality of the quartz glass is ensured, and the service life of the quartz glass is prolonged.
Drawings
FIG. 1 is a schematic view showing the structure of an annealing furnace for producing and processing quartz glass according to the present utility model;
FIG. 2 is a schematic view of an open state structure of the present utility model;
FIG. 3 is a schematic view of the structure of the interior of the annealing furnace body of the present utility model;
fig. 4 is a schematic structural view of a heat dissipation port according to the present utility model.
In the figure: 1. an annealing furnace body; 2. closing the door; 3. fixing the sliding rail; 4. a support plate; 5. a partition plate; 6. a placement groove; 7. a drawing plate; 8. a rear retaining plate; 9. a first handle; 10. a second handle; 11. a mounting plate; 12. an electrode heating plate; 13. a heating control device; 14. a control panel; 15. a temperature sensor; 16. a heat radiation port; 17. and an observation window.
Detailed Description
The utility model is further illustrated by the following examples:
example 1
As shown in fig. 1-4, the utility model provides an annealing furnace for producing and processing quartz glass, which comprises an annealing furnace body 1, wherein a sealing door 2 is hinged to the front side of the annealing furnace body 1, fixed sliding rails 3 are fixedly arranged at the lower ends of the left side and the right side in the annealing furnace body 1, a supporting plate 4 is movably clamped in the fixed sliding rails 3, a partition plate 5 is fixedly arranged at the top of the supporting plate 4, a placing groove 6 is partitioned between the partition plates 5, a clamping groove is formed in the top of the supporting plate 4, a drawing plate 7 is movably clamped in the clamping groove, the drawing plate 7 is arranged under the placing groove 6, a rear retaining plate 8 is fixedly connected to the rear side of the drawing plate 7, a first handle 9 is fixedly arranged at the middle end of the front side of the supporting plate 4, and a second handle 10 is fixedly arranged at the front side of the drawing plate 7.
In this embodiment, through being provided with fixed slide rail 3, backup pad 4, division board 5, standing groove 6 etc. through opening closure door 2 downwards, then through pulling handle one 9, drive the inboard outside activity of backup pad 4 along fixed slide rail 3 through handle one 9, thereby pull out backup pad 4 from the inside of fixed slide rail 3, simultaneously through pulling handle two 10 alone, drive draw-out plate 7 outside activity along the draw-in groove at backup pad 4 top through handle two 10, drive back butt plate 8 synchronous activity through draw-out plate 7, thereby combine the protection of the anti-skidding wear-resisting coating on draw-out plate 7 and the back butt plate 8 thereby through the inside pulling out of standing groove 6 that sets up between division board 5 of the quartz glass that will be placed on the draw-out plate 7, thereby make quartz glass take out more conveniently from the inside of annealing furnace body 1, thereby reduce workman's intensity of labour, processing efficiency has been improved simultaneously.
Example 2
As shown in fig. 1-4, on the basis of embodiment 1, the present utility model provides a technical solution: preferably, the inside of the annealing furnace body 1 is fixedly provided with a mounting plate 11, the bottom of the mounting plate 11 is fixedly provided with an electrode heating plate 12, the electrode heating plates 12 are respectively positioned on the left side and the right side of the placing groove 6, the top of the mounting plate 11 is fixedly provided with a heating control device 13, the middle end of the top of the annealing furnace body 1 is fixedly provided with a control panel 14, the left upper end of the rear side of the inside of the annealing furnace body 1 is fixedly provided with a temperature sensor 15, and the lower end of the rear side of the annealing furnace body 1 is equidistantly provided with a cooling hole 16.
In this embodiment, by providing the electrode heating plates 12, the heating control device 13, the control panel 14, the temperature sensor 15 and the like, by enabling the quartz glass to be located between the electrode heating plates 12, driving and heating the electrode heating plates 12 by the heating control device 13 to maintain the temperature of the quartz glass, controlling the heating control device 13 by operating the control panel 14, controlling the electrode heating plates 12 to slowly cool by the heating control device 13, simultaneously monitoring the temperature change rate inside the annealing furnace body 1 by the temperature sensor 15 and transmitting an electric signal to the control panel 14 to control and cooperate with the use of the variable frequency cooling fan arranged in the cooling hole 16, so that the temperature reduction of the quartz glass tends to be gentle and cool at a proper speed, thereby ensuring the annealing treatment quality of the quartz glass and prolonging the service life of the quartz glass.
The working principle of the annealing furnace for producing and processing quartz glass will be specifically described below.
As shown in fig. 1-4, the electrode heating plates 12 are driven and heated by the heating control device 13 to maintain the temperature of the quartz glass, the heating control device 13 is controlled by the operation control panel 14, the electrode heating plates 12 are controlled by the heating control device 13 to slowly cool down, the temperature change rate of the inside of the annealing furnace body 1 is monitored by the temperature sensor 15 and an electric signal is transmitted to the control panel 14 to control and cooperate with the use of a variable-frequency cooling fan arranged in the cooling port 16, so that the temperature of the quartz glass is gradually cooled at a proper speed, the annealing treatment quality of the quartz glass is ensured, the sealing door 2 is opened downwards after the annealing treatment, then the first handle 9 is pulled, the supporting plate 4 is driven to move outwards along the inner side of the fixed sliding rail 3 by the first handle 9, the supporting plate 4 is pulled out from the inner side of the fixed sliding rail 3, meanwhile, the second handle 10 is independently pulled, the pulling plate 7 is driven to move outwards along the clamping groove at the top of the supporting plate 4, the rear retaining plate 8 is driven to move synchronously by the pulling plate 7, the retaining plate 7 is combined with the use of a variable-frequency cooling fan arranged in the cooling port 16, the annealing furnace is enabled to cool down at proper speed, the annealing treatment quality is ensured, the quartz glass is enabled to be placed inside the quartz glass 1 through the retaining plate 7, and the retaining plate is placed inside the retaining plate 5 is more conveniently from the separating plate 5.
The foregoing utility model has been generally described in great detail, but it will be apparent to those skilled in the art that modifications and improvements can be made thereto. Accordingly, it is intended to cover modifications or improvements within the spirit of the inventive concepts.
Claims (7)
1. The utility model provides an annealing furnace for quartz glass production and processing, includes annealing furnace body (1), its characterized in that: the annealing furnace is characterized in that the front side of the annealing furnace body (1) is hinged to be provided with a sealing door (2), the lower ends of the left side and the right side of the inside of the annealing furnace body (1) are fixedly provided with fixing sliding rails (3), the inside movable clamping of the fixing sliding rails (3) is provided with a supporting plate (4), the top of the supporting plate (4) is fixedly provided with a partition plate (5), a holding groove (6) is partitioned between the partition plates (5), the top of the supporting plate (4) is provided with a clamping groove, the inside movable clamping of the clamping groove is provided with a drawing plate (7), the drawing plate (7) is arranged under the holding groove (6), the rear side of the drawing plate (7) is fixedly connected with a rear retaining plate (8), and the middle end of the front side of the supporting plate (4) is fixedly provided with a first handle (9), and the front side of the drawing plate (7) is fixedly provided with a second handle (10).
2. The annealing furnace for producing and processing quartz glass according to claim 1, wherein: the annealing furnace is characterized in that a mounting plate (11) is fixedly mounted in the annealing furnace body (1), an electrode heating plate (12) is fixedly mounted at the bottom of the mounting plate (11), the electrode heating plates (12) are respectively located on the left side and the right side of the placing groove (6), a heating control device (13) is fixedly mounted at the top of the mounting plate (11), a control panel (14) is fixedly mounted at the middle end of the top of the annealing furnace body (1), a temperature sensor (15) is fixedly mounted at the left upper end of the rear side in the annealing furnace body (1), and a cooling opening (16) is formed in the lower end of the rear side of the annealing furnace body (1) at equal intervals.
3. The annealing furnace for producing and processing quartz glass according to claim 1, wherein: the top of the drawing plate (7) and the front side of the rear retaining plate (8) are both provided with anti-skid wear-resistant paint.
4. The annealing furnace for producing and processing quartz glass according to claim 1, wherein: the support plate (4) can slide along the fixed sliding rail (3) for a distance of half the length of the fixed sliding rail (3), and the drawing plate (7) can draw forward for a distance of two thirds along the inside of the clamping groove.
5. The annealing furnace for producing and processing quartz glass according to claim 1, wherein: an observation window (17) is fixedly arranged on the front side of the sealing door (2).
6. The annealing furnace for producing and processing quartz glass according to claim 2, wherein: the heating control device (13) and the temperature sensor (15) are electrically connected with the control panel (14), and an adjusting button is arranged at the top of the control panel (14).
7. The annealing furnace for producing and processing quartz glass according to claim 2, wherein: the inside of the radiating opening (16) is provided with a variable-frequency radiating fan, and the variable-frequency radiating fan is electrically connected with the control panel (14).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN202320725964.7U CN219730782U (en) | 2023-04-05 | 2023-04-05 | Annealing furnace for quartz glass production and processing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
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CN202320725964.7U CN219730782U (en) | 2023-04-05 | 2023-04-05 | Annealing furnace for quartz glass production and processing |
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Publication Number | Publication Date |
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CN219730782U true CN219730782U (en) | 2023-09-22 |
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CN202320725964.7U Active CN219730782U (en) | 2023-04-05 | 2023-04-05 | Annealing furnace for quartz glass production and processing |
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2023
- 2023-04-05 CN CN202320725964.7U patent/CN219730782U/en active Active
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