CN219610425U - Double-sided electroplating structure of chip plastic package body - Google Patents
Double-sided electroplating structure of chip plastic package body Download PDFInfo
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- CN219610425U CN219610425U CN202223354688.2U CN202223354688U CN219610425U CN 219610425 U CN219610425 U CN 219610425U CN 202223354688 U CN202223354688 U CN 202223354688U CN 219610425 U CN219610425 U CN 219610425U
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Abstract
The utility model belongs to the technical field of semiconductors, and particularly relates to a double-sided electroplating structure of a chip plastic package body, which comprises the following components: the chip plastic package body comprises a plurality of chips and a first plastic package layer for coating the chips; the chip plastic package body is provided with a plurality of through holes and a plurality of blind holes for exposing the I/O ports of the chip along the thickness direction; the first seed layers are positioned on the side walls of the through holes and the blind holes and on the two sides of the chip plastic package body; the first conductive column is filled in the through hole, the second conductive column is filled in the blind hole, and the first rewiring layer is arranged on the first seed layers at two sides of the chip plastic package body. In the utility model, the first rewiring layers on two sides of the chip plastic package body are synchronously connected through the first conductive posts filled in the through holes of the chip plastic package body, so that signal interconnection and penetration between functional chips are realized. Compared with the prior art, the preparation process flow of the double-sided electroplating structure of the chip plastic package body is simple, the production efficiency is high, the production cost is low, and the yield is improved.
Description
Technical Field
The utility model relates to the technical field of semiconductors, in particular to a double-sided electroplating structure of a chip plastic package body.
Background
With the development of the semiconductor field, the densification of microelectronic packaging technology has become a mainstream in new generation electronic products. Different packaging technologies have great differences in the aspects of manufacturing procedures and processes, and play a vital role in the performance of the chip after packaging. With the development of packaging technology and technology, chips are developed towards higher density, faster speed, smaller size, lower cost, and the like. The electroplating of the two sides of the chip plastic package body is a key link of the existing packaging technology, and the quality of the electroplating effect directly influences the performance and use of the chip.
At present, the process of electroplating two sides of the chip plastic package body is separated, namely, one side of the chip plastic package body is firstly subjected to electroplating treatment, and the other side of the chip plastic package body is then subjected to electroplating treatment.
Disclosure of Invention
The utility model aims to provide a double-sided electroplating structure of a chip plastic package body, which has the advantages of relatively simple preparation method, low production cost and high yield.
To achieve the purpose, the utility model adopts the following technical scheme:
in one aspect, a double-sided electroplating structure of a chip plastic package body is provided, including:
the chip plastic package body comprises a plurality of chips and a first plastic package layer for coating the chips; the chip plastic package body is provided with a plurality of through holes penetrating through the chip plastic package body and a plurality of blind holes exposing the I/O port of the chip along the thickness direction of the chip plastic package body;
the first seed layers are positioned on the side walls of the through holes, the side walls of the blind holes and the two sides of the chip plastic package body;
the first conductive column is filled in the through hole, the second conductive column is filled in the blind hole, and the first rewiring layer is positioned on the first seed layers at two sides of the chip plastic package body;
the first rewiring layer on one side of the chip plastic package body is connected with the I/O port of the chip through the second conductive column, and is connected with the first rewiring layer on the other side through the first conductive column.
In the utility model, the first rewiring layers on two sides of the chip plastic package body are synchronously connected through the first conductive posts filled in the through holes of the chip plastic package body, so that signal interconnection and penetration between functional chips are realized. Compared with the prior art, the preparation process flow of the double-sided electroplating structure of the chip plastic package body is simple, the production efficiency is high, the production cost is low, and the yield is improved.
In the utility model, the number of chips is at least two.
The first conductive column of the through hole, the second conductive column in the blind hole and the first rewiring layers on two sides of the chip plastic package body are prepared through double-sided electroplating by adopting a direct current electroplating or pulse electroplating method, so that signal interconnection and penetration between chips are realized.
As a preferable scheme of the double-sided electroplating structure of the chip plastic package body, the through holes are X-shaped through holes or vertical through holes, and preferably X-shaped through holes.
As one of the preferable schemes of the double-sided electroplating structure of the chip plastic package body, the double-sided electroplating structure further comprises an anti-oxidation layer with conductivity, wherein the anti-oxidation layer is positioned on one side, away from the chip plastic package body, of the first rewiring layer on two sides of the chip plastic package body.
As a preferred scheme of the double-sided electroplating structure of the chip plastic package body, the double-sided electroplating structure of the chip plastic package body further comprises:
the third conductive column is positioned on one side of the first rewiring layer on one side of the chip plastic package body;
the second plastic sealing layer is positioned on one side of the first rewiring layer and coats the third conductive column, and the end face of the third conductive column is exposed out of the second plastic sealing layer;
and the second redistribution layer is positioned on one side of the second plastic sealing layer and connected with the third conductive post.
As a preferred scheme of the double-sided electroplating structure of the chip plastic package body, the double-sided electroplating structure of the chip plastic package body further comprises:
the dielectric layer is arranged on two sides of the first plastic sealing layer respectively, and the dielectric layer is positioned between the first plastic sealing layer and the first seed layer. The overall strength of the product can be improved by providing a dielectric layer.
As a second preferred scheme of the double-sided electroplating structure of the chip plastic package body, the double-sided electroplating structure further comprises an anti-oxidation layer with conductivity, wherein the anti-oxidation layer is positioned on one side of the second redistribution layer away from the chip plastic package body and one side of the first redistribution layer away from the second redistribution layer.
In the utility model, the preparation method of the double-sided electroplating structure of the chip plastic package body comprises the following steps:
s10, preparing a chip plastic package body, and enabling the chip to be wrapped in a first plastic package layer;
s20, carrying out hole opening treatment on the chip plastic package body to form a through hole penetrating through the chip plastic package body and a blind hole exposing an I/O port of the chip;
s30, manufacturing a first conductive column in the through hole synchronously through double-sided electroplating, manufacturing a second conductive column in the blind hole, and manufacturing a first rewiring layer connected with the first conductive column and the second conductive column synchronously on the double sides of the chip plastic package body;
wherein, the double-sided electroplating adopts direct current electroplating or pulse electroplating.
The utility model can realize the synchronous manufacture of the first conductive column and the second conductive column in the through hole and the blind hole of the chip plastic package body and the synchronous manufacture of the first rewiring layer on the two sides of the chip plastic package body by opening the through hole and the blind hole of the chip plastic package body and matching with direct current plating or pulse plating, thereby realizing the signal interconnection and penetration between functional chips. Compared with the existing single-sided electroplating, the method has the advantages that the process flow can be shortened, the production efficiency is improved, the cost is reduced, and the yield can be correspondingly improved.
As a preferable scheme of the preparation method of the double-sided electroplating structure of the chip plastic package body, the through holes are X-shaped through holes or vertical through holes, and the preparation method is suitable for double-sided electroplating by adopting direct current electroplating or pulse electroplating.
Preferably, the through holes are X-shaped through holes, so that the double-sided electroplating effect can be further improved, and the product yield is improved.
As a preferable scheme of the preparation method of the double-sided electroplating structure of the chip plastic package body, the step S10 specifically comprises the following steps:
s10a, providing a carrier plate and a chip, and attaching the chip to the carrier plate;
s10b, adopting a plastic packaging material to carry out plastic packaging on the chip to form a first plastic packaging layer for coating the chip;
s10c, removing the carrier plate to obtain the chip plastic package body.
As another preferable scheme of the preparation method of the double-sided electroplating structure of the chip plastic package body,
the step S10 specifically includes the following steps:
s10a, providing a carrier plate and a chip, and attaching the chip to the carrier plate;
s10b, adopting a plastic packaging material to carry out plastic packaging on the chip to form a first plastic packaging layer for coating the chip;
s10c, removing the carrier plate;
and S10d, respectively preparing dielectric layers on two sides of the first plastic sealing layer to obtain the chip plastic sealing body.
Further, in S10a, a glue film is first attached to one side of the carrier, and then the front side (not limited to the front side, but also the back side) of the chip is fixed on the glue film by a chip mounter; wherein, the carrier plate material can be SUS, prepreg (BT), FR4, FR5, glass, PP, EMC, PI and the like; the adhesive film material includes, but is not limited to, any of temporary bonding adhesive, DAF film, PI film, dry film, ABF film, and ABF-like adhesive film.
Further, in S10b, the molding compound material includes, but is not limited to, any of EMC, ABF, PI, PP.
In step S10c, the carrier needs to be removed, and the adhesive film and the chip are separated.
Further, in S10d, dielectric layers are respectively prepared on two sides of the first molding layer, so as to obtain the chip molding body.
As a preferable scheme of the preparation method of the double-sided electroplating structure of the chip plastic package body, the step S20 specifically comprises the following steps: and a through hole is formed in the chip plastic package body along the thickness direction of the chip plastic package body at a position which avoids the chip, and a blind hole which enables the I/O port to be exposed is formed in the chip plastic package body at a position which corresponds to the I/O port of the chip.
Specifically, a drilling process is adopted to form a through hole penetrating up and down and a blind hole extending to an I/O port (output end) of the chip on the plastic sealing layer, and the drilling process comprises any one of laser drilling, mechanical drilling and mask covering Plasma tapping.
As a preferable scheme of the preparation method of the double-sided electroplating structure of the chip plastic package body, the step S30 specifically comprises the following steps:
s30a, manufacturing first seed layers on the side walls of the through holes and the blind holes and on two sides of the chip plastic package body along the thickness direction of the chip plastic package body;
s30b, attaching a first photosensitive film on the first seed layers positioned on two sides of the chip plastic package body, and enabling the first photosensitive film to cover part of the first seed layers;
s30c, electroplating is synchronously performed in the through hole, the blind hole and the first seed layers on the two sides of the chip plastic package body by adopting direct current electroplating or pulse electroplating, so that a first conductive column filled with the through hole, a second conductive column filled with the blind hole and a first rewiring layer positioned on the two sides of the chip plastic package body and connected with the first conductive column and the second conductive column are prepared.
Further, before the first seed layer is manufactured, the chip plastic package body after the opening is heated in a high vacuum state, the moisture and pollutants of the chip plastic package body are removed, and then the Ti-Cu seed layer with high adhesive force, excellent conductivity and uniform thickness is prepared on the two sides through magnetron sputtering. The magnetron sputtering Ti-Cu seed layer is a conventional technical means in the field, and is not described in detail. The first seed layer in the present utility model is not limited to the ti—cu seed layer, and may be a Ti seed layer.
After the first seed layer is manufactured, a first photosensitive film is stuck on the first seed layer at two sides of the chip plastic package body, and then a graphical window is formed through exposure and development;
and preparing a first conductive column in the through hole, preparing a second conductive column in the blind hole and preparing a first rewiring layer in the patterned window by adopting direct current electroplating or pulse electroplating.
For the product prepared by the step S10-30, the oxidation prevention layers can be respectively manufactured on the sides, far away from the chip plastic package body, of the first rewiring layers on the two sides of the product, so that the oxidation prevention effect on the first rewiring layers can be achieved, and meanwhile, the electric conductivity of the first rewiring layers is improved.
Specifically, the oxidation prevention layer is prepared by adopting a nickel-palladium-gold process, and has good oxidation resistance and conductivity.
As a preferable scheme of the preparation method of the double-sided electroplating structure of the chip plastic package body, the preparation method further comprises the step S40, and specifically comprises the following steps:
s40a, attaching a second photosensitive film on the first rewiring layer at one side of the chip plastic package body, and enabling part of the first rewiring layer to be exposed out of the second photosensitive film; specifically, a patterned window which exposes a portion of the first rewiring layer to the second photosensitive film is formed on the second photosensitive film by an exposure development technique;
s40b, manufacturing a third conductive column at the exposed position (namely a graphical window) of the first rewiring layer through electroplating;
s40c, removing the residual first photosensitive film and the residual second photosensitive film, and etching the exposed first seed layer;
s40d, performing plastic packaging treatment on the first rewiring layer and the third conductive column by adopting plastic packaging materials to form a second plastic packaging layer for coating the first rewiring layer and the third conductive column, and enabling one end face, far away from the first rewiring layer, of the third conductive column to be exposed out of the second plastic packaging layer;
s40e, manufacturing a second seed layer on the second plastic sealing layer, and connecting the second seed layer with the third conductive column;
s40f, sticking a third photosensitive film on the second seed layer, and exposing part of the second seed layer to the third photosensitive film; specifically, a patterned window which enables the second seed layer to be partially exposed out of the third photosensitive film is formed on the third photosensitive film through an exposure and development technology;
s40g, manufacturing a second redistribution layer by electroplating on one side (namely a patterned window) of the second seed layer exposed on the third photosensitive film;
and S40h, removing the residual third photosensitive film and etching away the part of the second seed layer exposed out of the second redistribution layer.
The second seed layer and the first seed layer have the same preparation process and can be a Ti-Cu seed layer or a Ti seed layer.
As another preferable scheme of the preparation method of the double-sided electroplating structure of the chip plastic package body, the preparation method further comprises the step S50 of respectively manufacturing an anti-oxidation layer with conductivity on the exposed sides of the first redistribution layer and the second redistribution layer, wherein the anti-oxidation layer is a Ni-Pd-Au film prepared through a nickel-palladium-gold process.
The utility model has the beneficial effects that: according to the utility model, through holes and blind holes are formed in the chip plastic package body, and direct current electroplating or pulse electroplating is matched, so that the first conductive columns and the second conductive columns can be synchronously prepared in the through holes and the blind holes of the chip plastic package body, and the first rewiring layers can be synchronously prepared on two sides of the chip plastic package body, thereby realizing signal interconnection and penetration between functional chips. Compared with the existing single-sided electroplating, the method shortens the process flow, improves the production efficiency, reduces the production cost of the double-sided electroplating structure of the chip plastic package body, and correspondingly improves the yield.
Drawings
In order to more clearly illustrate the technical solution of the embodiments of the present utility model, the drawings that are required to be used in the embodiments of the present utility model will be briefly described below. It is evident that the drawings described below are only some embodiments of the present utility model and that other drawings may be obtained from these drawings without inventive effort for a person of ordinary skill in the art.
Fig. 1 is a flowchart of a method for preparing a double-sided electroplating structure of a chip molding compound according to an embodiment of the utility model.
Fig. 2 is a schematic cross-sectional view of an adhesive film attached to a carrier according to an embodiment of the utility model.
Fig. 3 is a schematic cross-sectional view of a chip attached to a carrier by an adhesive film according to an embodiment of the utility model.
Fig. 4 is a schematic cross-sectional view of a chip according to an embodiment of the utility model after being adhered to a carrier by a plastic film for plastic packaging.
Fig. 5 is a schematic cross-sectional view of a chip molding package according to an embodiment of the utility model.
Fig. 6 is a schematic cross-sectional view of a chip molding package according to an embodiment of the utility model after forming an X-shaped through hole and a blind hole.
Fig. 7 is a schematic cross-sectional view of a first seed layer according to an embodiment of the present utility model.
Fig. 8 is a schematic cross-sectional view of a first photosensitive film formed on a first seed layer and exposed to light for development according to an embodiment of the present utility model.
Fig. 9 is a schematic cross-sectional view of an embodiment of the present utility model after preparing a first conductive pillar in an X-type through hole, preparing a second conductive pillar in a blind hole, and preparing a redistribution layer on a first seed layer on both sides of a chip molding.
Fig. 10 is a schematic cross-sectional view of a first redistribution layer with a second photosensitive film attached to the first redistribution layer to form a third conductive pillar according to an embodiment of the present utility model.
Fig. 11 is a schematic cross-sectional view of the first photosensitive film and the second photosensitive film after removing the residues according to the first embodiment of the present utility model.
Fig. 12 is a schematic cross-sectional view of a first redistribution layer and a third conductive pillar connected thereto after plastic packaging and thinning according to an embodiment of the present utility model.
Fig. 13 is a schematic cross-sectional view of a second plastic sealing layer after a second seed layer is formed on the second plastic sealing layer, a third photosensitive film is attached, and a second redistribution layer is formed according to an embodiment of the present utility model.
Fig. 14 is a schematic cross-sectional view of the third photosensitive film after removing the residual second seed layer and etching away the exposed second seed layer according to the first embodiment of the present utility model.
Fig. 15 is a schematic cross-sectional view of a double-sided electroplating structure of a chip molding compound according to an embodiment of the utility model.
Fig. 16 is a schematic cross-sectional view of a double-sided electroplating structure of a chip molding compound according to a second embodiment of the utility model.
Fig. 17 is a schematic cross-sectional view of a chip molding package according to a fifth embodiment of the utility model.
Fig. 18 is a schematic cross-sectional view of a chip molding package according to a fifth embodiment of the utility model after forming an X-shaped through hole and a blind hole.
Fig. 19 is a schematic cross-sectional view of a fifth embodiment of the utility model after preparing a first seed layer.
Fig. 20 is a schematic cross-sectional view of a fifth embodiment of the present utility model after a first photosensitive film is formed on a first seed layer and exposed to light for development.
Fig. 21 is a schematic cross-sectional view of a fifth embodiment of the present utility model after preparing a first conductive pillar in an X-shaped through hole, preparing a second conductive pillar in a blind hole, and preparing a redistribution layer on a first seed layer on both sides of a chip molding.
Fig. 22 is a schematic cross-sectional view of a fifth embodiment of the present utility model after a second photosensitive film is attached to a first redistribution layer on one side to prepare a third conductive pillar.
Fig. 23 is a schematic cross-sectional view of the fifth embodiment of the present utility model after removing the residual first photosensitive film and second photosensitive film.
Fig. 24 is a schematic cross-sectional view of a fifth embodiment of the present utility model after plastic packaging and thinning the first redistribution layer and the third conductive pillars connected thereto.
Fig. 25 is a schematic cross-sectional view of a fifth embodiment of the present utility model after a second seed layer is formed on a second molding layer, a third photosensitive film is attached, and a second redistribution layer is formed.
Fig. 26 is a schematic cross-sectional view of a fifth embodiment of the utility model after removing the residual third photosensitive film and etching away the exposed second seed layer.
Fig. 27 is a schematic cross-sectional view of a double-sided electroplating structure of a chip molding compound according to a fifth embodiment of the utility model.
In the figure:
1. a carrier plate; 2. an adhesive film; 3. a chip; 41. a first plastic layer; 411. a through hole; 412. a blind hole; 42. a second plastic layer; 51. a first seed layer; 52. a second seed layer; 61. a first photosensitive film; 62. a second photosensitive film; 63. a third photosensitive film; 71. a first conductive pillar; 72. a second conductive post; 73. a third conductive post; 81. a first rewiring layer; 82. a second rewiring layer; 9. an oxidation preventing layer; 10. a dielectric layer.
Detailed Description
The technical scheme of the utility model is further described below by the specific embodiments with reference to the accompanying drawings.
Wherein the drawings are for illustrative purposes only and are shown in schematic, non-physical, and not intended to be limiting of the present patent; for the purpose of better illustrating embodiments of the utility model, certain elements of the drawings may be omitted, enlarged or reduced and do not represent the size of the actual product; it will be appreciated by those skilled in the art that certain well-known structures in the drawings and descriptions thereof may be omitted.
The same or similar reference numbers in the drawings of embodiments of the utility model correspond to the same or similar components; in the description of the present utility model, it should be understood that, if the terms "upper", "lower", "left", "right", "inner", "outer", etc. indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, only for convenience in describing the present utility model and simplifying the description, rather than indicating or implying that the apparatus or elements being referred to must have a specific orientation, be constructed and operated in a specific orientation, so that the terms describing the positional relationships in the drawings are merely for exemplary illustration and should not be construed as limiting the present patent, and that the specific meaning of the terms described above may be understood by those of ordinary skill in the art according to specific circumstances.
In the description of the present utility model, unless explicitly stated and limited otherwise, the term "coupled" or the like should be interpreted broadly, as it may be fixedly coupled, detachably coupled, or integrally formed, as indicating the relationship of components; can be mechanically or electrically connected; can be directly connected or indirectly connected through an intermediate medium, and can be communication between the two parts or interaction relationship between the two parts. The specific meaning of the above terms in the present utility model will be understood in specific cases by those of ordinary skill in the art.
Example 1
As shown in fig. 1, the preparation method of the double-sided electroplating structure of the chip plastic package body in this embodiment is as follows:
step 1, adhering temporary bonding glue (adhesive film 2) on a carrier plate 1 made of FR4 material (as shown in figure 2);
step 2, fixing the back surfaces of the chips 3 on temporary bonding glue through a chip mounter (as shown in fig. 3);
step 3, using EMC molding compound to mold the chip 3 to form a first molding layer 41 (as shown in fig. 4) covering the chip;
step 4, removing the carrier plate 1, and removing the temporary bonding glue to obtain a chip plastic package (shown in figure 5);
step 5, performing hole opening treatment on the first plastic sealing layer 41 through a laser drilling process to form a plurality of X-shaped through holes 411 penetrating through the first plastic sealing layer 4 up and down and a plurality of blind holes 412 exposing the I/O ports of the chip 3 (as shown in fig. 6);
step 6, heating in a high vacuum state, removing moisture and pollutants of the chip plastic package body after opening, and preparing a Ti-Cu seed layer with high adhesive force, excellent conductivity and uniform thickness on two sides by magnetron sputtering, namely a first seed layer 51 (shown in figure 7);
step 7, attaching a first photosensitive film 61 to the exposed side of the first seed layer 51, and forming a patterned window on the first photosensitive film 61 by exposure and development (as shown in fig. 8);
step 8, preparing a first conductive post 71 in the X-shaped through hole 41, preparing a second conductive post 72 in the blind hole 42 and preparing a first rewiring layer 81 in the patterned window prepared in step 7 by adopting a pulse plating method (as shown in fig. 9);
step 9, attaching a second photosensitive film 62 on the first redistribution layer 81 near the front side of the chip 3, exposing and developing the second photosensitive film 62 to form a patterned window, and then electroplating copper deposition to obtain a third conductive post 73 (copper post) connected with the first redistribution layer 81 in the patterned window (as shown in fig. 10);
step 10, removing the residual first photosensitive film 61 and second photosensitive film 62, and etching away the exposed first seed layer 51 (see fig. 11);
step 11, plastic packaging is performed on the third conductive column 73 and the first redistribution layer 81 positioned below the third conductive column 73 by adopting an EMC plastic packaging material to form a second plastic packaging layer 42 which coats the third conductive column 73 and the first redistribution layer 81, and grinding treatment is performed on the second plastic packaging layer 42 so that the upper end face of the third conductive column 73 is exposed (refer to fig. 12);
step 12, continuing to sputter a second seed layer 52 (Ti-Cu seed layer) on the second plastic sealing layer 42, then attaching a third photosensitive film 63 on the second seed layer 52, performing exposure and development treatment, preparing a patterned window penetrating the third photosensitive film 63 on the third photosensitive film 63, and electroplating copper deposition in the patterned window to prepare a second redistribution layer 82 (refer to fig. 14);
step 13, removing the residual third photosensitive film 63 and etching away the exposed second seed layer 52 (refer to fig. 14);
in step 14, an oxidation preventing layer 9 is respectively plated on the surfaces of the exposed first redistribution layer 81 and the exposed second redistribution layer 82 by a nickel-palladium-gold process, so as to obtain the double-sided electroplating structure of the chip plastic package body as shown in fig. 15.
As shown in fig. 15; the double-sided electroplating structure of the chip plastic package body in the embodiment comprises:
the chip plastic package body comprises a plurality of chips 3 and a first plastic package layer 41 for coating the chips 3; the first plastic sealing layer 41 is provided with a plurality of through holes 411 penetrating through the first plastic sealing layer 41 and a plurality of blind holes 412 exposing the I/O ports of the chip 3 along the thickness direction thereof;
the first seed layers 51 are positioned on the side walls of the through holes 411, the side walls of the blind holes 412 and the two sides of the first plastic sealing layer 41;
the first conductive pillars 71 filled in the through holes 411, the second conductive pillars 72 filled in the blind holes 412, and the first redistribution layer on the first seed layer 51 on both sides of the first molding layer 41;
the first redistribution layer 81 on one side of the first plastic sealing layer 41 is connected to the I/O port of the chip 3 through the second conductive pillar 72, and is connected to the first redistribution layer 81 on the other side through the first conductive pillar 71.
In the present utility model, the number of chips 3 is at least two.
The first conductive pillars 71 of the through holes 411, the second conductive pillars 72 in the blind holes 412, and the first redistribution layer 81 on both sides of the chip plastic package are manufactured by double-sided electroplating through a pulse electroplating method, so as to realize signal interconnection and penetration between the chips 3.
Further, the through hole 411 is an X-shaped through hole, and the efficiency of double-sided electroplating and the yield of products can be improved by adopting the X-shaped through hole.
Further, the double-sided electroplating structure of the chip plastic package body further comprises:
a third conductive pillar 73, the third conductive pillar 73 being located at one side of the first redistribution layer 81 at one side of the first molding layer 41;
a second molding layer 42, wherein the second molding layer 42 is located at one side of the first redistribution layer 81 and covers the third conductive pillars 73, and an end surface of the third conductive pillars 73 is exposed to the second molding layer 42;
a second seed layer 52 located on one side of the second molding layer 42 and connected to the third conductive pillars 73, and a second redistribution layer 82 located on the second seed layer 52.
Further, the double-sided electroplating structure of the chip plastic package further comprises an oxidation preventing layer 9 with conductivity, wherein the oxidation preventing layer 9 is positioned on the exposed side of the second redistribution layer 82 and on the exposed side of the first redistribution layer 81.
Example two
The preparation method of the double-sided electroplating structure of the chip plastic package body of the embodiment is basically the same as that of the first embodiment, and the difference is that the circuit structure of the embodiment is a single-layer circuit structure obtained by double-sided pulse electroplating.
Specifically, the preparation method of the double-sided electroplating structure of the chip plastic package body in the embodiment is as follows:
step 1, adhering temporary bonding glue (adhesive film 2) on a carrier plate 1 made of FR4 material (as shown in figure 2);
step 2, fixing the back surfaces of the chips 3 on temporary bonding glue through a chip mounter (as shown in fig. 3);
step 3, using EMC molding compound to mold the chip 3 to form a first molding layer 41 (as shown in fig. 4) covering the chip;
step 4, removing the carrier plate 1, and removing the temporary bonding glue to obtain a chip plastic package (shown in figure 5);
step 5, performing hole opening treatment on the first plastic sealing layer 41 through a laser drilling process to form a plurality of X-shaped through holes 411 penetrating through the first plastic sealing layer 4 up and down and a plurality of blind holes 412 exposing the I/O ports of the chip 3 (as shown in fig. 6);
step 6, heating in a high vacuum state, removing moisture and pollutants of the chip plastic package body after opening, and preparing a Ti-Cu seed layer with high adhesive force, excellent conductivity and uniform thickness on two sides by magnetron sputtering, namely a first seed layer 51 (shown in figure 7);
step 7, attaching a first photosensitive film 61 to the exposed side of the first seed layer 51, and forming a patterned window on the first photosensitive film 61 by exposure and development (as shown in fig. 8);
step 8, preparing a first conductive post 71 in the X-shaped through hole 41, preparing a second conductive post 72 in the blind hole 42 and preparing a first rewiring layer 81 in the patterned window prepared in step 7 by adopting a direct current electroplating method (as shown in fig. 9);
step 9, removing the residual first photosensitive film 61 and etching away the exposed first seed layer 51;
step 10, plating an oxidation preventing layer 9 on the surface of the exposed first redistribution layer 81 by a nickel-palladium-gold process, so as to obtain the double-sided electroplating structure of the chip plastic package body as shown in fig. 16.
Specifically, the double-sided electroplating structure of the chip plastic package body in the embodiment includes:
the chip plastic package body comprises a plurality of chips 3 and a first plastic package layer 41 for coating the chips 3; the first plastic sealing layer 41 is provided with a plurality of through holes 411 penetrating through the first plastic sealing layer 41 and a plurality of blind holes 412 exposing the I/O ports of the chip 3 along the thickness direction thereof;
the first seed layers 51 are positioned on the side walls of the through holes 411, the side walls of the blind holes 412 and the two sides of the first plastic sealing layer 41;
the first conductive pillars 71 filled in the through holes 411, the second conductive pillars 72 filled in the blind holes 412, and the first redistribution layer on the first seed layer 51 on both sides of the first molding layer 41;
the first redistribution layer 81 on one side of the first plastic sealing layer 41 is connected to the I/O port of the chip 3 through the second conductive pillar 72, and is connected to the first redistribution layer 81 on the other side through the first conductive pillar 71.
In the present utility model, the number of chips 3 is at least two.
The first conductive pillars 71 of the through holes 411, the second conductive pillars 72 in the blind holes 412, and the first redistribution layer 81 on both sides of the chip plastic package are manufactured by double-sided electroplating through a pulse electroplating method, so as to realize signal interconnection and penetration between the chips 3.
Further, the through hole 411 is an X-shaped through hole, and the efficiency of double-sided electroplating and the yield of products can be improved by adopting the X-shaped through hole.
Further, the double-sided electroplating structure of the chip plastic package further comprises an oxidation preventing layer 9 with conductivity, wherein the oxidation preventing layer 9 is positioned on the exposed side of the second redistribution layer 82 and on the exposed side of the first redistribution layer 81.
Example III
The present embodiment is substantially the same as the first embodiment, except that the through hole formed in the first plastic layer is a vertical through hole, and specifically, the through hole is circular. In other embodiments, the vertical through hole is not limited to a circle, and may be a polygon.
The preparation method of the double-sided electroplating structure of the chip plastic package body in this embodiment is the same as that in the first embodiment, and detailed description thereof is omitted.
Example IV
The difference between the present embodiment and the first embodiment is that the third conductive pillar, the second molding layer, the second seed layer and the second redistribution layer are all located on one side of the first redistribution layer on the other side, and the specific preparation method may refer to the first embodiment and is not described again.
Example five
The preparation method of the double-sided electroplating structure of the chip plastic package of the present embodiment is basically the same as that of the first embodiment, except that the dielectric layer 10 is added.
Specifically, the preparation method of the double-sided electroplating structure of the chip plastic package body in the embodiment is as follows:
as shown in fig. 1, the preparation method of the double-sided electroplating structure of the chip plastic package body in this embodiment is as follows:
step 1, adhering temporary bonding glue (adhesive film 2) on a carrier plate 1 made of FR4 material (as shown in figure 2);
step 2, fixing the back surfaces of the chips 3 on temporary bonding glue through a chip mounter (as shown in fig. 3);
step 3, using EMC molding compound to mold the chip 3 to form a first molding layer 41 (as shown in fig. 4) covering the chip;
step 4, removing the carrier plate 1, preparing dielectric layers 10 on two sides of the first plastic sealing layer 41 respectively, and removing temporary bonding glue to obtain a chip plastic sealing body (as shown in fig. 17); the dielectric layer material can be ABF, P.P, EMC, PI, etc.;
step 5, performing hole opening treatment on the first plastic sealing layer 41 and the dielectric layer 10 through a laser drilling process to form a plurality of X-shaped through holes 411 penetrating the first plastic sealing layer 4 and the dielectric layer 10 up and down and a plurality of blind holes 412 exposing the I/O ports of the chip 3 (as shown in fig. 18);
step 6, heating in a high vacuum state, removing moisture and pollutants of the chip plastic package body after opening, and preparing a Ti-Cu seed layer with high adhesive force, excellent conductivity and uniform thickness on two sides by magnetron sputtering, namely a first seed layer 51 (shown in figure 19);
step 7, attaching a first photosensitive film 61 to the exposed side of the first seed layer 51, and forming a patterned window on the first photosensitive film 61 by exposure and development (as shown in fig. 20);
step 8, preparing a first conductive post 71 in the X-shaped through hole 41, preparing a second conductive post 72 in the blind hole 42 and preparing a first rewiring layer 81 in the patterned window prepared in step 7 by adopting a pulse plating method (as shown in fig. 21);
step 9, attaching a second photosensitive film 62 on the first redistribution layer 81 near the front side of the chip 3, exposing and developing the second photosensitive film 62 to form a patterned window, and then electroplating copper deposition to obtain a third conductive post 73 (copper post) connected with the first redistribution layer 81 in the patterned window (as shown in fig. 22);
step 10, removing the residual first photosensitive film 61 and second photosensitive film 62, and etching away the exposed first seed layer 51 (see fig. 23);
step 11, plastic packaging is performed on the third conductive column 73 and the first redistribution layer 81 positioned below the third conductive column 73 by adopting an EMC plastic packaging material to form a second plastic packaging layer 42 which coats the third conductive column 73 and the first redistribution layer 81, and grinding treatment is performed on the second plastic packaging layer 42 to expose the upper end face of the third conductive column 73 (refer to fig. 24);
step 12, continuing to sputter a second seed layer 52 (Ti-Cu seed layer) on the second plastic sealing layer 42, then attaching a third photosensitive film 63 on the second seed layer 52, performing exposure and development treatment, preparing a patterned window penetrating the third photosensitive film 63 on the third photosensitive film 63, and electroplating copper deposition in the patterned window to prepare a second redistribution layer 82 (refer to fig. 25);
step 13, removing the residual third photosensitive film 63 and etching away the exposed second seed layer 52 (refer to fig. 26);
in step 14, an oxidation preventing layer 9 is respectively plated on the surfaces of the exposed first redistribution layer 81 and the exposed second redistribution layer 82 by a nickel-palladium-gold process, so as to obtain the double-sided electroplating structure of the chip plastic package body as shown in fig. 27.
As shown in fig. 27; the double-sided electroplating structure of the chip plastic package body in the embodiment comprises:
the chip plastic package body comprises a plurality of chips 3, a first plastic package layer 41 for coating the chips 3 and dielectric layers 10 positioned on two sides of the first plastic package layer 41; the first plastic sealing layer 41 and the dielectric layer 10 are provided with a plurality of through holes 411 penetrating the first plastic sealing layer 41 and the dielectric layer 10 and a plurality of blind holes 412 exposing the I/O ports of the chip 3;
a first seed layer 51 located on the sidewall of the through hole 411, the sidewall of the blind hole 412, and both sides of the dielectric layer 10;
a first conductive post 71 filled in the via 411, a second conductive post 72 filled in the blind via 412, and a first re-wiring layer on the first seed layer 51 on both sides of the dielectric layer 10;
the first redistribution layer 81 on one side of the dielectric layer 10 is connected to the I/O port of the chip 3 through the second conductive pillar 72, and is connected to the first redistribution layer 81 on the other side through the first conductive pillar 71.
In the present utility model, the number of chips 3 is at least two.
The first conductive pillars 71 of the through holes 411, the second conductive pillars 72 in the blind holes 412, and the first redistribution layer 81 on both sides of the chip plastic package are manufactured by double-sided electroplating through a pulse electroplating method, so as to realize signal interconnection and penetration between the chips 3.
Further, the through hole 411 is an X-shaped through hole, and the efficiency of double-sided electroplating and the yield of products can be improved by adopting the X-shaped through hole.
Further, the double-sided electroplating structure of the chip plastic package body further comprises:
a third conductive pillar 73, the third conductive pillar 73 being located at one side of the first redistribution layer 81 at one side of the first molding layer 41;
a second molding layer 42, wherein the second molding layer 42 is located at one side of the first redistribution layer 81 and covers the third conductive pillars 73, and an end surface of the third conductive pillars 73 is exposed to the second molding layer 42;
a second seed layer 52 located on one side of the second molding layer 42 and connected to the third conductive pillars 73, and a second redistribution layer 82 located on the second seed layer 52.
Further, the double-sided electroplating structure of the chip plastic package further comprises an oxidation preventing layer 9 with conductivity, wherein the oxidation preventing layer 9 is positioned on the exposed side of the second redistribution layer 82 and on the exposed side of the first redistribution layer 81.
It should be understood that the above description is only illustrative of the preferred embodiments of the present utility model and the technical principles employed. It will be apparent to those skilled in the art that various modifications, equivalents, variations, and the like can be made to the present utility model. However, such modifications are intended to fall within the scope of the present utility model without departing from the spirit of the present utility model. In addition, some terms used in the description and claims of the present utility model are not limiting, but are merely for convenience of description.
Claims (6)
1. The utility model provides a two-sided electroplating structure of chip plastic envelope body which characterized in that includes:
the chip plastic package body comprises a plurality of chips and a first plastic package layer for coating the chips; the chip plastic package body is provided with a plurality of through holes penetrating through the chip plastic package body and a plurality of blind holes exposing the I/O port of the chip along the thickness direction of the chip plastic package body;
the first seed layers are positioned on the side walls of the through holes, the side walls of the blind holes and the two sides of the chip plastic package body;
the first conductive column is filled in the through hole, the second conductive column is filled in the blind hole, and the first rewiring layer is positioned on the first seed layers at two sides of the chip plastic package body;
the first rewiring layer on one side of the chip plastic package body is connected with the I/O port of the chip through the second conductive column, and is connected with the first rewiring layer on the other side through the first conductive column.
2. The double-sided plating structure of a chip molding compound of claim 1, wherein the through hole is an X-shaped through hole or a vertical through hole.
3. The dual-sided plating structure of a chip molding compound of claim 1, further comprising an oxidation preventing layer having electrical conductivity, wherein the oxidation preventing layer is located on a side of the first redistribution layer on both sides of the chip molding compound away from the chip molding compound.
4. The double-sided plating structure of a chip molding compound of claim 1, further comprising:
the third conductive column is positioned on one side of the first rewiring layer on one side of the chip plastic package body;
the second plastic sealing layer is positioned on one side of the first rewiring layer and coats the third conductive column, and the end face of the third conductive column is exposed out of the second plastic sealing layer;
and the second redistribution layer is positioned on one side of the second plastic sealing layer and connected with the third conductive post.
5. The double-sided plating structure of a chip molding compound of claim 4, further comprising:
the dielectric layer is arranged on two sides of the first plastic sealing layer respectively, and the dielectric layer is positioned between the first plastic sealing layer and the first seed layer.
6. The double-sided plating structure of a chip molding compound of claim 4, further comprising an oxidation preventing layer having conductivity, the oxidation preventing layer being located on a side of the second redistribution layer away from the chip molding compound and on a side of the first redistribution layer away from the second redistribution layer.
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