CN219485150U - Wafer moisturizing vertical immersion multi-station lifting water tank - Google Patents
Wafer moisturizing vertical immersion multi-station lifting water tank Download PDFInfo
- Publication number
- CN219485150U CN219485150U CN202320377190.3U CN202320377190U CN219485150U CN 219485150 U CN219485150 U CN 219485150U CN 202320377190 U CN202320377190 U CN 202320377190U CN 219485150 U CN219485150 U CN 219485150U
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- Prior art keywords
- lifting
- water tank
- overflow water
- wafer
- moisturizing
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 72
- 230000003020 moisturizing effect Effects 0.000 title claims abstract description 19
- 238000007654 immersion Methods 0.000 title claims abstract description 13
- 239000000178 monomer Substances 0.000 claims abstract description 29
- 230000007246 mechanism Effects 0.000 claims abstract description 20
- 238000001514 detection method Methods 0.000 claims description 9
- 230000000712 assembly Effects 0.000 claims description 3
- 238000000429 assembly Methods 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 2
- 235000012431 wafers Nutrition 0.000 abstract description 33
- 238000013461 design Methods 0.000 abstract description 8
- 230000009471 action Effects 0.000 abstract description 5
- 239000007921 spray Substances 0.000 abstract description 4
- 238000004321 preservation Methods 0.000 abstract description 2
- 238000005498 polishing Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 4
- 238000007599 discharging Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 238000013459 approach Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
The utility model relates to a wafer moisturizing vertical immersion multi-station lifting water tank, which comprises a overflow water tank; the bottom of the overflow water tank is provided with a water inlet; a plurality of lifting monomers are arranged on one side of the inside of the overflow water tank; the inside of the overflow water tank is also provided with a positioning groove connected with the lifting monomer; the outer side of the overflow water tank is provided with a lifting mechanism; the other side of the lifting single body opposite to the positioning groove is connected with the lifting mechanism. The plurality of lifting monomers are arranged in the overflow water tank, and the lifting mechanism and the positioning groove on the lifting monomers are matched, so that a plurality of wafers can be conveniently placed in the positioning groove, and the wafers are completely immersed in the overflow water tank for moisture preservation under the action of the lifting mechanism; compared with the existing spray head type moisturizing mode, the design can obtain better moisturizing effect and reduce the water vapor splashing phenomenon; meanwhile, the vertical multi-station compact type design is adopted, so that the space can be greatly saved compared with the existing horizontal type cache design.
Description
Technical Field
The utility model relates to a lifting water tank, in particular to a wafer moisturizing vertical immersion multi-station lifting water tank.
Background
In the wafer manufacturing process, some alkaline polishing solution remains on the surface of the wafer after the wafer is ground and polished, so that the surface of the wafer needs to be kept wet all the time after the grinding and polishing, so that the surface of the wafer is kept in a wet and non-dry state, otherwise, the subsequent cleaning process cannot be cleaned cleanly, and the product is unqualified. At present, in the production process of polishing equipment, the polishing equipment is divided into manual loading and unloading and automatic loading and unloading, and when the manual loading and unloading, the special suction tool is used for manually taking down the wafer from the polishing equipment, and in order to ensure the wetting of the surface of the wafer, the wafer can be immediately and vertically placed into a wafer transfer water tank filled with water. In the automatic feeding and discharging production process, when the wafer is taken from the polishing equipment after polishing is finished, the wafer is in the groove, and the wafer can be taken automatically only by adopting a sucker type manipulator; however, the sucker type mechanical arm is limited by the size of the water tank after sucking the wafer from the polishing equipment, the sucker type mechanical arm can not directly put the wafer into the transfer water tank, the wafer needs to be put in a buffer station first, then the wafer is vertically put into the material frame by other thin mechanical arms, and the structure of the buffer station commonly used at present is as follows: the wafer is horizontally placed on a plurality of support columns, tapered guide and bearing steps are processed on the support columns, and water is sprayed on the wafer at a spray nozzle to preserve moisture (as shown in figure 3). The disadvantage of this approach is that: when a plurality of cache requirements exist, the upper graph cache device is adopted to have larger space requirements, the number of the spray heads is also more, the cost is higher, and the material taking and discharging mechanical arm is required to have larger material taking and discharging stroke.
Therefore, further improvements are needed.
Disclosure of Invention
Therefore, the utility model provides the wafer moisturizing vertical immersion multi-station lifting water tank for overcoming the defects in the prior art, which has compact structural design, reduces space occupation rate, has better moisturizing effect by fully immersing the wafer, reduces water vapor splashing phenomenon, meets the cache requirement of a plurality of wafers, and has stable water entering and shorter dead time.
The utility model can be realized by the following technical scheme:
the wafer moisturizing vertical immersion multi-station lifting water tank comprises a overflow water tank; the bottom of the overflow water tank is provided with a water inlet; a plurality of lifting monomers are arranged on one side of the inside of the overflow water tank; the inside of the overflow water tank is also provided with a positioning groove connected with the lifting monomer; the outer side of the overflow water tank is provided with a lifting mechanism; the other side of the lifting single body opposite to the positioning groove is connected with the lifting mechanism.
Preferably, the lifting monomer is provided with a horizontal section and a vertical section; the horizontal section and the vertical section are distributed in an inverted L shape; the vertical section is positioned in the overflow water tank; the horizontal section is positioned at the top of the vertical section and is connected with the lifting mechanism; the outer side of the overflow water tank is provided with a lifting base plate.
Preferably, the lifting mechanism comprises a guide rod and a push rod which are arranged at the bottom of each horizontal section; the lifting cylinder is arranged at the bottom of the lifting substrate; the lifting cylinders are in one-to-one correspondence with the horizontal sections; and guide sleeve assemblies are arranged on two sides of each lifting part.
Preferably, the lower side of the guide rod is slidingly connected in the corresponding guide sleeve assembly; the bottom of the push rod is connected with the lifting cylinder; the lifting base plate is provided with through holes relative to the guide rod and the push rod.
Preferably, a lifting monomer guide groove is arranged at the other side of the inner part of the overflow water groove, which is opposite to the vertical section; the lifting monomer guide grooves are in one-to-one correspondence with the lifting monomers.
Preferably, one side of the positioning groove is connected with the vertical section, and the other side of the positioning groove is connected in the lifting single body guiding groove in a sliding manner; the positioning groove is an arc groove.
Preferably, the other side of the lifting base plate opposite to the overflow water tank is also provided with a mounting plate; the mounting plate is provided with a lifting detection sensor; the lifting detection sensors are in one-to-one correspondence with the lifting monomers.
The utility model has the following beneficial effects: the plurality of lifting monomers are arranged in the overflow water tank, and the lifting mechanism and the positioning groove on the lifting monomers are matched, so that a plurality of wafers can be conveniently placed in the positioning groove, and the wafers are completely immersed in the overflow water tank for moisture preservation under the action of the lifting mechanism; compared with the existing spray head type moisturizing mode, the design can obtain better moisturizing effect and reduce the water vapor splashing phenomenon; meanwhile, a vertical multi-station compact design is adopted, so that compared with the existing horizontal cache design, the space can be greatly saved; in addition, the requirement of multiple caches is met, each lifting monomer can be independently controlled, and the use flexibility is high; under the action of a plurality of guide sleeves (grooves), the lifting and water feeding processes are stable, and the wafer dead time is shorter.
Secondly, under the cooperation of the lifting detection sensor, the lifting state of the air cylinder can be mastered in real time; and the overflow water tank adopts a mode of supplying water from the lower part and overflowing from the upper part in an open way, so that foreign matters in the tank can be discharged along with overflow of the water, and the cleanliness of the water in the tank is maintained.
Drawings
Fig. 1 is a schematic view of an assembly structure of the present utility model.
Fig. 2 is a schematic view of another orientation.
Fig. 3 is a schematic structural diagram of the lifting unit.
Fig. 4 is a schematic diagram of a buffer station in the prior art.
In the figure: 1 is an overflow water tank, 2 is a water inlet, 3 is a lifting monomer, 3.1 is a horizontal section, 3.2 is a vertical section, 4 is a positioning groove, 5 is a lifting base plate, 6 is a guide rod, 7 is a push rod, 8 is a lifting cylinder, 9 is a guide sleeve assembly, 10 is a lifting monomer guide groove, 11 is a mounting plate, and 12 is a lifting detection sensor.
Detailed Description
The following description of the embodiments of the present utility model will be made clearly and fully with reference to the accompanying drawings, in which it is evident that the embodiments described are only some, but not all embodiments of the utility model. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to be within the scope of the utility model.
Terms used herein, including technical and scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art, provided that the terms are not defined differently. It is to be understood that terms defined in commonly used dictionaries have meanings that are consistent with the meaning of the terms in the prior art.
Referring to fig. 1-3, a wafer moisturizing vertical immersion multi-station lifting water tank comprises a overflow water tank 1; a water inlet 2 is formed in the bottom of the overflow water tank 1; a plurality of lifting monomers 3 are arranged on one side of the inside of the overflow water tank 1; the inside of the overflow water tank 1 is also provided with a positioning groove 4 connected with the lifting monomer 3; the outer side of the overflow water tank 1 is provided with a lifting mechanism; the other side of the lifting single body 3 opposite to the positioning groove 4 is connected with a lifting mechanism.
Further, the lifting single body 3 is provided with a horizontal section 3.1 and a vertical section 3.2; the horizontal section 3.1 and the vertical section 3.2 are distributed in an inverted L shape; the vertical section 3.2 is positioned in the overflow water tank 1; the horizontal section 3.1 is positioned at the top of the vertical section 3.2 and is connected with the lifting mechanism; the outer side part of the overflow water tank 1 is provided with a lifting base plate 5.
In this embodiment, due to the inverted L-shaped design of the combination of the horizontal section 3.1 and the vertical section 3.2 of the lifting unit 3, when the horizontal section 3.1 moves under the action of the lifting mechanism, the vertical section 3.2 has a deeper sinking depth compared with the horizontal section 3.1, so when the lifting mechanism drives the horizontal section 3.1 to descend, the vertical section 3.2 can descend to a deeper depth, thereby achieving the purpose of completely immersing the wafer in the groove; while rising, the vertical section 3.2 can also rise to the water surface.
Further, the lifting mechanism comprises a guide rod 6 and a push rod 7 which are arranged at the bottom of each horizontal section; the lifting base plate 5 is provided with a lifting cylinder 8; the lifting cylinders 8 are in one-to-one correspondence with the horizontal sections 3.1; guide sleeve assemblies 9 are arranged on two sides of each lifting cylinder 8.
In the embodiment, the lifting monomer is linked with the lifting cylinder through a horizontal plate 3.1; and through the cooperation of guide bar 6 and uide bushing subassembly 9, realize the spacing of lift in-process.
Further, the lower side of the guide rod 6 is slidingly connected in the corresponding guide sleeve assembly 9; the bottom of the push rod 7 is connected with a lifting cylinder 8; the lifting base plate 5 is provided with through holes relative to the guide rod 6 and the push rod 7.
Specifically, the lifting cylinder 8 applies power to the horizontal section 3.1 through the push rod 7, and then drives the corresponding lifting monomer to perform lifting motion, so that the wafer is immersed in the groove or lifted above the liquid level under the action of the lifting monomer. Meanwhile, the elevation guide for each elevation unit is not limited to the single-sided guide bar and guide bush assembly 9. The method comprises the following steps:
further, a lifting single body guide groove 10 is arranged at the other side of the inner part of the overflow water tank 1, which is opposite to the vertical section 3.2; the lifting single body guide grooves 10 are in one-to-one correspondence with the lifting single bodies 3.
Further, one side of the positioning groove 4 is connected with the vertical section 3.2, and the other side is connected in the lifting single body guiding groove 10 in a sliding way; the positioning groove 4 is an arc groove.
Specifically, because the positioning groove 4 is fixedly connected with the vertical section 3.2, the lifting single body guiding groove 10 can guide and limit the lifting single body 3 while lifting and limiting the positioning groove 4. And the lifting monomer is guided from two directions by being matched with the guide rod and the guide sleeve assembly.
Further, the other side of the lifting base plate opposite to the overflow water tank 1 is also provided with a mounting plate 11; the mounting plate 11 is provided with a lifting detection sensor 12; the lifting detection sensors are in one-to-one correspondence with the lifting monomers.
Specifically, the lift detection sensor 12 is a proximity sensor, and can detect a stroke in real time.
Finally, it is noted that the above embodiments are only for illustrating the technical solution of the present utility model and not for limiting the same, and although the present utility model has been described in detail with reference to the preferred embodiments, it should be understood by those skilled in the art that modifications and equivalents may be made thereto without departing from the spirit and scope of the technical solution of the present utility model, which is intended to be covered by the scope of the claims of the present utility model.
Claims (7)
1. The utility model provides a vertical submergence multistation lifting water tank of wafer moisturizing which characterized in that: comprises a overflow water tank; the bottom of the overflow water tank is provided with a water inlet; a plurality of lifting monomers are arranged on one side of the inside of the overflow water tank; the inside of the overflow water tank is also provided with a positioning groove connected with the lifting monomer; the outer side of the overflow water tank is provided with a lifting mechanism; the other side of the lifting single body opposite to the positioning groove is connected with the lifting mechanism.
2. The wafer moisturizing vertical immersion multi-station lifting water tank according to claim 1, wherein: the lifting monomer is provided with a horizontal section and a vertical section; the horizontal section and the vertical section are distributed in an inverted L shape; the vertical section is positioned in the overflow water tank; the horizontal section is positioned at the top of the vertical section and is connected with the lifting mechanism; the outer side of the overflow water tank is provided with a lifting base plate.
3. The wafer moisturizing vertical immersion multi-station lifting water tank according to claim 2, wherein: the lifting mechanism comprises a guide rod and a push rod which are arranged at the bottom of each horizontal section; the lifting cylinder is arranged at the bottom of the lifting substrate; the lifting cylinders are in one-to-one correspondence with the horizontal sections; and guide sleeve assemblies are arranged on two sides of each lifting cylinder.
4. A wafer moisturizing vertical immersion multi-station lifting water tank as recited in claim 3, wherein: the lower side of the guide rod is slidingly connected into the corresponding guide sleeve assembly; the bottom of the push rod is connected with the lifting cylinder; the lifting base plate is provided with through holes relative to the guide rod and the push rod.
5. The wafer moisturizing vertical immersion multi-station lifting water tank as set forth in claim 4, wherein: a lifting single guide groove is formed in the other side, opposite to the vertical section, of the inner part of the overflow water groove; the lifting monomer guide grooves are in one-to-one correspondence with the lifting monomers.
6. The wafer moisturizing vertical immersion multi-station lifting water tank according to claim 5, wherein: one side of the positioning groove is connected with the vertical section, and the other side of the positioning groove is connected in the lifting single body guide groove in a sliding manner; the positioning groove is an arc groove.
7. The wafer moisturizing vertical immersion multi-station lifting water tank as set forth in claim 6, wherein: the other side of the lifting base plate, which is opposite to the overflow water tank, is also provided with a mounting plate; the mounting plate is provided with a lifting detection sensor; the lifting detection sensors are in one-to-one correspondence with the lifting monomers.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320377190.3U CN219485150U (en) | 2023-03-03 | 2023-03-03 | Wafer moisturizing vertical immersion multi-station lifting water tank |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202320377190.3U CN219485150U (en) | 2023-03-03 | 2023-03-03 | Wafer moisturizing vertical immersion multi-station lifting water tank |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN219485150U true CN219485150U (en) | 2023-08-08 |
Family
ID=87509926
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202320377190.3U Active CN219485150U (en) | 2023-03-03 | 2023-03-03 | Wafer moisturizing vertical immersion multi-station lifting water tank |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN219485150U (en) |
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2023
- 2023-03-03 CN CN202320377190.3U patent/CN219485150U/en active Active
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| Date | Code | Title | Description |
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| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP03 | Change of name, title or address | ||
| CP03 | Change of name, title or address |
Address after: Room 546, No. 8, Qingzheng Street, Qingyundian, Daxing District, Beijing 102600 (cluster registration) Patentee after: Beijing Riyang Hongchuang Intelligent Equipment Co.,Ltd. Country or region after: China Address before: Room 546, No. 8, Qingzheng Street, Qingyundian, Daxing District, Beijing 102600 (cluster registration) Patentee before: BEIJING SUNT TECHNOLOGY CO.,LTD. Country or region before: China |