CN219417830U

CN219417830U - Leveling device for light source layer and optical system layer

Info

Publication number: CN219417830U
Application number: CN202320017011.5U
Authority: CN
Inventors: 邓煌辉; 杨光; 张豹
Original assignee: Beijing U Precision Tech Co Ltd
Current assignee: Beijing U Precision Tech Co Ltd
Priority date: 2023-01-04
Filing date: 2023-01-04
Publication date: 2023-07-25
Anticipated expiration: 2033-01-04

Abstract

The utility model relates to a leveling device for a light source layer and an optical system layer, and relates to the technical field of wafer alignment verification devices. The light source layer and optical system layer leveling device comprises a fixing frame, wherein an optical system layer, a light source layer and an adjusting layer are sequentially arranged on the fixing frame from top to bottom, at least three height-adjustable lifting adjusting units are arranged on the adjusting layer, and any lifting adjusting unit can be in contact with the light source layer and adjust the inclination state of the light source layer. The device is used for adjusting the optical system layer and the transmission light source layer, so that the optical system layer and the transmission light source layer can be kept in a mutually parallel state, the accuracy of east control positioning of the optical system layer and the transmission light source layer is improved, and the imaging effect is improved.

Description

Leveling device for light source layer and optical system layer

Technical Field

The utility model relates to the technical field of wafer alignment verification devices, in particular to a leveling device for a light source layer and an optical system layer.

Background

In the prior art, the alignment accuracy of all the mark points on a 12-inch wafer is detected and evaluated, and a wafer alignment verification device is generally adopted, that is, an infrared optical system and a transmission light source are required to scan all the mark points on the wafer and acquire images. Typically, the wafer is fixed, and an infrared optical system layer is placed directly over the wafer to beat the wafer pair, and the infrared optical system is movable in both directions X, Y, with the stroke taking into account all the mark points on the wafer. The transmissive light source layer is placed directly under the wafer in Fang Angshi wafer pairs to provide light source illumination, and the transmissive light source can move in both X, Y directions, with the stroke taking into account all of the mark points on the wafer. However, in the Z direction, there is an error in the thickness of the single wafer, and the infrared optical system objective lens needs to adjust the depth of field focusing mark point. The optical system layer and the transmission light source layer are mutually independent, and the X coordinate, the Y coordinate and the XY plane of the optical system layer and the transmission light source layer are difficult to be completely parallel by the respective Cartesian coordinate systems, so that the optical system layer and the transmission light source layer are inaccurate in motion control positioning and poor in imaging effect.

Disclosure of Invention

The utility model provides a leveling device for a light source layer and an optical system layer, which is used for adjusting the optical system layer and a transmission light source layer, so that the optical system layer and the transmission light source layer can be kept in a mutually parallel state, the accuracy of east control positioning of the optical system layer and the transmission light source layer is improved, and the imaging effect is improved.

The utility model provides a leveling device for a light source layer and an optical system layer, which comprises a fixing frame, wherein the fixing frame is sequentially provided with the optical system layer, the light source layer and an adjusting layer from top to bottom, the adjusting layer is provided with at least three height-adjustable lifting adjusting units, and any lifting adjusting unit can be contacted with the light source layer and adjust the inclination state of the light source layer.

In one embodiment, the lifting adjustment unit comprises a connection seat and a lifting platform; the connecting seat is connected with the adjusting layer, the lifting platform is arranged on the connecting seat, the adjusting layer is provided with a through hole, and the lifting platform can penetrate through the through hole and be in contact with the light source layer. Through this embodiment, every lift adjustment unit all is provided with lift platform, and every lift platform is mutually independent, through adjusting lift platform's height, realizes the inclination regulation of light source layer to realize that the light source layer can be parallel to each other with the optical system layer.

In one embodiment, the lifting platform is further connected with a connecting shaft, a bearing is sleeved on the connecting shaft, and the light source layer is provided with a yielding hole for accommodating the connecting shaft.

In one embodiment, the light source layer is further provided with a limiting groove adapted to the aligning bearing. Through this embodiment, the internal diameter of spacing groove is slightly greater than the external diameter of bearing, when aligning the bearing enters into spacing inslot, plays spacing effect.

In one embodiment, the bearing is a self-aligning bearing. Through this embodiment, the aligning bearing has the degree of freedom of direction of rotation, has joint bearing characteristic again, can guarantee that θZ is adjustable again, can guarantee the independent lift adjustment of lift adjustment unit, when adjusting one of them point lift adjustment unit, do not receive other two point lift adjustment units constraint.

In one embodiment, the lifting platform comprises one of a hydraulic cylinder, an air cylinder, or an electric push rod.

In one embodiment, a rotation leveling device is further arranged on the adjustment layer, and the rotation leveling device can enable the light source layer to rotate. According to the embodiment, the light source layer can be further adjusted in the rotation direction, the degree of freedom of the light source layer is increased, and the positioning accuracy is improved.

In one embodiment, the rotary leveling device comprises a positioning piece connected with the light source layer, the adjusting layer is provided with fixing plates respectively positioned on two sides of the positioning piece, the fixing plates are in threaded connection with adjusting rods, and the adjusting rods can be in contact with the positioning piece. According to the embodiment, the adjusting rods positioned on two sides of the positioning piece are adjusted, and the relative positions of the positioning piece are indirectly adjusted, so that the rotation angle of the light source layer on the horizontal plane is adjusted.

In one embodiment, the lifting adjusting units are three, and the connecting lines of the three lifting adjusting units are in an equilateral triangle.

In one embodiment, a wafer mounting layer is further disposed on the mount between the optical system layer and the light source layer.

The above-described features may be combined in various suitable ways or replaced by equivalent features as long as the object of the present utility model can be achieved.

Compared with the prior art, the leveling device for the light source layer and the optical system layer has at least the following beneficial effects:

the light source layer is characterized in that an adjusting layer is further arranged below the light source layer, a plurality of lifting adjusting units are arranged on the adjusting layer, the upper ends of the lifting adjusting units can be in contact with the light source layer, and according to actual use requirements, the position of a contact point between the lifting units and the light source layer can be adjusted by adjusting the lifting adjusting units, so that the inclined state of the light source layer is adjusted, the light source layer is kept parallel to the optical system layer, and the imaging effect is improved.

Drawings

The utility model will be described in more detail hereinafter on the basis of embodiments and with reference to the accompanying drawings.

FIG. 1 is a schematic perspective view of the present utility model;

FIG. 2 is a side view schematic of FIG. 1;

FIG. 3 is a schematic cross-sectional view of the lift adjustment unit;

FIG. 4 is a schematic top view facilitating viewing of the position of the lift adjustment unit and the rotary leveling device;

FIG. 5 is a schematic view of a partially enlarged construction of the rotary leveling device of FIG. 4;

in the drawings, like parts are designated with like reference numerals. The figures are not to scale.

Reference numerals:

10. a fixing frame; 11. an optical system layer; 12. a wafer mounting layer; 13. a light source layer; 131. a relief hole; 132. a limit groove; 14. an adjustment layer; 141. a through hole; 20. a lifting adjusting unit; 21. aligning bearings, 22, connecting shafts; 23. a lifting platform; 24. a connecting seat; 30. a rotary leveling device; 31. an adjusting rod; 32. a fixing plate; 33. a positioning piece; 40. a transmission light source; 50. an infrared optical system.

Detailed Description

The utility model will be further described with reference to the accompanying drawings.

As shown in fig. 1 and 2, the present utility model provides a leveling device for a light source layer 13 and an optical system layer 11, which comprises a fixing frame 10, wherein the fixing frame 10 is sequentially provided with the optical system layer 11, the light source layer 13 and an adjusting layer 14 from top to bottom, the adjusting layer 14 is provided with at least three height-adjustable lifting adjusting units 20, and any lifting adjusting unit 20 can contact with the light source layer 13 and adjust the inclination state of the light source layer 13.

Specifically, the light source layer 13 includes a first substrate and a transmission light source 40, where a planar transmission system is further disposed on the first substrate, and the transmission light source 40 is mounted on the light source layer 13 through the planar transmission system (including a guide rail), and the planar transmission system is a cross slide rail or a crawler-type transmission structure; the light source layer 13 is a device structure for providing light source irradiation directly under the wafer alignment, and the transmissive light source 40 moves in the direction X, Y of the light source layer 13. The optical system layer 11 includes a second substrate and an infrared optical system 50 responsible for capturing the device structure of the mark points directly above the wafer pair, the optical system being required to move in the direction X, Y, Z of this layer to capture each mark point of the 12 inch wafer pair.

It should be further noted that, in the Z direction, there is an error in the thickness of a single wafer, and meanwhile, the objective lens of the infrared optical system 50 needs to adjust the focus mark point of the depth of field, and two degrees of freedom, i.e. coarse focus and fine focus, are set on the Z axis to compensate the error in the Z axis direction, and adjust the focal length, the infrared optical system 50 can collect the mark point image meeting the condition, and the system analyzes the alignment accuracy of two wafers through the collected image, so as to determine whether the alignment bonding of the two wafers is successful. The optical system layer 11 and the transmission light source layer 13 are mutually independent, and the respective Cartesian coordinate systems are difficult to achieve that the X coordinate, the Y coordinate and the XY plane are completely parallel, so that the movement control and the positioning are inaccurate, and the imaging effect is poor. The parallelism of the X coordinate, the Y coordinate and the XY plane of the transmission light source layer 13 and the optical system layer 11 is adjusted through the lifting adjusting units 20, so that the parallelism error is ensured to be within an acceptable range, and the imaging effect is improved. So that the transmission light source 40 is coaxial with the Z-axis of the infrared optical system 50 (camera).

As shown in fig. 3, in one embodiment, the elevation adjustment unit 20 includes a connection seat 24 and an elevation platform 23; the connecting seat 24 is connected with the adjusting layer 14, the lifting platform 23 is arranged on the connecting seat 24, the adjusting layer 14 is provided with a through hole 141, and the lifting platform 23 can penetrate through the through hole 141 to be in contact with the light source layer 13. Through this embodiment, each lift adjustment unit 20 is provided with lift platform 23, and each lift platform 23 is mutually independent, through adjusting the height of lift platform 23, realizes the inclination adjustment of light source layer 13 to realize that light source layer 13 can be parallel to each other with optical system layer 11.

Specifically, the lifting platform 23 may incorporate a high-precision fine adjustment device with scales, so that the parallelism between the light source layer 13 and the optical system layer 11 may be adjusted to a very precise level.

In one embodiment, the lifting adjusting units 20 are three, and the connecting lines of the three lifting adjusting units 20 are in an equilateral triangle.

In one embodiment, the lifting platform 23 is further connected with a connecting shaft 22, the connecting shaft 22 is sleeved with a bearing, and the light source layer 13 is provided with a yielding hole 131 for accommodating the connecting shaft 22.

In one embodiment, the light source layer 13 is further provided with a limiting groove 132 adapted to the aligning bearing 21. With the present embodiment, the inner diameter of the limiting groove 132 is slightly larger than the outer diameter of the bearing, and the limiting function is performed when the aligning bearing 21 enters the limiting groove 132.

In one embodiment, the bearing is a self-aligning bearing 21. With the present embodiment, the aligning bearing 21 has both the degree of freedom of the rotation direction and the characteristics of the knuckle bearing, so that it is ensured that θz is adjustable, and it is ensured that the elevation adjusting unit 20 is independently adjusted in elevation, and when one of the elevation adjusting units 20 is adjusted, it is not constrained by the other two elevation adjusting units 20.

Specifically, the lifting platform 23 may be manually fine-tuned, and the upper parts of the platforms are stacked with the aligning bearings 21, when one lifting adjustment unit 20 is fixed, that is, only one aligning bearing 21 enters the limiting groove 132, two degrees of freedom of Z axis and θz exist in the light source layer 13 relative to the adjustment layer 14, and when three lifting adjustment units 20 are fixed, that is, the aligning bearings 21 of the three lifting adjustment units 20 enter the limiting groove 132, and three independent degrees of freedom of Z axis exist in the light source layer 13, so that pitch deflection can be adjusted.

Further, the method for adjusting the parallelism of the light source layer 13 and the optical system layer 11 is as follows: one lifting adjusting unit 20 (the lifting adjusting unit 20 on the opposite side of the rotary leveling device 30) is fixed, the other two lifting adjusting units 20 are loosened, the two degrees of freedom of theta Z are adjusted by combining the adjusting rod 31 of the rotary leveling device 30, and the X coordinate and the Y coordinate of the light source layer 13 and the optical system layer 11 are ensured to be parallel within an acceptable error range by combining a measuring tool, so that the two layers of X coordinate and Y coordinate can be regarded as parallel. After adjusting the respective X coordinates and Y coordinates to be parallel to each other, fixing the remaining two lifting adjustment units 20, respectively adjusting the respective Z-axis lifting platforms 23 of 3 points, adjusting the pitching deflection, and combining with the measuring tool, ensuring that the parallelism of the two layers of XY surfaces is within an acceptable range, namely, the two layers of X Y surfaces are parallel. Since only one elevation adjustment unit 20 is fixed, the positioning member 33 displaced laterally will slightly rotate with the light source layer 13, so that the guide rail on the light source layer 13 is parallel to the guide rail of the optical system layer 11 in the XY plane. As shown in fig. 4, the light source layer 13 is provided with mounting grooves (not shown) for mounting two guide rails, and the two mounting grooves are located outside the 3 elevation adjustment units 20.

In one embodiment, the lift platform 23 comprises one of a hydraulic cylinder, an air cylinder, or an electric push rod. Automatic adjustment of the lifting platform 23 is achieved.

In one embodiment, the adjustment layer 14 is further provided with a rotation leveling device 30, and the rotation leveling device 30 can rotate the light source layer 13. By this embodiment, the light source layer 13 can be further adjusted in the rotation direction, the degree of freedom of the light source layer 13 is increased, and the positioning accuracy is improved.

As shown in fig. 4, in one embodiment, the rotation leveling device 30 includes a positioning member 33 connected to the light source layer 13, and the adjustment layer 14 is provided with fixing plates 32 respectively located at both sides of the positioning member 33, and the fixing plates 32 are screwed with an adjusting rod 31, and the adjusting rod 31 can be in contact with the positioning member 33. By adjusting the adjusting rods 31 positioned on both sides of the positioning member 33 in this embodiment, the rotation angle of the light source layer 13 on the horizontal plane is adjusted indirectly by adjusting the relative positions of the positioning member 33.

Specifically, the light source layer 13 is provided with a clamping groove, the positioning piece 33 is located in the clamping groove, and one end of the adjusting rod 31, which is in contact with the positioning piece 33, is an arc-shaped surface. The adjusting lever 31 may be provided as a manual differential head to improve rotation accuracy.

In one embodiment, the mount 10 is further provided with a wafer mounting layer 12 between the optical system layer 11 and the light source layer 13.

In the description of the present utility model, it should be understood that the terms "upper," "lower," "bottom," "top," "front," "rear," "inner," "outer," "left," "right," and the like indicate or are based on the orientation or positional relationship shown in the drawings, merely to facilitate description of the present utility model and to simplify the description, and do not indicate or imply that the devices or elements referred to must have a particular orientation, be configured and operated in a particular orientation, and thus should not be construed as limiting the present utility model.

While the utility model has been described with reference to a preferred embodiment, various modifications may be made and equivalents may be substituted for elements thereof without departing from the scope of the utility model. In particular, the technical features mentioned in the respective embodiments may be combined in any manner as long as there is no structural conflict. The present utility model is not limited to the specific embodiments disclosed herein, but encompasses all technical solutions falling within the scope of the claims.

Claims

1. The utility model provides a light source layer and optical system layer levelling device which characterized in that, includes the mount, mount top-down is provided with optical system layer, light source layer and adjustment layer in order, be provided with at least three height-adjustable's lift adjustment unit on the adjustment layer, the lift adjustment unit can with the light source layer contact and adjust the inclination of light source layer.

2. The light source layer and optical system layer leveling device according to claim 1, wherein the elevation adjustment unit comprises a connection base and an elevation platform; the connecting seat is connected with the adjusting layer, the lifting platform is arranged on the connecting seat, the adjusting layer is provided with a through hole, and the lifting platform can penetrate through the through hole and be in contact with the light source layer.

3. The leveling device for the light source layer and the optical system layer according to claim 2, wherein the lifting platform is further connected with a connecting shaft, a bearing is sleeved on the connecting shaft, and the light source layer is provided with a yielding hole for accommodating the connecting shaft.

4. The light source layer and optical system layer leveling device according to claim 3, wherein the light source layer is further provided with a limit groove adapted to the bearing.

5. A light source layer and optical system layer leveling device in accordance with claim 3 wherein said bearing is a self aligning bearing.

6. The light source layer and optical system layer leveling device of claim 2, wherein the lifting platform comprises one of a hydraulic cylinder, an air cylinder, or an electric push rod.

7. The light source layer and optical system layer leveling device according to any one of claims 1 to 6, wherein a rotation leveling device is further provided on the adjustment layer, and the rotation leveling device is capable of rotating the light source layer.

8. The leveling device for a light source layer and an optical system layer according to claim 7, wherein the rotating leveling device comprises a positioning piece connected with the light source layer, fixing plates respectively arranged on two sides of the positioning piece are arranged on the adjusting layer, and adjusting rods are connected with the fixing plates in a threaded mode and can be in contact with the positioning piece.

9. The light source layer and optical system layer leveling device according to any one of claims 1 to 6, wherein the number of the elevation adjustment units is three, and the connecting lines of the three elevation adjustment units are equilateral triangles.

10. The light source layer and optical system layer leveling device of any one of claims 1-6, wherein a wafer mounting layer is further disposed on the mount between the optical system layer and the light source layer.