CN2193993Y - 反馈型激光干涉计 - Google Patents

反馈型激光干涉计 Download PDF

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CN2193993Y
CN2193993Y CN 94203399 CN94203399U CN2193993Y CN 2193993 Y CN2193993 Y CN 2193993Y CN 94203399 CN94203399 CN 94203399 CN 94203399 U CN94203399 U CN 94203399U CN 2193993 Y CN2193993 Y CN 2193993Y
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laser interferometer
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semiconductor laser
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艾勇
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Abstract

反馈型激光干涉计,是一种利用物理光学干涉原 理观测机械工件的光洁度、平整度、形状及夹角的精 密测量仪器。它设置有半导体激光器LD,透镜L、 反射镜M1和M2,半反射镜BS。其特征是:在成象 区E与半导体激光器LD之间设置有反馈电路,产 生反馈电流的组件由针孔板d、光电管PD和放大器 A构成。本实用新型的特点是:抗干扰能力强,能在 生产现场对机械工件进行观测。

Description

本实用新型涉及精密测量仪器,是一种利用物理光学干涉原理观测机械工件的光洁度、平整度、形状及夹角的反馈型激光干涉计。
现有的激光干涉计,参看图1,它设置有半导体激光器LD,反射镜M1和M2、半反射镜BS,电流Io激发LD发出光束,经透镜L成为平行光。再经半反射镜BS分成互相垂直的反射平行光和透射平行光,前者射到M2后沿原路返回,透过BS到达成相区E处;后者经M1反射后沿原路返回,再由BS反射也到达E处,由于这两条光束之间存在位相差,在E处便有干涉条纹图象产生。因图象的形状与M1、M2的表面状态有关,从这里就可获得有关被测物(M1或M2)的表面状态信息。这种高精度测量必须在实验室进行。
本实用新型的目的在于提供一种能在生产现场使用的反馈型激光干涉计,它能在有机械性噪音的生产现场中,正常观测,抗干扰性强。
本实用新型的目的是这样实现的,它设置有半导体激光器LD、透镜L、反射镜M1和M2、半反射镜BS,其特征是:在成象区E与半导体激光器LD之间设置有反馈电路,产生反馈电流的组件则由针孔板d,光电管PD和放大器A构成。当在生产现场进行观测时,由于机械性噪音振动,会导致干涉图象模糊不清,此时,穿过针孔板d的干涉图象光照到光电管PD上成为电信号,再经放大器A放大的电信号反馈到LD,使光频率f作相应的变化,使位相回到原来的值,使干涉图象清晰,即反馈型激光干涉计具备了抗干扰能力。
现在叙述反馈型激光干涉针能提高抗干扰能力的理论分析。参看图2,由于来到E处的两条光束之间有位相差,才产生干涉条纹,位相差δ与干涉条纹强度P的关系式为:
δ= (4πfD)/(C) ① 和 P=a+bcos δ ②
C为真空中光速,a、b是与光学系统有关的常数。从式中知,要保持干涉条纹强度P稳定,就需保持位相差δ稳定,从①式知,需要保持激光频率f与光路差D的乘积不变来实现。当干涉计在生产现场使用机械性干扰振动导致干涉图象不稳时,我们是利用半导体激光器所发射光频率f与它的注入电流成正比的特点,在干涉计内增设一条反馈电路,从而实现D与f总是彼长此消地变化,保持乘积稳定,实现图象清晰的。
本实用新型的反馈型激光干涉计,其特点是:抗干扰能力强,能在生产现场对机械工件进行观测。
下面结合实施例和附图进一步叙述。
实施例:在一台泰曼--格林型激光干涉计上增设反馈电路后就成为本实用新型的实施例,图2为本实施例的光路原理图,图中虚线为光路,实线为电路。干涉计上的半导体激光器为日本产的HL7806G型,光电管系用北京产的2Cu101A型,放大器系用日本产的upc151C型,针孔板d的针孔直径为0.5mm,现以此去检查机械工件的平整度,当M1物体表面的图样。参看图3,当外界干扰振动在频率为25~1000HZ,振幅在9um以内时,图仍保持清晰。若不加反馈装置,则此时的图样模糊不清如图4,无法观测。本方案的增设反馈电路的作法,对各种以半导体激光器作为光源的干涉计均能适用,并能取得提高抗干扰能力的显著效果。
现在叙述附图和图面说明:附图共四幅,图1为现有的激光干涉计的干涉图象成象原理图,图2为本实用新型的反馈型激光干涉计的干涉图象成象原理图,图3为正常的干涉图样,特征是条纹清晰,图4为不正常的干涉图样,特征是条纹模糊,图1图2中虚线表示光路,箭头表示光的走向,图2中的实线表示反馈电路的联线,图中各符号的意义是:
LD-半导体激光器        M1,M2-反射镜        BS-半反射镜        IO-电流
L-透镜        E-成象区        d-针孔板        PD-光电管        A-放大器

Claims (1)

  1. 反馈型激光干涉计设置有半导体激光器LD,透镜L、反射镜M1和M2、半反射镜BS,其特征是:在成象区E与半导体激光器LD之间设置有反馈电路,产生反馈电流的组件由针孔板d、光电管PD和放大器A构成。
CN 94203399 1994-02-03 1994-02-03 反馈型激光干涉计 Expired - Fee Related CN2193993Y (zh)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1322308C (zh) * 2005-04-21 2007-06-20 中国科学院上海光学精密机械研究所 微小转角干涉测量装置
CN105043242A (zh) * 2015-05-29 2015-11-11 北方民族大学 一种对比式抗干扰阶梯平面反射镜激光干涉仪及标定方法和测量方法
CN105136020A (zh) * 2015-05-29 2015-12-09 北方民族大学 一种对比式抗干扰微动阶梯平面反射镜激光干涉仪及标定方法和测量方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1322308C (zh) * 2005-04-21 2007-06-20 中国科学院上海光学精密机械研究所 微小转角干涉测量装置
CN105043242A (zh) * 2015-05-29 2015-11-11 北方民族大学 一种对比式抗干扰阶梯平面反射镜激光干涉仪及标定方法和测量方法
CN105136020A (zh) * 2015-05-29 2015-12-09 北方民族大学 一种对比式抗干扰微动阶梯平面反射镜激光干涉仪及标定方法和测量方法
CN105136020B (zh) * 2015-05-29 2017-11-10 北方民族大学 一种对比式抗干扰微动阶梯平面反射镜激光干涉仪及标定方法和测量方法
CN105043242B (zh) * 2015-05-29 2017-12-08 北方民族大学 一种对比式抗干扰阶梯平面反射镜激光干涉仪及标定方法和测量方法

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