CN219320643U - Moving device of photomask support - Google Patents

Moving device of photomask support Download PDF

Info

Publication number
CN219320643U
CN219320643U CN202320680634.0U CN202320680634U CN219320643U CN 219320643 U CN219320643 U CN 219320643U CN 202320680634 U CN202320680634 U CN 202320680634U CN 219320643 U CN219320643 U CN 219320643U
Authority
CN
China
Prior art keywords
moving mechanism
axis moving
photomask
mask
axis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202320680634.0U
Other languages
Chinese (zh)
Inventor
徐伟峰
雷远坤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shenzhen Jiemicrochip Technology Co ltd
Original Assignee
Shenzhen Jiemicrochip Technology Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shenzhen Jiemicrochip Technology Co ltd filed Critical Shenzhen Jiemicrochip Technology Co ltd
Priority to CN202320680634.0U priority Critical patent/CN219320643U/en
Application granted granted Critical
Publication of CN219320643U publication Critical patent/CN219320643U/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00Technologies relating to the processing of minerals
    • Y02P40/50Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57Improving the yield, e-g- reduction of reject rates

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

The utility model provides a moving device of a photomask bracket, comprising: the photomask positioning seat is used for placing a photomask plate; the X-axis moving mechanism is arranged below the photomask positioning seat, and a first sliding block is arranged at the bottom of the X-axis moving mechanism; the Y-axis moving mechanism is arranged below the X-axis moving mechanism, a second sliding block is arranged at the bottom of the Y-axis moving mechanism, a first sliding rail arranged in the X-axis direction is arranged above the Y-axis moving mechanism, and the first sliding block is connected with the first sliding rail; the base is provided with a second sliding rail arranged in the Y-axis direction, and the second sliding block is connected with the second sliding rail; the photomask positioning mechanism, the X-axis moving mechanism and the Y-axis moving mechanism are sequentially stacked, are compactly arranged, save space, improve moving speed and are sequentially connected in a sliding rail mode, so that the photomask positioning mechanism is high in stability.

Description

Moving device of photomask support
Technical Field
The utility model relates to the technical field of semiconductor manufacturing, in particular to a moving device of a photomask bracket for semiconductor photoetching.
Background
A photomask, also known as a photomask (english: reticle, mask): in the fabrication of integrated circuits, patterns are formed on semiconductors by photolithographic techniques, and the principle of acting through photomasks is necessary to replicate the patterns on a wafer.
The photomask is used in an exposure machine, which is a device for transferring image information on a film or other transparent body to a surface coated with a photosensitive material by turning on light to emit ultraviolet rays, and is now widely used in the fields of semiconductors, microelectronics, biological devices and nanotechnology. The photomask bracket in the exposure machine is used for placing a photomask, the photomask selectively transmits ultraviolet light so that a photosensitive substance negative film below the photomask is printed with various patterns, and then a corresponding circuit is engraved.
In operation, the mask support is required to be subjected to photo-etching on the wafer through continuous movement, and in the prior art, the mask support moving equipment is complex in structure and huge in volume, so that the speed is low in the moving process.
Therefore, there is a need to design a mask holder moving device to solve the above-mentioned problems.
Disclosure of Invention
The present utility model provides a device for moving a mask frame, which is used for solving the technical problems mentioned in the background art.
In order to solve the problems, the utility model provides the following technical scheme: a reticle support moving apparatus comprising:
the photomask positioning seat is used for placing a photomask plate;
the X-axis moving mechanism is arranged below the photomask positioning seat, and a first sliding block is arranged at the bottom of the X-axis moving mechanism;
the Y-axis moving mechanism is arranged below the X-axis moving mechanism, a second sliding block is arranged at the bottom of the Y-axis moving mechanism, a first sliding rail arranged in the X-axis direction is arranged above the Y-axis moving mechanism, and the first sliding block is connected with the first sliding rail;
the base is provided with a second sliding rail arranged in the Y-axis direction, and the second sliding block is connected with the second sliding rail;
the X-axis moving mechanism, the Y-axis moving mechanism and the base are all provided with openings corresponding to the photomask plate.
Furthermore, the photomask positioning seat is provided with a photomask plate placing position, and a limiting rod is arranged on the periphery of the photomask plate placing position.
Further, a first locking component in the X-axis direction and a second locking component in the Y-axis direction are further arranged on the periphery of the photomask plate placement position and used for locking and fixing the position of the photomask plate.
Further, the locking member is driven by a cylinder.
Further, a limiting seat is arranged on the X-axis moving mechanism, the limiting seat is of a structure, and the photomask positioning seat is matched with the limiting seat.
Further, a magnetic component is arranged at the joint of the limiting seat and the photomask positioning seat, and the limiting seat is matched with the photomask positioning seat through magnetic attraction.
Further, the mask positioning seat is connected with the X-axis moving mechanism through a fastener.
Compared with the prior art, the utility model has at least the following beneficial effects:
the photomask positioning mechanism, the X-axis moving mechanism and the Y-axis moving mechanism are sequentially stacked, are compactly arranged, save space, improve moving speed and are sequentially connected in a sliding rail mode, so that the photomask positioning mechanism is high in stability.
Drawings
In order to more clearly illustrate the embodiments of the utility model or the technical solutions in the prior art, the drawings that are required in the embodiments or the description of the prior art will be briefly described, it being obvious that the drawings in the following description are only some embodiments of the utility model, and that other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a schematic overall structure of an embodiment of the present utility model;
FIG. 2 is a side view of FIG. 1;
FIG. 3 is an exploded view of FIG. 1;
fig. 4 is a schematic view of another angle of fig. 3.
Detailed Description
The following description of the embodiments of the present utility model will be made clearly and completely with reference to the accompanying drawings, in which it is apparent that the embodiments described are only some embodiments of the present utility model, but not all embodiments. All other embodiments, which can be made by those skilled in the art based on the embodiments of the utility model without making any inventive effort, are intended to fall within the scope of the utility model. It is to be understood that the drawings are designed solely for the purposes of illustration and not as a definition of the limits of the utility model. The connection relationships shown in the drawings are for convenience of clarity of description only and are not limiting on the manner of connection.
It is noted that when one component is considered to be "connected" to another component, it may be directly connected to the other component, or intervening components may also be present. Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this utility model belongs. It should also be noted that the terms "mounted," "connected," and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected, unless otherwise specifically defined and limited; either mechanically or electrically, or by communication between two components. The specific meaning of the above terms in the present utility model will be understood in specific cases by those of ordinary skill in the art. The terminology used herein in the description of the utility model is for the purpose of describing particular embodiments only and is not intended to be limiting of the utility model.
It should be further noted that, in the description of the present utility model, it should be noted that, directions or positional relationships indicated by terms such as "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., are based on directions or positional relationships shown in the drawings, are merely for convenience of describing the present utility model and simplifying the description, and do not indicate or imply that the apparatus or elements referred to must have a specific direction, be configured and operated in the specific direction, and thus should not be construed as limiting the present utility model. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
The utility model discloses a moving device of a photomask support, and aims to solve the problems that in the prior art, the moving device of the photomask support is complex in structure and huge in size, and the speed is low in the moving process.
Referring to fig. 1 to 4, a moving device of a mask holder includes:
the photomask positioning seat 100 is used for placing a photomask plate;
an X-axis moving mechanism 200, wherein the X-axis moving mechanism 200 is disposed below the mask positioning seat 100, and a first slider 202 is disposed at the bottom of the X-axis moving mechanism 200;
a Y-axis moving mechanism 300, wherein the Y-axis moving mechanism 300 is disposed below the X-axis moving mechanism 200, a second slider 302 is disposed at the bottom of the Y-axis moving mechanism 300, a first slide rail 301 disposed in the X-axis direction is disposed above the Y-axis moving mechanism 300, and the first slider 202 is connected to the first slide rail 301;
the base 400 is provided with a second sliding rail 401 arranged in the Y-axis direction, and the second sliding block 302 is connected with the second sliding rail 401;
the X-axis moving mechanism 200, the Y-axis moving mechanism 300, and the base 400 are provided with openings corresponding to the photomask.
The photomask in this embodiment is made of a glass substrate as a raw material.
As shown in fig. 3, the mask positioning seat 100 is provided with a mask plate placing position 101, and a limit rod 102 is provided around the mask plate placing position 101.
In this embodiment, a first locking member 103 in the X-axis direction and a second locking member 104 in the Y-axis direction are further disposed around the photomask placing position 101, so as to lock and fix the position of the photomask.
In this embodiment, the locking member is driven by a cylinder.
As shown in fig. 1 and 3, a limiting seat 201 is disposed on the X-axis moving mechanism 200, the limiting seat 201 is in a "" structure, and the mask positioning seat 100 is matched with the limiting seat 201.
In this embodiment, the connection between the limiting seat 201 and the mask positioning seat 100 is provided with a magnetic attraction component, and the limiting seat 201 and the mask positioning seat 100 are magnetically attracted to be matched, so that the magnetic attraction type matching connection process is simple and easy to operate.
In another embodiment, the mask positioning base 100 is connected to the X-axis moving mechanism 200 by a fastener, so as to improve the connection stability.
According to the utility model, through the laminated layout design, the occupied space of the equipment is reduced, and the running stability and the running efficiency are high by adopting a sliding rail moving mode.
In the description and claims of this application, the words "comprise/comprising" and the words "have/include" and variations thereof are used to specify the presence of stated features, values, steps, or components, but do not preclude the presence or addition of one or more other features, values, steps, components, or groups thereof.
Some features of the utility model, which are, for clarity of illustration, described in the context of separate embodiments, may also be provided in combination in a single embodiment. Conversely, some features of the utility model, which are, for brevity, described in the context of a single embodiment, may also be provided separately or in any suitable combination in different embodiments.
The foregoing description of the preferred embodiment of the utility model is not intended to be limiting, but rather is intended to cover all modifications, equivalents, and alternatives falling within the spirit and principles of the utility model.

Claims (7)

1. A reticle holder moving apparatus, comprising:
the photomask positioning seat is used for placing a photomask plate;
the X-axis moving mechanism is arranged below the photomask positioning seat, and a first sliding block is arranged at the bottom of the X-axis moving mechanism;
the Y-axis moving mechanism is arranged below the X-axis moving mechanism, a second sliding block is arranged at the bottom of the Y-axis moving mechanism, a first sliding rail arranged in the X-axis direction is arranged above the Y-axis moving mechanism, and the first sliding block is connected with the first sliding rail;
the base is provided with a second sliding rail arranged in the Y-axis direction, and the second sliding block is connected with the second sliding rail;
the X-axis moving mechanism, the Y-axis moving mechanism and the base are all provided with openings corresponding to the photomask plate.
2. The mask holder moving device according to claim 1, wherein the mask positioning seat is provided with a mask plate placement position, and a limit rod is provided around the mask plate placement position.
3. The mask holder moving apparatus according to claim 2, wherein a first locking member in an X-axis direction and a second locking member in a Y-axis direction are further provided at a periphery of the mask placement position for locking and fixing a position of the mask.
4. A mask holder moving apparatus according to claim 3, wherein the locking member is driven by a cylinder.
5. The mask holder moving device according to claim 1, wherein a limit seat is provided on the X-axis moving mechanism, the limit seat is in a "" structure, and the mask positioning seat is matched with the limit seat.
6. The device according to claim 5, wherein a magnetic attraction component is arranged at the joint of the limiting seat and the mask positioning seat, and the limiting seat is matched with the mask positioning seat through magnetic attraction.
7. The mask holder moving device according to claim 5, wherein the mask positioning base and the X-axis moving mechanism are connected by a fastener.
CN202320680634.0U 2023-03-29 2023-03-29 Moving device of photomask support Active CN219320643U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202320680634.0U CN219320643U (en) 2023-03-29 2023-03-29 Moving device of photomask support

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202320680634.0U CN219320643U (en) 2023-03-29 2023-03-29 Moving device of photomask support

Publications (1)

Publication Number Publication Date
CN219320643U true CN219320643U (en) 2023-07-07

Family

ID=87021850

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202320680634.0U Active CN219320643U (en) 2023-03-29 2023-03-29 Moving device of photomask support

Country Status (1)

Country Link
CN (1) CN219320643U (en)

Similar Documents

Publication Publication Date Title
EP2998983A2 (en) Stage apparatus, exposure apparatus and device fabricating method
TW200425268A (en) Exposure device and manufacturing method for device
CN104487897B (en) liquid immersion member and exposure device
EP1804279A1 (en) Substrate for exposure, exposure method and device manufacturing method
KR20050118721A (en) Exposure apparatus and method for manufacturing device
JPWO2006030908A1 (en) Substrate holding apparatus, exposure apparatus, and device manufacturing method
KR101712219B1 (en) Exposure apparatus, exposure method and device manufacturing method
US8440372B2 (en) Single field zero mask for increased alignment accuracy in field stitching
US9223225B2 (en) Liquid immersion member, exposure apparatus, exposure method, and device manufacturing method
TW201116943A (en) Pattern formation apparatus, pattern formation method, and device manufacturing method
CN219320643U (en) Moving device of photomask support
CN109240047A (en) A kind of write-through exposure machine and its scaling method
JP2001100169A (en) Substrate supporting device and substrate processing device
JP2006054289A (en) Substrate holder, stage apparatus, exposure apparatus, and device manufacturing method
CN219320644U (en) Photomask driving system
CN111650817A (en) Semiconductor combined mask exposure device and use method
JP2005012009A (en) Substrate holder, stage apparatus, and exposure apparatus
CN117452761A (en) Photomask driving system
CN206411418U (en) One kind is inverted exposure sources
CN110515279A (en) A kind of mask plate jig, exposure machine
CN210270511U (en) Multifunctional supporting device for semiconductor photomask
TW517177B (en) Aligner
JP2007115992A (en) Exposure device, substrate and device manufacturing method
CN215896311U (en) Eight-inch silicon wafer metal mask loading device
JP2007311374A (en) Substrate holder, exposure apparatus and manufacturing method of device

Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant