CN210270511U - Multifunctional supporting device for semiconductor photomask - Google Patents
Multifunctional supporting device for semiconductor photomask Download PDFInfo
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- CN210270511U CN210270511U CN201921280946.2U CN201921280946U CN210270511U CN 210270511 U CN210270511 U CN 210270511U CN 201921280946 U CN201921280946 U CN 201921280946U CN 210270511 U CN210270511 U CN 210270511U
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- plate
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- supporting device
- light shield
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 21
- 239000011521 glass Substances 0.000 claims description 19
- 230000015572 biosynthetic process Effects 0.000 abstract description 2
- 238000001459 lithography Methods 0.000 abstract description 2
- 238000000034 method Methods 0.000 description 3
- 238000001259 photo etching Methods 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000003292 glue Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
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Abstract
The utility model relates to the technical field of semiconductors, in particular to a multifunctional supporting device for a semiconductor photomask, which comprises a bottom plate, wherein a pillar is closely bonded on the top surface of the bottom plate near the edge of the front side, a beam is closely bonded on the top end of the pillar, and a photomask fixing device and a light gathering device are sequentially arranged below the beam from top to bottom; this multi-functional strutting arrangement for semiconductor light shield is through the bottom plate that is equipped with, pillar and light shield fixing device etc, the ultraviolet lamp carries out light projection promptly, thereby it forms the lithography image to pass through convex lens on the wafer, simultaneously the user of service can be according to the threaded rod that is equipped with, the sliding sleeve, slider and bar groove etc. be convenient for highly adjust light shield fixing device and light condensing equipment, and then the size of having adjusted the formation of image, this design is simple easy to operate, the light shield of being convenient for exposes, the problem that current light shield lacks corresponding support frame has been solved.
Description
Technical Field
The utility model relates to the field of semiconductor technology, specifically be a multi-functional strutting arrangement for semiconductor light shield.
Background
In the process of making IC, using photo-etching technique to form pattern on semiconductor, in order to copy the pattern on the wafer, the principle of acting through the photo mask, which is also called photo mask plate and mask plate, is that quartz glass is used as substrate, on which a layer of metal chromium and photosensitive glue are plated to form a photosensitive material, the designed circuit pattern is exposed on the photosensitive glue by electronic laser equipment, the exposed area will be developed, the circuit pattern is formed on the metal chromium to form a photo mask plate similar to the exposed negative film, then the photo mask plate is used to project and position the integrated circuit, the projected circuit is photo-etched by the integrated circuit photo-etching machine, the production and processing procedures are as follows: exposing, developing, removing photosensitive resist, and finally applying to photoetching;
in view of the fact that the conventional photomask lacks a corresponding support frame for fixing the photomask during exposure and the distance between the photomask and the wafer is difficult to adjust during exposure, a multifunctional supporting device for a semiconductor photomask is proposed.
SUMMERY OF THE UTILITY MODEL
An object of the utility model is to provide a multi-functional semiconductor is strutting arrangement for light shield to solve the problem that the current light shield that proposes in the above-mentioned background lacks corresponding support frame.
In order to achieve the above object, the utility model provides a following technical scheme:
a multifunctional supporting device for a semiconductor photomask comprises a bottom plate, wherein a supporting column is tightly bonded on the top surface of the bottom plate close to the edge of the front side, a cross beam is tightly bonded on the top end of the supporting column, and a photomask fixing device and a light gathering device are sequentially arranged below the cross beam from top to bottom; a circular groove is formed in the top surface of the bottom plate, a first glass plate is embedded in the circular groove, and a wafer plate is arranged on the first glass plate; a strip-shaped groove is formed in the rear side face of the strut, a threaded rod is rotatably connected in the strip-shaped groove through a bearing, the top end of the threaded rod penetrates through the top face of the strut, and an adjusting screw is coaxially and tightly bonded to the top end of the threaded rod; the light gathering device comprises a rectangular plate, a light gathering hole is formed in the rectangular plate, a convex lens is embedded in the light gathering hole, a sliding sleeve is tightly bonded to the front side face of the rectangular plate, and the sliding sleeve is connected with the support in a sliding mode; the light shield fixing device comprises a fixed plate and a movable plate above the fixed plate, wherein a through hole is formed in the top surface of the fixed plate, a second glass plate is embedded in the through hole, lugs are symmetrically and tightly bonded on the top surface of the fixed plate, a groove is formed in the movable plate, a third glass plate is embedded in the groove, rotating shafts are symmetrically and tightly bonded on the left side surface and the right side surface of the movable plate close to the front end, and the rotating shafts are rotatably connected with the lugs; the front side face of the fixed plate is tightly bonded with a sliding block, the sliding block is provided with a threaded hole, and the threaded hole is in threaded connection with the threaded rod.
Preferably, the bottom surface of crossbeam is equipped with the ultraviolet lamp, just the ultraviolet lamp passes through lamp stand and crossbeam fixed connection.
Preferably, the groove, the through hole, the light gathering hole and the circular groove are all located on the same vertical surface.
Preferably, the sliding sleeve is in threaded connection with a clamping screw.
Preferably, the ultraviolet lamp is positioned right above the groove.
Preferably, the adjusting screw is rotatably connected to the top surface of the pillar via a bearing.
Compared with the prior art, the beneficial effects of the utility model are that: this multi-functional strutting arrangement for semiconductor light shield is through the bottom plate that is equipped with, pillar and light shield fixing device etc, the ultraviolet lamp carries out light projection promptly, thereby it forms the lithography image to pass through convex lens on the wafer, simultaneously the user of service can be according to the threaded rod that is equipped with, the sliding sleeve, slider and bar groove etc. be convenient for highly adjust light shield fixing device and light condensing equipment, and then the size of having adjusted the formation of image, this design is simple easy to operate, the light shield of being convenient for exposes, the problem that current light shield lacks corresponding support frame has been solved.
Drawings
Fig. 1 is a schematic view of the overall structure of the present invention;
FIG. 2 is a schematic view of a part of the structure of the present invention;
FIG. 3 is a schematic diagram of a partial explosion structure in the present invention;
fig. 4 is a schematic structural diagram of the light condensing device of the present invention;
FIG. 5 is a schematic structural view of the fixing device for a light shield according to the present invention;
fig. 6 is an exploded view of the fixing device of the present invention.
In the figure: 1. a base plate; 11. a circular groove; 12. a wafer plate; 13. a first glass plate; 2. a pillar; 21. a strip-shaped groove; 22. a threaded rod; 23. adjusting the screw; 3. a cross beam; 4. a light condensing device; 41. a rectangular plate; 411. a light gathering hole; 412. a convex lens; 42. a sliding sleeve; 43. clamping the screw; 5. a mask fixing device; 51. a fixing plate; 511. a lug; 512. a through hole; 5121. a second glass plate; 52. a movable plate; 521. a groove; 5211. a third glass plate; 522. a rotating shaft; 53. a slider; 531. a threaded hole; 6. an ultraviolet lamp.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.
In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and to simplify the description, but do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore should not be construed as limiting the present invention.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature.
Example 1
A multifunctional supporting device for a semiconductor photomask is disclosed, as shown in figures 1 to 6, and comprises a bottom plate 1, a support column 2 is closely adhered to the top surface of the bottom plate 1 near the front edge, a cross beam 3 is closely adhered to the top end of the support column 2, and a photomask fixing device 5 and a light gathering device 4 are sequentially arranged below the cross beam 3 from top to bottom; the top surface of the bottom plate 1 is provided with a circular groove 11, a first glass plate 13 is embedded in the circular groove 11, and a wafer plate 12 is arranged on the first glass plate 13; a strip-shaped groove 21 is formed in the rear side face of the pillar 2, a threaded rod 22 is rotatably connected in the strip-shaped groove 21 through a bearing, the top end of the threaded rod 22 penetrates through the top face of the pillar 2, and an adjusting screw 23 is coaxially and tightly bonded to the top end of the threaded rod 22; the light gathering device 4 comprises a rectangular plate 41, a light gathering hole 411 is formed in the rectangular plate 41, a convex lens 412 is embedded in the light gathering hole 411, a sliding sleeve 42 is tightly bonded on the front side face of the rectangular plate 41, and the sliding sleeve 42 is connected with the support 2 in a sliding mode; the mask fixing device 5 comprises a fixed plate 51 and a movable plate 52 above the fixed plate 51, wherein the top surface of the fixed plate 51 is provided with a through hole 512, a second glass plate 5121 is embedded in the through hole 512, lugs 511 are symmetrically and tightly bonded on the top surface of the fixed plate 51, a groove 521 is formed in the movable plate 52, a third glass plate 5211 is embedded in the groove 521, rotating shafts 522 are symmetrically and tightly bonded on the left side surface and the right side surface of the movable plate 52 close to the front ends, and the rotating shafts 522 are rotationally connected with the lugs 511; the front side surface of the fixed plate 51 is closely adhered with a slide block 53, the slide block 53 is provided with a threaded hole 531, and the threaded hole 531 is in threaded connection with the threaded rod 22.
Specifically, the bottom surface of crossbeam 3 is equipped with ultraviolet lamp 6, and ultraviolet lamp 6 passes through lamp stand and crossbeam 3 fixed connection, and ultraviolet lamp 6 is used for providing the light source for the exposure.
Specifically, the groove 521, the through hole 512, the light gathering hole 411 and the circular groove 11 are located on the same vertical plane, which ensures that the light shield can form an orthographic projection on the wafer plate 12.
Specifically, the sliding sleeve 42 is in threaded connection with a clamping screw 43, the clamping screw 43 is used for conveniently fixing the sliding sleeve 42, and meanwhile, the light gathering device 4 is convenient to adjust.
Further, the uv lamp 6 is located right above the groove 521, which facilitates the uv lamp 6 to form an orthographic projection on the wafer plate 12 through the mask.
In addition to this, the adjusting screw 23 is rotatably connected to the top side of the column 2 by means of bearings which, on the one hand, provide a supporting function for the adjusting screw 23 and, on the other hand, support the rotation of the adjusting screw 23.
Before using the multifunctional supporting device for semiconductor mask of this embodiment, the user first rotates the adjusting screw 23, and at the same time, the threaded rod 22 rotates, under the action of the threaded hole 531, the slide block 53 moves along the threaded rod 22 in the strip-shaped groove 21, at this time, the slide block 53 drives the mask fixing device 5 to move in the vertical direction, at the same time, the user lifts up the movable plate 52, and at the same time, the rotation shaft 522 rotates along the lug 511, and then the user places the mask on the second glass plate 5121 in the through hole 512, at the same time, the user covers the movable plate 52, then the user unscrews the clamping screw 43, and moves the sliding sleeve 42, thereby adjusting the height of the light-gathering device 4, at this time, the clamping screw 43 is tightened, the light gathering device 4 can be fixed, and finally, a user coats a photoresist solution on the wafer plate 12, and the wafer plate 12 is placed on the first glass plate 13 in the circular groove 11;
when the multifunctional supporting device for a semiconductor mask of the present embodiment is used, a user turns on the power of the ultraviolet lamp 6, and the light source passes through the third glass plate 5211 in the groove 521, the second glass plate 5121 in the through hole 512, and the convex lens 412 in this order, and forms an image on the wafer plate 12.
The foregoing shows and describes the general principles, essential features, and advantages of the invention. It should be understood by those skilled in the art that the present invention is not limited by the above embodiments, and the description in the above embodiments and the description is only preferred examples of the present invention, and is not intended to limit the present invention, and that the present invention can have various changes and modifications without departing from the spirit and scope of the present invention, and these changes and modifications all fall into the scope of the claimed invention. The scope of the invention is defined by the appended claims and equivalents thereof.
Claims (6)
1. A multifunctional supporting device for a semiconductor photomask comprises a bottom plate (1), and is characterized in that: a support post (2) is tightly bonded on the top surface of the bottom plate (1) close to the front side edge, a cross beam (3) is tightly bonded on the top end of the support post (2), and a light shield fixing device (5) and a light gathering device (4) are sequentially arranged below the cross beam (3) from top to bottom; a circular groove (11) is formed in the top surface of the bottom plate (1), a first glass plate (13) is embedded in the circular groove (11), and a wafer plate (12) is arranged on the first glass plate (13); a strip-shaped groove (21) is formed in the rear side face of the strut (2), a threaded rod (22) is rotatably connected in the strip-shaped groove (21) through a bearing, the top end of the threaded rod (22) penetrates through the top face of the strut (2), and an adjusting screw (23) is coaxially and tightly bonded to the top end of the threaded rod (22); the light gathering device (4) comprises a rectangular plate (41), a light gathering hole (411) is formed in the rectangular plate (41), a convex lens (412) is embedded in the light gathering hole (411), a sliding sleeve (42) is tightly bonded to the front side face of the rectangular plate (41), and the sliding sleeve (42) is connected with the support column (2) in a sliding mode; the light shield fixing device (5) comprises a fixing plate (51) and a movable plate (52) above the fixing plate (51), a through hole (512) is formed in the top surface of the fixing plate (51), a second glass plate (5121) is embedded in the through hole (512), lugs (511) are symmetrically and tightly bonded to the top surface of the fixing plate (51), a groove (521) is formed in the movable plate (52), a third glass plate (5211) is embedded in the groove (521), rotating shafts (522) are symmetrically and tightly bonded to the left side surface and the right side surface of the movable plate (52) close to the front end, and the rotating shafts (522) are rotatably connected with the lugs (511); a sliding block (53) is tightly adhered to the front side face of the fixing plate (51), a threaded hole (531) is formed in the sliding block (53), and the threaded hole (531) is in threaded connection with the threaded rod (22).
2. The multi-functional supporting device for a semiconductor reticle according to claim 1, wherein: the bottom surface of crossbeam (3) is equipped with ultraviolet lamp (6), just ultraviolet lamp (6) pass through lamp stand and crossbeam (3) fixed connection.
3. The multi-functional supporting device for a semiconductor reticle according to claim 1, wherein: the groove (521), the through hole (512), the light gathering hole (411) and the circular groove (11) are all located on the same vertical surface.
4. The multi-functional supporting device for a semiconductor reticle according to claim 1, wherein: and a clamping screw (43) is in threaded connection with the sliding sleeve (42).
5. The multi-functional supporting device for a semiconductor reticle according to claim 2, wherein: the ultraviolet lamp (6) is positioned right above the groove (521).
6. The multi-functional supporting device for a semiconductor reticle according to claim 1, wherein: the adjusting screw (23) is rotatably connected with the top surface of the support column (2) through a bearing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921280946.2U CN210270511U (en) | 2019-08-08 | 2019-08-08 | Multifunctional supporting device for semiconductor photomask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201921280946.2U CN210270511U (en) | 2019-08-08 | 2019-08-08 | Multifunctional supporting device for semiconductor photomask |
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| Publication Number | Publication Date |
|---|---|
| CN210270511U true CN210270511U (en) | 2020-04-07 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201921280946.2U Active CN210270511U (en) | 2019-08-08 | 2019-08-08 | Multifunctional supporting device for semiconductor photomask |
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| CN (1) | CN210270511U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112799282A (en) * | 2020-12-30 | 2021-05-14 | 六安优云通信技术有限公司 | Wafer photoetching, developing and etching device for manufacturing power supply chip and preparation process thereof |
-
2019
- 2019-08-08 CN CN201921280946.2U patent/CN210270511U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112799282A (en) * | 2020-12-30 | 2021-05-14 | 六安优云通信技术有限公司 | Wafer photoetching, developing and etching device for manufacturing power supply chip and preparation process thereof |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| TR01 | Transfer of patent right |
Effective date of registration: 20231225 Address after: 212400 Building 8, 102 Chongming West Road, Jurong Development Zone, Zhenjiang City, Jiangsu Province Patentee after: Jiangsu Jingdu Semiconductor Technology Co.,Ltd. Address before: No.102, Chongming West Road, Jurong Development Zone, Zhenjiang City, Jiangsu Province Patentee before: JIANGSU YIDU TECHNOLOGY Co.,Ltd. |
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| TR01 | Transfer of patent right |