CN219092916U - Wafer expansion ring cleaning machine - Google Patents

Wafer expansion ring cleaning machine Download PDF

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Publication number
CN219092916U
CN219092916U CN202223407786.8U CN202223407786U CN219092916U CN 219092916 U CN219092916 U CN 219092916U CN 202223407786 U CN202223407786 U CN 202223407786U CN 219092916 U CN219092916 U CN 219092916U
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China
Prior art keywords
seat
driving mechanism
wafer
medicine
frame
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CN202223407786.8U
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Chinese (zh)
Inventor
卢传播
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Xiamen Goodhand Electronic Technology Co ltd
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Xiamen Goodhand Electronic Technology Co ltd
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Priority to CN202223407786.8U priority Critical patent/CN219092916U/en
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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  • Cleaning By Liquid Or Steam (AREA)

Abstract

The utility model discloses a wafer expanding ring cleaning machine which comprises a frame, and a medicine feeding device, a standing device, a cleaning device, a drying device and a carrying manipulator which are arranged on the frame; the medicine feeding device comprises a medicine feeding seat, a medicine feeding driving mechanism, a brush and a medicine liquid supply device, wherein the top surface of the medicine feeding seat is used for placing a wafer expanding ring, the medicine feeding driving mechanism is used for driving the brush to brush the surface of the wafer expanding ring above the medicine feeding seat, and the medicine liquid supply device is provided with a liquid outlet for spraying medicine liquid to the surface of the brush; the standing device comprises a standing seat with a top surface for placing the wafer expansion ring; the cleaning device comprises a cleaning seat and a two-fluid nozzle, the top surface of the cleaning seat is used for placing a wafer expanding ring, and the two-fluid nozzle sprays atomized water towards the top surface of the cleaning seat; the drying device is used for placing the wafer expansion ring into drying; the carrying manipulator is used for transferring the wafer expansion ring among the medicine feeding seat, the standing seat, the cleaning seat and the drying device. The utility model realizes the automatic cleaning of the wafer expansion ring.

Description

Wafer expansion ring cleaning machine
Technical Field
The utility model relates to the technical field of wafer processing equipment, in particular to a wafer expanding ring cleaning machine.
Background
The wafer is divided into wafers, the divided wafers are usually stuck on a membrane after being divided into wafers, and the membrane is expanded and fixed by a wafer expansion ring so that the wafers are separated from each other for subsequent processing.
The wafer expansion ring is usually recycled, so that the wafer expansion ring needs to be cleaned before being reused, and currently, manual cleaning is mostly adopted, so that the efficiency is low.
Disclosure of Invention
The utility model aims to provide a wafer expanding ring cleaning machine, which overcomes the defects and realizes automatic cleaning of a wafer expanding ring.
To achieve the above object, the solution of the present utility model is: the wafer expanding ring cleaning machine comprises a frame, a medicine feeding device, a standing device, a cleaning device, a drying device and a carrying manipulator, wherein the medicine feeding device, the standing device, the cleaning device, the drying device and the carrying manipulator are arranged on the frame;
the medicine feeding device comprises a medicine feeding seat, a medicine feeding driving mechanism, a brush and a medicine liquid supply device, wherein the top surface of the medicine feeding seat is used for placing a wafer expanding ring, the medicine feeding driving mechanism is used for driving the brush to brush the surface of the wafer expanding ring above the medicine feeding seat, and the medicine liquid supply device is provided with a liquid outlet for spraying medicine liquid onto the surface of the brush;
the standing device comprises a standing seat with a top surface for placing the wafer expansion ring;
the cleaning device comprises a cleaning seat and a two-fluid nozzle, wherein the top surface of the cleaning seat is used for placing a wafer expanding ring, and the two-fluid nozzle sprays atomized water towards the top surface of the cleaning seat;
the drying device is used for placing the wafer expansion ring into drying;
the carrying manipulator is used for transferring the wafer expansion ring among the medicine feeding seat, the standing seat, the cleaning seat and the drying device.
Further, the drying device comprises a drying seat and a drying driving mechanism, wherein the top surface of the drying seat is used for placing a wafer expanding ring, and the drying driving mechanism is connected with and drives the drying seat to horizontally rotate.
Further, still be provided with on the frame medicine-feeding box, keep still the case, wash case and drying cabinet, medicine-feeding device seals up and sets up in the medicine-feeding box, keep still the device seal and set up in the case of keeping still, belt cleaning device seals up and sets up in the washing case, drying cabinet seals up and sets up in the drying cabinet, all be provided with the chamber door that can open or close on medicine-feeding box, the case of keeping still, washing case and the drying cabinet.
Furthermore, the medicine feeding seat, the standing seat, the cleaning seat and the spin-drying seat are all provided with hollowed-out parts, and the bottoms of the medicine feeding box, the standing box, the cleaning box and the drying box are all communicated with a sewer pipe.
Further, the medicine feeding driving mechanism comprises a medicine feeding seat rotary driving mechanism and a brush driving mechanism, wherein the medicine feeding seat rotary driving mechanism is connected with and drives the medicine feeding seat so as to enable a wafer on the medicine feeding seat to expand and encircle an axis to rotate, and the brush driving mechanism is connected with and at least drives the brush to lift above a wafer expanding ring on the medicine feeding seat.
Further, still be provided with material loading frame, receipts work or material rest in the frame, material loading frame, loading device, device of standing, belt cleaning device, drying device and receipts work or material rest are in the frame top is sharp and arranges in proper order, the handling manipulator is in material loading frame, loading seat, stand seat, belt cleaning seat, drying device and receipts work or material rest between transport wafer expansion ring in proper order.
Further, the handling manipulator comprises clamping jaws, a first translation driving mechanism, a second translation driving mechanism and a clamping jaw lifting driving mechanism, wherein the first translation driving mechanism and the second translation driving mechanism are respectively connected and drive the clamping jaws to linearly displace along the linear arrangement direction parallel to and perpendicular to the feeding frame, the medicine feeding device, the standing device, the cleaning device, the drying device and the material collecting frame, and the clamping jaw lifting driving mechanism is connected with and drives the clamping jaws to lift.
Further, the charging frame includes crane, crane lift actuating mechanism, material loading fork and material loading fork actuating mechanism, vertical array has multilayer wafer expansion ring slot on the charging frame to supply a plurality of wafer expansion ring interval arrays to insert, crane lift actuating mechanism connects and drives the crane goes up and down, the crane lateral wall is opened and is formed with the material loading frame and gets the material outlet, material loading fork actuating mechanism connects and drives the material loading fork inserts or withdraws from the material loading frame gets the material outlet and inserts or withdraw from a wafer expansion ring below in the crane in order to insert and take out a wafer expansion ring, the transport manipulator operation goes out wafer expansion ring on the material loading fork.
Further, receive the work or material rest and include receipts material fork, receipts material fork elevating drive mechanism, receipts material carousel and receipts material carousel rotary drive mechanism, the transport manipulator with wafer expansion ring transport to receive material fork top, receive material fork elevating drive mechanism connect and drive receive material fork and go up and down, receive material fork includes first receipts material fork arm, second receipts material fork arm and receipts material fork opening and closing drive mechanism, receive material fork opening and closing drive mechanism connect and drive first receipts material fork arm and second receipts material fork arm are close to or keep away from horizontally, receive material carousel rotary drive mechanism connect and drive receive material carousel horizontal rotation, receive material carousel top has a plurality of open-top's receipts silo around its axis of rotation circumference array, in order to switch each receive silo one of the silo motion to receive material fork below.
After the scheme is adopted, the beneficial effects of the utility model are as follows: the top surface of the medicine feeding seat of the medicine feeding device is provided with a liquid outlet for spraying medicine liquid onto the surface of the hairbrush, so that the cleaning medicine liquid can be automatically brushed on the wafer expansion ring; transferring the wafer expansion ring to a standing seat through a carrying manipulator, and standing to fully soak the wafer expansion ring with the liquid medicine; transferring the wafer expansion ring onto the cleaning seat by using a carrying manipulator, and spraying atomized water towards the top surface of the cleaning seat by using a two-fluid spray head to flush the surface of the wafer expansion ring by using high-pressure water-gas mixing two fluids and flushing the cleaning liquid medicine; transferring the wafer expansion ring into a drying device by using a carrying manipulator, and drying the washed wafer expansion ring; therefore, the full-process cleaning of the wafer expansion ring is automatically realized, and the cleaning process is efficient, automatic and good in effect.
Drawings
FIG. 1 is a schematic perspective view of the present utility model;
FIG. 2 is a schematic perspective view of the device according to the present utility model;
FIG. 3 is a schematic perspective view of a stationary device according to the present utility model;
FIG. 4 is a schematic perspective view of a cleaning device according to the present utility model;
fig. 5 is a schematic perspective view of a drying apparatus according to the present utility model;
FIG. 6 is a schematic perspective view of a handling robot according to the present utility model;
FIG. 7 is a schematic perspective view of a lifting frame according to the present utility model;
FIG. 8 is a schematic perspective view of a feed fork according to the present utility model;
FIG. 9 is an enlarged view of a portion of the utility model at A in FIG. 1;
FIG. 10 is a schematic perspective view of a receiving turntable according to the present utility model;
FIG. 11 is a schematic view of a sewer pipe according to the present utility model.
Description of the reference numerals: 1-frame, 2-medicine feeding device, 3-standing device, 4-cleaning device, 5-drying device, 6-carrying manipulator, 7-medicine feeding seat, 8-medicine feeding driving mechanism, 9-brush, 10-wafer expanding ring, 11-standing seat, 12-cleaning seat, 13-two fluid nozzle, 14-spin-drying seat, 15-medicine feeding box, 16-standing box, 17-cleaning box, 18-drying box, 19-box door, 20-hollow, 21-sewer pipe, 22-brush driving mechanism, 23-feeding frame, 24-collecting frame, 25-clamping jaw, 26-first translation driving mechanism, 27-second translation driving mechanism, 28-box door opening and closing cylinder, 29-lifting frame, 30-lifting frame lifting driving mechanism, 31-feeding fork, 32-feeding fork driving mechanism, 33-wafer expanding ring slot, 34-feeding frame material taking opening, 35-receiving fork, 36-receiving fork lifting driving mechanism, 37-receiving turntable, 38-cleaning seat rotating driving mechanism, 39-first receiving fork arm, 40-second receiving fork arm, 41-receiving fork opening and closing driving mechanism, 42-receiving groove, 43-liquid inlet, 44-air inlet, 45-air supply device, 46-medicine collecting groove, 47-brush lifting driving mechanism, 48-brush translation driving mechanism, 49-brush supporting arm and 50-claw arm.
Detailed Description
The utility model will be described in detail with reference to the accompanying drawings and specific embodiments.
The utility model provides a wafer expanding ring cleaning machine, which is shown in fig. 1-11, and comprises a frame 1, a feeding frame 23, a medicine feeding device 2, a standing device 3, a cleaning device 4, a drying device 5, a receiving frame 24 and a carrying manipulator 6, wherein the feeding frame 23, the medicine feeding device 2, the standing device 3, the cleaning device 4, the drying device 5, the receiving frame 24 and the carrying manipulator 6 are arranged on the frame 1: in this embodiment, for the cleaning process, in order to make the device structure more compact and the working efficiency higher, the feeding frame 23, the feeding device 2, the standing device 3, the cleaning device 4, the drying device 5 and the receiving frame 24 are sequentially arranged above the frame 1 in a straight line, and the structures of the feeding frame 23 and the receiving frame 24 are not particularly limited, and are used for placing the wafer expanding ring 10;
the medicine feeding device 2 comprises a medicine feeding seat 7, a medicine feeding driving mechanism 8, a brush 9 and a medicine liquid feeding device, wherein the top surface of the medicine feeding seat 7 is used for placing a wafer expanding ring 10, the structure of the medicine feeding driving mechanism 8 is not particularly limited, as long as the medicine feeding driving mechanism can drive the brush 9 and the medicine feeding seat 7 to generate relative displacement, so that the brush 9 can brush the surface of the wafer expanding ring 10 above the medicine feeding seat 7, in the embodiment, the medicine feeding driving mechanism 8 comprises a medicine feeding seat rotating driving mechanism (not shown in the figure, can be any existing rotating driving mechanism) and a brush driving mechanism 22, the medicine feeding seat rotating driving mechanism is connected with and drives the medicine feeding seat 7, so that the wafer expanding ring 10 on the medicine feeding seat 7 rotates along with the medicine feeding seat 7 around an axis, the brush driving mechanism 22 is connected with and drives at least the brush 9 to lift above the wafer expansion ring 10 on the medicine feeding seat 7, the medicine liquid supplying device is provided with a liquid outlet for ejecting medicine liquid onto the surface of the brush 9, and then when the wafer expansion ring 10 is placed on the medicine feeding seat 7, the liquid outlet ejects the medicine liquid to adhere the medicine liquid onto the brush 9, the medicine liquid can be any medicine liquid used in the existing process of cleaning the wafer expansion ring, the brush driving mechanism 22 drives the brush 9 to descend and prop against the upper surface of the wafer expansion ring 10, the medicine feeding seat rotating driving mechanism is started, the medicine feeding seat 7 is driven to drive the wafer expansion ring 10 to rotate around the axis, and after one circle of rotation, the medicine liquid is uniformly brushed on the wafer expansion ring 10 by the brush 9; in a preferred embodiment, in order to avoid the waste of the liquid medicine and ensure that the liquid medicine can be uniformly adhered to the brush 9, the medicine feeding device 2 further comprises a medicine collecting tank 46, the liquid outlet is formed in the brush 9, the brush driving mechanism 22 comprises a brush lifting driving mechanism 47, a brush translation driving mechanism 48 and a brush supporting arm 49, the brush lifting driving mechanism 47 is connected with and drives the brush supporting arm 49 to lift, the brush translation driving mechanism 48 is connected with one end of the brush supporting arm 49, the brush supporting arm 49 is driven to horizontally swing, the brush 9 is arranged on the bottom surface of the other end of the brush supporting arm 49, the medicine collecting tank 49 and the medicine feeding seat 7 are positioned below a path for driving the brush 9 to move when the brush supporting arm 49 swings, and then when the brush 9 moves above the medicine collecting tank 49, the liquid medicine 9 is driven to extend downwards into the medicine collecting tank 49, at this time, the liquid medicine dropped from the brush 9 is collected by the medicine collecting tank 49, and the liquid medicine can be dipped when the liquid medicine in the medicine collecting tank 49 is sufficient, and the liquid medicine is not required to be opened every time when the medicine is fed to the brush 9;
the standing device 3 comprises a standing seat 11 with the top surface for placing the wafer expansion ring 10, and is used for standing the wafer expansion ring 10 after brushing the liquid medicine, so that the liquid medicine fully soaks the wafer expansion ring 10;
the cleaning device 4 comprises a cleaning seat 12 and a two-fluid nozzle 13, the top surface of the cleaning seat 12 is provided for placing the wafer expanding ring 10, the two-fluid nozzle 13 is also called a two-fluid nozzle or an atomization nozzle in the prior art, can mix water flow and gas, and then pressurizes and ejects the water flow to the surface of an object to achieve the cleaning effect, the specific structure of the interior of the cleaning device is not described in the embodiment, the two-fluid nozzle 13 is provided with a liquid inlet 43, an air inlet 44 and a spray hole (not shown in the drawing), the liquid inlet 43 is communicated with a water source device, the water source device can be any existing device capable of providing high-pressure water (not shown in the drawing), the air inlet 44 is communicated with an air supply device (not shown in the drawing), the air supply device can be any existing device which can supply high-pressure air under any action, spray holes spray atomized water towards the top surface of the cleaning seat 12 to clean the surface of the wafer expansion ring 10 and wash away the liquid medicine on the surface of the wafer expansion ring 10, and in particular, in order to improve the cleaning effect, the spray holes are positioned above the edge part of the cleaning seat 12 and are opposite to the wafer expansion ring 10, the cleaning seat 12 is rotatably arranged and is connected with a cleaning seat rotation driving mechanism 38 for driving the cleaning seat 12 to rotate, the cleaning seat 12 drives the wafer expansion ring 10 to rotate around a shaft to make the spray holes spray the whole wafer expansion ring 10; the drying device 5 is used for placing the wafer expansion ring 10 into drying, the drying device 5 can be any device capable of accelerating the surface drying of an object by utilizing heating drying, centrifugal drying, blowing drying or the like, and particularly in the embodiment, the drying device 5 comprises a drying seat 14 and a drying driving mechanism, the top surface of the drying seat 14 is used for placing the wafer expansion ring 10, and the drying driving mechanism is connected with and drives the drying seat 14 to horizontally rotate so as to dry the wafer expansion ring 10 through centrifugal force; in a preferred embodiment, the drying device 5 further includes an air supply device 45, where the air supply device 45 is disposed above the spin-drying seat 14 and blows air toward the wafer expansion ring 10 on the spin-drying seat 14 to accelerate the drying of the wafer expansion ring 10;
the handling manipulator 6 sequentially transfers the wafer expansion ring 10 between the loading frame 23, the medicine loading seat 7, the standing seat 11, the cleaning seat 12, the spin-drying seat 14 and the material receiving frame 24, and the conventional arrangement is not particularly limited in structure, and for improving efficiency, two handling manipulators 6 are preferably arranged; in this embodiment, the handling manipulator 6 includes a clamping jaw 25, a first translational driving mechanism 26, a second translational driving mechanism 27, and a clamping jaw lifting driving mechanism, where the clamping jaw 25 includes at least two claw arms 50, and a claw arm opening and closing driving mechanism (not shown in the drawing, and may be an air cylinder, etc., with a structure not limited) that drives each claw arm 50 to open and close horizontally, so that the clamping jaw 25 can clamp or release the wafer expanding ring 10 from the periphery of the wafer expanding ring 10, and the first translational driving mechanism 26 and the second translational driving mechanism 27 are respectively connected to and drive the clamping jaw 25 to linearly displace in a direction parallel to and perpendicular to the linear arrangement direction of the feeding frame 23, the feeding device 2, the standing device 3, the cleaning device 4, the drying device 5, and the receiving frame 24, so that the clamping jaw 25 can extend into the feeding frame 23, the feeding seat 7, the standing seat 11, the cleaning seat 12, the spin-drying seat 14, and the receiving frame 24, and the clamping jaw 25 is connected to and driven to lift and lift the wafer expanding ring 10.
In order to avoid the splashing of liquid medicine or water flow in the cleaning process, the equipment is polluted and secondary pollution to the wafer expansion ring 10 is caused, the machine frame 1 is further provided with a medicine feeding box 15, a standing box 16, a cleaning box 17 and a drying box 18, the medicine feeding device 2 is arranged in the medicine feeding box 15 in a sealing mode, the standing device 3 is arranged in the standing box 16 in a sealing mode, the cleaning device 4 is arranged in the cleaning box 17 in a sealing mode, the drying device 5 is arranged in the drying box 18 in a sealing mode, the medicine feeding box 15, the standing box 16, the cleaning box 17 and the drying box 18 are all provided with box doors 19 which can be opened or closed, each box door 19 is correspondingly provided with a box door opening and closing cylinder 28 for pneumatically driving each box door 19 to be opened or closed independently, hollowed-out 20 are arranged on the medicine feeding seat 7, the standing seat 11, the cleaning seat 12 and the seat 14, and sewer pipes 21 are respectively arranged at the bottoms of the medicine feeding box 15, the standing box 16, the cleaning box 17 and the drying box 18 so as to prevent water flow accumulated in a spin-drying box.
Specifically in this embodiment, the loading frame 23 includes a lifting frame 29, a lifting frame lifting driving mechanism 30, a loading fork 31 and a loading fork driving mechanism 32, where a plurality of wafer expansion ring slots 33 are longitudinally arranged on the loading frame 23 in array for inserting a plurality of wafer expansion rings 10 at intervals, the lifting frame lifting driving mechanism 30 is connected to and drives the lifting frame 29 to lift, a loading frame material taking opening 34 is formed on a side wall of the lifting frame 29 in an open manner, the loading fork driving mechanism 32 is connected to and drives the loading fork 31 to be inserted into or withdrawn from the loading frame material taking opening 34 below one wafer expansion ring 10 in the lifting frame 29, when the loading fork 31 is inserted into the lower part of the one wafer expansion ring 10, the lifting frame lifting driving mechanism 30 drives the lifting frame 29 to descend, so that the wafer expansion ring 10 above the loading fork 31 falls on the loading fork 31, when the loading fork 31 is withdrawn from the lifting frame 29, one wafer expansion ring 10 is inserted, and the handling manipulator 6 is transferred to the wafer expansion ring 10 on the loading fork 31 and placed on the wafer seat 7.
Specifically in this embodiment, the receiving rack 24 includes a receiving fork 35, a receiving fork lifting driving mechanism 36, a receiving turntable 37 and a receiving turntable rotation driving mechanism 38, the handling manipulator 6 transfers the dried wafer expansion ring 10 on the spin-drying seat 14 onto the receiving fork 35, the receiving fork lifting driving mechanism 36 is connected to and drives the receiving fork 35 to lift, the receiving fork 35 includes a first receiving fork arm 39, a second receiving fork arm 40 and a receiving fork opening driving mechanism 41, the receiving fork opening driving mechanism 41 is connected to and drives the first receiving fork arm 39 and the second receiving fork arm 40 to horizontally approach or separate from each other, when approaching, the wafer expansion ring 10 can drop onto the receiving fork 35, when separating, the wafer expansion ring 10 on the receiving fork 35 leaks from between the first receiving fork arm 39 and the second receiving fork arm 40, the receiving turntable rotation driving mechanism 38 is connected to and drives the receiving turntable 37 to horizontally rotate, when the receiving turntable 37 rotates around a plurality of circumferential arrays of receiving turntable 37 to one of receiving turntable rotation axes 42, and when moving to the receiving turntable rotation 42 in the receiving turntable rotation direction of the receiving turntable 37.
The above embodiments are only preferred embodiments of the present utility model, and are not limited to the present utility model, and all equivalent changes made according to the design key of the present utility model fall within the protection scope of the present utility model.

Claims (9)

1. The wafer expanding ring cleaning machine is characterized by comprising a frame (1), and a medicine feeding device (2), a standing device (3), a cleaning device (4), a drying device (5) and a carrying manipulator (6) which are arranged on the frame (1):
the medicine feeding device (2) comprises a medicine feeding seat (7), a medicine feeding driving mechanism (8), a brush (9) and a medicine liquid supply device, wherein the top surface of the medicine feeding seat (7) is used for placing a wafer expanding ring (10), the medicine feeding driving mechanism (8) is used for driving the brush (9) to brush the surface of the wafer expanding ring (10) above the medicine feeding seat (7), and the medicine liquid supply device is provided with a liquid outlet for spraying medicine liquid to the surface of the brush (9);
the standing device (3) comprises a standing seat (11) with the top surface for placing a wafer expanding ring (10);
the cleaning device (4) comprises a cleaning seat (12) and a two-fluid spray head (13), wherein the top surface of the cleaning seat (12) is used for placing a wafer expanding ring (10), and the two-fluid spray head (13) sprays atomized water towards the top surface of the cleaning seat (12);
the drying device (5) is used for placing the wafer expansion ring (10) for drying;
the carrying manipulator (6) is used for transferring the wafer expansion ring (10) among the medicine loading seat (7), the standing seat (11), the cleaning seat (12) and the drying device (5).
2. A wafer expander cleaning machine as defined in claim 1, wherein: the drying device (5) comprises a drying seat (14) and a drying driving mechanism, wherein the top surface of the drying seat (14) is used for placing a wafer expansion ring (10), and the drying driving mechanism is connected with and drives the drying seat (14) to horizontally rotate.
3. A wafer expander cleaning machine as defined in claim 2, wherein: still be provided with on frame (1) medicine-feeding box (15), stand case (16), wash case (17) and drying cabinet (18), medicine-feeding device (2) seal arrangement is in medicine-feeding box (15), it sets up to stand device (3) seal in case (16) stand, cleaning device (4) seal arrangement is in wash case (17), drying device (5) seal arrangement is in drying cabinet (18), all be provided with on medicine-feeding box (15), stand case (16), wash case (17) and drying cabinet (18) chamber door (19) that can open or close.
4. A wafer expander cleaning machine as claimed in claim 3, wherein: go up medicine seat (7), rest seat (11), wash seat (12) and spin-dry seat (14) on all be provided with fretwork (20), go up medicine chest (15), rest case (16), wash case (17) and drying cabinet (18) bottom of the case all has switch on downcomer (21).
5. A wafer expander cleaning machine as defined in claim 1, wherein: the medicine feeding driving mechanism (8) comprises a medicine feeding seat rotary driving mechanism and a brush driving mechanism (22), wherein the medicine feeding seat rotary driving mechanism is connected with and drives the medicine feeding seat (7) so as to enable a wafer expanding ring (10) on the medicine feeding seat (7) to rotate around an axis, and the brush driving mechanism (22) is connected with and at least drives the brush (9) to lift above the wafer expanding ring (10) on the medicine feeding seat (7).
6. A wafer expander cleaning machine as defined in claim 1, wherein: still be provided with on frame (1) material loading frame (23), receive work or material rest (24), material loading frame (23), medicine feeding device (2), device of standing (3), belt cleaning device (4), drying device (5) and receive work or material rest (24) are in frame (1) top is sharp arranges in proper order, transport manipulator (6) are in material loading frame (23), material loading seat (7), stand seat (11), cleaning seat (12), drying device (5) and receive and transport wafer expansion ring (10) in proper order between work or material rest (24).
7. A wafer expander cleaning machine as defined in claim 6, wherein: the carrying manipulator (6) comprises clamping jaws (25), a first translation driving mechanism (26), a second translation driving mechanism (27) and a clamping jaw lifting driving mechanism, wherein the first translation driving mechanism (26) and the second translation driving mechanism (27) are respectively connected and drive the clamping jaws (25) to linearly displace along the linear arrangement direction parallel to and perpendicular to the feeding frame (23), the medicine feeding device (2), the standing device (3), the cleaning device (4), the drying device (5) and the collecting frame (24), and the clamping jaw lifting driving mechanism is connected and drives the clamping jaws (25) to lift.
8. A wafer expander cleaning machine as defined in claim 6, wherein: the feeding frame (23) comprises a lifting frame (29), a lifting frame lifting driving mechanism (30), a feeding fork (31) and a feeding fork driving mechanism (32), a plurality of wafer expansion ring slots (33) are longitudinally arranged on the feeding frame (23) and are used for inserting a plurality of wafer expansion rings (10) at intervals, the lifting frame lifting driving mechanism (30) is connected with and drives the lifting frame (29) to lift, a feeding frame material taking opening (34) is formed in the side wall of the lifting frame (29) in an opening mode, the feeding fork driving mechanism (32) is connected with and drives the feeding fork (31) to be inserted into or withdrawn from the lower portion of one wafer expansion ring (10) in the lifting frame (29) from the feeding frame material taking opening (34) so as to insert and take out one wafer expansion ring (10), and the conveying manipulator (6) rotates out of the wafer expansion ring (10) on the feeding fork (31).
9. A wafer expander cleaning machine as defined in claim 6, wherein: the material collecting frame (24) comprises a material collecting fork (35), a material collecting fork lifting driving mechanism (36), a material collecting rotary table (37) and a material collecting rotary table rotary driving mechanism (38), the carrying manipulator (6) transfers the wafer expanding ring (10) to the upper portion of the material collecting fork (35), the material collecting fork lifting driving mechanism (36) is connected with and drives the material collecting fork (35) to lift, the material collecting fork (35) comprises a first material collecting fork arm (39), a second material collecting fork arm (40) and a material collecting fork opening and closing driving mechanism (41), the material collecting fork opening and closing driving mechanism (41) is connected with and drives the first material collecting fork arm (39) and the second material collecting fork arm (40) to horizontally approach or separate, the material collecting rotary driving mechanism (38) is connected with and drives the material collecting rotary table (37) to horizontally rotate, a plurality of top opening material collecting grooves (42) are circumferentially arrayed around the rotation axis of the material collecting rotary table (37) so as to switch the material collecting rotary table (37) to one of the material collecting grooves (35) in the rotary process of switching.
CN202223407786.8U 2022-12-19 2022-12-19 Wafer expansion ring cleaning machine Active CN219092916U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202223407786.8U CN219092916U (en) 2022-12-19 2022-12-19 Wafer expansion ring cleaning machine

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202223407786.8U CN219092916U (en) 2022-12-19 2022-12-19 Wafer expansion ring cleaning machine

Publications (1)

Publication Number Publication Date
CN219092916U true CN219092916U (en) 2023-05-30

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CN202223407786.8U Active CN219092916U (en) 2022-12-19 2022-12-19 Wafer expansion ring cleaning machine

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CN (1) CN219092916U (en)

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