CN218996655U

CN218996655U - Wafer moving platform and measurement equipment with same

Info

Publication number: CN218996655U
Application number: CN202123036611.6U
Authority: CN
Inventors: 刘钦源; 郑少宇
Original assignee: Presys Suzhou Intelligent Technology Co ltd
Current assignee: Presys Suzhou Intelligent Technology Co ltd
Priority date: 2021-12-06
Filing date: 2021-12-06
Publication date: 2023-05-09
Anticipated expiration: 2031-12-06

Abstract

The utility model discloses a wafer moving platform and a measuring device with the same, comprising: a bottom plate; the X-axis sliding plate is arranged on the bottom plate; the Y-axis sliding plate is arranged on the X-axis sliding plate; the first sliding mechanism is connected between the bottom plate and the X-axis sliding plate and used for driving the first extending side of the X-axis sliding plate to slide out of the bottom plate along the X-axis direction; the second sliding mechanism is connected between the X-axis sliding plate and the Y-axis sliding plate and used for driving the second extending side of the Y-axis sliding plate to slide out of the X-axis sliding plate along the Y-axis direction; the X-axis sliding plate is provided with a first extending side, and the Y-axis sliding plate is provided with a second extending side. The utility model can improve the stability of the mobile platform in the moving process, further ensure that the end face of the wafer to be measured always keeps a consistent angle, and ensure the accuracy of the wafer measurement.

Description

Wafer moving platform and measurement equipment with same

Technical Field

The present utility model relates to wafer measurement technologies, and in particular, to a wafer moving platform and a measurement apparatus having the same.

Background

The semiconductor factory generally faces the problems of more processes and complex processes, and in order to ensure the quality of the wafer, the critical dimension parameters of the wafer need to be measured, so that whether the production line is abnormal or not can be timely found.

In the prior art, a wafer moving platform is generally disposed, the moving platform includes a sliding mechanism and a sliding plate slidably connected to the sliding mechanism, and a wafer is disposed on the sliding plate to move synchronously therewith, so as to drive the detecting mechanism to measure a plurality of positions of the wafer. When the wafer moves to different positions, the end face to be measured of the wafer needs to be always kept at a consistent angle so as to ensure the accuracy of measurement. However, in the existing moving platform, when the sliding plate moves out of a certain position of the sliding mechanism, the sliding plate is stressed unevenly to cause inclination, so that the measuring accuracy of the wafer is reduced.

Accordingly, there is a need for an improvement over the prior art to overcome the deficiencies described in the prior art.

Disclosure of Invention

The utility model aims to provide a wafer moving platform and a measuring device with the same, so as to prevent a sliding plate from tilting.

The utility model aims at realizing the following technical scheme: a wafer moving platform, comprising: a bottom plate; the X-axis sliding plate is arranged on the bottom plate; the Y-axis sliding plate is arranged on the X-axis sliding plate; the first sliding mechanism is connected between the bottom plate and the X-axis sliding plate and used for driving the first extending side of the X-axis sliding plate to slide out of the bottom plate along the X-axis direction; the second sliding mechanism is connected between the X-axis sliding plate and the Y-axis sliding plate and used for driving the second extending side of the Y-axis sliding plate to slide out of the X-axis sliding plate along the Y-axis direction; the X-axis sliding plate is provided with a first extending side, and the Y-axis sliding plate is provided with a second extending side.

Further, the first sliding mechanism includes: the first guide rail is fixed on the bottom plate along the X-axis direction; the second guide rail is arranged in parallel with the first guide rail; and a first roller structure received between the first rail and the second rail such that the second rail is slidable relative to the first rail; wherein, X axle sliding plate with the second guide rail meets.

Further, the second sliding mechanism includes: the third guide rail is fixed on the X-axis sliding plate along the Y-axis direction; the fourth guide rail is arranged in parallel with the third guide rail; and a second roller structure received between the third rail and the fourth rail such that the fourth rail is slidable relative to the third rail; wherein, the Y-axis sliding plate is connected with the fourth guide rail.

Further, a side of the Y-axis sliding plate opposite to the first protruding side is a first weighted side, and a first accommodating space for accommodating the first weighting member is provided between the first weighted side and the X-axis sliding plate.

Further, the moving platform comprises a first guide block fixed on the X-axis sliding plate and located at the first accommodating space, the first guide block is provided with a first guide groove, the first weighting piece is fixed on the first weighting side, and the first guide groove can guide the first weighting piece to slide along the Y-axis direction.

Further, a side of the X-axis sliding plate opposite to the second extending side is a second weighting side, and the second weighting side extends out of the bottom plate to form a second accommodating space for accommodating the second weighting member.

Further, the moving platform comprises a second guide block fixed on the bottom plate and located at the second accommodating space, the second guide block is provided with a second guide groove, the second weighting piece is fixed on the second weighting side, and the second guide groove can guide the second weighting piece to slide along the X-axis direction.

Further, the number of the first sliding mechanisms is two, and the first sliding mechanisms are respectively located at two sides of the X-axis sliding plate, and the number of the second sliding mechanisms is two, and the second sliding mechanisms are respectively located at two sides of the Y-axis sliding plate.

Further, the first sliding mechanism and the second sliding mechanism are provided with driving pieces for driving the X-axis sliding plate and the Y-axis sliding plate to slide respectively.

In addition, the utility model also provides a measuring device, comprising: the wafer moving platform; the wafer carrying platform is arranged on the Y-axis sliding plate and is used for accommodating and positioning a wafer; and the measuring mechanism is positioned above the wafer carrier and is arranged towards the wafer carrier.

Compared with the prior art, the utility model has the following beneficial effects: according to the utility model, the first weighting piece is arranged on the Y-axis sliding plate, when the X-axis sliding plate drives the Y-axis sliding plate to partially extend out of the bottom plate along the X-axis direction, the first weighting piece can improve the weight of the X-axis sliding plate at a position far away from the first extending side, so that the instability of the movable platform caused by the fact that the part of the X-axis sliding plate extending out of the bottom plate is not born is avoided; through set up the second and add the heavy piece on X axle sliding plate, when Y axle sliding plate stretches out X axle sliding plate along Y axle direction part, the second adds the heavy piece and can improve the weight of Y axle sliding plate in keeping away from the second department of stretching out the side, avoids because of the part that the Y axle sliding plate stretches out X axle sliding plate is not born and causes moving platform unstable.

Drawings

Fig. 1 is a schematic structural view of a mobile platform according to the present utility model.

Fig. 2 is an exploded view of the mobile platform of the present utility model.

Fig. 3 is a schematic structural view of a first sliding mechanism in the present utility model.

FIG. 4 is a schematic exploded view of the first weighting member and the first guide block of the present utility model.

Fig. 5 is a schematic diagram of the structure of the measuring apparatus of the present utility model.

Detailed Description

In order to make the above objects, features and advantages of the present application more comprehensible, embodiments accompanied with figures are described in detail below. It is to be understood that the specific embodiments described herein are for purposes of illustration only and are not limiting. It should be further noted that, for convenience of description, only some, but not all of the structures related to the present application are shown in the drawings. All other embodiments, which can be made by one of ordinary skill in the art without undue burden from the present disclosure, are within the scope of the present disclosure.

The terms "comprising" and "having" and any variations thereof herein are intended to cover a non-exclusive inclusion. For example, a process, method, system, article, or apparatus that comprises a list of steps or elements is not limited to only those listed steps or elements but may include other steps or elements not listed or inherent to such process, method, article, or apparatus.

Reference herein to "an embodiment" means that a particular feature, structure, or characteristic described in connection with the embodiment may be included in at least one embodiment of the present application. The appearances of such phrases in various places in the specification are not necessarily all referring to the same embodiment, nor are separate or alternative embodiments mutually exclusive of other embodiments. Those of skill in the art will explicitly and implicitly appreciate that the embodiments described herein may be combined with other embodiments.

Referring to fig. 1 to 4, a wafer moving platform according to a preferred embodiment of the present utility model includes: a bottom plate 10; an X-axis sliding plate 20 arranged on the bottom plate 10; a Y-axis sliding plate 30 provided on the X-axis sliding plate 20; a first sliding mechanism 40 connected between the base plate 10 and the X-axis sliding plate 20 to drive the first projecting side 21 of the X-axis sliding plate 20 to slide out of the base plate 10 in the X-axis direction; and a second sliding mechanism 50 connected between the X-axis sliding plate 20 and the Y-axis sliding plate 30 to drive the second protruding side 31 of the Y-axis sliding plate 30 to slide out of the X-axis sliding plate 20 along the Y-axis direction; wherein a first weighting member 60 is provided on a side of the Y-axis sliding plate 30 opposite to the first projecting side 21, and a second weighting member 70 is provided on a side of the x-axis sliding plate 20 opposite to the second projecting side 31.

According to the utility model, the first weighting piece 60 is arranged on the Y-axis sliding plate 30, when the X-axis sliding plate 20 drives the Y-axis sliding plate 30 to partially extend out of the bottom plate 10 along the X-axis direction, the first weighting piece 60 can increase the weight of the X-axis sliding plate 20 at the position far away from the first extending side 21, so that the instability of a moving platform caused by the fact that the part of the X-axis sliding plate 20 extending out of the bottom plate 10 is not born is avoided; by providing the second weight 70 on the X-axis sliding plate 20, when the Y-axis sliding plate 30 partially extends out of the X-axis sliding plate 20 in the Y-axis direction, the second weight 70 can increase the weight of the Y-axis sliding plate 30 at a position far from the second extending side 31, and unstable moving platform due to the fact that the portion of the Y-axis sliding plate 30 extending out of the X-axis sliding plate 20 is not supported can be avoided.

Further, the first sliding mechanism 40 is specifically a cross roller guide, and includes a first guide rail 41, a second guide rail 42, and a first roller structure 43, where the first guide rail 41 is fixed on the base plate 10 along the X direction, the second guide rail 42 is parallel to the first guide rail 41, and the first roller structure 43 is received between the first guide rail 41 and the second guide rail 42, so that the second guide rail 42 can slide relative to the first guide rail 41; the X-axis slide plate 20 is fixedly connected to the second rail 42. The first roller structure 43 includes a roller frame 431 fixed to the first rail 41 and a roller 432 mounted on the roller frame 431, and the second rail 42 has a slide groove (not shown) into which the roller 432 is fitted. By assembling the two rows of roller guides in parallel, the rail system can bear loads in four directions, and since pre-compression can be applied to the cross roller guides, a sliding motion with no play, high rigidity, and light motion can be obtained.

In addition, the first sliding mechanism 40 is further provided with a driving member (not shown) in driving connection with the X-axis sliding plate 20 to drive the X-axis sliding plate 20 to move along the X-axis direction.

Further, the structure of the second slide mechanism 50 is the same as that of the first slide mechanism 40. The second sliding mechanism 50 includes a third rail 51, a fourth rail 52, and a second roller structure (not shown), the third rail 51 being fixed to the X-axis sliding plate 20 along the Y-axis direction, the fourth rail 52 being disposed in parallel with the third rail 51, the second roller structure being received between the third rail 51 and the fourth rail 52 such that the fourth rail 52 is slidable relative to the third rail 51. The Y-axis slide plate 30 is fixedly connected to the fourth rail 52. In addition, the second sliding mechanism 50 is also provided with a driving member, and the driving member is in transmission connection with the Y-axis sliding plate 30 to drive the Y-axis sliding plate 30 to move along the Y-axis direction.

Further, the number of the first sliding mechanisms 40 is two, and the first sliding mechanisms are respectively located at two sides of the X-axis sliding plate 20, and the number of the second sliding mechanisms 50 is two, and the second sliding mechanisms are respectively located at two sides of the Y-axis sliding plate 30.

Further, the side of the Y-axis sliding plate 30 opposite to the first projecting side 21 is a first weight side 32, and a first accommodating space for accommodating the first weight 60 is provided between the first weight side 32 and the X-axis sliding plate 20. The moving platform includes a first guide block 80 fixed on the X-axis sliding plate 20 at the first receiving space, the first guide block 80 being provided with a first guide groove 81, the first weight 60 being fixed on the first weight side 32, the first guide groove 81 being capable of guiding the first weight 60 to slide in the Y-axis direction.

Specifically, the number of the first guide grooves 81 is two, and the first guide grooves 81 are respectively formed by downwardly recessing from the upper end surface of the first guide block 80, and are formed by upwardly recessing from the lower end surface of the first guide block 80, and the first guide grooves 81 are through structures extending from one side to the other side along the Y-axis direction.

The first weight 60 includes a frame 61 and a weight plate 62, and the frame 61 and the weight plate 62 extend from one side to the other side of the Y-axis sliding plate 30 in the Y-axis direction. The frame 61 is connected with the bottom of the Y-axis sliding plate 30 by bolts, buckles and the like, the frame 61 comprises an upper plate 611 and an upper plate 612 which are oppositely arranged, the number of the weighting plates 62 is two, the weighting plates 62 are respectively arranged on the upper plate 611 and the upper plate 612, and the two weighting plates 62 are respectively in sliding fit with the two first guide grooves 81. Preferably, the frame 61 is not in contact with the X-axis sliding plate 20, and the weight plate 62 is not in contact with the groove bottom of the first guide groove 81.

Further, the side of the X-axis sliding plate 20 opposite to the second protruding side 31 is a second weight side 22, and the second weight side 22 extends out of the base plate 10 to form a second accommodating space for accommodating the second weight 70.

The moving platform includes a second guide block 90 fixed to the base plate 10 at the second receiving space, the second guide block 90 being provided with a second guide groove 91, the second weight 70 being fixed to the second weight side 22, the second guide groove 91 being capable of guiding the second weight 70 to slide in the X-axis direction. The second weight 70 has a structure similar to that of the first weight 60, and the second guide block 90 has a structure similar to that of the first guide block 80, and the present utility model will not be repeated here.

Preferably, in order to facilitate assembly of the first and

second weight members

60 and 70, the first and

second weight members

60 and 70 may be formed of a multi-segment splice. In the present embodiment, the first and

second weight members

60 and 70 are combined by two sections, which are respectively assembled by approaching each other from both sides of the first and/or

second guide blocks

80 and 90, thereby improving the convenience of assembly.

In addition, referring to fig. 5, the present utility model further provides a measurement apparatus, including the foregoing wafer movement translation; the wafer carrier 100 is disposed on the Y-axis sliding plate 30, and is used for accommodating and positioning a wafer 500; and a measuring mechanism 200 located above the wafer stage 100 and disposed towards the wafer stage 100. Preferably, the measuring apparatus further includes a robot 300 and a receiving box 400 receiving the wafer 500, and the robot 300 may place the wafer 500 to be measured in the receiving box 400 on the wafer stage 100 or put the wafer 500 after the measurement on the wafer stage 100 back into the receiving box 400.

The foregoing description is only of embodiments of the present application, and is not intended to limit the scope of the patent application, and all equivalent structures or equivalent processes using the descriptions and the drawings of the present application or direct or indirect application in other related technical fields are included in the scope of the patent protection of the present application.

Claims

1. A wafer moving platform, comprising:

a bottom plate (10);

an X-axis sliding plate (20) arranged on the bottom plate (10);

a Y-axis sliding plate (30) provided on the X-axis sliding plate (20);

a first sliding mechanism (40) connected between the base plate (10) and the X-axis sliding plate (20) to drive a first projecting side (21) of the X-axis sliding plate (20) to slide out of the base plate (10) along the X-axis direction; and

a second sliding mechanism (50) connected between the X-axis sliding plate (20) and the Y-axis sliding plate (30) to drive a second protruding side (31) of the Y-axis sliding plate (30) to slide out of the X-axis sliding plate (20) along the Y-axis direction;

the Y-axis sliding plate (30) is provided with a first weighting piece (60) on the side opposite to the first extending side (21), and the X-axis sliding plate (20) is provided with a second weighting piece (70) on the side opposite to the second extending side (31).

2. The wafer moving platform of claim 1, wherein the first slide mechanism (40) comprises:

a first rail (41) fixed to the base plate (10) along the X-axis direction;

a second guide rail (42) disposed parallel to the first guide rail (41); and

a first roller structure (43) received between the first rail (41) and the second rail (42) such that the second rail (42) is slidable relative to the first rail (41);

wherein the X-axis sliding plate (20) is connected with the second guide rail (42).

3. The wafer moving platform of claim 1, wherein the second slide mechanism (50) comprises:

a third guide rail (51) fixed to the X-axis sliding plate (20) along the Y-axis direction;

a fourth guide rail (52) disposed parallel to the third guide rail (51); and

a second roller structure received between the third rail (51) and the fourth rail (52) such that the fourth rail (52) is slidable relative to the third rail (51);

wherein the Y-axis sliding plate (30) is connected with the fourth guide rail (52).

4. The wafer moving platform of claim 1, wherein a side of the Y-axis slide plate (30) opposite the first projecting side (21) is a first weighted side (32), and a first receiving space for receiving the first weight (60) is provided between the first weighted side (32) and the X-axis slide plate (20).

5. The wafer moving platform according to claim 4, characterized in that the moving platform includes a first guide block (80) fixed on the X-axis sliding plate (20) and located at the first accommodation space, the first guide block (80) being provided with a first guide groove (81), the first weight member (60) being fixed on the first weight side (32), the first guide groove (81) being capable of guiding the first weight member (60) to slide in the Y-axis direction.

6. The wafer moving platform of claim 1, wherein a side of the X-axis slide plate (20) opposite the second projecting side (31) is a second weighted side (22), the second weighted side (22) extending out of the base plate (10) to form a second receiving space for receiving the second weight (70).

7. The wafer moving platform according to claim 6, characterized in that the moving platform includes a second guide block (90) fixed to the bottom plate (10) and located at the second accommodation space, the second guide block (90) being provided with a second guide groove (91), the second weight member (70) being fixed to the second weight side (22), the second guide groove (91) being capable of guiding the second weight member (70) to slide in the X-axis direction.

8. The wafer moving platform according to claim 1, wherein the number of the first sliding mechanisms (40) is two, and the first sliding mechanisms are respectively located at two sides of the X-axis sliding plate (20), and the number of the second sliding mechanisms (50) is two, and the second sliding mechanisms are respectively located at two sides of the Y-axis sliding plate (30).

9. The wafer moving platform according to claim 3, wherein the first slide mechanism (40) and the second slide mechanism (50) are each provided with a driving member to drive the X-axis slide plate (20) and the Y-axis slide plate (30) to slide, respectively.

10. A measurement device, comprising: the wafer moving platform of any one of claims 1 to 9;

a wafer carrier (100) disposed on the Y-axis sliding plate (30) and used for accommodating and positioning a wafer (500); and

and the measuring mechanism (200) is positioned above the wafer carrier (100) and is arranged towards the wafer carrier (100).