CN218974628U - Flower type evaporation microprism retroreflective film - Google Patents
Flower type evaporation microprism retroreflective film Download PDFInfo
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- CN218974628U CN218974628U CN202223077459.0U CN202223077459U CN218974628U CN 218974628 U CN218974628 U CN 218974628U CN 202223077459 U CN202223077459 U CN 202223077459U CN 218974628 U CN218974628 U CN 218974628U
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Abstract
The utility model relates to a flower type evaporation microprism retroreflective film, which comprises a hard protective film surface layer, a flexible optical carrier film layer, a microprism pyramid layer, a printing layer, an evaporation metal layer and a film layer for being adhered to the surface of an object, wherein the surface of the film layer is covered with an adhesive layer or a viscous ink layer, and the adhesive layer or the viscous ink layer synchronously adheres to pyramid surfaces of the evaporation metal layer and the microprism pyramid layer. Unlike traditional integral block pattern evaporation, the present utility model has the advantages that the continuous pattern evaporation is adopted, the punched hollowed-out pattern film plays a role in shielding in the evaporation process, the hollowed-out pattern holes are adopted to evaporate the metal layer patterns or shapes on the pyramid layers, the retro-reflection parts of the patterns or shapes are increased, the visual effect is obvious, the resolution is high, the evaporated hollowed-out pattern film can be reused, the cost is saved, the production efficiency is improved in continuous production, and the consistency and quality of products are improved.
Description
Technical Field
The utility model relates to the technical field of reflecting films. In particular to a flower type evaporation microprism retroreflective film.
Background
The traditional microbead product is composed of a base material, glass microbeads of reflective key components, a metal vapor layer and a resin adhesive, and is a lens embedded type civil microbead reflective product, and the microbeads of the reflective product are arranged on the outer surface of the base material and do not reflect light when meeting water, so that the defects of easy oxidation, bead dropping, mildew, fading, wear resistance and the like exist.
At present, civil reflecting materials with built-in microprism structures appear in the market, a super-soft optical carrier film is generally adopted, a hard array microprism pyramid is implanted on the surface of the super-soft optical carrier film, then a full-face vapor plating metal layer is carried out on the diagonal conical surface, the effect of protecting the pyramid is achieved, the compact full-face vapor plating metal layer plays the role of reflecting silver mirror surfaces, the retroreflective brightness of the microprism reflecting materials is increased, but the reflecting materials still have the defects, and in order to increase the compound fastness between the microprism reflecting materials and articles endowed with the reflecting effect, the viscosity or the glue applying amount of glue is often directly increased to achieve the effect of treating the symptoms and preventing the cause. Namely, after the microprism reflective film with the full-face vapor plating metal layer is compositely attached to an object endowed with a reflective effect through glue, the metal layer and the pyramid layer are separated from each other and delaminated due to the strong viscosity of the adhesive, an interlayer structure is damaged, the effect of protecting the pyramid is lost, and the microprism retroreflective system is damaged due to the environmental factors such as water meeting from the outside, and the reflective effect is lost.
Disclosure of Invention
The utility model provides a pattern vapor plating microprism retroreflective film, which adopts a compound adhesive glue layer to be directly attached with a metal layer and a glue layer to be directly attached with a prism layer at the same time to give a reflective effect to an object, solves the problem of interlayer fastness of a reflective structure, and improves the added value of the product given with the reflective effect to the object by a method of vapor plating metal layers with different patterns.
The utility model adopts the following technical scheme:
the utility model provides a flower formula coating by vaporization microprism retro-reflective film, includes hard protection film surface course, flexible optical carrier rete, microprism pyramid rete, stamp layer, coating by vaporization metal level and is used for pasting the glued membrane layer that covers in the article surface, and hard protection film surface course is compound above flexible optical carrier rete, and below and the plane of microprism pyramid layer of flexible optical carrier rete are compound, its characterized in that: the vapor plating metal layer is a certain shape or pattern continuity array vapor plating on the corner cone surface of the microprism pyramid layer, the surface of the adhesive film layer is covered with an adhesive layer or a viscous ink layer, the adhesive layer or the viscous ink layer is synchronously adhered with the vapor plating metal layer and the pyramid surface of the microprism pyramid layer, the printing layer is arranged on the corner cone surface, and the printing shape or pattern is complementary with the pattern or shape of the vapor plating metal layer.
Further, the total thickness of the patterned vapor deposition microprism retroreflective film is 100-140 um.
Further, the thickness of the pyramid layer of the microprism is 10-50 um.
Further improved, the pyramid surface of the pyramid layer of the microprism is a pyramid square borderless continuous array of 1cm 2 There are not less than 1000 unit pyramids in the area.
Further improved, the flexible optical carrier film layer is a TPU film, and the thickness of the flexible optical carrier film layer is 10-100 um.
Further improved, the hard protective film surface layer is a PET film, and the thickness of the hard protective film surface layer is 10-100 um.
Further improved, the adhesive film layer is a PES film, and the thickness of the adhesive film layer is 10 um-100 um.
Further improved, the array pattern of the vapor deposition metal layer is a unit pattern array of a circle, a triangle, a five-pointed star and a diamond.
The manufacturing method of the fancy evaporation microprism retroreflective film comprises the following steps:
and 6, compounding the corner conical surface of the microprism reflecting film with the local vapor plating metal layer formed in the step 5 with an adhesive film to prepare the fancy vapor plating microprism reflecting film.
The application of the fancy evaporation microprism retroreflective film is that: and (3) sticking the adhesive film surface of the retroreflective film with the adhesive film layer on the surface of the object with the reflective effect, thermally sticking the retroreflective film to enable the adhesive film layer to be heated to generate adhesiveness, adhering the adhesive film layer on the surface of the object, and removing the protective film on the surface of the retroreflective film layer.
As can be seen from the above description of the structure of the present utility model, compared with the prior art, the present utility model has the following advantages:
1. compared with the fully plated metal plating microprism reflecting film, the flower type vapor plating microprism reflecting film has various flower type and colorful visual effects from the appearance.
2. On the action of the interlayer structure, the adhesive and the hot melt adhesive generated after the adhesive film are hot melted, one surface is simultaneously connected with all the metal vapor layers and the microprism pyramid layers without the plating metal layers, and the other surface is connected with the object surface endowed with the reflecting effect, while the attaching fastness between the metal layers and the object surface is reduced, the pyramid surface is creatively connected with the object surface, the attaching performance between the whole retroreflective film and the object surface is improved, the service life of the retroreflective object product is prolonged, and the added value efficiency is improved.
3. Compared with the perspective film formed by the existing punched reflective film, the reflective pattern or shape of the reflective film is a discontinuous array, the non-reflective part is reserved, but the retroreflective system is destroyed and does not reflect light, the whole film is complete and not hollowed out, the visual effect of high and low dislocation is not generated, and the whole retroreflective film is connected with the surface of an object through an adhesive, so that the adhesion fastness is not reduced; and the punched part of the punched reflective film does not exist, only the reserved reflective part is connected with the object, so that the contact area is reduced, and the adhesion fastness is reduced.
4. Unlike traditional single-piece fancy evaporation, the novel patterned film has the advantages that the patterned film is subjected to continuous fancy evaporation, the punched hollowed-out patterned film plays a role in shielding in the evaporation process, the metal layer pattern or the pattern of the hollowed-out patterned hole evaporation is formed in the pyramid layer, the retro-reflection part of the pattern or the pattern reflection part is enhanced, the visual effect is obvious, the resolution is high, the hollowed-out patterned film after evaporation can be reused, the cost is saved, the production efficiency is improved due to continuous production, and the consistency quality of products is improved.
Drawings
FIG. 1 is a schematic view showing an interlayer structure of a patterned vapor deposition microprism retroreflective film according to the present utility model.
Fig. 2 is a schematic diagram of a retroreflective cross-section of a patterned vapor deposition microprism according to the present utility model.
FIG. 3 is a flow chart of a method for manufacturing a patterned vapor deposition microprism retroreflective film of the present utility model.
FIG. 4 is a schematic view of another interlayer structure of a patterned vapor deposited microprism retroreflective film according to the present utility model.
FIG. 5 is a schematic view of a retroreflective section of another patterned vapor deposition microprism of the present utility model.
Detailed Description
Specific embodiments of the present utility model will be described below with reference to the accompanying drawings.
Example 1:
referring to fig. 1 and 2, a circular array vapor deposition microprism retroreflective film comprises a hard protective film surface layer 1, a flexible optical carrier film layer 2, a microprism pyramid layer 3, a vapor deposition metal layer 4 and a glue film layer 6 for being attached to the surface of an object, wherein the hard protective film surface layer 1 is compounded on the flexible optical carrier film layer 2, and the lower surface of the flexible optical carrier film layer 2 is compounded with the plane of the microprism pyramid layer 3. The vapor deposition metal layer 4 is a vapor deposition aluminum layer, the vapor deposition metal layer 4 is in a circular array vapor deposition on the corner cone surface of the microprism pyramid layer 3, the surface of the adhesive film layer 6 is covered with an adhesive layer 5, and the adhesive layer 5 is synchronously adhered with the corner cone surfaces of the vapor deposition metal layer 4 and the microprism pyramid layer 3.
The total thickness of the patterned vapor deposition microprism retroreflective film is 100-140 um.
The thickness of the pyramid layer 3 of the microprism is 10-50 um.
The angular conical surface of the pyramid layer 3 of the microprism is a pyramid square borderless continuous array, 1cm of which 2 There are not less than 1000 unit pyramids in the area.
The flexible optical carrier film layer 2 is a TPU film, and the thickness of the flexible optical carrier film layer 2 is 10 um-100 um.
The hard protective film surface layer 1 is a PET film, and the thickness of the hard protective film surface layer 1 is 10 um-100 um.
The adhesive film layer 6 is a PES film, and the thickness of the adhesive film layer 6 is 10 um-100 um.
The application of the pattern evaporation microprism retroreflective film is that the PES adhesive film layer 6 is hot-melted into high-viscosity hot melt adhesive through the heat conduction of the pattern evaporation microprism retroreflective film, and then the high-viscosity hot melt adhesive is compounded with the garment fabric.
Referring to fig. 3, the method for manufacturing the circular array fancy evaporation microprism retroreflective film comprises the following steps:
Example 2:
referring to fig. 2, a triangular array vapor deposition microprism retroreflective film includes a hard protective film surface layer 1, a flexible optical carrier film layer 2, a microprism pyramid layer 3, a vapor deposition metal layer 4 and a glue film layer 6 for adhering to the surface of an object, wherein the hard protective film surface layer 1 is compounded on the flexible optical carrier film layer 2, and the lower surface of the flexible optical carrier film layer 2 is compounded with the plane of the microprism pyramid layer 3. The vapor deposition metal layer 4 is a vapor deposition zinc sulfide layer, the vapor deposition metal layer 4 is vapor deposited on the corner cone surface of the microprism pyramid layer 3 in a triangular array, the surface of the adhesive film layer 6 is covered with an adhesive ink layer (color) 5, the adhesive ink layer (color) 5 is synchronously adhered to the corner cone surfaces of the vapor deposition metal layer 4 and the microprism pyramid layer 3, and the other surface of the adhesive ink layer (color) 5 is connected with the adhesive film layer 6.
The application of the floral vapor deposition microprism retroreflective film is that the PES adhesive film layer 6 is thermally fused into high-viscosity hot melt adhesive through the heat conduction of the floral vapor deposition microprism retroreflective film, and then the high-viscosity hot melt adhesive is compounded with the shoe material fabric.
Referring to fig. 3, the method for manufacturing the triangular array type vapor deposition microprism retroreflective film comprises the following steps:
Example 3:
referring to fig. 2, a diamond array vapor deposition microprism retroreflective film includes a hard protective film surface layer 1, a flexible optical carrier film layer 2, a microprism pyramid layer 3, a vapor deposition metal layer 4 and a glue film layer 6 for adhering to the surface of an object, wherein the microprism pyramid layer 3 is a color transparent microprism pyramid layer 3, the hard protective film surface layer 1 is compounded on the flexible optical carrier film layer 2, and the lower surface of the flexible optical carrier film layer 2 is compounded with the plane of the microprism pyramid layer 3. The vapor deposition metal layer 4 is a vapor deposition aluminum layer, the vapor deposition metal layer 4 is in a diamond array vapor deposition on the corner conical surface of the microprism pyramid layer 3, the surface of the adhesive film layer 6 is covered with an adhesive layer, the adhesive layer is synchronously adhered with the corner conical surfaces of the vapor deposition metal layer 4 and the microprism pyramid layer 3, and the other surface of the adhesive layer is connected with the adhesive film layer 6.
The application of the fancy evaporation microprism retroreflective film is that the PES film layer 6 is hot-melted into high-viscosity hot melt adhesive through hot-stamping heat conduction of the fancy evaporation microprism retroreflective film, and then the high-viscosity hot melt adhesive is compounded with the luggage leather material.
Referring to fig. 3, the method for manufacturing the diamond array fancy evaporation microprism retroreflective film comprises the following steps:
Example 4:
referring to fig. 4 and 5, a pentagram array evaporation microprism retroreflective film includes a hard protective film surface layer 1, a flexible optical carrier film layer 2, a microprism pyramid layer 3, an evaporation metal layer 4, a printing layer 7 and a glue film layer 6 for adhering to the surface of an object, wherein the hard protective film surface layer 1 is compounded on the flexible optical carrier film layer 2, and the lower surface of the flexible optical carrier film layer 2 is compounded with the plane of the microprism pyramid layer 3. The vapor deposition metal layer 4 is a vapor deposition zinc sulfide layer, the vapor deposition metal layer 4 is vapor deposited on the corner cone surface of the microprism pyramid layer 3 in a pentagram array, the shape or pattern of the printing layer 7 is printed on the corner cone surface of the microprism pyramid layer 3 in a complementary manner with the pattern or shape of the metal layer, the surface of the adhesive film layer 6 is covered with an adhesive layer 5, and the adhesive layer 5 is synchronously adhered with the vapor deposition metal layer 4 and the printing layer 7 on the corner cone surface of the microprism pyramid layer 3.
The application of the floral vapor deposition microprism retroreflective film is that the PES adhesive film layer 6 is hot-melted to form high-viscosity hot melt adhesive through heat conduction of the floral vapor deposition microprism retroreflective film, and then the high-viscosity hot melt adhesive is compounded with textile cloth.
Referring to fig. 3, the method for manufacturing the pentagram array flower type evaporation microprism retroreflective film comprises the following steps:
The foregoing is merely illustrative of specific embodiments of the present utility model, but the design concept of the present utility model is not limited thereto, and any insubstantial modification of the present utility model by using the design concept shall fall within the scope of the present utility model.
Claims (8)
1. The utility model provides a flower formula coating by vaporization microprism retro-reflective film, includes hard protection film surface course, flexible optical carrier rete, microprism pyramid rete, stamp layer, coating by vaporization metal level and is used for pasting the glued membrane layer that covers in the article surface, and hard protection film surface course is compound above flexible optical carrier rete, and below and the plane of microprism pyramid layer of flexible optical carrier rete are compound, its characterized in that: the vapor plating metal layer is a certain shape or pattern continuity array vapor plating on the corner cone surface of the microprism pyramid layer, the surface of the adhesive film layer is covered with an adhesive layer or a viscous ink layer, the adhesive layer or the viscous ink layer is synchronously adhered with the vapor plating metal layer and the pyramid surface of the microprism pyramid layer, the printing layer is arranged on the corner cone surface, and the printing shape or pattern is complementary with the pattern or shape of the vapor plating metal layer.
2. A patterned vapor deposited microprism retroreflective film as defined in claim 1, wherein: the total thickness of the floral vapor plating microprism retroreflective film is 100 um-140 um.
3. A patterned vapor deposited microprism retroreflective film as defined in claim 1, wherein: the thickness of the pyramid layer of the microprism is 10-50 um.
4. A patterned vapor deposited microprism retroreflective film as defined in claim 1, wherein: the pyramid surface of the pyramid layer of the microprism is a pyramid square borderless continuous array of 1cm 2 There are not less than 1000 unit pyramids in the area.
5. A patterned vapor deposited microprism retroreflective film as defined in claim 1, wherein: the flexible optical carrier film layer is a TPU film, and the thickness of the flexible optical carrier film layer is 10 um-100 um.
6. A patterned vapor deposited microprism retroreflective film as defined in claim 1, wherein: the hard protective film surface layer is a PET film, and the thickness of the hard protective film surface layer is 10-100 um.
7. A patterned vapor deposited microprism retroreflective film as defined in claim 1, wherein: the adhesive film layer is a PES film, and the thickness of the adhesive film layer is 10 um-100 um.
8. A patterned vapor deposited microprism retroreflective film as defined in claim 1, wherein: the array pattern of the vapor plating metal layer is a unit pattern array of a circle, a triangle, a diamond and a five-pointed star.
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CN202223077459.0U CN218974628U (en) | 2022-11-21 | 2022-11-21 | Flower type evaporation microprism retroreflective film |
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CN202223077459.0U CN218974628U (en) | 2022-11-21 | 2022-11-21 | Flower type evaporation microprism retroreflective film |
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