CN218969352U

CN218969352U - Substrate loading table

Info

Publication number: CN218969352U
Application number: CN202223390297.6U
Authority: CN
Inventors: 顾骏; 王德苗; 顾为民; 冯斌; 李东滨
Original assignee: Hangzhou Bifanke Electronic Technology Co ltd
Current assignee: Hangzhou Bifanke Electronic Technology Co ltd
Priority date: 2022-12-17
Filing date: 2022-12-17
Publication date: 2023-05-05
Anticipated expiration: 2032-12-17

Abstract

The utility model discloses a substrate loading table, which relates to the technical field of film plating and comprises a machine body and a control panel fixedly arranged on the machine body, wherein a vacuum cylinder is fixedly arranged on the machine body; the sputtering target heads are fixedly arranged on the vacuum cylinder; the rotating plate is vertically arranged in the vacuum cylinder in a sliding manner; the rotating assemblies are fixedly arranged on the rotating plate. According to the substrate loading table, the substrate is turned over by utilizing the rotating assembly, so that a worker can simultaneously perform magnetron sputtering coating treatment on the two sides of the substrate without opening the vacuum cylinder for many times, the workload of the worker is reduced, the efficiency of magnetron sputtering coating on the substrate is improved, the situation that the vacuum effect in the vacuum cylinder is influenced due to the fact that the vacuum cylinder is opened for many times is avoided as much as possible, and the effect of magnetron sputtering coating on the substrate is improved to a certain extent.

Description

Substrate loading table

Technical Field

The utility model relates to the technical field of film plating, in particular to a substrate loading table.

Background

The magnetron sputtering coating equipment is one of vacuum coating, and the sputtering coating is that under the vacuum condition, a cathode is connected with high-voltage electricity to excite glow discharge, and positively charged argon ions strike a cathode target material, so that the argon ions shoot out film material particles and deposit on a substrate to form a film layer.

The product coated by the magnetron sputtering coating equipment has the advantages of excellent uniformity of a film layer, strong adhesive force, high compactness and the like, and is widely applied to materials such as stainless steel, water-coated hardware, plastic parts, glass ceramics and the like.

The utility model provides a chinese patent of bulletin CN209974876U, name "vertical two-sided magnetron sputtering coating equipment of adjustable height", includes the quick-witted case, support piece is installed to the upper end of machine case, the vacuum box is installed to upper end one side of support piece, the magnetron target head is installed to upper end one side of vacuum box, sliding connection has the sputtering target platform on the support piece, the guiding axle has been welded respectively to the lower extreme both sides of sputtering target platform, guiding axle sliding connection is on support piece, two the lower extreme welding of guiding axle has the connecting seat jointly, adjusting device is installed jointly on the lateral wall of connecting seat and machine case. The problems that the distance between a coating product and a sputtering head is inconvenient to adjust in the coating process and the sputtering range of a coating is inconvenient to adjust due to the fact that the magnetron sputtering target and an evaporation source of the existing magnetron sputtering coating equipment are fixedly arranged in a vacuum chamber and the use flexibility is poor are solved.

However, when the magnetron sputtering coating equipment is used for performing magnetron sputtering coating on the substrate, in order to coat the coating layer on both sides of the substrate, after one side of the substrate is subjected to measurement and control sputtering coating, the substrate needs to be turned over to the other side so as to perform magnetron sputtering coating treatment on the other side of the substrate, but the problem of adjusting the distance between a coating product and a sputtering handle is only solved in the above patent, so when the magnetron sputtering coating equipment is used for performing magnetron sputtering coating on both sides of the substrate, the substrate can be turned over after the magnetron sputtering coating on the other side of the substrate is completed, the workload of staff is increased, the efficiency of the magnetron sputtering coating on the substrate is reduced, and the effect of the magnetron sputtering coating on the substrate is reduced to a certain extent because the vacuum cylinder is repeatedly opened.

Disclosure of Invention

The object of the present utility model is to provide a substrate loading table, which solves the above-mentioned drawbacks in the prior art.

In order to achieve the above object, the present utility model provides the following technical solutions: the substrate loading table comprises a machine body, a control panel fixedly arranged on the machine body, and further comprises: the vacuum cylinder is fixedly arranged on the machine body; the sputtering target heads are fixedly arranged on the vacuum cylinder; the rotating plate is vertically arranged in the vacuum cylinder in a sliding manner; a plurality of rotating assemblies, each rotating assembly is all fixed to be set up on the swivel plate, rotating assembly includes: two transverse plates rotatably arranged on the rotating plate, clamping plates are arranged between the two transverse plates in a collinear and reverse sliding way, and elastic pieces are arranged between each clamping plate and the two transverse plates; the rotating plate is provided with a driving component for driving the two clamping plates to rotate.

Further, the rotating assembly further comprises a first supporting plate and a second supporting plate which are fixedly installed on the rotating plate, and the two transverse plates are respectively connected to the first supporting plate and the second supporting plate in a rotating mode.

Further, the elastic piece is a pressure spring, and two ends of the pressure spring are fixedly connected with the transverse plate and the clamping plate respectively.

Further, the driving assembly comprises a support fixedly connected to the first supporting plate, a first motor is fixedly installed on the support, and the output end of the first motor is fixedly connected with one of the two transverse plates.

Further, clamping grooves are formed in one side, close to each other, of each clamping plate, and a protection pad is fixedly arranged in each clamping groove and is a rubber pad; and a pull rod is fixedly arranged on one side, far away from the clamping groove, of each clamping plate, and the section of the pull rod is T-shaped.

Further, a plurality of electric telescopic rods are fixedly installed in the vacuum cylinder, the output ends of the electric telescopic rods are fixedly connected with lifting rings, and the rotating plate is rotatably arranged in the lifting rings.

Further, the bottom surface fixedly connected with a plurality of connecting rods of lift ring, a plurality of the bottom fixedly connected with trident board of connecting rod, fixedly connected with second motor on the trident board, the output of second motor with rotating plate fixed connection.

Further, the side wall of the vacuum cylinder is fixedly provided with an observation window.

In the technical scheme, the utility model provides a substrate loading table, which has the following beneficial effects: when the magnetron sputtering coating process is carried out on the substrate, the vacuum cylinder is opened, the two clamping plates on the rotating assembly can clamp the substrate to be subjected to the magnetron sputtering coating, then the height of the rotating plate is adjusted, so that the substrate and the sputtering target head can be adjusted to a proper distance, then the magnetron target head is utilized to carry out the coating process on one side of the substrate, after the coating process is finished, the driving assembly is utilized to enable the two transverse plates to rotate under the action of the driving assembly, so that the substrate between the two clamping plates is turned over, the sputtering target head can carry out the magnetron sputtering coating on the other side of the substrate, and the rotating assembly is utilized to turn over the substrate, so that a worker does not need to open the vacuum cylinder for multiple times, and the magnetron sputtering coating process can be carried out on the two sides of the substrate at the same time.

Drawings

In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings that are needed in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments described in the present utility model, and other drawings may be obtained according to these drawings for a person having ordinary skill in the art.

FIG. 1 is a schematic view of the overall structure provided by an embodiment of the present utility model;

FIG. 2 is a schematic view of the internal structure of the vacuum cylinder in FIG. 1 according to an embodiment of the present utility model;

FIG. 3 is a schematic view of a partially disassembled structure of FIG. 2 according to an embodiment of the present utility model;

FIG. 4 is a schematic view of a portion of the rotating plate of FIG. 3 according to an embodiment of the present utility model;

FIG. 5 is a schematic view of a partial structure of FIG. 4 according to an embodiment of the present utility model;

FIG. 6 is a schematic diagram of the structure shown in FIG. 5A according to an embodiment of the present utility model;

FIG. 7 is a schematic diagram of the structure shown in FIG. 5B according to an embodiment of the present utility model;

fig. 8 is a schematic view of the bottom structure of fig. 4 according to an embodiment of the present utility model.

Reference numerals illustrate:

1. a body; 2. a control panel; 3. a vacuum cylinder; 4. a sputter target; 5. an observation window; 61. an electric telescopic rod; 62. a lifting ring; 63. a rotating plate; 64. a rotating assembly; 641. a first support plate; 642. a second support plate; 643. a cross plate; 644. a clamping plate; 645. an elastic member; 646. a first motor; 647. a bracket; 648. a clamping groove; 649. a pull rod; 65. a second motor; 66. a tri-fork plate; 67. and a connecting rod.

Detailed Description

In order to make the technical scheme of the present utility model better understood by those skilled in the art, the present utility model will be further described in detail with reference to the accompanying drawings.

Referring to fig. 1 to 8, a substrate loading table provided in an embodiment of the present utility model includes a machine body 1, a control panel 2 fixedly mounted on the machine body 1, and further includes: the vacuum cylinder 3, the vacuum cylinder 3 is fixedly installed on the machine body 1; a plurality of sputtering targets 4, each sputtering target 4 being fixedly mounted on the vacuum cylinder 3; the rotating plate 63, the rotating plate 63 is vertically arranged in the vacuum cylinder 3 in a sliding way; a plurality of rotating assemblies 64, each rotating assembly 64 is fixedly disposed on the rotating plate 63, and the rotating assembly 64 comprises: two transverse plates 643 rotatably arranged on the rotating plate 63, clamping plates 644 are arranged between the two transverse plates 643 in a collinear and reverse sliding way, and elastic elements 645 are arranged between each clamping plate 644 and the two transverse plates 643; the rotating plate 63 is provided with a driving component for driving the two clamping plates 644 to rotate; when the magnetron sputtering coating process is performed on the substrate, the vacuum cylinder 3 is opened, so that the two clamping plates 644 on the rotating assembly 64 can clamp the substrate to be subjected to the magnetron sputtering coating, then the height of the rotating plate 63 is adjusted, so that the substrate and the sputtering target 4 can be adjusted to a proper distance, then the magnetron target is used for coating the one surface of the substrate, after the coating process is completed, the driving assembly is used for enabling the two transverse plates 643 to rotate under the action of the driving assembly, and therefore the substrate between the two clamping plates 644 is turned over, so that the sputtering target 4 can perform the magnetron sputtering coating on the other surface of the substrate, and the workpiece is turned over by the rotating assembly 64, so that a worker does not need to open the vacuum cylinder 3 for multiple times, and the magnetron sputtering coating process can be performed on both surfaces of the substrate, thereby not only reducing the workload of the worker, improving the efficiency of the magnetron sputtering coating on the substrate, but also avoiding the occurrence of the influence on the vacuum effect in the vacuum cylinder 3 due to the multiple opening of the vacuum cylinder 3 to a certain extent, and improving the magnetron sputtering effect on the substrate.

Specifically, the rotating assembly 64 further includes a first support plate 641 and a second support plate 642 fixedly mounted on the rotating plate 63, and two transverse plates 643 are rotatably connected to the first support plate 641 and the second support plate 642, respectively; the first support plate 641 and the second support plate 642 provide an effect of supporting the two cross plates 643 in an auxiliary manner.

Specifically, the elastic element 645 is a compression spring, and two ends of the compression spring are fixedly connected with the transverse plate 643 and the clamping plate 644 respectively; by using the compression springs, the two clamping plates 644 can move towards the direction close to each other under the action of the elastic force of the compression springs, so that the effect of rapidly clamping the substrate is achieved.

Specifically, the driving assembly includes a bracket 647 fixedly connected to the first supporting plate 641, a first motor 646 is fixedly installed on the bracket 647, and an output end of the first motor 646 is fixedly connected with one of the two transverse plates 643; by using the first motor 646 on the bracket 647, after the magnetron sputtering coating is completed on one surface of the substrate, one of the two transverse plates 643 can rotate under the action of the first motor 646, the other transverse plate 643 can also rotate under the drive of the first motor 646, and then the other surface of the substrate can be overturned.

Specifically, two clamping plates 644 are provided with clamping grooves 648 on one side close to each other, and a protection pad is fixedly arranged in each clamping groove 648 and is a rubber pad; a pull rod 649 is fixedly arranged on one side of the two clamping plates 644 far from the clamping groove 648, and the cross section of the pull rod 649 is T-shaped; the clamping groove 648 is utilized to limit the placing position of the substrate, and the rubber pad in the clamping groove 648 is utilized to protect the end face of the substrate, so that the condition that the end face of the substrate is damaged when the two clamping plates 644 clamp and limit the substrate due to the large acting force of the elastic piece 645 is avoided as much as possible; by using the pull rod 649, the effect of conveniently and rapidly disassembling and assembling the substrate between the two clamping plates 644 by pulling the two clamping plates 644 is achieved.

Specifically, the inside of the vacuum cylinder 3 is fixedly provided with a plurality of electric telescopic rods 61, the output ends of the electric telescopic rods 61 are fixedly connected with lifting rings 62, and a rotating plate 63 is rotatably arranged in the lifting rings 62; when the distance between the substrate and the sputtering target 4 needs to be adjusted by utilizing the electric telescopic rod 61, the electric telescopic rod 61 is opened, so that the rotating plate 63 on the lifting frame can be lifted or settled under the driving of the electric telescopic rod 61, and the substrates with different specifications can be adjusted to proper distances according to the substrates with different specifications and the sputtering target 4.

Specifically, the bottom surface of the lifting ring 62 is fixedly connected with a plurality of connecting rods 67, the bottom ends of the plurality of connecting rods 67 are fixedly connected with a three-fork plate 66, the three-fork plate 66 is fixedly connected with a second motor 65, and the output end of the second motor 65 is fixedly connected with the rotating plate 63; the second motor 65 of the three-fork plate 66 can drive the rotating plate 63 to rotate.

Specifically, the side wall of the vacuum cylinder 3 is fixedly provided with an observation window 5; the observation window 5 on the side wall of the vacuum cylinder 3 is utilized to achieve the effect of monitoring the substrate in the vacuum cylinder 3 in real time.

While certain exemplary embodiments of the present utility model have been described above by way of illustration only, it will be apparent to those of ordinary skill in the art that modifications may be made to the described embodiments in various different ways without departing from the spirit and scope of the utility model. Accordingly, the drawings and description are to be regarded as illustrative in nature and not as restrictive of the scope of the utility model, which is defined by the appended claims.

Claims

1. The substrate loading table comprises a machine body (1) and a control panel (2) fixedly arranged on the machine body (1), and is characterized by further comprising:

a vacuum cylinder (3), wherein the vacuum cylinder (3) is fixedly arranged on the machine body (1);

a plurality of sputtering target heads (4), wherein each sputtering target head (4) is fixedly arranged on the vacuum cylinder (3);

the rotating plate (63) is vertically arranged in the vacuum cylinder (3) in a sliding manner;

a plurality of rotating assemblies (64), each rotating assembly (64) being fixedly disposed on the rotating plate (63), the rotating assembly (64) comprising:

two transverse plates (643) rotatably arranged on the rotating plates (63), clamping plates (644) are arranged between the two transverse plates (643) in a collinear and reverse sliding way, and elastic pieces (645) are arranged between each clamping plate (644) and the two transverse plates (643);

the rotating plate (63) is provided with a driving component for driving the two clamping plates (644) to rotate.

2. A substrate loading station according to claim 1, wherein the rotating assembly (64) further comprises a first support plate (641) and a second support plate (642) fixedly mounted on the rotating plate (63), and the transverse plates (643) are rotatably connected to the first support plate (641) and the second support plate (642), respectively.

3. The substrate loading table according to claim 1, wherein the elastic member (645) is a compression spring, and two ends of the compression spring are fixedly connected with the transverse plate (643) and the clamping plate (644), respectively.

4. A substrate mounting table according to claim 2, wherein the driving assembly comprises a bracket (647) fixedly connected to the first supporting plate (641), a first motor (646) is fixedly mounted on the bracket (647), and an output end of the first motor (646) is fixedly connected with one of the two transverse plates (643).

5. The substrate loading table according to claim 1, wherein two clamping plates (644) are provided with clamping grooves (648) on one side, which is close to each other, of each clamping plate, and a protective pad is fixedly arranged in each clamping groove (648), and is a rubber pad;

one side of each clamping plate (644) far away from the clamping groove (648) is fixedly provided with a pull rod (649), and the section of each pull rod (649) is T-shaped.

6. The substrate loading table according to claim 1, wherein a plurality of electric telescopic rods (61) are fixedly installed in the vacuum cylinder (3), the output ends of the electric telescopic rods (61) are fixedly connected with lifting rings (62), and the rotating plate (63) is rotatably arranged in the lifting rings (62).

7. The substrate loading table according to claim 6, wherein a plurality of connecting rods (67) are fixedly connected to the bottom surface of the lifting ring (62), a three-fork plate (66) is fixedly connected to the bottom ends of the plurality of connecting rods (67), a second motor (65) is fixedly connected to the three-fork plate (66), and the output end of the second motor (65) is fixedly connected to the rotating plate (63).

8. A substrate loading station according to claim 1, characterized in that the side wall of the vacuum drum (3) is fixedly provided with an observation window (5).