CN218812076U

CN218812076U - Air inlet device for LPCVD equipment

Info

Publication number: CN218812076U
Application number: CN202222311146.0U
Authority: CN
Inventors: 左佳旺; 吴志明
Original assignee: Hunan Red Sun Photoelectricity Science and Technology Co Ltd
Current assignee: Hunan Red Sun Photoelectricity Science and Technology Co Ltd
Priority date: 2022-08-31
Filing date: 2022-08-31
Publication date: 2023-04-07
Anticipated expiration: 2032-08-31

Abstract

The utility model discloses an air inlet unit for LPCVD equipment, including confined inlet manifold, be equipped with the reaction gas conveyer pipe in the inlet manifold, the reaction gas conveyer pipe is used for carrying reaction gas to the reacting chamber, be equipped with coolant entry and coolant export on the inlet manifold. The utility model has the advantages of simple structure and less blockage of the pipeline.

Description

Air inlet device for LPCVD equipment

Technical Field

The utility model relates to a LPCVD technology technical field especially relates to an air inlet unit for LPCVD equipment.

Background

The air inlet modes of the LPCVD equipment used in the market at present mainly comprise flange air inlet and pipeline air inlet. The flange air inlet mode is annular air inlet or Y-shaped air nozzle air inlet; the pipeline air inlet mode mainly adopts spray pipe air inlet or straight pipe air inlet.

In order to avoid too rapid a reaction of the silane in the region of the furnace mouth, auxiliary gas inlets are generally added, so that the silane can be fed directly into the furnace via the auxiliary gas inlets into the region of the furnace tail.

The decomposition temperature of silane is 400 ℃, the LP process temperature is about 600 ℃ and is higher than the decomposition temperature of silane, so that silane can be partially decomposed in the process of conveying silane to the tail of the furnace, a layer of silicon powder is adhered to the inner wall of the pipeline after the pipeline for conveying silane is used for a long time, and after a period of process, a silicon powder layer adhered to the inner wall of the pipeline becomes thick, and cannot be improved by nitrogen purging. When a pipeline is blocked or silicon powder is seriously deposited, the following problems 1 that the uniformity difference among the whole boat of battery pieces is large and the battery pieces cannot reach the standard can occur; 2. the edge deposition time of the single cell is insufficient, and the growth rate is too slow; 3. hardware damage such as a flowmeter, a pneumatic valve and the like caused by pipeline blockage; 4. the equipment maintenance period is short, and the utilization rate of the equipment is influenced. And along with silicon powder deposit at the pipeline inner wall, can lead to the pipeline internal diameter to reduce, and the silane flow is unchangeable, then silane admission speed can accelerate, leads to silicon powder deposit inadequately, and the process film thickness also can reduce, influences product quality.

SUMMERY OF THE UTILITY MODEL

The to-be-solved technical problem of the utility model is to overcome the not enough of prior art, provide a simple structure, reduce the air inlet unit for LPCVD equipment who blocks up the pipeline.

In order to solve the technical problem, the utility model discloses a following technical scheme:

the utility model provides a LPCVD is air inlet unit for equipment, includes confined air intake manifold, be equipped with the reactant gas conveyer pipe in the air intake manifold, the reactant gas conveyer pipe is used for carrying reactant gas in to the reacting chamber, be equipped with coolant entry and coolant export on the air intake manifold.

As a further improvement of the above technical solution:

the reaction gas delivery pipe passes through the gas inlet manifold and is communicated with the reaction chamber.

One end of the reaction gas conveying pipe is closed, an air outlet pipe is arranged on the reaction gas conveying pipe, and the air outlet pipe penetrates through the air inlet main pipe to be communicated with the reaction chamber.

The outlet duct is equipped with many, many the outlet duct is along reaction gas conveyer pipe length direction interval arrangement.

The air outlet pipe is welded with the air inlet main pipe.

And a cooling medium input pipe is arranged on the air inlet main pipe, and the cooling medium inlet is an inlet of the cooling medium input pipe.

The air inlet main pipe is provided with a cooling medium output pipe, the cooling medium outlet is the outlet of the cooling medium output pipe, and the length of the cooling medium output pipe is smaller than that of the cooling medium input pipe.

The cooling medium input pipe and the cooling medium output pipe are arranged at the same end of the air inlet main pipe.

The inner wall of the reaction gas conveying pipe is a smooth inner wall.

Compared with the prior art, the beneficial effects of the utility model reside in that:

the utility model discloses a gas inlet unit for LPCVD equipment, be equipped with the reaction gas conveyer pipe in the inlet manifold, carry the reaction gas silane in to the reacting chamber through the reaction gas conveyer pipe, enter into coolant to the inlet manifold through the coolant, heat in the inlet manifold is taken away to coolant, export from the coolant export, reach and carry out refrigerated purpose to the reaction gas conveyer pipe, moreover, the steam generator is simple in structure, can avoid silane to decompose into silica flour before getting into the reacting chamber prerequisite, adhere to the reaction gas conveyer pipe inner wall, cause the pipe blockage, avoid silane admission speed to accelerate, influence product quality.

Further, the utility model discloses an air inlet unit for LPCVD equipment is equipped with the coolant input tube on the inlet manifold, and the coolant entry is the entry of coolant input tube. In carrying coolant to the air intake manifold through the coolant input tube, prolonged coolant's cooling route to a certain extent, can be better cool off reaction gas conveyer pipe, improve the cooling effect.

Further, the utility model discloses an air inlet unit for LPCVD equipment, reaction gas conveyer pipe inner wall are smooth inner wall, can reduce silica flour and adhere to on reaction gas conveyer pipe's inner wall, reduce the pipe blockage.

Drawings

Fig. 1 is a schematic front view of a first embodiment of the gas inlet device for LPCVD equipment according to the present invention.

Fig. 2 is a schematic top view of a first embodiment of the gas inlet device for LPCVD equipment according to the present invention.

Fig. 3 is a schematic cross-sectional view of a first embodiment of the gas inlet device for LPCVD equipment according to the present invention.

Fig. 4 is a schematic front view of a second embodiment of the gas inlet device for LPCVD equipment according to the present invention.

Fig. 5 is a schematic top view of a second embodiment of the gas inlet device for LPCVD equipment according to the present invention.

Fig. 6 is a schematic sectional view of a second embodiment of the gas inlet device for LPCVD equipment according to the present invention.

The reference numerals in the figures denote: 1. an intake manifold; 2. a reaction gas delivery pipe; 21. an air outlet pipe; 3. a cooling medium inlet; 4. a cooling medium outlet; 5. a reaction chamber; 6. a cooling medium input pipe; 7. and a cooling medium output pipe.

Detailed Description

The technical solution of the present invention will be further described in detail with reference to the drawings and specific embodiments.

As used in this disclosure and in the claims, the terms "a," "an," "the," and/or "the" are not intended to be inclusive in the singular, but rather are inclusive in the plural unless the context clearly dictates otherwise. The use of "first," "second," and the like in this disclosure is not intended to indicate any order, quantity, or importance, but rather is used to distinguish one element from another. Similarly, the word "comprising" or "comprises", and the like, means that the element or item preceding the word comprises the element or item listed after the word and its equivalent, but does not exclude other elements or items. The terms "connected" or "coupled" and the like are not restricted to physical or mechanical connections, but may include electrical connections, whether direct or indirect.

Example one

Fig. 1 to fig. 3 show an embodiment of the air inlet device for LPCVD equipment of the present invention, the air inlet device for LPCVD equipment of this embodiment, including confined air inlet manifold 1, be equipped with reaction gas conveyer pipe 2 in the air inlet manifold 1, reaction gas conveyer pipe 2 is used for carrying reaction gas to reaction chamber 5 in, is equipped with cooling medium entry 3 and cooling medium export 4 on the air inlet manifold 1.

This gas inlet unit for LPCVD equipment, be equipped with reaction gas conveyer pipe 2 in the inlet manifold 1, carry reaction gas silane in 5 to the reacting chamber through reaction gas conveyer pipe 2, enter 3 to inlet manifold 1 input coolant through the coolant, heat in the inlet manifold 1 is taken away to the coolant, export 4 outputs from the coolant outlet, reach and carry out refrigerated purpose to reaction gas conveyer pipe 2, moreover, the steam generator is simple in structure, can avoid silane to decompose into silica flour before getting into 5 prerequisite of reacting chamber, adhere to at reaction gas conveyer pipe 2 inner walls, cause the pipeline to block up, avoid silane admission speed to accelerate, influence product quality.

In this embodiment, the reaction gas delivery pipe 2 passes through the gas inlet manifold 1 to be communicated with the reaction chamber 5, the structure is simple, and silane is directly delivered to the reaction chamber 5 through the reaction gas delivery pipe 2.

In this embodiment, the intake manifold 1 is provided with a cooling medium inlet pipe 6, and the cooling medium inlet 3 is an inlet of the cooling medium inlet pipe 6. Carry coolant to the air intake manifold 1 in through coolant input tube 6, prolonged coolant's cooling route to a certain extent, can be better cool off reaction gas conveyer pipe 2, improve the cooling effect. Preferably, the cooling medium may be nitrogen or the like.

Further, in this embodiment, the cooling medium outlet pipe 7 is disposed on the intake manifold 1, the cooling medium outlet 4 is an outlet of the cooling medium outlet pipe 7, and the length of the cooling medium outlet pipe 7 is smaller than that of the cooling medium inlet pipe 6. Preferably, the cooling medium is input to the other end of the air inlet manifold 1 through the cooling medium input pipe 6, then is diffused to each part in the air inlet manifold 1, and is output from the shorter cooling medium output pipe 7 after cooling the reaction gas conveying pipe 2, so that the cooling path of the cooling medium is prolonged, and the cooling effect on the reaction gas conveying pipe 2 is improved.

Furthermore, in this embodiment, the cooling medium input pipe 6 and the cooling medium output pipe 7 are disposed at the same end of the gas inlet manifold 1, so that the cooling medium is conveyed from one end to the other end of the gas inlet manifold 1, and then returns to the input end along the length direction of the reactant gas conveying pipe 2, thereby further improving the cooling effect on the reactant gas conveying pipe 2.

In this embodiment, the inner wall of the reaction gas delivery pipe 2 is a smooth inner wall, which can reduce the adhesion of silicon powder on the inner wall of the reaction gas delivery pipe 2 and reduce the blockage of the pipeline.

In this embodiment, the gas inlet manifold 1, the reaction gas delivery pipe 2, the cooling medium inlet pipe 6, and the cooling medium outlet pipe 7 are all steel pipes.

The air intake process of the present embodiment is as follows (dc intake): silane is input into the reaction chamber 5 from the reaction gas conveying pipe 2, cold nitrogen is input into the other end of the air inlet main pipe 1 from the cooling medium input pipe 6, and then the cold nitrogen is diffused to all parts in the air inlet main pipe 1 to cool the reaction gas conveying pipe 2 and is output from the cooling medium output pipe 7.

Example two

Fig. 4 to fig. 6 show another embodiment of the air inlet device for LPCVD equipment of the present invention, and the air inlet device for LPCVD equipment of the present embodiment is substantially the same as the first embodiment, except that: in this embodiment, one end of the reaction gas delivery pipe 2 is closed, and the reaction gas delivery pipe 2 is provided with an air outlet pipe 21, and the air outlet pipe 21 penetrates through the gas inlet header pipe 1 to be communicated with the reaction chamber 5. The reaction gas silane is introduced into the reaction gas delivery pipe 2 and enters the reaction chamber 5 through the gas outlet pipe 21.

Preferably, in this embodiment, the outlet pipes 21 are provided in plural numbers, and the plural outlet pipes 21 are arranged at intervals along the length direction of the reaction gas supply pipe 2. Compared with the first embodiment, the reactive silane gas of the present embodiment can enter the reaction chamber 5 through the gas outlet pipes 21, and the gas inlet is more uniform.

In this embodiment, the outlet pipe 21 is welded to the inlet manifold 1, and the connection is simple and the sealing performance is good.

The air intake process of the present embodiment is as follows (shower intake): reaction gas silane is input into the reaction gas conveying pipe 2, silane is input into the reaction chamber 5 through each gas outlet pipe 21, meanwhile, cold nitrogen is input into the other end of the gas inlet main pipe 1 from the cooling medium input pipe 6, then the cold nitrogen is diffused to each position in the gas inlet main pipe 1 to cool the reaction gas conveying pipe 2, and then the cold nitrogen is output from the cooling medium output pipe 7.

It should be noted that although the present invention has been described with reference to the preferred embodiments, the present invention is not limited thereto. The technical solution of the present invention can be used by anyone skilled in the art to make many possible variations and modifications, or to modify equivalent embodiments, without departing from the scope of the technical solution of the present invention, using the technical content disclosed above. Therefore, any simple modification, equivalent change and modification made to the above embodiments by the technical entity of the present invention should fall within the protection scope of the technical solution of the present invention, all without departing from the contents of the technical solution of the present invention.

Claims

1. An air inlet device for LPCVD equipment, characterized in that: including confined inlet manifold (1), be equipped with reaction gas conveyer pipe (2) in inlet manifold (1), reaction gas conveyer pipe (2) are used for carrying reaction gas in to reacting chamber (5), be equipped with coolant entry (3) and coolant outlet (4) on inlet manifold (1).

2. The gas inlet device for LPCVD equipment according to claim 1, wherein: the reaction gas delivery pipe (2) passes through the gas inlet manifold (1) and is communicated with the reaction chamber (5).

3. The gas inlet device for LPCVD equipment according to claim 1, wherein: one end of the reaction gas conveying pipe (2) is closed, an air outlet pipe (21) is arranged on the reaction gas conveying pipe (2), and the air outlet pipe (21) penetrates through the air inlet header pipe (1) to be communicated with the reaction chamber (5).

4. The gas inlet apparatus for an LPCVD apparatus according to claim 3, wherein: the gas outlet pipe (21) is provided with a plurality of gas outlet pipes (21) which are arranged at intervals along the length direction of the reaction gas conveying pipe (2).

5. The gas inlet apparatus for an LPCVD apparatus according to claim 3, wherein: the air outlet pipe (21) is welded with the air inlet main pipe (1).

6. The gas inlet device for LPCVD equipment according to any one of claims 1 to 5, wherein: and a cooling medium input pipe (6) is arranged on the air inlet main pipe (1), and the cooling medium inlet (3) is an inlet of the cooling medium input pipe (6).

7. The gas inlet apparatus for an LPCVD apparatus according to claim 6, wherein: the air inlet main pipe (1) is provided with a cooling medium output pipe (7), the cooling medium outlet (4) is an outlet of the cooling medium output pipe (7), and the length of the cooling medium output pipe (7) is smaller than that of the cooling medium input pipe (6).

8. The gas inlet device for an LPCVD apparatus according to claim 7, wherein: the cooling medium input pipe (6) and the cooling medium output pipe (7) are arranged at the same end of the air inlet main pipe (1).

9. The gas inlet device for LPCVD equipment according to any one of claims 1 to 5, wherein: the inner wall of the reaction gas conveying pipe (2) is a smooth inner wall.