CN218779008U

CN218779008U - Drawing type mask clamp for preparing silicon carbide electrode

Info

Publication number: CN218779008U
Application number: CN202223054704.6U
Authority: CN
Inventors: 梁红伟; 韩中元; 张克雄; 柳阳; 张振中; 张贺秋; 张赫之; 马浩然; 夏晓川
Original assignee: Dalian University of Technology
Current assignee: Dalian University of Technology
Priority date: 2022-11-17
Filing date: 2022-11-17
Publication date: 2023-03-31
Anticipated expiration: 2032-11-17

Abstract

The utility model belongs to the technical field of mask clamps, and discloses a drawing type mask clamp for preparing a silicon carbide electrode, which comprises a mask clamp body, wherein the mask clamp body is divided into four hollowed square holes which are uniformly distributed and a hollowed slide rail which is used for adjusting the position of a graphical mask; drawer type masks for realizing patterned electrodes having alignment circular holes for fine alignment opened thereon. The utility model discloses a pull formula mask anchor clamps for preparation of carborundum electrode through the mask version design that the drawer type multilayer can be twitch, and the nested combination of different pattern masks, has effectively solved the carborundum sample for the experiments, and multilayer electrode size alignment accuracy is not high, frequently changes the sample and introduces and stains, and a plurality of discrete mask cost are too high, are difficult for preserving the scheduling problem. The mask clamp saves cost in preparation, and can be used for preparing multilayer complex electrode structures for experiments.

Description

Drawing type mask clamp for preparing silicon carbide electrode

Technical Field

The utility model belongs to the technical field of the mask anchor clamps, especially, relate to a pull formula mask anchor clamps for preparation of carborundum electrode.

Background

The mask clamp is a die required by the semiconductor industry when the semiconductor contact electrode is prepared by using equipment such as electron beam evaporation, magnetron sputtering and the like. The mask shop finely processes the stainless steel plate according to the pattern designed by the customer, and windows the sample above the slots to form a fine pattern structure. When the electrode is prepared, a sample for a small-size experiment can be placed in the groove position of the mask, and the patterned electrode is realized to meet the experiment requirement. At present, the design trend of the electrode of a device based on silicon carbide is more complicated and refined, a plurality of layers of electrode nesting and a routing array area which is aligned finely between 50um and 300um are not lacked, a complex photoetching process is not needed at the moment, equipment such as electron beam evaporation and magnetron sputtering is selected to prepare a semiconductor contact electrode by adopting a direct mask method, and the process means is simpler and more convenient. However, multiple sets of masks need to be designed, and in the process of using multiple types of mask clamps, multiple sample loading is inconvenient, patterns are difficult to align, more particles and other stains are introduced to a sample when the masks are frequently replaced, more unstable factors are introduced, the stability of the process is reduced, and other difficulties exist. Also, since various types of jigs are designed, waste in mask processing cost is caused, and in order to reduce the cost, we propose a pull-out type mask jig for silicon carbide electrode production. The drawing mask clamp has the advantages that: 1. the pattern precision of the contact of the multilayer electrode prepared by using equipment such as electron beam evaporation, magnetron sputtering and the like can be improved; 2. the method avoids the problem that the process is unstable due to particle contamination caused by repeated operation of the sample for multiple times of alignment when the mask is replaced; 3. drawer-type reticles reduce mask fabrication costs and facilitate storage management.

SUMMERY OF THE UTILITY MODEL

In order to solve the problem existing in the mask clamp when the more meticulous complicated electrode of above-mentioned carborundum device preparation, the utility model provides a pull formula mask clamp for carborundum electrode preparation. Through the design of drawer type multilayer drawable mask plates, the problems that the silicon carbide sample for experiments is low in size alignment precision of multilayer electrodes, contamination is caused by frequent replacement of samples, the cost of a plurality of discrete masks is too high, the silicon carbide sample is not easy to store and the like are effectively solved.

The technical scheme of this utility innovation does:

a pull type mask jig for silicon carbide electrode production includes:

the mask clamp comprises a mask clamp body, a clamping piece and a clamping piece, wherein the mask clamp body is divided into four hollowed square holes which are uniformly distributed and a hollowed slide rail which is used for adjusting the position of a graphical mask;

a plurality of drawer type masks for implementing a patterned electrode having alignment circular holes opened thereon for fine alignment;

further, the mask clamp body is a cuboid mask with a set thickness, and the size of the hollow square hole accords with the size of a sample;

further, the hollowed-out slide rails are respectively arranged at two ends of the mask clamp body, and the length of each slide rail is consistent with the moving distance;

further, the aligning circular holes are distributed at the left end and the right end of each drawer type mask and correspond to the two tail ends of the sliding rail;

further, the drawer type mask is positioned at the interlayer of the mask clamp body, the width of the drawer type mask is equal to that of the main body, and the length of the drawer type mask is smaller than that of the main body.

The utility model has the advantages that: the utility model discloses a pull formula mask anchor clamps for preparation of carborundum electrode through the drawer type multilayer mask design that can twitch, and the nested combination of different pattern masks, has effectively solved the carborundum sample for the experiment, and multilayer electrode size alignment accuracy is not high, frequently changes the sample and introduces and stains, and a plurality of discrete mask cost are too high, are difficult for preserving the scheduling problem. The mask clamp saves cost in preparation, and can be used for preparing multilayer complex electrode structures for experiments.

Drawings

Fig. 1 is a schematic view of a main body of a pull-out mask clamp for preparing a silicon carbide electrode according to the present invention.

Fig. 2 is a schematic view of a first layer of a pull-out mask clamp for preparing a silicon carbide electrode according to the present invention.

Fig. 3 is a schematic diagram of a second layer of the pull-out mask clamp for preparing a silicon carbide electrode according to the present invention.

Fig. 4 is a schematic view of the whole structure of a pull-out mask clamp for preparing a silicon carbide electrode according to the present invention.

In the figure: 1, hollowing out a slide rail; 2, carrying a step; 3 hollowing out square holes; 4 a first circular hole; 5 a first electrode; 6 a second electrode; 7 second circular hole.

Detailed Description

The principles and features of the present invention are described below in conjunction with the following drawings, the examples given are only intended to illustrate the present invention and are not intended to limit the scope of the present invention.

As shown in fig. 1, 2 and 3, the drawing type mask clamp of the present invention comprises: a jig mask body, a first layer mask and a second layer mask.

As shown in FIG. 1, the mask body of the clamp is a rectangular mask clamp provided with a hollowed-out slide rail 1 and a hollowed-out square hole 3, the width of the mask clamp is 20mm-100mm, and the length of the mask clamp is 50mm-200mm. The width of the slide rail is 1mm-5mm. The hollowed square holes 3 are used for placing silicon carbide samples with corresponding specifications, and the side length of the hollowed square holes 3 is 5-20 mm. The periphery of the hollow square hole 3 is provided with a bearing step 2, and the width of the bearing step 2 is 1mm-5mm. The size of the silicon carbide sample is smaller than that of the bearing step 2 and larger than that of the hollowed square hole 3.

As shown in fig. 2 and 3, the whole width of the first layer mask and the second layer mask is consistent with that of the fixture mask body, the length of the first layer mask and the second layer mask is 10mm-100mm smaller than that of the fixture mask body, and the positions of the hollowed square holes 3 are not shielded.

As shown in fig. 2, 3 and 4, when the jig mask body is used for the first time of electrode evaporation, the drawer type mask is required to be placed in the state shown in fig. 4, and the first alignment circular hole 4 of the first layer mask in fig. 2 and the second alignment circular hole 7 of the second layer mask in fig. 3 are required to be respectively placed at the left end and the right end of the hollow slide rail 1 in fig. 1. When the second electrode evaporation is to be aligned, the first alignment round hole 4 of the first layer mask in fig. 2 is arranged at the right end of the left hollow slide rail 1 in fig. 1 in a sliding mode through the hollow slide rail 1, so that the pattern can be aligned with the pattern designed by the clamp mask body, the whole size of the first electrode 5 is smaller than the hollow square hole 3, and the whole array is 4-18 mm. When the third time of electrode evaporation alignment is to be carried out, the first alignment round hole 4 of the second layer of the mask in FIG. 2 is arranged at the left end of the left side hollow slide rail 1 in FIG. 1 through slide rail sliding, the second alignment round hole 7 of the second layer of the mask in FIG. 3 is arranged at the left end of the right side hollow slide rail 1 in FIG. 1 through the hollow slide rail 1 sliding, the whole size of the second electrode 6 is smaller than the hollow square hole 3, the size of the whole array is 4mm-18mm, and fine electrode alignment can be realized.

The foregoing is a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, a plurality of improvements and decorations can be made without departing from the principle of the present invention, and these improvements and decorations should be regarded as the protection scope of the present invention.

Claims

1. A pull type mask jig for silicon carbide electrode production, comprising:

a plurality of drawer type masks for implementing patterned electrodes, on which alignment circular holes for fine alignment are opened;

the mask clamp body is a cuboid mask with a set thickness, and the size of the hollow square hole accords with the size of a sample;

the hollow slide rails are respectively arranged at two ends of the mask clamp body, and the length of each slide rail is consistent with the moving distance;

the aligning circular holes are distributed at the left end and the right end of each drawer type mask and correspond to the two tail ends of the sliding rail;

the drawer type mask is positioned at the interlayer of the mask clamp body, the width of the drawer type mask is equal to that of the main body, and the length of the drawer type mask is smaller than that of the main body.

2. The pull type mask jig according to claim 1, wherein the pull type mask jig comprises a jig mask body, a first layer mask and a second layer mask;

the clamp mask body is a rectangular mask clamp which is provided with two symmetrical hollowed-out slide rails and four hollowed-out square holes which are uniformly distributed and located between the two hollowed-out slide rails, bearing steps are arranged around the hollowed-out square holes, and the size of a sample is smaller than that of the bearing steps and larger than that of the hollowed-out square holes;

the overall width of the first layer of mask and the second layer of mask is consistent with that of the clamp mask body, the length of the first layer of mask and the second layer of mask is smaller than that of the clamp mask body, and the positions of the hollowed square holes are not shielded;

the left end of the first layer of mask and the right end of the second layer of mask are respectively provided with an alignment round hole, the left side hollowed-out slide rail is slid to enable the alignment round hole in the first layer of mask to be aligned with two tail ends of the left side hollowed-out slide rail respectively, and the right side hollowed-out slide rail is slid to enable the alignment round hole in the second layer of mask to be aligned with two tail ends of the right side hollowed-out slide rail respectively.