CN218580054U - Deposition apparatus and electrode structure for deposition apparatus - Google Patents
Deposition apparatus and electrode structure for deposition apparatus Download PDFInfo
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- CN218580054U CN218580054U CN202222840697.6U CN202222840697U CN218580054U CN 218580054 U CN218580054 U CN 218580054U CN 202222840697 U CN202222840697 U CN 202222840697U CN 218580054 U CN218580054 U CN 218580054U
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- 230000008021 deposition Effects 0.000 title claims abstract description 68
- 238000004519 manufacturing process Methods 0.000 abstract description 11
- 238000000151 deposition Methods 0.000 description 47
- 239000010408 film Substances 0.000 description 14
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000005457 optimization Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
The utility model relates to a deposition equipment and be used for deposition equipment's electrode structure, electrode structure include negative pole subassembly, positive pole spare and connecting piece, wherein positive pole spare and the relative just interval setting of negative pole subassembly. The connecting piece sets up between negative pole subassembly and positive pole spare to the connecting piece can be dismantled with negative pole subassembly and positive pole spare and be connected, and connecting piece, negative pole subassembly enclose jointly with positive pole spare and close and form the deposit chamber. The deposition equipment and the electrode structure for the deposition equipment can adjust the distance between the anode piece and the cathode piece, so that the film forming quality of the deposition equipment is optimized, the gas loss can be reduced, and the production cost is reduced.
Description
Technical Field
The utility model relates to a PECVD coating film technical field especially relates to a deposition equipment and be used for deposition equipment's electrode structure.
Background
PECVD (Plasma Enhanced Chemical Vapor Deposition ) is a common process for preparing solar cell thin films. PECVD is a method in which a gas containing atoms of a film component is ionized by microwaves or radio frequencies to locally form plasma, which is chemically very reactive and easily reacts to deposit a desired film on a substrate. The deposition parameters of the deposition equipment determine the quality of the film. The key parameters are deposition temperature, pressure, power, gas flow, electrode plate spacing and the like of the deposition equipment. Wherein the electrode plate spacing significantly affects the performance of the thin films prepared by PECVD. Too large or too small a distance between the electrode plates affects the deposition rate of the thin film and the quality of the formed film. The electrode spacing plays a very significant role in PECVD deposited thin films.
The conventional PECVD chamber of the deposition equipment has two main types, one type is a relatively sealed chamber, the relatively sealed chamber can also greatly reduce the total flow of gas and reduce the production cost, but the periphery needs to be sealed, the electrode distance is not adjustable, and the process optimization is influenced. The other PECVD cavity is open, the upper electrode and the lower electrode are completely separated, the distance can be adjusted by adjusting the position of the upper electrode or the lower electrode, the method can adjust the electrode distance at any time so as to optimize the film quality, but because the upper electrode and the lower electrode are completely separated, the gas consumption in the production process is much larger than that of a sealed cavity, and the production cost is much higher.
SUMMERY OF THE UTILITY MODEL
In view of the above, it is necessary to provide a deposition apparatus and an electrode structure for the deposition apparatus, which can achieve both the sealing performance of the PECVD chamber and the adjustability of the electrode distance.
In one aspect, the present application provides an electrode structure for a deposition apparatus, comprising:
a cathode assembly;
an anode member opposite to and spaced apart from the cathode assembly; and the number of the first and second groups,
the connecting piece is arranged between the cathode assembly and the anode piece, the connecting piece is detachably connected with the cathode assembly and the anode piece, and the connecting piece, the cathode assembly and the anode piece jointly enclose to form a deposition cavity.
The technical solution of the present application is further described below:
in one embodiment, the cathode assembly comprises a cover body and a cathode piece fixed on the cover body, the cathode piece is arranged opposite to the anode piece, the cover body is detachably connected with the anode piece through the connecting piece, and the cover body, the connecting piece and the anode piece jointly enclose to form the deposition cavity.
In one embodiment, the cathode member includes a body and a power connector connected to the body, the cover body is provided with a through-hole, the body is disposed in the deposition chamber, the power connector is disposed through the hole, and one end of the power connector, which is far away from the body, penetrates through the hole.
In one embodiment, an insulating layer is arranged between the cover body and the cathode piece.
In one embodiment, two ends of the cover body are respectively provided with a first positioning seat protruding towards the anode piece, one of the first positioning seat and the connecting piece is provided with a first positioning groove, the other one of the first positioning seat and the connecting piece is provided with a first positioning protrusion, and the first positioning protrusion is inserted into the first positioning groove.
In one embodiment, two ends of the anode member are respectively provided with a second positioning seat protruding towards the cover body, one of the second positioning seat and the connecting member is provided with a second positioning groove, the other one of the second positioning seat and the connecting member is provided with a second positioning protrusion, and the second positioning protrusion is inserted into the second positioning groove.
In one embodiment, the cover body is electrically connected with the anode piece through the connecting piece, and the cover body and/or the anode piece are/is grounded.
In one embodiment, the connecting piece is provided with an exhaust hole communicated with the deposition cavity.
In one embodiment, the connecting piece is provided with a plurality of exhaust holes which are arranged at intervals.
On the other hand, this application still provides a deposition apparatus, including box and foretell electrode structure, the box is equipped with the vacuum cavity, electrode structure sets up in the vacuum cavity.
Above-mentioned deposition apparatus and be used for deposition apparatus's electrode structure to pass through the connecting piece and connect anode spare and negative pole subassembly, and the connecting piece cathode subassembly with anode spare encloses jointly and closes and form the deposit chamber for the deposit chamber can form relative confined cavity, compare with traditional deposit chamber of open type completely, the deposit chamber of this application can greatly reduced gas loss volume, thereby reduce the gas quantity of consumption in the production process, reduced manufacturing cost, simultaneously because the connecting piece with cathode subassembly and anode spare is for dismantling the connection, thereby can adjust the interval between anode spare and the cathode subassembly through changing the connecting piece of co-altitude not, thereby optimize deposition apparatus's film forming quality.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this application, are included to provide a further understanding of the invention, and are incorporated in and constitute a part of this specification.
In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings needed to be used in the description of the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings without creative efforts.
FIG. 1 is a schematic structural diagram of an electrode structure of a deposition apparatus according to an embodiment;
FIG. 2 is an exploded view of the electrode structure for the deposition apparatus shown in FIG. 1;
FIG. 3 is a cross-sectional view of a connector according to one embodiment.
Description of reference numerals:
10. a cathode assembly; 11. a cover body; 111. avoiding holes; 12. a cathode member; 121. a body; 122. a power supply connector; 13. a first positioning seat; 131. a first positioning groove; 20. an anode member; 21. a second positioning seat; 211. a second positioning groove; 30. a connecting member; 31. a first positioning protrusion; 32. a second positioning projection; 33. an exhaust hole; 40. and a deposition chamber.
Detailed Description
In order to make the above objects, features and advantages of the present invention more comprehensible, embodiments of the present invention are described in detail below with reference to the accompanying drawings. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. The invention may be embodied in many other forms different from those described herein and similar modifications may be made by those skilled in the art without departing from the spirit and scope of the invention and, therefore, the invention is not to be limited to the specific embodiments disclosed below.
Specifically, an electrode structure is provided for use in a deposition apparatus to ionize a gas containing atoms of a film component into a plasma. Referring to fig. 1, fig. 1 shows a schematic view of an electrode structure in an embodiment of the present invention. Specifically, the electrode structure of an embodiment includes a cathode assembly 10, an anode member 20, and a connecting member 30, wherein the anode member 20 is disposed opposite to and spaced apart from the cathode assembly 10. The connecting member 30 is disposed between the cathode assembly 10 and the anode member 20, and the connecting member 30 is detachably connected to the cathode assembly 10 and the anode member 20, and the connecting member 30, the cathode assembly 10 and the anode member 20 together enclose a deposition chamber 40.
When the electrode structure is used, the anode member 20 and the cathode assembly 10 are respectively connected to the positive and negative electrodes of a power supply, so that an electric field is generated between the anode member 20 and the cathode assembly 10, and gas containing film component atoms is introduced into the deposition cavity 40 between the anode member 20 and the cathode assembly 10, so that the gas can be ionized into plasma by the anode member 20 and the cathode assembly 10, and finally the plasma is deposited to form a desired film. Compare in traditional complete separation's positive pole and negative pole, the electrode structure of this application passes through connecting piece 30 and connects positive pole piece 20 and negative pole subassembly 10 to connecting piece 30, negative pole subassembly 10 enclose jointly with positive pole piece 20 and close and form deposition chamber 40, make deposition chamber 40 can form relative confined cavity, thereby can the greatly reduced gas loss volume, thereby reduce the gas volume of consumption in the production process, reduced manufacturing cost. Meanwhile, the connecting piece 30 is detachably connected with the cathode assembly 10 and the anode piece 20, so that the distance between the anode piece 20 and the cathode assembly 10 can be adjusted by replacing the connecting piece 30 with different heights, and the film forming quality of the deposition equipment is optimized.
Specifically, referring to fig. 1, the cathode assembly 10 includes a housing 11 and a cathode member 12 fixed to the housing 11, the cathode member 12 is disposed opposite to the anode member 20, the housing 11 is detachably connected to the anode member 20 through a connector 30, and the housing 11, the connector 30 and the anode member 20 together enclose a deposition chamber 40. The cathode member 12 is used for connecting the negative pole of the power supply, and the anode member 20 is used for connecting the positive pole of the power supply.
Further, the cathode 12 includes a body 121 and a power connector 122 connected to the body 121, the cover 11 is provided with a through-hole 111, the body 121 is disposed in the deposition chamber 40, the power connector 122 is disposed through the hole 111, and one end of the power connector 122, which is far away from the body 121, penetrates through the hole 111. The body 121 of the cathode 12 is disposed in the deposition chamber 40, so that the cathode 12 can be effectively protected, and the power connector 122 of the cathode 12 passes through the avoiding hole 111 of the cover 11 and partially exposes out of the avoiding hole 111 to form a power feed point, so that the cathode 12 can be connected to the power source cathode through the power connector 122. Preferably, the cathode member 12 is provided with a plurality of power connectors 122, correspondingly, the cover 11 is provided with a plurality of avoiding holes 111, and the power connectors 122 are inserted into the avoiding holes 111 in a one-to-one correspondence manner, so that a plurality of power feeding points can be formed on the outer surface of the cover 11, and the stability of the connection between the cathode member 12 and a power supply is improved.
Further, an insulating layer (not shown) is provided between the cover 11 and the cathode member 12, so as to effectively isolate the cover 11 from the cathode member 12, and specifically, the insulating layer may be an insulating material layer separately provided between the cathode member 12 and the cover 11, or may be an insulating coating applied to the inner surface of the cover 11 and the wall of the avoiding hole 111. Preferably, the insulating coating may be a teflon coating.
Optionally, in an embodiment, the cover 11 and the anode element 20 are electrically conducted through the connecting element 30, for example, the connecting element 30 is made of a metal material, so that the cover 11 and the anode element 20 are electrically conducted. Further, either or both of the enclosure 11 or the anode member 20 may be grounded, such as by external wiring or a metal housing of the deposition apparatus. The cover body 11 is electrically conducted with the anode piece 20 through the connecting piece 30, and any one or all of the cover body 11 or the anode piece 20 is grounded, so that a good grounding structure outside the electrode structure can be ensured, and the quality and uniformity of a deposited film can be well improved.
Referring to fig. 2, two ends of the cover 11 are respectively provided with a first positioning seat 13 protruding towards the anode member 20, and two connecting members 30 are provided, and the connecting members 30 are connected with the first positioning seats 13 in a one-to-one correspondence manner. Preferably, the first positioning seat 13 is provided with a first positioning groove 131, one side of the connecting member 30 close to the first positioning seat 13 is provided with a first positioning protrusion 31, and the first positioning protrusion 31 is inserted into the first positioning groove 131, so that the connecting member 30 is fixedly connected to the cover 11. It should be noted that, in another embodiment, the first positioning groove 131 may be formed in the connecting member 30, the first positioning protrusion 31 may be disposed on the first positioning seat 13, and the connecting member 30 and the cover 11 may be connected and fixed by inserting the first positioning protrusion 31 into the first positioning groove 131.
Further, the two ends of the anode member 20 are respectively provided with a second positioning seat 21 protruding towards the cover 11, and the two connecting members 30 are connected with the two second positioning seats 21 in a one-to-one correspondence manner. Preferably, the second positioning seat 21 is provided with a second positioning groove 211, one side of the connecting member 30 close to the second positioning seat 21 is provided with a second positioning protrusion 32, and the second positioning protrusion 32 is inserted into the second positioning groove 211, so that the connecting member 30 is fixedly connected to the anode member 20. It should be noted that, in another embodiment, the connecting element 30 may also be provided with a second positioning groove 211, the second positioning seat 21 is provided with a second positioning protrusion 32, and the connecting element 30 and the anode element 20 can also be connected and fixed by inserting the second positioning protrusion 32 into the second positioning groove 211.
It should be noted that there are many ways for the connecting member 30 to detachably connect the housing 11 and the anode member 20, and the connecting member is not limited to the form of the positioning groove and the positioning protrusion. For example, in other embodiments, the connecting member 30 and the cover 11 and the anode member 20 may be screwed or snapped, and are not limited herein.
Referring to fig. 3, the connecting member 30 is provided with an exhaust hole 33 communicating with the deposition chamber 40, and the exhaust hole 33 is used for exhausting the exhaust gas in the deposition chamber 40 to ensure the gas circulation in the deposition chamber 40. Further, the connecting member 30 is provided with a plurality of air discharge holes 33, and the plurality of air discharge holes 33 are spaced apart. Preferably, the width of the exhaust hole 33 is greater than or equal to 0.1mm, and the distance between two adjacent exhaust holes 33 is greater than or equal to 0.1mm, so as to ensure the gas circulation in the deposition chamber 40, reduce the total flow of the gas, and avoid the waste of the gas. It should be noted that, in other embodiments, the width, number and shape of the air vent 33 may be set as required, and are not limited herein. Since the connection member 30 is detachably connected to the cap body 11 and the anode member 20, the amount of exhaust gas in the deposition chamber 40 can be adjusted by replacing the connection member 30 having the exhaust holes 33 of different specifications, thereby optimizing the performance of the deposited film and controlling the cost.
Another embodiment of the present application further provides a deposition apparatus, where the deposition apparatus of an embodiment includes a box body and the electrode structure of any one of the above embodiments, the box body is provided with a vacuum chamber, and the electrode structure is disposed in the vacuum chamber.
The electrode structure of the deposition equipment is connected with the anode piece 20 and the cathode assembly 10 through the connecting piece 30, the cathode assembly 10 and the anode piece 20 jointly enclose to form the deposition cavity 40, so that the deposition cavity 40 can form a relatively closed cavity, compared with the traditional completely-open deposition cavity 40, the deposition cavity 40 of the application can greatly reduce the gas loss, thereby reducing the gas consumption in the production process, and reducing the production cost, meanwhile, because the connecting piece 30 is detachably connected with the cathode assembly 10 and the anode piece 20, the distance between the anode piece 20 and the cathode assembly 10 can be adjusted by replacing the connecting piece 30 with different heights, and the film forming quality of the deposition equipment is optimized.
The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.
The above-mentioned embodiments only represent some embodiments of the present invention, and the description thereof is specific and detailed, but not to be construed as limiting the scope of the present invention. It should be noted that, for those skilled in the art, without departing from the spirit of the present invention, several variations and modifications can be made, which are within the scope of the present invention. Therefore, the protection scope of the present invention should be subject to the appended claims.
In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", and the like, indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for convenience of description and simplicity of description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, should not be construed as limiting the present invention.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature. In the description of the present invention, "a plurality" means at least two, e.g., two, three, etc., unless specifically limited otherwise.
In the present invention, unless otherwise expressly stated or limited, the terms "mounted," "connected," and "fixed" are to be construed broadly and may, for example, be fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; they may be directly connected or indirectly connected through intervening media, or they may be connected internally or in any other suitable relationship, unless expressly stated otherwise. The specific meaning of the above terms in the present invention can be understood according to specific situations by those skilled in the art.
In the present application, unless expressly stated or limited otherwise, the first feature may be directly on or directly under the second feature or indirectly via intermediate members. Also, a first feature "on," "above," and "over" a second feature may be directly on or obliquely above the second feature, or simply mean that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature may be directly under or obliquely under the first feature, or may simply mean that the first feature is at a lesser elevation than the second feature.
It will be understood that when an element is referred to as being "secured to" or "disposed on" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "upper," "lower," "left," "right," and the like as used herein are for illustrative purposes only and do not denote a unique embodiment.
Claims (10)
1. An electrode structure for a deposition apparatus, comprising:
a cathode assembly (10);
an anode member (20), the anode member (20) being disposed opposite to and spaced apart from the cathode assembly (10); and the number of the first and second groups,
a connector (30), the connector (30) is arranged between the cathode component (10) and the anode piece (20), the connector (30) is detachably connected with the cathode component (10) and the anode piece (20), and the connector (30), the cathode component (10) and the anode piece (20) jointly enclose to form a deposition cavity (40).
2. The electrode structure for a deposition apparatus according to claim 1, wherein the cathode assembly (10) comprises a housing (11) and a cathode member (12) fixed to the housing (11), the cathode member (12) is disposed opposite to the anode member (20), the housing (11) is detachably connected to the anode member (20) through the connecting member (30), and the housing (11), the connecting member (30) and the anode member (20) together enclose the deposition chamber (40).
3. The electrode structure for a deposition apparatus according to claim 2, wherein the cathode member (12) includes a body (121) and a power connector (122) connected to the body (121), the cover (11) is provided with a through-hole (111), the body (121) is disposed in the deposition chamber (40), the power connector (122) is inserted into the hole (111) and an end of the power connector (122) away from the body (121) penetrates the hole (111).
4. The electrode structure for a deposition apparatus according to claim 2, wherein an insulating layer is provided between the cover (11) and the cathode member (12).
5. The electrode structure for a deposition apparatus according to claim 2, wherein both ends of the housing (11) are provided with first positioning seats (13) protruding toward the anode member (20), one of the first positioning seats (13) and the connecting member (30) is provided with first positioning grooves (131), and the other one of the first positioning seats (13) and the connecting member is provided with first positioning protrusions (31), and the first positioning protrusions (31) are inserted into the first positioning grooves (131).
6. The electrode structure for a deposition apparatus according to claim 2, wherein both ends of the anode member (20) are provided with second positioning seats (21) protruding toward the housing (11), one of the second positioning seats (21) and the connecting member (30) is provided with second positioning grooves (211), and the other is provided with second positioning protrusions (32), and the second positioning protrusions (32) are inserted into the second positioning grooves (211).
7. The electrode structure for a deposition apparatus according to claim 2, wherein the enclosure (11) is in electrical communication with the anode member (20) through the connection member (30), the enclosure (11) and/or the anode member (20) being arranged to ground.
8. The electrode structure for a deposition apparatus according to claim 1, wherein the connecting member (30) is opened with an exhaust hole (33) communicating with the deposition chamber (40).
9. The electrode structure for a deposition apparatus according to claim 8, wherein the connection member (30) is provided with a plurality of the exhaust holes (33), and the plurality of exhaust holes (33) are provided at intervals.
10. A deposition apparatus comprising a chamber and an electrode structure according to any one of claims 1 to 9, the chamber being provided with a vacuum chamber, the electrode structure being arranged within the vacuum chamber.
Priority Applications (1)
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CN202222840697.6U CN218580054U (en) | 2022-10-27 | 2022-10-27 | Deposition apparatus and electrode structure for deposition apparatus |
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CN202222840697.6U CN218580054U (en) | 2022-10-27 | 2022-10-27 | Deposition apparatus and electrode structure for deposition apparatus |
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Effective date of registration: 20240112 Address after: 610200 within phase 6 of Industrial Development Zone of Southwest Airport Economic Development Zone, Shuangliu District, Chengdu City, Sichuan Province Patentee after: TONGWEI SOLAR (CHENGDU) Co.,Ltd. Address before: 610200 Southwest Airport Economic Development Zone, Shuangliu County, Chengdu City, Sichuan Province Patentee before: Zhongwei New Energy (Chengdu) Co.,Ltd. |