CN218481428U - Sub-surface multi-parameter nano standard template - Google Patents
Sub-surface multi-parameter nano standard template Download PDFInfo
- Publication number
- CN218481428U CN218481428U CN202222197696.4U CN202222197696U CN218481428U CN 218481428 U CN218481428 U CN 218481428U CN 202222197696 U CN202222197696 U CN 202222197696U CN 218481428 U CN218481428 U CN 218481428U
- Authority
- CN
- China
- Prior art keywords
- calibration
- calibration area
- dimensional grid
- sub
- parameter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Length Measuring Devices By Optical Means (AREA)
Abstract
The utility model relates to a sub-surface multi-parameter nanometer standard model, including the X that is used for the location to look for calibration position to tracking mark, Y to tracking mark and alignment mark, be used for the Z of calibration to step calibration region, one-dimensional grid calibration region and two-dimensional grid calibration region, use the utility model discloses a sub-surface multi-parameter nanometer standard model carries out the instrument calibration on time, can distinguish current position and fix a position to the region of awaiting measuring fast with the help of tracking mark and alignment mark, can be used to confocal microscope, white light interference microscope, the calibration and the source tracing of sub-surface measuring instruments such as ultrasonic atomic force microscope, for the quantity value accuracy in the sub-surface geometric parameters measurement provides the guarantee, power semiconductor, precision manufacturing, the development of strategic emerging industries such as national defense military project have high industrial value.
Description
Technical Field
The utility model relates to a sub-surface multi-parameter nanometer standard model belongs to measurement detection technology field.
Background
The development of high-power laser systems and large-scale optical systems puts more stringent requirements on performance indexes such as stability, imaging quality, coating quality and laser damage resistance threshold of optical elements, and the performance indexes are greatly reduced due to subsurface damage of the elements. Therefore, it is important to detect sub-surface damage of the component. Common subsurface detection methods include destructive detection methods such as cross-sectional microscopy, angle polishing, HF chemical etching, and the like, and non-destructive detection methods such as fluorescence microscopy, polarization laser scattering, confocal laser scanning microscopy, and the like. The destructive detection method can cause irreversible damage to the material, and is troublesome in sample preparation, long in time consumption and low in precision; the nondestructive detection method utilizes imaging technologies such as acoustics and optics, and has the characteristics of rapidness, no damage, high precision and the like, so that the nondestructive detection method is widely applied to subsurface damage measurement.
However, in the current sub-surface nondestructive detection method, the problems of incapability of ensuring the accuracy of the measurement value, difficulty in tracing the source of the measurement value and the like generally exist. A common optical surface topography measuring instrument generally adopts a conventional standard sample plate for calibration and magnitude traceability, and the standard sample plate adopts a micro-nano processing technology to etch various nano structures and is calibrated by an authoritative metering mechanism, so that the accuracy and the traceability of the magnitude are ensured. For a subsurface measuring instrument, the measuring principle and the measuring method thereof are still in the research and exploration stage at present, and due to the difference between the subsurface measurement and the surface measurement, the accuracy of the calibration by adopting a conventional standard template cannot be ensured. Therefore, the research on the standard template for calibrating the subsurface measuring instrument is of great significance for ensuring the accuracy and traceability of the subsurface measuring result. Related research can further promote the research and development work of the subsurface measuring instrument.
SUMMERY OF THE UTILITY MODEL
In view of the above-mentioned shortcomings of the prior art, the present invention provides a sub-surface multi-parameter nano standard template, which is convenient for calibrating a sub-surface optical topography measuring instrument.
In order to achieve the above object, the present invention provides a sub-surface multi-parameter nano standard template, which comprises a base substrate, wherein a Z-direction step calibration region is arranged in the middle of the base substrate, the Z-direction step calibration region comprises a plurality of strip calibration steps arranged in a line along the X direction, and each strip calibration step extends along the Y direction;
the base plate is also provided with an X-direction tracking mark and a Y-direction tracking mark, the X-direction tracking mark points to the center of the Z-direction step calibration area along the X direction, and the Y-direction tracking mark points to the center of the Z-direction step calibration area along the Y direction; the Z-direction step calibration area is also provided with an alignment mark, and the alignment mark points to the center of the Z-direction step calibration area along the X direction;
the base plate is also provided with a one-dimensional grid calibration area and a two-dimensional grid calibration area, and the one-dimensional grid calibration area is internally provided with a plurality of strip-shaped grids which are arranged in a row along the X direction; the two-dimensional grid calibration area is provided with a grid array which is arranged in rows along the X direction and arranged in columns along the Y direction.
Preferably, the X-direction tracking mark, the Y-direction tracking mark and the alignment mark are all in the shape of triangular arrows, and the arrows point to the center of the Z-direction step calibration area.
Preferably, the X-direction tracking mark, the Y-direction tracking mark and the alignment mark are different in overall size.
More preferably, the outline dimension of the Y-direction tracking mark is larger than the outline dimension of the X-direction tracking mark, and the outline dimension of the X-direction tracking mark is larger than the outline dimension of the alignment mark.
Preferably, a plurality of pairs of strip-shaped calibration steps with different widths are symmetrically arranged on two sides of the center line of the Z-direction step calibration area.
More preferably, the width dimension of the strip-shaped calibration step close to the center line of the Z-direction step calibration area is larger, and the width dimension of the strip-shaped calibration step far from the center line of the Z-direction step calibration area is smaller.
Preferably, the one-dimensional grid calibration area and the two-dimensional grid calibration area are respectively located on two sides of the Z-direction step calibration area.
Preferably, the substrate board is provided with two one-dimensional grid calibration areas and two-dimensional grid calibration areas, and each one-dimensional grid calibration area and each two-dimensional grid calibration area are located at four corner positions of the substrate board.
More preferably, the grid size in the same one-dimensional grid calibration area or two-dimensional grid calibration area is the same, and the grid size in different one-dimensional grid calibration areas or two-dimensional grid calibration areas is different.
As mentioned above, the utility model relates to a sub-surface multi-parameter nanometer standard model has following beneficial effect: the utility model discloses a sub-surface multi-parameter nanometer standard template, including X to the tracking mark, Y to the tracking mark and alignment mark that are used for fixing a position and look for the alignment position, Z for the calibration is to step calibration area, one-dimensional grid calibration area and two-dimensional grid calibration area, use the utility model discloses a sub-surface multi-parameter nanometer standard template when carrying out instrument calibration, can distinguish the current position fast and fix a position to the region of awaiting measuring with the help of tracking mark and alignment mark; the standard template comprises a plurality of geometric parameters, a Z-direction step calibration area can be used for calibrating the longitudinal (Z-direction) characteristics of the instrument, and a one-dimensional grid calibration area and a two-dimensional grid calibration area can be used for calibrating the transverse (X, Y plane direction) characteristics of the instrument. In addition, the two-dimensional grid calibration area can also calibrate the orthogonality of the instrument transverse two-dimensional coordinate system. The standard sample plate is prepared by adopting a semiconductor process, the height and width of the structure can be accurately controlled, the batch production is convenient, and the production cost of a single standard sample plate is obviously reduced. Through at the silicon nitride layer coating by vaporization gold rete, improve the reflectivity of model subsurface, promote the efficiency of returning light of calibration instrument, at gold rete surface coating by vaporization silicon dioxide layer, can enough play the guard action to tracking mark, step, grid nanostructure in the standard model, also really simulated the actual surface state of measurand in the subsurface measurement. Therefore, the utility model discloses a sub-surface multi-parameter nanometer standard model can be used for the calibration of sub-surface optical morphology measuring apparatu fast conveniently, and the accuracy of calibration is high.
Drawings
Fig. 1 is a schematic view showing a topological structure of a subsurface multi-parameter nano standard template according to the present invention.
FIG. 2 is a cross-sectional structure diagram of a sub-surface multi-parameter nano-scale template.
Fig. 3a to 3j are schematic diagrams showing the cross-sectional structural changes of the master template manufactured by processing from the substrate during the manufacturing process of the sub-surface multi-parameter nano-master template.
Description of the element reference numerals
1. Base plate
2Z to step calibration area
3. Bar-shaped calibration step
4X tracking mark
5Y tracking-oriented marker
6. Alignment mark
7a one-dimensional grid calibration area
7b one-dimensional grid calibration area
8a two-dimensional grid calibration area
8b two-dimensional grid calibration area
9. Silicon dioxide layer
10. Silicon nitride layer
11. Photoresist layer
12. Gold film layer
13. Vapor deposition of a silicon dioxide layer
Detailed Description
The following description is provided for illustrative purposes, and other advantages and features of the present invention will become apparent to those skilled in the art from the following detailed description.
It should be understood that the structure, ratio, size and the like shown in the drawings attached to the present specification are only used for matching with the content disclosed in the specification, so as to be known and read by those skilled in the art, and are not used for limiting the limit conditions that the present invention can be implemented, so that the present invention has no technical essential meaning, and any structure modification, ratio relationship change or size adjustment should still fall within the scope that the technical content disclosed in the present invention can cover without affecting the function that the present invention can produce and the purpose that the present invention can achieve. Meanwhile, the terms such as "upper", "lower", "left", "right", "middle" and "one" used in the present specification are for convenience of description, and are not intended to limit the scope of the present invention, and changes or adjustments of the relative relationship thereof may be made without substantial technical changes, and the present invention is also regarded as the scope of the present invention.
As shown in fig. 1, the utility model provides a sub-surface multi-parameter nanometer standard template, including the base plate 1, the middle part of the base plate 1 is equipped with Z to step calibration area 2,Z and includes a plurality of bar calibration steps 3 arranged in a line along the X direction to step calibration area 2, each bar calibration step 3 extends along the Y direction;
the base plate 1 is also provided with an X-direction tracking mark 4 and a Y-direction tracking mark 5, wherein the X-direction tracking mark 4 points to the center of the Z-direction step calibration area 2 along the X direction, and the Y-direction tracking mark 5 points to the center of the Z-direction step calibration area 2 along the Y direction; the Z-direction step calibration area 2 is also provided with an alignment mark 6, and the alignment mark 6 points to the center of the Z-direction step calibration area 2 along the X direction;
the base plate 1 is further provided with one-dimensional grid calibration regions 7a and 7b and two-dimensional grid calibration regions 8a and 8b, and a plurality of strip-shaped grids arranged in a row along the X direction are arranged in the one-dimensional grid calibration regions 7a and 7 b; the two-dimensional grid calibration regions 8a and 8b are provided with a grid array arranged in rows along the X direction and in columns along the Y direction.
The utility model discloses a sub-surface multi-parameter nanometer standard template, including X that is used for the location to look for the calibration position to tracking mark 4, Y to tracking mark 5 and alignment mark 6, Z for the calibration is to step calibration area 2, one-dimensional grid calibration area 7a, 7b and two-dimensional grid calibration area 8a, 8b, use the utility model discloses a sub-surface multi-parameter nanometer standard template carries out the instrument calibration, can distinguish current position and fix a position to the region of awaiting measuring with the help of tracking mark and alignment mark 6 fast; the standard template comprises a plurality of geometric parameters, the Z-direction step calibration area 2 can be used for calibrating the longitudinal (Z-direction) characteristics of the instrument, and the one-dimensional grid calibration areas 7a and 7b and the two-dimensional grid calibration areas 8a and 8b can be used for calibrating the transverse (X, Y plane direction) characteristics of the instrument. Furthermore, the two-dimensional grid calibration regions 8a, 8b may also calibrate the orthogonality of the instrument's transverse two-dimensional coordinate system. The standard sample plate is prepared by adopting a semiconductor process, the height and width of the structure can be accurately controlled, the batch production is convenient, and the production cost of a single standard sample plate is obviously reduced. By evaporating the gold film layer 12 on the silicon nitride layer 10, the reflectivity of the subsurface of the sample plate is improved, the light return efficiency of the calibration instrument is improved, and the silicon dioxide layer 13 is evaporated on the surface of the gold film layer 12, so that the tracking mark, the step and the grid nanostructure in the standard sample plate can be protected, and the actual surface state of the measured object in the subsurface measurement can be truly simulated. Therefore, the utility model discloses a sub-surface multi-parameter nanometer standard model can be used for the calibration of sub-surface optical morphology measuring apparatu fast conveniently, and the accuracy of calibration is high.
The utility model provides a pair of among sub-surface multi-parameter nanometer standard model, as shown in FIG. 1, one-dimensional grid calibration area 7a, 7b and two-dimensional grid calibration area 8a, 8b are located Z respectively and calibrate regional 2 both sides of step, in order to adapt to the calibration demand of different instruments, be equipped with two one-dimensional grid calibration area 7a, 7b and two-dimensional grid calibration area 8a, 8b on the base plate 1, each one-dimensional grid calibration area 7a, 7b and two-dimensional grid calibration area 8a, 8b are located four corner positions of base plate 1, one-dimensional grid calibration area includes the great little one-dimensional grid calibration area 7a of big cycle one-dimensional grid calibration area 7a of grid width and the little one-dimensional grid calibration area 7b of grid width, and two-dimensional grid calibration area includes the great big cycle two-dimensional grid calibration area 8a of grid width and the little cycle two-dimensional grid calibration area 8b of grid width, and the grid size in the same one-dimensional grid calibration area or two-dimensional grid calibration area is the same, and the grid size in the different one-dimensional grid calibration area is different. In this way, different periods of the grid can be calibrated for different requirements.
As shown in fig. 1, the X-direction tracking mark 4, the Y-direction tracking mark 5 and the alignment mark 6 are all in the shape of triangular arrows, and the arrows all point to the center of the Z-direction step calibration area 2, so that when the apparatus performs calibration, the current position can be quickly located and the detection area can be found through the tracking mark and the alignment mark 6. The X-tracking mark 4, the Y-tracking mark 5 and the alignment mark 6 have different outer dimensions, so that different tracking marks and alignment marks 6 can be distinguished by identifying the dimensions of the tracking marks and alignment marks 6 to distinguish different positions and directions. As shown in fig. 1, the outer dimension of the Y-tracking mark 5 is larger than the outer dimension of the X-tracking mark 4, the outer dimension of the X-tracking mark is larger than the outer dimension of the alignment mark 6, and the shape and the outer dimension of each of the tracking mark and the alignment mark 6 can be designed according to the situation.
As shown in fig. 1, two one-dimensional grid calibration regions are respectively located at the upper left corner and the upper right corner of the base plate 1, two-dimensional grid calibration regions are respectively located at the lower left corner and the lower right corner of the base plate 1, and the Z-direction step calibration region 2 is located at the midpoint of the base plate 1. The Y-direction tracking mark 5 is located between the large-period grid (the one-dimensional grid calibration area at the upper left corner of the substrate board 1 and the two-dimensional grid calibration area at the lower left corner of the substrate board 1) and the small-period grid (the one-dimensional grid calibration area at the upper right corner of the substrate board 1 and the two-dimensional grid calibration area at the lower right corner of the substrate board 1) for isolating the large-period grid and pointing to the Z-direction step calibration area 2. The X-direction tracking marks 4 are located between the small-sized one-dimensional grid and the small-sized two-dimensional grid for isolating the one-dimensional and two-dimensional grids and pointing to the Z-direction step calibration area 2. During calibration, the whole appearance of the standard template cannot be seen due to the limitation of the visual field of an instrument, and the relative position of each functional area can be determined according to the arrow direction so as to quickly position the feature to be measured.
As shown in fig. 1, a plurality of pairs of strip-shaped calibration steps 3 with different widths are symmetrically arranged on two sides of the center line of the Z-direction step calibration area 2, the width of the strip-shaped calibration step 3 close to the center line of the Z-direction step calibration area 2 is larger, and the width of the strip-shaped calibration step 3 far away from the center line of the Z-direction step calibration area 2 is smaller. The Z-direction step calibration area 2 comprises five pairs of strip-shaped calibration steps 3 with different widths so as to meet the calibration requirements of the sub-surface measuring instruments with different resolutions. The Z-direction step calibration area 2 comprises a pair of small-size alignment marks 6, and the alignment marks 6 point to the middle positions of all step height structures and are used for indicating the scanning position and direction during calibration.
The utility model discloses a sub-surface multi-parameter nanometer standard model's basement board 1 adopts the silicon material to make, and the micro-structure such as calibration area and trailing mark, alignment mark 6 adopts semiconductor technology processing to form. As shown in fig. 2, the standard template is divided into 5 layers, each corresponding to 4 different materials. The materials of the 5-layer structure are respectively as follows from bottom to top: a substrate plate 1 made of silicon material, a silicon dioxide layer 9, a silicon nitride layer 10, a gold film layer 12 and a vapor deposition silicon dioxide layer 13. The silicon dioxide layer 9 is thin and is generated by oxidizing the substrate plate 1 made of silicon material, so that the subsequent deposition of the silicon nitride layer 10 is facilitated; the silicon dioxide layer 13 is large in thickness, generally several micrometers to dozens of micrometers, can be accurately regulated according to calibration requirements, and mainly has the function of covering the nano structure on the silicon substrate to form a sub-surface; the thickness of the silicon nitride layer 10 can be accurately regulated and controlled as required to prepare structures such as steps, grids and the like with different heights; the gold film layer 12 is thin, generally hundreds of nanometers, and is mainly used for improving the surface roughness of the nano structure and improving the surface reflectivity of the standard sample plate; the evaporated silicon dioxide layer 13 can protect the microstructure on the base plate 1 and truly simulate the actual surface condition of the object to be measured in the sub-surface measurement. The material of the evaporated silicon dioxide layer 13 is not limited to silicon dioxide, and may be other transparent materials, depending on the use scenario of the standard template, and the main purpose is to construct a sub-surface of the standard template.
The method for preparing a subsurface multi-parameter nano standard template corresponding to the subsurface multi-parameter nano standard template of the present invention is used for preparing the subsurface multi-parameter nano standard template of the above technical solution or any preferred technical solution thereof, please refer to fig. 3a to 3j, and comprises the following steps:
1) Carrying out oxidation treatment on the front surface (the surface on which the microstructure is formed is the front surface) of the silicon material base plate 1 to generate a silicon dioxide layer 9;
2) Depositing a silicon nitride layer 10 on the silicon dioxide layer 9;
3) Spin-coating a photoresist layer 11 on the silicon nitride layer 10;
4) Photoetching the photoresist layer 11 by using a photoetching machine to etch patterns required by tracking marks, steps, grids and the like;
5) Etching and stripping the silicon nitride layer 10 and the silicon dioxide layer 9 to form a tracking mark, a step and a grid nanostructure;
6) Removing the photoresist, and evaporating a gold film layer 12 on the front surface of the etched substrate plate 1;
7) And (3) evaporating a silicon dioxide layer 13 on the surface of the gold film layer 12, and carrying out chemical mechanical polishing on the surface of the evaporated silicon dioxide layer 13 to obtain a smooth and flat surface, thereby completing the preparation of the sample plate.
Before the oxidation treatment of the substrate board 1 to form the silicon dioxide layer 9, the method further comprises the following steps:
a) Cleaning the base plate 1, and then drying, so that the front surface of the base plate 1 can be ensured to be clean, and a silicon dioxide layer 9 can be generated;
in the step 2), depositing a silicon nitride layer 10 by low-pressure chemical vapor deposition;
in the above step 5), the silicon nitride layer 10 is stripped by etching; etching and stripping the silicon dioxide layer 9 to expose the silicon substrate;
after completing the step 5), the photoresist is removed, and then the gold film layer 12 is formed by evaporation.
Fig. 3a is a schematic view showing a state where oxidation treatment is not performed after the substrate board 1 is cleaned, fig. 3b is a schematic view showing a state where a silicon dioxide layer 9 is generated by oxidation treatment on the substrate board 1, fig. 3c is a schematic view showing a state where a silicon nitride layer 10 is deposited on the silicon dioxide layer 9, fig. 3d is a schematic view showing a state where a photoresist layer 11 is spin-coated on the silicon nitride layer 10, fig. 3e is a schematic view showing a state where the photoresist layer 11 is subjected to photolithography by using a photolithography machine and a pattern required for tracking marks, steps, grids, etc. is etched, fig. 3f is a schematic view showing that the silicon nitride layer 10 is etched and stripped, fig. 3g is a schematic view showing that the silicon dioxide layer 9 is etched and stripped, fig. 3h is a schematic view showing a state where the photoresist is removed, fig. 3i is a schematic view showing a state where a gold film layer 12 is formed by evaporation, and fig. 3j is a schematic view showing a state where the silicon dioxide layer 13 is evaporated and the surface of the evaporated silicon dioxide layer 13 is chemically mechanically polished to obtain a smooth and to complete the preparation of a sample.
The standard sample plate obtained by the process flow has high dimensional accuracy and stable performance, and can meet the use requirements in atmospheric environment, vacuum environment or other special environments. The method can prepare structures such as nano steps, one-dimensional grids, two-dimensional grids and the like on the silicon substrate, and obtains accurate structure size through accurate regulation and control of etching and deposition processes, so that the calibration requirements of different types of subsurface measuring instruments are met.
The subsurface multi-parameter nanometer standard template prepared by the process flow can be used for calibrating and tracing subsurface measuring instruments such as a confocal microscope, a white light interference microscope, an ultrasonic atomic force microscope and the like, provides guarantee for the accuracy of the measurement value in the measurement of the subsurface geometric parameters, assists in the development of strategic emerging industries such as semiconductors, precision manufacturing, national defense and military industry and the like, and has high industrial utilization value.
To sum up, the utility model discloses effectively overcome all kinds of shortcomings among the prior art and had high industrial utilization value.
The above embodiments are merely illustrative of the principles and effects of the present invention, and are not to be construed as limiting the invention. Any person skilled in the art can modify or change the above embodiments without departing from the spirit and scope of the present invention. Accordingly, it is intended that all equivalent modifications or changes which may be made by those skilled in the art without departing from the spirit and technical spirit of the present invention be covered by the claims of the present invention.
Claims (9)
1. A subsurface multi-parameter nanometer standard template is characterized by comprising a base plate, wherein a Z-direction step calibration area is arranged in the middle of the base plate and comprises a plurality of strip-shaped calibration steps which are arranged in a row along the X direction, and each strip-shaped calibration step extends along the Y direction;
the base plate is also provided with an X-direction tracking mark and a Y-direction tracking mark, the X-direction tracking mark points to the center of the Z-direction step calibration area along the X direction, and the Y-direction tracking mark points to the center of the Z-direction step calibration area along the Y direction; the Z-direction step calibration area is also provided with an alignment mark, and the alignment mark points to the center of the Z-direction step calibration area along the X direction;
the base plate is also provided with a one-dimensional grid calibration area and a two-dimensional grid calibration area, and the one-dimensional grid calibration area is internally provided with a plurality of strip-shaped grids which are arranged in a row along the X direction; the two-dimensional grid calibration area is provided with a grid array which is arranged in rows along the X direction and in columns along the Y direction.
2. The sub-surface multi-parameter nano-scale master plate of claim 1, wherein: the X-direction tracking mark, the Y-direction tracking mark and the alignment mark are all in the shape of triangular arrows, and the arrows point to the center of the Z-direction step calibration area.
3. The subsurface multi-parameter nano-standard template as claimed in claim 1, wherein: the X-direction tracking mark, the Y-direction tracking mark and the alignment mark are different in overall size.
4. The sub-surface multi-parameter nano-scale master plate of claim 3, wherein: the outer dimension of the Y-direction tracking mark is larger than that of the X-direction tracking mark, and the outer dimension of the X-direction tracking mark is larger than that of the alignment mark.
5. The sub-surface multi-parameter nano-scale master plate of claim 1, wherein: and a plurality of pairs of strip-shaped calibration steps with different widths are symmetrically arranged on two sides of the central line of the Z-direction step calibration area.
6. The sub-surface multi-parameter nano-scale template of claim 5, wherein: the width dimension of the strip-shaped calibration step close to the central line of the Z-direction step calibration area is larger, and the width dimension of the strip-shaped calibration step far away from the central line of the Z-direction step calibration area is smaller.
7. The sub-surface multi-parameter nano-scale master plate of claim 1, wherein: the one-dimensional grid calibration area and the two-dimensional grid calibration area are respectively positioned on two sides of the Z-direction step calibration area.
8. The sub-surface multi-parameter nano-scale master plate of claim 1, wherein: the base plate is provided with two one-dimensional grid calibration areas and two-dimensional grid calibration areas, and each one-dimensional grid calibration area and each two-dimensional grid calibration area are located at four corner positions of the base plate.
9. The sub-surface multi-parameter nano-standard template of claim 8, wherein: the grid sizes in the same one-dimensional grid calibration area or two-dimensional grid calibration area are the same, and the grid sizes in different one-dimensional grid calibration areas or two-dimensional grid calibration areas are different.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222197696.4U CN218481428U (en) | 2022-08-19 | 2022-08-19 | Sub-surface multi-parameter nano standard template |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222197696.4U CN218481428U (en) | 2022-08-19 | 2022-08-19 | Sub-surface multi-parameter nano standard template |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN218481428U true CN218481428U (en) | 2023-02-14 |
Family
ID=85166787
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202222197696.4U Active CN218481428U (en) | 2022-08-19 | 2022-08-19 | Sub-surface multi-parameter nano standard template |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN218481428U (en) |
-
2022
- 2022-08-19 CN CN202222197696.4U patent/CN218481428U/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5920067A (en) | Monocrystalline test and reference structures, and use for calibrating instruments | |
| JP4791597B2 (en) | Substrate alignment system and method in nanoimprint process | |
| US6218264B1 (en) | Method of producing a calibration standard for 2-D and 3-D profilometry in the sub-nanometer range | |
| US7788818B1 (en) | Mesoscale hybrid calibration artifact | |
| CN105865389B (en) | A kind of micro-and nanoscale standard and its tracking method | |
| JPH0321901B2 (en) | ||
| TW200416377A (en) | Standard member for length measurement, method for producing the same, and electron beam length measuring device using the same | |
| CN105674911A (en) | Non-contact type micro-nano 3D measuring method and device | |
| CN112097626A (en) | Metal film thickness measuring method based on resistance method | |
| CN110646639A (en) | Standard template for calibrating nano measuring instrument and preparation method thereof | |
| CA1117653A (en) | Wafer indexing system | |
| CN111220821A (en) | Diamond AFM probe system and manufacturing method | |
| CN102955378A (en) | Morphology characterization method for photoresist | |
| US6358860B1 (en) | Line width calibration standard manufacturing and certifying method | |
| CN103488060B (en) | Determine the method for photolithographic exposure defocusing amount | |
| CN218481428U (en) | Sub-surface multi-parameter nano standard template | |
| JPH01262403A (en) | Probe and its manufacture | |
| CN106017383A (en) | Contact-type step gauge probe detection pattern sample block | |
| CN111128964B (en) | Nanometer-sized line spacing standard sample wafer and preparation method thereof | |
| CN115372368A (en) | Subsurface multi-parameter nano standard template and preparation method thereof | |
| US4761560A (en) | Measurement of proximity effects in electron beam lithography | |
| CN113341664A (en) | Concave SOI substrate electron beam alignment mark structure and preparation method thereof | |
| CN115877036A (en) | Line width standard sample wafer and tracking method of standard lines thereof | |
| Huebner et al. | A nanoscale linewidth/pitch standard for high-resolution optical microscopy and other microscopic techniques | |
| CN211785623U (en) | Diamond AFM probe system |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant |