CN218312829U - Polishing chuck and semi-automatic polishing machine - Google Patents
Polishing chuck and semi-automatic polishing machine Download PDFInfo
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- CN218312829U CN218312829U CN202222619459.2U CN202222619459U CN218312829U CN 218312829 U CN218312829 U CN 218312829U CN 202222619459 U CN202222619459 U CN 202222619459U CN 218312829 U CN218312829 U CN 218312829U
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Abstract
The utility model relates to a noble metal polishing technical field, especially, relate to a polishing chuck and semi-automatic burnishing machine, this polishing chuck includes the roating seat, the abrasive brick, the elastic component, driving lever and linkage subassembly, the roating seat is equipped with inner chamber and guide channel, guide channel extends to the axle center department of roating seat by one side of roating seat, the abrasive brick slides and sets up in the inner chamber, the quantity of abrasive brick is a plurality of, each abrasive brick sets up around the axle center evenly distributed of roating seat, the quantity of elastic component is the same with the quantity of abrasive brick, each elastic component sets up between roating seat and abrasive brick, the driving lever is connected with the abrasive brick, and the driving lever extends the roating seat, the linkage subassembly is connected with adjacent abrasive brick, in order to drive adjacent abrasive brick synchronous motion. Polishing chuck, adopt each abrasive brick to surround the mode that forms the polishing passageway with the guide channel intercommunication, do benefit to the abundant and each abrasive brick contact of surface of the bracelet in the polishing passageway to shorten polishing time, reach the purpose that promotes the polishing efficiency of bracelet.
Description
Technical Field
The utility model relates to a noble metal polishing technical field especially relates to a polishing chuck and semi-automatic burnishing machine.
Background
With the development of a noble metal bracelet polishing technology, a noble metal bracelet polishing machine is provided, and can polish a noble metal bracelet to improve the glossiness of the bracelet. However, the bracelet is polished by using the polishing rod, because the contact surface between the polishing rod and the outer surface of the bracelet is limited, when the outer surface of the bracelet needs to be polished completely, the bracelet needs to rotate and the polishing rod is controlled to rotate around the outer surface of the bracelet, so that all the outer surfaces of the bracelet can be polished, the polishing time is too long, and the polishing efficiency is low.
SUMMERY OF THE UTILITY MODEL
In view of the above, it is necessary to provide a polishing chuck and a semi-automatic polishing machine to solve the problem of low polishing efficiency.
A polishing chuck, comprising:
the rotary seat is provided with an inner cavity and a guide channel, the inner cavity is communicated with the guide channel, and the guide channel extends to the axis of the rotary seat from one side of the rotary seat;
the grinding blocks are arranged in the inner cavity in a sliding mode, the number of the grinding blocks is multiple, the grinding blocks are uniformly distributed around the axis of the rotating seat and are provided with a first working position and a second working position, when the grinding blocks are located at the first working position, the grinding blocks surround to form a polishing channel communicated with the guide channel, the axis of the polishing channel is overlapped with the axis of the rotating seat, and when the grinding blocks are located at the second working position, the grinding blocks are far away from each other to be located outside the guide channel;
the number of the elastic pieces is the same as that of the grinding blocks, and each elastic piece is arranged between the rotary seat and the grinding block so as to drive the grinding block to be positioned at a first working position;
the deflector rod is connected with the grinding block and extends out of the rotating seat, and the rotating seat is provided with an avoiding groove for the deflector rod to pass through; and
the linkage assemblies are in multiple groups, and each group of linkage assemblies is connected with the adjacent grinding blocks respectively so as to drive the adjacent grinding blocks to move synchronously.
According to the polishing chuck, firstly, the grinding blocks are controlled to be in the second working position through the deflector rod, at the moment, the elastic piece is stressed and compressed, then the bracelet is moved to the axis of the rotary seat through the guide channel, the deflector rod is loosened, the elastic piece drives the grinding blocks to be in the first working position under the guide of the linkage assembly, so that part of the outer surface of the bracelet is located in the polishing channel, at the moment, the outer surface of the bracelet located in the polishing channel is in contact with the grinding blocks, finally, the rotary seat is controlled to rotate around the axis of the rotary seat, and meanwhile, the bracelet is controlled to rotate around the axis of the bracelet, so that the outer surface of the bracelet is in friction with the grinding blocks, and the outer surface of the bracelet is polished. Through the design, the mode that the grinding blocks surround to form the polishing channel communicated with the guide channel is adopted, the full contact between the outer surface of the bracelet in the polishing channel and the grinding blocks is facilitated, the bracelet is controlled to rotate around the axis of the bracelet, the outer surface of the bracelet is rapidly polished, the polishing time is shortened, and the purpose of improving the polishing efficiency of the bracelet is achieved.
In one embodiment, the rotating base comprises a rotating disc and two cover plates, the two cover plates are respectively connected with two ends of the rotating disc, the grinding block, the elastic piece and the linkage assembly are arranged between the two cover plates, and the avoiding groove is formed in the cover plates.
In one embodiment, the turntable comprises an outer wall and a supporting block, the thickness of the outer wall is larger than that of the supporting block, the supporting block is connected with the inner side of the outer wall, two cover plates are respectively connected with two ends of the supporting block, one end, far away from the grinding block, of each cover plate and the outer wall define a protection groove, and the deflector rod is arranged in the protection groove.
In one embodiment, the supporting block is provided with a sliding groove, and the grinding block is arranged in the sliding groove in a sliding mode.
In one embodiment, the grinding block is provided with a mounting groove, and one end of the elastic element is arranged in the mounting groove.
In one embodiment, the linkage assembly comprises two connecting blocks and two guide rods, one ends of the two connecting blocks are pivoted with the guide rods, one ends of the two connecting blocks, far away from the guide rods, are respectively pivoted with the adjacent grinding blocks, and the guide rods are connected with the rotating base in a sliding mode.
In one embodiment, the rotating seat is provided with a guide groove, and the guide rod is arranged in the guide groove in a sliding manner.
In one embodiment, the number of blocks is three.
In one embodiment, the abrasive block has a guide surface provided at an end of the abrasive block adjacent the polishing channel.
The semi-automatic polishing machine comprises a driving device and the polishing chuck, wherein the driving device is connected with the polishing chuck to drive the polishing chuck to rotate.
Drawings
FIG. 1 is a schematic view of a polishing chuck according to an embodiment of the present invention;
FIG. 2 is a cross-sectional schematic view of the polishing chuck shown in FIG. 1;
FIG. 3 is a schematic view of the abrading block of the polishing chuck of FIG. 1 in a first operating position;
FIG. 4 is a schematic view of the abrading block of the polishing chuck of FIG. 1 in a second operational position;
FIG. 5 is an exploded view of the polishing chuck shown in FIG. 1;
FIG. 6 is an exploded view of the spin base of the polishing chuck shown in FIG. 5;
FIG. 7 is a schematic view of the configuration of the abrasive block of the polishing chuck shown in FIG. 5;
FIG. 8 is a schematic view of the configuration of the abrading block of the polishing chuck of FIG. 5 engaged with a linkage assembly;
fig. 9 is a schematic structural diagram of the semi-automatic polishing machine according to the embodiment of the present invention.
The reference numbers in the figures have the meaning:
100. polishing the chuck;
10. a rotating base; 11. an inner cavity; 12. a guide channel; 13. a turntable; 131. an outer wall; 132. a support block; 133. a chute; 14. a cover plate; 141. an avoidance groove; 142. a guide groove; 15. a protective slot;
20. grinding blocks; 21. mounting grooves; 22. a guide surface;
30. an elastic member;
40. a deflector rod;
50. a linkage assembly; 51. connecting blocks; 52. a guide rod;
60. polishing the channel;
200. semi-automatic polishing machine; 201. a drive device.
Detailed Description
In order to make the above objects, features and advantages of the present invention more comprehensible, embodiments of the present invention are described in detail below with reference to the accompanying drawings. In the following description, numerous specific details are set forth in order to provide a thorough understanding of the present invention. The present invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein, as those skilled in the art will be able to make similar modifications without departing from the spirit and scope of the present invention.
In the description of the present invention, it is to be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "upper", "lower", "front", "rear", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", "clockwise", "counterclockwise", "axial", "radial", "circumferential", and the like, indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for convenience of description and simplicity of description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore, should not be construed as limiting the present invention.
Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one such feature. In the description of the present invention, "a plurality" means at least two, e.g., two, three, etc., unless specifically limited otherwise.
In the present invention, unless otherwise expressly stated or limited, the terms "mounted," "connected," and "fixed" are to be construed broadly and may, for example, be fixedly connected, detachably connected, or integrally formed; can be mechanically or electrically connected; they may be directly connected or indirectly connected through intervening media, or they may be connected internally or in any other suitable relationship, unless expressly stated otherwise. The specific meaning of the above terms in the present invention can be understood according to specific situations by those skilled in the art.
In the present application, unless expressly stated or limited otherwise, the first feature may be directly on or directly under the second feature or indirectly via intermediate members. Also, a first feature "on," "over," and "above" a second feature may be directly or diagonally above the second feature, or may simply indicate that the first feature is at a higher level than the second feature. A first feature being "under," "below," and "beneath" a second feature may be directly under or obliquely under the first feature, or may simply mean that the first feature is at a lesser elevation than the second feature.
It will be understood that when an element is referred to as being "secured to" or "disposed on" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "upper," "lower," "left," "right," and the like as used herein are for illustrative purposes only and do not denote a unique embodiment.
As shown in fig. 1 to 8, it is a polishing chuck 100 according to an embodiment of the present invention.
As shown in fig. 1 to 8, the polishing chuck 100 includes: the rotary seat 10, the grinding block 20, the elastic element 30, the shift lever 40 and the linkage assembly 50. The rotary base 10 is used for driving the grinding blocks 20 to rotate, the grinding blocks 20 are multiple in number, each grinding block 20 is installed in the rotary base 10 and is used for being in contact with the outer surface of a bracelet, the elastic piece 30 is used for driving the grinding blocks 20 to be in contact with the bracelet, the shifting rod 40 is used for shifting the grinding blocks 20 so that the bracelet can be placed between the grinding blocks 20, the linkage assemblies 50 are multiple in number, and the linkage assemblies 50 are used for driving the adjacent grinding blocks 20 to synchronously move respectively. The mode that the grinding blocks 20 are driven to rotate by the rotary seat 10 and the elastic pieces 30 drive the grinding blocks 20 to be in contact with the bracelet is adopted, the outer surface of the bracelet is favorably and fully in contact with the grinding blocks 20, the bracelet is controlled to rotate around the axis of the bracelet, the outer surface of the bracelet is quickly polished, polishing time is shortened, and the purpose of improving polishing efficiency of the bracelet is achieved.
The polishing chuck 100 described above will be further described with reference to fig. 1 to 8.
For example, in order to improve the stability of the polishing chuck 100 during polishing, as shown in fig. 1, 2 and 6, the rotary base 10 is provided with an inner cavity 11 and a guide channel 12, the inner cavity 11 is communicated with the guide channel 12, the guide channel 12 extends from one side of the rotary base 10 to the axial center of the rotary base 10, specifically, the rotary base 10 includes a rotary disc 13 and two cover plates 14, the two cover plates 14 are respectively connected with two ends of the rotary disc 13, and the grinding block 20, the elastic member 30 and the linkage assembly 50 are disposed between the two cover plates 14. The mode that the abrasive block 20, the elastic piece 30 and the linkage assembly 50 are arranged between the two cover plates 14 and the avoidance groove 141 is formed in the cover plate 14 is favorable for protecting the abrasive block 20, the elastic piece 30 and the linkage assembly 50 through the rotary disc 13 and the two cover plates 14, the abrasive block 20, the elastic piece 30 and the linkage assembly 50 are prevented from being damaged by the outside, and the purpose of improving the stability of the polishing chuck 100 during polishing is achieved.
For example, in order to contact the grinding blocks 20 with the outer surface of the bracelet, as shown in fig. 2, 3, 4 and 7, the grinding blocks 20 are slidably disposed in the inner cavity 11, the number of the grinding blocks 20 is multiple, each grinding block 20 is uniformly distributed around the axial center of the rotary base 10, each grinding block 20 has a first working position and a second working position, as shown in fig. 3, when each grinding block 20 is in the first working position, each grinding block 20 surrounds a polishing channel 60 communicated with the guide channel 12, the axial center of the polishing channel 60 is coincident with the axial center of the rotary base 10, as shown in fig. 4, when each grinding block 20 is in the second working position, each grinding block 20 is away from each other to be outside the guide channel 12, in the present embodiment, the number of the grinding blocks 20 is selected to be three, and each grinding block 20 has a guide surface 22, as shown in fig. 2 and 7, the guide surface 22 is disposed at one end of the grinding block 20 close to the polishing channel 60.
In order to realize that the elastic elements 30 can drive the grinding blocks 20 to be in contact with the bracelet, as shown in fig. 2 to 4, the number of the elastic elements 30 is the same as that of the grinding blocks 20, each elastic element 30 is arranged between the rotary base 10 and the grinding block 20 to drive the grinding block 20 to be in the first working position, specifically, the elastic elements 30 are springs, in order to facilitate installation of the elastic elements 30, the grinding block 20 is provided with a mounting groove 21, one end of each elastic element 30 is arranged in the mounting groove 21, and the other end of each elastic element 30 abuts against the inner side wall of the rotary base 10.
In the present embodiment, the shift lever 40 is connected to the grinding block 20, the shift lever 40 extends out of the rotary seat 10, and the rotary seat 10 is provided with an avoiding groove 141 for the shift lever 40 to pass through, wherein the avoiding groove 141 is provided on the cover plate 14.
Further, in order to prevent the driving lever 40 from being worn by the rotary base 10 during rotation, as shown in fig. 2 to 4, the rotary plate 13 includes an outer wall 131 and a supporting block 132, the thickness of the outer wall 131 is greater than that of the supporting block 132, the supporting block 132 is connected to the inner side of the outer wall 131, two cover plates 14 are respectively connected to two ends of the supporting block 132, one end of each cover plate 14, which is far away from the grinding block 20, and the outer wall 131 enclose a protection slot 15, and the driving lever 40 is disposed in the protection slot 15. Wherein, the supporting block 132 is provided with a chute 133, and the grinding block 20 is slidably disposed in the chute 133.
For example, in order to realize that the linkage assembly 50 can drive each grinding block 20 to move synchronously, as shown in fig. 3, 4, 5 and 8, the number of the linkage assemblies 50 is multiple, each linkage assembly 50 is connected with the adjacent grinding block 20 respectively to drive the adjacent grinding block 20 to move synchronously, specifically, the linkage assembly 50 includes two connection blocks 51 and two guide rods 52, one end of each of the two connection blocks 51 is pivotally connected to the guide rod 52, one end of each of the two connection blocks 51 away from the guide rod 52 is pivotally connected to the adjacent grinding block 20 respectively, the guide rod 52 is slidably connected to the rotary base 10, wherein the rotary base 10 is provided with a guide groove 142, the guide rod 52 is slidably disposed in the guide groove 142, and the guide groove 142 is disposed on the cover plate 14.
As shown in fig. 9, the present invention further provides a semi-automatic polishing machine 200, the semi-automatic polishing machine 200 comprises a driving device 201 and the polishing chuck 100, the driving device 201 is connected to the polishing chuck 100 to drive the polishing chuck 100 to rotate.
The utility model discloses a theory of operation does: firstly, as shown in fig. 4, the grinding blocks 20 are controlled to be in the second working position by the shifting rod 40, the elastic element 30 is compressed under force, then the bracelet is moved to the axis of the rotary seat 10 through the guide channel 12, the shifting rod 40 is released, as shown in fig. 3, the elastic element 30 drives the grinding blocks 20 to be in the first working position under the guide of the linkage assembly 50, so that part of the outer surface of the bracelet is in the polishing channel 60, at the moment, the outer surface of the bracelet in the polishing channel 60 is contacted with the grinding blocks 20, finally, the rotary seat 10 is controlled to rotate around the axis of the bracelet, and the bracelet is controlled to rotate around the axis of the bracelet, so that the outer surface of the bracelet is rubbed with the grinding blocks 20, and the outer surface of the bracelet is polished.
The utility model has the advantages that: the mode that the grinding blocks 20 surround to form the polishing channel 60 communicated with the guide channel 12 is adopted, the outer surface of the bracelet in the polishing channel 60 is favorably and fully contacted with the grinding blocks 20, and the bracelet is controlled to rotate around the axis of the bracelet, so that the outer surface of the bracelet is rapidly polished, the polishing time is shortened, and the purpose of improving the polishing efficiency of the bracelet is achieved.
All possible combinations of the technical features of the above embodiments may not be described for the sake of brevity, but should be considered as within the scope of the present disclosure as long as there is no contradiction between the combinations of the technical features.
The above-mentioned embodiments only represent several embodiments of the present invention, and the description thereof is specific and detailed, but not to be construed as limiting the scope of the invention. It should be noted that, for those skilled in the art, without departing from the spirit of the present invention, several variations and modifications can be made, which are within the scope of the present invention. Therefore, the protection scope of the present invention should be subject to the appended claims.
Claims (10)
1. A polishing chuck, comprising:
the rotary seat is provided with an inner cavity and a guide channel, the inner cavity is communicated with the guide channel, and the guide channel extends to the axis of the rotary seat from one side of the rotary seat;
the grinding blocks are arranged in the inner cavity in a sliding mode, the number of the grinding blocks is multiple, the grinding blocks are uniformly distributed around the axis of the rotating seat and provided with a first working position and a second working position, when the grinding blocks are located at the first working position, the grinding blocks surround to form a polishing channel communicated with the guide channel, the axis of the polishing channel is overlapped with the axis of the rotating seat, and when the grinding blocks are located at the second working position, the grinding blocks are far away from each other to be located outside the guide channel;
the number of the elastic pieces is the same as that of the grinding blocks, and each elastic piece is arranged between the rotating seat and the grinding block so as to drive the grinding block to be in a first working position;
the deflector rod is connected with the grinding block and extends out of the rotating seat, and the rotating seat is provided with an avoidance groove for the deflector rod to pass through; and
the linkage assemblies are arranged in a plurality of groups, and each group of linkage assemblies is respectively connected with the adjacent grinding blocks so as to drive the adjacent grinding blocks to move synchronously.
2. The buffing chuck according to claim 1 wherein said rotatable base comprises a turntable and two cover plates, said two cover plates are respectively connected to two ends of said turntable, said abrading block, said resilient member and said linkage assembly are disposed between said two cover plates, and said avoiding groove is disposed on said cover plates.
3. The polishing chuck according to claim 2, wherein the turntable comprises an outer wall and a supporting block, the outer wall has a thickness greater than the supporting block, the supporting block is connected to an inner side of the outer wall, two cover plates are respectively connected to two ends of the supporting block, a protective groove is defined by one end of each cover plate, which is away from the grinding block, and the outer wall, and the deflector rod is disposed in the protective groove.
4. The buffing chuck according to claim 3 wherein said support block defines a channel, said abrading block being slidably disposed within said channel.
5. The polishing chuck according to claim 1, wherein the abrasive block is provided with a mounting groove, and one end of the elastic member is disposed in the mounting groove.
6. The polishing chuck according to claim 1, wherein the linkage assembly comprises two connecting blocks and two guide rods, one end of each of the two connecting blocks is pivotally connected to the guide rod, one end of each of the two connecting blocks, which is away from the guide rod, is pivotally connected to the adjacent grinding block, and the guide rods are slidably connected to the rotating base.
7. The polishing chuck according to claim 6, wherein the rotating base is provided with a guide groove, and the guide rod is slidably disposed in the guide groove.
8. The polishing chuck according to claim 1, wherein the number of the abrasive blocks is three.
9. The polishing chuck according to claim 1, wherein the grinding blocks have a guide surface provided at an end of the grinding blocks adjacent to the polishing channel.
10. A semi-automatic polishing machine comprising a drive means, and a polishing chuck according to any one of claims 1 to 9, said drive means being connected to said polishing chuck to drive said polishing chuck in rotation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222619459.2U CN218312829U (en) | 2022-09-30 | 2022-09-30 | Polishing chuck and semi-automatic polishing machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222619459.2U CN218312829U (en) | 2022-09-30 | 2022-09-30 | Polishing chuck and semi-automatic polishing machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN218312829U true CN218312829U (en) | 2023-01-17 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202222619459.2U Active CN218312829U (en) | 2022-09-30 | 2022-09-30 | Polishing chuck and semi-automatic polishing machine |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN218312829U (en) |
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2022
- 2022-09-30 CN CN202222619459.2U patent/CN218312829U/en active Active
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