CN215036624U - Polishing assembly and stone nursing machine - Google Patents

Abstract

The application provides a polishing subassembly and stone material nursing machine, polishing subassembly includes pivot and a plurality of polishing work head. The peripheral face of the rotating shaft is provided with guide convex strips and limiting convex blocks which are staggered in the circumferential direction and the axial direction. The rotary disc of the polishing working head comprises a first rotary disc base body, a second rotary disc base body and a third rotary disc base body which are sequentially fixed in a stacked mode, a rotating shaft penetrates through a first through hole of the first rotary disc base body, a second through hole of the second rotary disc base body and a third through hole of the third rotary disc base body, and a first groove, a second groove and a third groove are formed in the inner walls of the first through hole, the second through hole and the third through hole respectively. The guide convex strip is matched with the first groove, so that the rotary table can axially slide but cannot circumferentially rotate. The first rotary table base body at the bottommost part is located between the guide protruding strip and the limiting protruding block in the axial direction, and the limiting protruding block is matched with the second groove at the bottommost part and can rotate relatively, so that the rotary table at the bottommost part is limited in the axial direction or separated from the rotating shaft. The polishing assembly can automatically change the pad, and the working efficiency is improved.

Description

Polishing assembly and stone nursing machine

Technical Field

The application belongs to the technical field of stone material nursing, more specifically says, relates to a polishing subassembly and stone material nursing machine.

Background

In conventional stone curing equipment, a polishing pad is generally used to perform a polishing crystallization operation on stone. In the polishing and crystallization operation process, the polishing pad is easy to wear, the pad needs to be replaced by a new pad manually, the pad replacement process is complicated, time and labor are wasted, and the operation efficiency is low.

SUMMERY OF THE UTILITY MODEL

An object of the embodiment of this application is to provide a polishing subassembly and stone material nursing machine to the manual work that exists among the solution prior art is traded the pad and is more loaded down with trivial details, wastes time and energy, technical problem that the operating efficiency is low.

In order to achieve the purpose, the technical scheme adopted by the application is as follows: a polishing assembly is provided that includes a spindle and a plurality of polishing heads. The outer peripheral face of pivot is equipped with at least one along the axially extended direction sand grip of pivot, and the outer peripheral face of one of them one end of pivot is equipped with at least one spacing lug, and direction sand grip and spacing lug are all staggered in the circumferencial direction and the axial along the pivot. Each polishing working head comprises a rotary table and a polishing pad, the rotary table comprises a first rotary table base body, a second rotary table base body and a third rotary table base body which are sequentially fixed in a stacked mode, the first rotary table base body is provided with a first through hole, the inner wall of the first through hole is provided with a first groove, the second rotary table base body is provided with a second through hole, the inner wall of the second through hole is provided with a second groove, the third rotary table base body is provided with a third through hole, and the inner wall of the third through hole is provided with a third groove. In the circumferential direction, the width of the limiting convex block is smaller than or equal to that of the guiding convex strip, the width of the second groove is larger than the sum of the width of the guiding convex strip and the width of the twice limiting convex block, and the width of the third groove is larger than the sum of the width of the limiting convex block and the width of the guiding convex strip. The polishing pad sets up in the bottom surface of third carousel base member, and the first through-hole, second through-hole and the third through-hole of each carousel are passed to the pivot, and direction sand grip and each first recess cooperation to make each polishing working head all cup joint in the periphery of pivot and can slide but can not circumferential direction along the pivot axial. The first turntable base body of the bottommost turntable is axially positioned between the guide convex strip and the limiting lug, and the limiting lug is matched with the second groove of the bottommost turntable and can operatively rotate relatively, so that the bottommost turntable is axially limited or axially separated along the rotating shaft.

Alternatively, the guide ribs and the limit projections may have the same width in the circumferential direction.

Optionally, the outer peripheral surface of the rotating shaft is a cylindrical surface, and the outer peripheral surfaces of the guiding raised strips and the limiting lugs at the outermost side in the radial direction of the rotating shaft are both arc surfaces.

Optionally, the outer peripheral surface of the outermost side of the guiding convex strip and the limiting lug in the radial direction of the rotating shaft is concentric with the outer peripheral surface of the rotating shaft.

Optionally, inner walls of the first groove, the second groove and the third groove are all arc surfaces.

Optionally, the number of the guide convex strips and the number of the limit convex blocks are equal, and the guide convex strips and the limit convex blocks are distributed on the outer peripheral surface of the rotating shaft at equal intervals;

the quantity of first recess, second recess and third recess all equals with the quantity of direction sand grip, and the equal interval distribution of first recess, second recess and third recess.

Optionally, the first, second and third turntable substrates of the turntable are fixed as one body by screws.

Optionally, a bottom surface of a third turntable base of the turntable is provided with raised needle brushes for holding polishing pads.

Optionally, the polishing pad is a scouring pad.

According to another aspect of the present application, there is further provided a stone conditioning machine including the buffing assembly of any of the above.

The application provides a polishing subassembly's beneficial effect lies in: compared with the prior art, the polishing assembly has the advantages that the guide convex strips and the limiting convex blocks are arranged on the outer peripheral surface of the rotating shaft, correspondingly, the inner wall of the first through hole of the first rotary table base body is provided with the first groove matched with the limiting convex blocks, the inner wall of the second through hole of the second rotary table base body is provided with the second groove, the inner wall of the third through hole of the third rotary table base body is provided with the third groove, the width of the second groove is larger than the sum of the width of the guide convex strips and the width of the two times of the limiting convex blocks in the circumferential direction, and the width of the third groove is larger than the sum of the width of the limiting convex blocks and the width of the guide convex strips; when the rotating shaft is pushed to the first rotating disc base body to be blocked by the guide convex strip, the rotating disc is rotated towards the direction of the guide convex strip until the first groove is aligned with the guide convex strip; in the rotating process, when the rotating shaft is viewed from the axial direction, the first rotating disc base body is positioned in the axial gap between the guide raised strip and the limiting lug, so that the guide raised strip and the limiting lug cannot block the first rotating disc base body from rotating; the width of the second groove is large enough to allow the limiting lug to rotate in the second groove in a preset range relatively, so that the limiting lug cannot block the rotation of the second turntable substrate, and the third turntable substrate is positioned at the bottom of the limiting lug so as not to block the rotation of the third turntable substrate, so that the turntable can smoothly rotate to the position where the first groove is aligned with the guide convex strip; then, the rotating discs are continuously pushed to the rotating shaft, and a plurality of rotating discs can be sleeved on the periphery of the rotating shaft according to the method. And when assembling last carousel, align first recess earlier and change epaxial spacing lug, advance the carousel toward the pivot, when advancing first carousel base member and blockked by the direction sand grip, rotate the carousel towards the direction of direction sand grip to the end again, spacing lug is hindered by the first side border lateral wall of second recess and can not continue to rotate this moment, and in the pivot axial, first carousel base member and third carousel base member are restricted by spacing lug, thereby make the carousel can not follow the pivot and go out of axially. When the rotating shaft rotates in the reverse direction of the rotating discs during assembly, the rotating discs can be driven to rotate to work, and when the rotating shaft rotates in the reverse direction of the rotating direction of the work until the first groove of the bottommost rotating disc aligns with the limiting bump, the bottommost rotating disc is relieved from axial limitation, so that the bottommost rotating disc can be separated from the rotating shaft under the action of self gravity, and the upper rotating disc can slide downwards along the rotating shaft under the action of self gravity to be supplemented with the pad. Through the structure, the polishing assembly can realize automatic replacement of the polishing pad without manual pad replacement, so that the operation time and the operation cost are saved, and the operation efficiency is improved.

Drawings

In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings needed to be used in the embodiments or the prior art descriptions will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present application, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without inventive exercise.

FIG. 1 is a schematic perspective view of a polishing assembly provided in an embodiment of the present disclosure;

FIG. 2 is a schematic perspective view of a polishing assembly according to an embodiment of the present disclosure, as viewed from the bottom;

FIG. 3 is a schematic perspective view of a spindle of a polishing assembly according to an embodiment of the present disclosure;

FIG. 4 is a bottom view of a spindle of a polishing assembly provided in an embodiment of the present application;

FIG. 5 is a schematic perspective view of a turntable of a polishing assembly according to an embodiment of the present disclosure;

fig. 6 is a schematic perspective view of a turntable of a polishing assembly according to an embodiment of the present disclosure, as viewed from the bottom;

FIG. 7 is an exploded view of a turntable of a polishing assembly provided in an embodiment of the present application;

FIG. 8 is a bottom view of a turntable of a polishing assembly according to an embodiment of the present disclosure, wherein the positions of the first, second, and third grooves are processed in a perspective manner;

figure 9 is a schematic perspective view of a polishing pad of a polishing assembly according to an embodiment of the present application.

Wherein, in the figures, the respective reference numerals:

10-a rotating shaft; 11-guiding convex strips; 12-a limit bump; 20-polishing the working head; 21-a turntable; 211-a first carousel base; 2111-first via; 2112-first groove; 212-a second turntable substrate; 2121-a second via; 2122-a second groove; 213-third turntable base; 2131-a third through hole; 2132-a third groove; 2133-needle brush; 22-a polishing pad; 30-screw.

Detailed Description

In order to make the technical problems, technical solutions and advantageous effects to be solved by the present application clearer, the present application is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the present application and are not intended to limit the present application.

It will be understood that when an element is referred to as being "secured to" or "disposed on" another element, it can be directly on the other element or be indirectly on the other element. When an element is referred to as being "connected to" another element, it can be directly connected to the other element or be indirectly connected to the other element.

It will be understood that the terms "length," "width," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," and the like, as used herein, refer to an orientation or positional relationship indicated in the drawings that is solely for the purpose of facilitating the description and simplifying the description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus should not be considered as limiting the present application.

Furthermore, the terms "first", "second" and "first" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the present application, "a plurality" means two or more unless specifically limited otherwise.

Referring to fig. 1 and 2 together, a polishing assembly provided by an embodiment of the present application will now be described. The polishing assembly comprises a rotating shaft 10 and a plurality of polishing working heads 20.

The rotating shaft 10 is a solid rigid material in the shape of a long rod, and the rotating shaft 10 can be connected with a driving device such as a motor, so as to drive the rotating shaft 10 to rotate. The outer peripheral surface of the rotating shaft 10 is provided with at least one guiding convex strip 11 extending along the axial direction of the rotating shaft 10, namely, the guiding convex strip 11 protrudes out of the outer peripheral surface of the rotating shaft 10. The outer peripheral surface of one end of the rotating shaft 10 is provided with at least one limiting bump 12, that is, the limiting bump 12 is located at the end of the rotating shaft 10, and that is, both the limiting bump 12 and the guiding convex strip 11 are located on the outer peripheral surface of the rotating shaft 10. The guiding protrusions 11 and the restricting protrusions 12 are offset from each other by a predetermined angle as viewed in the circumferential direction of the rotating shaft 10, that is, the positions of the restricting protrusions 12 are offset from the guiding protrusions 11 by a predetermined angle in the circumferential direction. Similarly, when viewed from the axial direction of the rotating shaft 10, one end of the guiding protrusion 11 is spaced from the end of the rotating shaft 10 by a predetermined distance, the limiting protrusion 12 is located at the end of the rotating shaft 10, and the guiding protrusion 11 and the limiting protrusion 12 are offset from each other by a predetermined distance. In summary, the guide ribs 11 and the stopper projections 12 are staggered in both the circumferential direction and the axial direction along the rotary shaft 10. The width of the limit projection 12 is smaller than or equal to the width of the guide protrusion 11 in the circumferential direction.

Each polishing head 20 includes a turntable 21 and a polishing pad 22. The turntable 21 includes a first turntable base 211, a second turntable base 212, and a third turntable base 213 that are stacked and fixed in this order. As shown in fig. 7, the first turntable base 211 has a first through hole 2111 at the center thereof, and the inner wall of the first through hole 2111 has a first recess 2112. The shape of the first through hole 2111 is matched with the rotating shaft 10, the shape of the first groove 2112 is matched with the guide convex strip 11, and the width of the first groove 2112 in the circumferential direction is slightly larger than the width of the guide convex strip 11, so that the rotating shaft 10 can pass through the first through hole 2111, the guide convex strip 11 on the rotating shaft 10 is clamped with the first groove 2112, and the first rotating disk base 211 can axially slide along the rotating shaft 10 but cannot circumferentially rotate relative to the rotating shaft 10.

The center of the second turntable base 212 has a second through hole 2121, and the inner wall of the second through hole 2121 has a second groove 2122. The width of the second groove 2122 in the circumferential direction is larger than the sum of the width of the guide rib 11 and twice the width of the stopper projection 12. The second through-hole 2121 is shaped to match the rotation shaft 10, and since the width of the second groove 2122 is greater than the width of the guide protrusion 11, the rotation shaft 10 can pass through the first through-hole 2111, and the guide protrusion 11 can pass through the second groove 2122 without obstructing the rotation shaft 10 from passing through the first through-hole 2111.

The third turntable base 213 has a third through hole 2131 in the center, and the inner wall of the third through hole 2131 has a third groove 2132. In the circumferential direction, the width of the third recess 2132 is greater than the sum of the width of the stopper protrusion 12 and the width of the guide protrusion 11. The shape of the third through hole 2131 matches that of the rotation shaft 10, and since the width of the third recess 2132 is greater than that of the guide protrusion 11, the rotation shaft 10 can pass through the third through hole 2131, and the guide protrusion 11 can pass through the third recess 2132 but does not obstruct the rotation shaft 10 from passing through the third through hole 2131.

It is understood that, as shown in fig. 8, the width of the second notch 2122 is largest, the width of the third notch 2132 is second, and the width of the first notch 2112 is smallest in the circumferential direction, and the first notch can be engaged with the guide protrusion 11.

The first turntable substrate 211, the second turntable substrate 212 and the third turntable substrate 213 are sequentially stacked and fixed to form a whole. The first through hole 2111, the second through hole 2121 and the third through hole 2131 are aligned. The first 2112, second 2122 and third 2132 recesses are also aligned so that they all lie on the same curved surface. The polishing pad 22 is disposed on the bottom surface of the third turntable base 213. The center of the polishing pad 22 also has a through hole, and the through hole in the center of the polishing pad 22 is at least slightly larger than the outer diameter of the rotating shaft 10. Therefore, the shaft 10 can pass through the turntable 21 and the polishing pad 22.

The number of the polishing heads 20 is plural, for example, three or four. A plurality of polishing heads 20 are sequentially stacked. The rotary shaft 10 passes through the rotary discs 21 and the polishing pads 22 of the respective polishing heads 20, so that the polishing heads 20 can be sleeved on the outer circumference of the rotary shaft 10. The rotating shaft 10 passes through the first through hole 2111, the second through hole 2121 and the third through hole 2131 of each rotating disc 21, and the guiding convex strip 11 is matched with each first groove 2112, so that each polishing working head 20 is sleeved on the periphery of the rotating shaft 10 and can axially slide along the rotating shaft 10 but cannot circumferentially rotate. The first turntable base 211 of the bottommost one of the turntables 21 is located in the axial gap between the guide rib 11 and the limit projection 12 in the axial direction; the limiting protrusion 12 is engaged with the second groove 2122 of the bottom-most rotary disc 21 and operatively rotates relative to the same, that is, when the rotary shaft 10 and the bottom-most rotary disc 21 rotate relative to each other, the limiting protrusion 12 slides relative to each other along the inner wall of the second groove 2122 in the second groove 2122, so as to limit the bottom-most rotary disc 21 axially or to be axially removed along the rotary shaft 10. Specifically, when the limit protrusions 12 slide to the side walls of the first side edges of the second grooves 2122, since the widths of the first grooves 2112 of the adjacent upper and lower layers of the first turntable base 211 and the third grooves 2132 of the third turntable base 213 are smaller than the width of the second grooves 2122, the bottom surface of the adjacent first turntable base 211 and the top surface of the third turntable base 213 are axially limited by the limit protrusions 12, so that the entire turntable 21 is axially limited. On the contrary, when the limiting protrusion 12 slides to the side wall of the second side edge of the second groove 2122, the first turntable base 211 and the third turntable base 213 are no longer axially limited by the limiting protrusion 12, and at this time, the whole turntable 21 can axially disengage from the end of the rotating shaft 10, so as to realize the detachment of the bottommost turntable 21.

When the polishing assembly is assembled, the rotating shaft 10 is sequentially inserted into the first through hole 2111, the second through hole 2121 and the third through hole 2131 of the rotating disc 21, which is fixed with the polishing pad 22 in advance, and when the rotating shaft is inserted, the first groove 2112 is aligned with the limiting bump 12 on the rotating shaft 10, and the rotating disc 21 is pushed towards the rotating shaft 10; since the width of the restricting protrusion 12 in the circumferential direction is smaller than or equal to the width of the guide protrusion 11, and the width of the first groove 2112 in the circumferential direction is slightly larger than the width of the guide protrusion 11, the first groove 2112 can smoothly pass through the restricting protrusion 12. When the first rotary disk base 211 is pushed forward until the first rotary disk base is stopped by the guide rib 11 and can not be pushed forward, the rotary disk 21 is rotated toward the direction of the guide rib 11 until the first notch 2112 is aligned with the guide rib 11. During this rotation, the first rotor base 211 is located in the axial gap between the guiding protruding strips 11 and the limiting protrusions 12 when viewed from the axial direction of the rotating shaft 10, so that the guiding protruding strips 11 and the limiting protrusions 12 do not hinder the rotation of the first rotor base 211; the width of the second groove 2122 is large enough to allow the limiting protrusion 12 to rotate relatively within the second groove 2122 by a predetermined distance, so that the limiting protrusion 12 does not obstruct the rotation of the second turntable base 212 in the process, and at this time, the third turntable base 213 is still located at the bottom position of the limiting protrusion 12, and the limiting protrusion 12 does not obstruct the rotation of the third turntable base 213, so that the turntable 21 can rotate smoothly to the position where the first groove 2112 is aligned with the guiding protrusion 11. Then, the rotating disc 21 is continuously pushed onto the rotating shaft 10, the first groove 2112 can allow the guiding protrusion 11 to axially pass through, at this time, the widths of the second groove 2122 and the third groove 2132 are large enough so that both the guiding protrusion 11 and the limiting protrusion 12 can simultaneously axially pass through, and the through hole in the center of the polishing pad 22 can also allow the rotating shaft 10 to smoothly pass through, so that the whole polishing working head 20 can be sleeved on the periphery of the rotating shaft 10 and can axially slide along the rotating shaft 10. Then, the polishing heads 20 can be sleeved on the periphery of the rotating shaft 10 according to the above steps. When the last polishing working head 20 is assembled, similarly, the first groove 2112 of the rotary disc 21 is aligned with the limit protrusion 12 on the rotating shaft 10, the rotary disc 21 is pushed toward the rotating shaft 10, when the first rotary disc substrate 211 is pushed forward and is blocked by the guide protrusion 11 and can not be pushed forward, the rotary disc 21 is rotated toward the direction of the guide protrusion 11, when the rotary disc 21 is rotated to the position where the first groove 2112 is aligned with the guide protrusion 11, the rotary disc is required to be rotated to the bottom continuously until the limit protrusion 12 contacts the side wall of the first side edge of the second groove 2122 and blocks the rotary disc 21 from rotating continuously, at this time, when viewed from the axial direction of the rotating shaft 10, the first rotary disc substrate 211 and the third rotary disc substrate 213 are limited by the limit protrusion 12, so that the rotary disc 21 can not be axially limited and can not be removed. The rest of the polishing heads 20 located at the upper layer cannot be separated from the spindle 10 due to the support of the turntable 21 at the lowermost layer.

When the polishing assembly works, the rotating shaft 10 can be driven to rotate by a driving device such as a motor, and the rotating shaft 10 drives all the polishing working heads 20 to rotate. The direction of rotation of the shaft 10 is opposite to the direction of the rotating disc 21 during assembly, so that it is ensured that the bottommost rotating disc 21 does not rotate relative to the shaft 10 during operation and further fall off the shaft 10. The polishing pad 22 of the polishing head 20 at the lowermost layer is pressed against the ground, thereby performing polishing crystallization nursing work on the stone such as ground marble.

When the polishing pad 22 of the lowermost polishing head 20 wears down and needs to be replaced after a period of operation, firstly, the whole polishing working assembly is lifted upwards to be separated from ground marble and other stones, the rotating shaft 10 is controlled by the driving device to rotate reversely, at this time, the polishing working head 20 at the bottommost part cannot respond to the rotation of the rotating shaft 10 in time due to the inertia effect, the bottommost turntable 21 will rotate in the opposite direction with respect to the shaft 10 until the stop lug 12 contacts the sidewall of the second side edge of the second groove 2122 and prevents the turntable 21 from further rotating, at which point the stop lug 12 is aligned with the first groove 2112 of the bottommost turntable 21, the stop lug 12 no longer axially stops the second and third turntable bases 212, 213, so that the rotary disk 21 can be disengaged from the rotary shaft 10 under the action of its own weight, the widths of the second recess 2122 and the third recess 2132 are also large enough to allow the limiting projection 12 to axially pass through when the rotary disk 21 is disengaged. The polishing head 20, with the polishing pad 22 worn away, is then removed. As the lowermost turn plate 21 is disengaged from the rotary shaft 10, the polishing head 20 located above gradually falls down along the rotary shaft 10 by its own weight. During the dropping process, the second grooves 2122 and the third grooves 2132 of the adjacent previous rotary disc 21 are wide enough to allow the guiding ribs 11 and the limiting protrusions 12 to pass through, but the first rotary disc base 211 is blocked by the limiting protrusions 12 when dropping to contact the limiting protrusions 12, so that the rotary disc 21 cannot continue to drop. At this time, the driving device drives the rotating shaft 10 to rotate in the working rotating direction, the rotating disc 21 cannot timely respond to the rotation of the rotating shaft 10 due to the inertia effect, so that the limiting protrusion 12 on the rotating shaft 10 rotates along the inner wall of the second groove 2122 of the rotating disc 21 until contacting the side wall of the first side edge of the second groove 2122, and at this time, when viewed from the axial direction of the rotating shaft 10, the first rotating disc base 211 and the third rotating disc base 213 are limited by the limiting protrusion 12, so that the axial limiting of the rotating disc 21 cannot be released. The polishing assembly realizes that the polishing working head 20 on the upper layer automatically slides down to perform pad repairing, and stone nursing work can be continuously performed. And so on until all the polishing working heads 20 sleeved on the rotating shaft 10 finish the work of automatically removing and repairing the pads.

Compared with the prior art, the polishing assembly is sleeved or separated through the clamping between the rotating shaft 10 and the rotating disc 21 of the polishing working head 20, the polishing pad can be automatically replaced, the pad does not need to be replaced manually, the operation time and the operation cost are saved, and the operation efficiency is improved.

In another embodiment of the present application, referring to fig. 3 and fig. 4, the outer peripheral surface of the rotating shaft 10 is a cylindrical surface, the outer peripheral surfaces of the guiding convex strip 11 and the limiting protrusion 12 at the outermost side in the radial direction of the rotating shaft 10 are both arc surfaces, and the radii of the arc surfaces of the guiding convex strip 11 and the limiting protrusion 12 at the outermost side in the radial direction of the rotating shaft 10 are equal.

Correspondingly, the inner walls of the first notch 2112, the second notch 2122 and the third notch 2132 of each turntable 21, which are matched with the guiding convex strip 11 and the limiting convex block 12, are also arc surfaces. This facilitates the manufacture of the spindle 10 and the turntable 21 and the mutual cooperation between the two.

In another embodiment of the present application, the outer peripheral surfaces of the guide ribs 11 and the stopper projections 12 on the outermost side in the radial direction of the rotating shaft 10 are concentric with the outer peripheral surface of the rotating shaft 10. Thus, the shape of the rotating shaft 10 is relatively regular, which facilitates the manufacture of the rotating shaft 10.

Further, in another embodiment of the present application, the guide ribs 11 and the stopper projections 12 have the same width in the circumferential direction, which facilitates the manufacture of the rotary shaft 10. In this case, since the width of the guide protrusion 11 and the width of the restriction protrusion 12 are equal, the width of the second groove 2122 is greater than the sum of three times the width of the restriction protrusion 12 in the circumferential direction.

In another embodiment of the present application, the guiding protrusions 11 and the limiting protrusions 12 are multiple and equal in number. And the guiding convex strips 11 and the limiting convex blocks 12 are distributed on the peripheral surface of the rotating shaft 10 at equal intervals. For example, in the present embodiment, as shown in fig. 3 and 4, the number of the guide protrusions 11 and the number of the limit protrusions 12 are three, the three guide protrusions 11 are identical in shape and size and are equally spaced on the outer circumferential surface of the rotating shaft 10, and the three limit protrusions 12 are also identical in shape and size and are equally spaced on the outer circumferential surface of the rotating shaft 10. The three limit protrusions 12 are located at the side of the end portions of the three guide convex strips 11 in a one-to-one correspondence.

Correspondingly, the number of the first grooves 2112, the second grooves 2122 and the third grooves 2132 is equal to the number of the guide ribs 11, the first grooves 2112 are equally spaced apart from each other on the inner wall of the first through hole 2111 of the first turntable substrate 211, the second grooves 2122 are equally spaced apart from each other on the inner wall of the second through hole 2121 of the second turntable substrate 212, and the third grooves 2132 are equally spaced apart from each other on the inner wall of the third through hole 2131 of the third turntable substrate 213. In summary, the first grooves 2112, the second grooves 2122, and the third grooves 2132 are equally spaced. This allows each guiding protrusion 11 to axially pass through each of the first 2112, second 2122 and third 2132 grooves respectively when the rotating shaft 10 is inserted into the center of the rotating disk 21.

In another embodiment of the present application, referring to fig. 5 to 8, the polishing assembly includes a plurality of screws 30, and the first turntable base 211, the second turntable base 212, and the third turntable base 213 of the turntable 21 are all ring-shaped discs and are fixed together by the screws 30. The first turntable base 211, the second turntable base 212 and the third turntable base 213 of the turntable 21 are respectively provided with a plurality of through holes at intervals, and each screw 30 sequentially passes through one through hole at the edge of each of the first turntable base 211, the second turntable base 212 and the third turntable base 213, so that the first turntable base 211, the second turntable base 212 and the third turntable base 213 are fixedly stacked.

In another embodiment of the present application, referring to fig. 6 and 8, the bottom surface of the third turntable base 213 of the turntable 21 is provided with needle brushes 2133 for fixing the protrusions of the polishing pad 22. The needle brush 2133 is distributed over the bottom surface of the third turntable base 213. The polishing pad 22 is adhesively fixed to the bottom surface of the third turntable base 213 by the needle brush 2133.

In another embodiment of the present application, as shown in FIG. 9, the polishing pad 22 is a scouring pad, which is a cleaning implement for cleaning, waxing and polishing floors and floor tiles.

The polishing assembly provided by the application has the following advantages: the polishing component can automatically lift off the worn polishing pad 22 and supplement a new pad structure, the tedious work of pad replacement is greatly reduced, the work efficiency of stone maintenance is improved, and compared with the existing manual pad polishing and supplementing structure, the polishing component is simpler in structure and more reliable in work.

According to another aspect of the present application, there is further provided a stone material care machine including the above-described burnishing assembly. Since the stone material nursing machine adopts all the technical schemes of all the embodiments, all the beneficial effects brought by the technical schemes of the embodiments are also achieved, and are not repeated herein.

The above description is only exemplary of the present application and should not be taken as limiting the present application, as any modification, equivalent replacement, or improvement made within the spirit and principle of the present application should be included in the protection scope of the present application.

Claims (10)

1. A polishing assembly, comprising:

the outer peripheral surface of the rotating shaft is provided with at least one guide convex strip extending along the axial direction of the rotating shaft, the outer peripheral surface of one end of the rotating shaft is provided with at least one limiting convex block, and the guide convex strips and the limiting convex blocks are staggered in the circumferential direction and the axial direction of the rotating shaft;

the polishing machine comprises a plurality of polishing working heads, a polishing head and a polishing device, wherein each polishing working head comprises a rotating disc and a polishing pad, the rotating disc comprises a first rotating disc base body, a second rotating disc base body and a third rotating disc base body which are sequentially fixed in a stacked mode, the first rotating disc base body is provided with a first through hole, the inner wall of the first through hole is provided with a first groove, the second rotating disc base body is provided with a second through hole, the inner wall of the second through hole is provided with a second groove, the third rotating disc base body is provided with a third through hole, and the inner wall of the third through hole is provided with a third groove; in the circumferential direction, the width of the limiting convex block is smaller than or equal to the width of the guide convex strip, the width of the second groove is larger than the sum of the width of the guide convex strip and twice the width of the limiting convex block, and the width of the third groove is larger than the sum of the width of the limiting convex block and the width of the guide convex strip; the polishing pad is arranged on the bottom surface of the third turntable base body, the rotating shaft penetrates through the first through hole, the second through hole and the third through hole of each turntable, and the guide convex strip is matched with each first groove, so that each polishing working head is sleeved on the periphery of the rotating shaft and can axially slide along the rotating shaft but cannot circumferentially rotate; the first turntable base body of the bottommost turntable is axially located between the guide protruding strip and the limiting protruding block, and the limiting protruding block is matched with the second groove of the bottommost turntable and can rotate relative to the second groove in an operable mode, so that the bottommost turntable is axially limited or axially separated along the rotating shaft.

2. The polishing assembly of claim 1, wherein the guide ribs and the retention tabs are equal in width in the circumferential direction.

3. The polishing assembly of claim 1, wherein the outer circumferential surface of the rotating shaft is a cylindrical surface, and the outer circumferential surfaces of the guiding convex strip and the limiting convex block at the outermost side in the radial direction of the rotating shaft are both arc surfaces.

4. The polishing assembly of claim 3, wherein the outer peripheral surfaces of the guide rib and the stopper projection on the outermost side in the radial direction of the rotating shaft are concentric with the outer peripheral surface of the rotating shaft.

5. A polishing assembly as set forth in claim 3 wherein the inner walls of the first, second and third grooves are all arcuate surfaces.

6. The polishing assembly of claim 1, wherein the guiding ribs and the limiting protrusions are equal in number, and the guiding ribs and the limiting protrusions are equally spaced on the outer circumferential surface of the rotating shaft;

the quantity of the first grooves, the second grooves and the third grooves is equal to that of the guide convex strips, and the first grooves, the second grooves and the third grooves are distributed at equal intervals.

7. The polishing assembly of any one of claims 1-6, wherein the first disk substrate, the second disk substrate, and the third disk substrate of the disk are secured together by screws.

8. The polishing assembly of any one of claims 1-6, wherein a bottom surface of the third disk substrate of the disk is provided with raised needle brushes for holding a polishing pad.

9. The polishing assembly of any one of claims 1-6, wherein the polishing pad is a scouring pad.

10. Stone care machine, characterized in that it comprises a finishing assembly according to any one of claims 1-9.

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