CN218203028U - Clamp for horizontal sputtering coating - Google Patents
Clamp for horizontal sputtering coating Download PDFInfo
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- CN218203028U CN218203028U CN202222648963.5U CN202222648963U CN218203028U CN 218203028 U CN218203028 U CN 218203028U CN 202222648963 U CN202222648963 U CN 202222648963U CN 218203028 U CN218203028 U CN 218203028U
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Abstract
The application belongs to the technical field of magnetron sputtering coating equipment and discloses a clamp for horizontal sputtering coating. The fixture for horizontal sputtering coating comprises: the positioning device comprises an arched column, a lower positioning pin and an upper positioning pin; the arched column consists of an upright column, an upper cross beam and a lower cross beam which are arranged in parallel, wherein one end of the upper cross beam and one end of the lower cross beam are respectively horizontally assembled at the upper end and the lower end of the upright column; the upper positioning pin is arranged at the top middle position of the upper cross beam, and the lower positioning pin is arranged at the bottom middle position of the lower cross beam; the upright post is provided with a clamping unit; the clamping unit consists of a rigid clamping arm and an elastic clamping arm, wherein the rigid clamping arm is arranged below the elastic clamping arm in the clamping unit, the rigid clamping arm is used for supporting and clamping the bottom of a workpiece to be coated, and the elastic clamping arm is used for clamping the top of the workpiece to be coated. The fixture for horizontal sputtering coating in the application has better compatibility with coating processes of substrates with different sizes and shapes, is suitable for automation of a cluster architecture or standard semiconductor types, and is suitable for mass production.
Description
Technical Field
The application belongs to the technical field of magnetron sputtering coating equipment, and particularly relates to a magnetron sputtering coating clamp which can be suitable for substrates with different sizes and shapes and different films.
Background
Magnetron sputtering is a coating technology widely applied at present, and is generally applied to the fields of microelectronics, optical films, integrated circuits and the like. The placement of the cathode is an important factor affecting the sputter coating process and the performance of the film. The placement modes of the cathode mainly comprise horizontal placement and vertical placement, and the magnetron sputtering mode is divided into a vertical sputtering coating mode and a horizontal sputtering coating mode according to different placement modes of the cathode.
In the vertical sputtering coating, the cathode is placed horizontally, and the substrate is placed parallel to the cathode, so that the sputtering direction is vertical. The process may be sputtering up or sputtering down. When upward sputtering is carried out, the substrate is positioned above the cathode, and the sputtering direction is upward; sputtering down is the opposite, with the substrate below the cathode and the sputtering direction down. For vertical sputter coating, the advantage is that gravity can be used to hold the substrate in place, and thus, better edge exclusion can be achieved. Electrostatic chucks are commonly used as a fixture in vertical sputtering for composite semiconductor applications because they provide good heat transfer and help prevent substrate warpage. The vertical configuration has two major drawbacks: firstly, particles from the peeling shield can fall onto the substrate in the deposition process, and for a large substrate which is difficult to support, the substrate is difficult to keep flat in the deposition process; in addition, these same particles may also fall and land on the cathode target, thereby creating arcing that affects product quality.
In horizontal sputter coating, the cathode is placed vertically and the substrate is placed parallel to the cathode so that the sputtering direction is horizontal. One benefit of horizontal sputter coating is that there is no concern about flaking particles. Due to gravity, the particles will tend to fall to the bottom of the chamber instead of on the cathode or substrate, which is highly advantageous for obtaining high quality thin films. The action of gravity in the horizontal configuration also helps the substrate to maintain good flatness; the horizontal configuration also has some mechanical advantages, and it is easier to simply suspend them in the chamber using a fixture. Securing and clamping are essential requirements for a horizontal configuration to hold the substrate in place and upright. The existing horizontal sputtering coating fixtures are all used for substrates with single size and single shape. The compatibility of the coating process for substrates with different sizes and shapes, the automation of a cluster framework or a standard semiconductor type, the reduction of the shielding of a tool on the substrate, the improvement of the assembly efficiency and the suitability for mass production are the difficult problems to be solved in the technical field of coating at present.
SUMMERY OF THE UTILITY MODEL
In order to solve the technical problems of the horizontal sputtering coating clamp pointed out in the background technology, the application adopts the following technical scheme:
a fixture for horizontal sputter coating, comprising: the positioning device comprises an arch column, a lower positioning pin and an upper positioning pin; the arched column consists of an upright column, an upper cross beam and a lower cross beam which are arranged in parallel, wherein one end of the upper cross beam and one end of the lower cross beam are respectively horizontally assembled at the upper end and the lower end of the upright column; the upper positioning pin is arranged at the top middle position of the upper cross beam, and the lower positioning pin is arranged at the bottom middle position of the lower cross beam; the upright post is provided with a clamping unit; the clamping unit is composed of a rigid clamping arm and an elastic clamping arm, the rigid clamping arm in the clamping unit is arranged below the elastic clamping arm, the rigid clamping arm is used for supporting and clamping the bottom of a workpiece to be coated, and the elastic clamping arm is used for clamping the top of the workpiece to be coated.
The clamping unit in the clamp for horizontal sputtering coating comprises a rigid clamping arm and an elastic clamping arm, and the elastic clamping arm can realize quick clamping and taking down of a workpiece to be coated and can be adapted to workpieces with different sizes; the lower positioning pin and the upper positioning pin are arranged in the middle, so that the symmetry axis of the workpiece to be coated is positioned on the arc-shaped column rotating shaft, and the sputtering coating is more uniform.
The preferred scheme is as follows: the clamping units are arranged into a plurality of clamping units, and the clamping units are sequentially assembled on the stand column from top to bottom. A plurality of clamping units are sequentially assembled on the stand column, so that the workpieces to be coated can be clamped in batches.
Preferably, a side limit strip is assembled on the upright post area between the rigid clamping arm and the elastic clamping arm in the clamping unit. The side limit strips can prevent the workpiece to be coated from moving towards the side direction.
Preferably, a key groove for assembling the clamping unit is formed in the upright column, and the length direction of the key groove is configured to be vertical. The vertical key groove is formed in the stand column, so that the distance between the rigid clamping arm and the elastic clamping arm in the clamping unit can be conveniently adjusted, and the clamping of workpieces to be coated with films of different sizes is realized.
Preferably, the rigid clamping arm comprises two supporting parts protruding upwards, and the upper end face of each supporting part is provided with an inwards-recessed arc-shaped groove. The two upwards-protruding supporting parts can enable the workpiece to be coated to be suspended and shielded in the air to be reduced to the maximum extent, the inwards-recessed arc-shaped grooves can be matched with the coated workpieces with different thicknesses, and clamping of the bottom edges of the coated workpieces can be achieved.
Furthermore, the distance between two upward protruding support parts in the rigid clamping arm is configured to be adjustable, and the distance between the support parts is locked through a locking device. The distance between the supporting parts is adjustable and can be suitable for further clamping the film-coated workpieces with different sizes.
Preferably, the elastic clamping arm comprises a clamping part protruding downwards, and an arc-shaped concave groove recessed inwards is formed in the lower end face of the clamping part. The arc-shaped groove in the elastic clamping arm realizes clamping of the top edge of the coated workpiece.
Preferably, the elastic clamping arm is provided with a clamping shifting sheet. The clamping shifting sheet is convenient for manually adjusting the tension of the elastic clamping arm to realize quick clamping and dismounting of the workpiece to be coated.
More specifically, the method further comprises the following steps: the device comprises a transmission rod, an upper limiting disc, a supporting disc and a lower limiting disc; the transmission rod is arranged in a vertical direction, the top end of the transmission rod is provided with an upper limiting disc, and the bottom end of the transmission rod is sequentially provided with a supporting disc and a lower limiting disc from top to bottom; the upper limiting disc is provided with a plurality of through holes for assembling the upper positioning pins, and the supporting disc, the lower limiting disc and the upper limiting disc are provided with a plurality of through holes for assembling the lower positioning pins.
Preferably, the method further comprises the following steps: t-shaped sleeve and arched column base; the center of the T-shaped sleeve is provided with a pin hole for assembling an upper positioning pin, and the arched column base comprises a central hole and a clamping groove; the T-shaped sleeve is assembled in the through hole of the upper limiting disc, and the upper positioning pin is assembled in the pin hole of the T-shaped sleeve; the arched column base is assembled in the through hole of the supporting disc, the lower positioning pin is assembled in the central hole of the arched column base, and the clamping groove is used for clamping the lower cross beam. The bow-shaped column base and the T-shaped sleeve can be used for quickly assembling and taking down the bow-shaped column, during assembly, the lower positioning pin is inserted into a center hole of the bow-shaped column base, the lower cross beam is clamped into the clamping groove, the T-shaped sleeve is inserted into a through hole corresponding to the upper positioning plate, and the pin hole is sleeved into the outer side wall of the upper positioning pin, so that the bow-shaped column can be quickly clamped.
Preferably, a plurality of arch-shaped columns are assembled between the upper limiting disc and the lower limiting disc, and each arch-shaped column is provided with a plurality of clamping units. And batch clamping can be further realized by configuring a plurality of arched columns.
Advantageous effects
The fixture for horizontal sputtering coating in the application has better compatibility with coating processes of substrates with different sizes and shapes, is suitable for automation of cluster architectures or standard semiconductor types, and is suitable for mass production.
Drawings
FIG. 1 is a schematic view of a fixture for horizontal sputter coating according to an embodiment I;
FIG. 2 is a schematic view of a fixture for horizontal sputter coating according to a second embodiment;
FIG. 3 is a schematic view of a T-shaped sleeve;
FIG. 4 is a schematic view showing the structure of a horizontal sputtering apparatus according to the third embodiment;
FIG. 5 is a schematic view showing a structure of a horizontal sputtering coating jig according to a fourth embodiment;
wherein: the clamping device comprises a vertical column 1, a rigid clamping arm 2, an elastic clamping arm 3, a lower positioning pin 4, an upper positioning pin 5, a clamping plectrum 6, a side limiting strip 7, a key groove 8, a locking device 9, a transmission rod 10, an upper limiting disc 11, a supporting disc 12, a lower limiting disc 13, an arched column base 14, a T-shaped sleeve 15, an axial limiting surface 16, an annular limiting surface 17, a pin hole 18, a lower cross beam 19, an upper cross beam 20, a supporting part 21 and a clamping part 22.
Detailed Description
In order to make the objects, technical solutions and advantages of the present application more clear, the present application will be further described in detail with reference to the accompanying drawings. In the description of the present application, "a number" means two or more unless otherwise specified.
Example one
A jig for horizontal sputter coating, as shown in fig. 1, comprising: the positioning device comprises an arched column, a lower positioning pin 4 and an upper positioning pin 5; the arched column consists of an upright column 1, an upper cross beam 20 and a lower cross beam 19 which are arranged in parallel, wherein one end of the upper cross beam and one end of the lower cross beam are respectively horizontally assembled at the upper end and the lower end of the upright column; the upper positioning pin is arranged at the top middle position of the upper cross beam, and the lower positioning pin is arranged at the bottom middle position of the lower cross beam; a clamping unit is assembled in the area between the upper cross beam and the lower cross beam of the upright post; the clamping unit is composed of a rigid clamping arm 2 and an elastic clamping arm 3, the rigid clamping arm is arranged below the elastic clamping arm in the clamping unit, the rigid clamping arm is used for supporting and clamping the bottom of a workpiece to be coated, and the elastic clamping arm is used for clamping the top of the workpiece to be coated.
The more detailed scheme is as follows: a side limit strip 7 is assembled in the column area between the rigid clamping arm and the elastic clamping arm in the clamping unit; the rigid clamping arm comprises two supporting parts 21 protruding upwards, and the upper end face of each supporting part is provided with an inwards-recessed arc-shaped groove; the elastic clamping arm comprises a clamping part 22 protruding downwards, and the lower end face of the clamping part is provided with an arc-shaped groove sunken inwards; the elastic clamping arm is provided with a clamping shifting sheet 6.
Example two
In an embodiment, as shown in fig. 2 and 3, a fixture for horizontal sputter coating further includes: the device comprises a transmission rod 10, an upper limiting disc 11, a supporting disc 12, a lower limiting disc 13, an arched column base 14 and a T-shaped sleeve 15; the transmission rod is arranged in a vertical direction, the top end of the transmission rod is provided with an upper limiting disc, and the bottom end of the transmission rod is sequentially provided with a supporting disc 12 and a lower limiting disc 13 from top to bottom; a pin hole 18 for assembling an upper positioning pin is formed in the center of the T-shaped sleeve, and the arched column base comprises a central hole and a clamping groove; the T-shaped sleeve is assembled in the through hole of the upper limiting disc, and the upper positioning pin is assembled in the pin hole of the T-shaped sleeve; the arched column base is assembled in a through hole of the supporting disc, the lower positioning pin is assembled in a center hole of the arched column base, and the clamping groove is used for clamping the lower cross beam. During assembly, the lower positioning pin is inserted into a central hole of the base of the arched column, the lower cross beam is clamped into the clamping groove, the T-shaped sleeve is inserted into the through hole corresponding to the upper positioning plate, and the pin hole 18 is sleeved on the outer side wall of the upper positioning pin, so that the arched column can be quickly clamped. The axial limiting surface 17 of the T-shaped sleeve is matched with the inner wall of the through hole of the upper limiting disc, and the annular limiting surface 16 of the T-shaped sleeve is matched with the upper end surface of the upper limiting disc.
EXAMPLE III
In the clamp for horizontal sputtering coating on the basis of the first embodiment, the distance between the rigid clamping arm and the elastic clamping arm in the clamping unit and the distance between two upward-protruding supporting parts in the rigid clamping arm are all configured in an adjustable mode.
As shown in fig. 4, a key groove 8 for assembling the clamping unit is arranged on the upright column, the length direction of the key groove is configured to be vertical, and the distance between two upward protruding supporting parts in the rigid clamping arm is locked through a locking device 9. The key groove arranged on the stand column is beneficial to adjusting the distance between the clamping units, and the distance between the rigid clamping arm and the elastic clamping arm can be conveniently adjusted, so that the application range of the clamp is enlarged.
After the arched column is assembled, as shown in fig. 5, a transmission rod 10, an upper limiting disc 11, a support disc 12, a lower limiting disc 13, an arched column base 14 and a T-shaped sleeve 15; the transmission rod is arranged in a vertical direction, the top end of the transmission rod is provided with an upper limiting disc, and the bottom end of the transmission rod is sequentially provided with a supporting disc 12 and a lower limiting disc 13 from top to bottom; a pin hole 18 for assembling an upper positioning pin is formed in the center of the T-shaped sleeve, and the arched column base comprises a central hole and a clamping groove; the T-shaped sleeve is assembled in the through hole of the upper limiting disc, and the upper positioning pin is assembled in the pin hole of the T-shaped sleeve; the arched column base is assembled in the through hole of the supporting disc, the lower positioning pin is assembled in the central hole of the arched column base, and the clamping groove is used for clamping the lower cross beam; the distance between the rigid clamping arm and the elastic clamping arm in the clamping unit and the distance between two upward-protruding supporting parts in the rigid clamping arm are configured in an adjustable mode.
The fixture for horizontal sputtering coating has better compatibility with coating processes of substrates with different sizes and shapes, is suitable for automation of a cluster architecture or standard semiconductor types, and is suitable for mass production.
Claims (10)
1. A fixture for horizontal sputter coating, comprising: the positioning device comprises an arched column, a lower positioning pin and an upper positioning pin; the arched column consists of an upright column, an upper cross beam and a lower cross beam which are arranged in parallel, wherein one end of the upper cross beam and one end of the lower cross beam are horizontally assembled at the upper end and the lower end of the upright column respectively; the method is characterized in that: the upper positioning pin is arranged at the top middle position of the upper cross beam, and the lower positioning pin is arranged at the bottom middle position of the lower cross beam; the upright post is provided with a clamping unit; the clamping unit is composed of a rigid clamping arm and an elastic clamping arm, the rigid clamping arm in the clamping unit is arranged below the elastic clamping arm, the rigid clamping arm is used for supporting and clamping the bottom of a workpiece to be coated, and the elastic clamping arm is used for clamping the top of the workpiece to be coated.
2. The jig for horizontal sputter coating according to claim 1, characterized in that: the clamping units are arranged into a plurality of clamping units, and the clamping units are sequentially assembled on the stand column from top to bottom.
3. The jig for horizontal sputter coating according to claim 1, characterized in that: and a side limit strip is assembled on the upright post area between the rigid clamping arm and the elastic clamping arm in the clamping unit.
4. The jig for horizontal sputter coating according to claim 1, characterized in that: the upright post is provided with a key groove for assembling the clamping unit, and the length direction of the key groove is configured to be vertical.
5. The jig for horizontal sputter coating according to claim 1, characterized in that: the rigid clamping arm comprises two supporting parts protruding upwards, and the upper end face of each supporting part is provided with an inwards-recessed arc-shaped groove.
6. The jig for horizontal sputter coating according to claim 5, characterized in that: the distance between the rigid clamping arm and the elastic clamping arm in the clamping unit and the distance between two upward-protruding supporting parts in the rigid clamping arm are configured in an adjustable mode.
7. The jig for horizontal sputter coating according to claim 1, characterized in that: the elastic clamping arm comprises a clamping part protruding downwards, and an inwards-recessed arc-shaped groove is formed in the lower end face of the clamping part.
8. The jig for horizontal sputter coating according to claim 7, characterized in that: and the elastic clamping arm is provided with a clamping shifting sheet.
9. The jig for horizontal sputter coating according to claim 1, characterized in that: further comprising: the device comprises a transmission rod, an upper limiting disc, a supporting disc and a lower limiting disc; the transmission rod is arranged in a vertical direction, the top end of the transmission rod is provided with an upper limiting disc, and the bottom end of the transmission rod is sequentially provided with a supporting disc and a lower limiting disc from top to bottom; the upper limiting disc is provided with a plurality of through holes for assembling the upper positioning pins, and the supporting disc, the lower limiting disc and the upper limiting disc are provided with a plurality of through holes for assembling the lower positioning pins.
10. The jig for horizontal sputter coating according to claim 9, characterized in that: further comprising: t-shaped sleeve and arched column base; the center of the T-shaped sleeve is provided with a pin hole for assembling an upper positioning pin, and the arched column base comprises a central hole and a clamping groove; the T-shaped sleeve is assembled in the through hole of the upper limiting disc, and the upper positioning pin is assembled in the pin hole of the T-shaped sleeve; the arched column base is assembled in the through hole of the supporting disc, the lower positioning pin is assembled in the central hole of the arched column base, and the clamping groove is used for clamping the lower cross beam.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222648963.5U CN218203028U (en) | 2022-10-09 | 2022-10-09 | Clamp for horizontal sputtering coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222648963.5U CN218203028U (en) | 2022-10-09 | 2022-10-09 | Clamp for horizontal sputtering coating |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN218203028U true CN218203028U (en) | 2023-01-03 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202222648963.5U Active CN218203028U (en) | 2022-10-09 | 2022-10-09 | Clamp for horizontal sputtering coating |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN218203028U (en) |
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2022
- 2022-10-09 CN CN202222648963.5U patent/CN218203028U/en active Active
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