CN217981720U - Large rotating mechanism for crystal surface macroscopic inspection - Google Patents
Large rotating mechanism for crystal surface macroscopic inspection Download PDFInfo
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- CN217981720U CN217981720U CN202220883368.7U CN202220883368U CN217981720U CN 217981720 U CN217981720 U CN 217981720U CN 202220883368 U CN202220883368 U CN 202220883368U CN 217981720 U CN217981720 U CN 217981720U
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Abstract
The utility model discloses a big rotary mechanism of crystal face macroscopical inspection, its characterized in that: including frame, rotatory module and rotation module, rotatory module is fixed at the frame inner chamber, rotatory module includes first motor, carousel and frame, the frame is fixed in the carousel upper end, it includes second motor, belt pulley module, axis of rotation and wafer adsorption apparatus to rotate the module, the wafer adsorption apparatus passes through the axis of rotation to be fixed on the frame top, and the axis of rotation passes through the belt pulley module to be connected with the second motor, the second motor is fixed in frame one side. The utility model is used for rotary device when macroscopical inspection wafer.
Description
Technical Field
The utility model relates to a semiconductor technology makes the field auxiliary instrument, especially relates to a big rotary mechanism of crystal face macroscopical examination.
Background
The wafer refers to a silicon wafer used for manufacturing a silicon semiconductor integrated circuit, and is called a wafer because the shape is circular; the silicon wafer can be processed into various circuit element structures to become IC products with specific electrical functions, the original material of the wafer is silicon, the surface of the earth crust has inexhaustible silicon dioxide, wherein an inspection platform is often used in the process of manufacturing and producing the wafer, the shape of the wafer is easy to observe, the wafer inspection is divided into macroscopic inspection and microscopic inspection, and during the macroscopic inspection, the crystal face inspection of the wafer lacks an inspection device for clamping the wafer.
SUMMERY OF THE UTILITY MODEL
To the problem, the utility model provides a big rotary mechanism of crystal face macroscopical inspection.
In order to solve the technical problem, the utility model discloses the technical scheme who adopts is: a large rotating mechanism for crystal face macroscopic inspection is characterized in that: including frame, rotatory module and rotation module, rotatory module is fixed at the frame inner chamber, rotatory module includes first motor, carousel and frame, the frame is fixed in the carousel upper end, it includes second motor, belt pulley module, axis of rotation and wafer adsorption apparatus structure to rotate the module, the wafer adsorption apparatus constructs through the axis of rotation to be fixed on the frame top, and the axis of rotation passes through the belt pulley module to be connected with the second motor, the second motor is fixed in frame one side.
Furthermore, a sucker for sucking the wafer in vacuum is arranged on the upper end face of the wafer adsorption mechanism.
Furthermore, an adjusting module consisting of an adjusting slide block and a bolt is arranged at the fixing position of the second motor and the rack.
Furthermore, a first sensing piece and a plurality of groups of first sensors matched with the first sensing piece are installed on the side edge of the rotary disc.
Furthermore, a second sensing piece is installed at the lower end of the belt pulley module, and a limiting block and a second sensor which are matched with the second sensing piece are arranged.
The two groups of limiting blocks are respectively positioned on two sides of the belt pulley set module and are positioned on the same horizontal line with the axis of the main shaft of the second motor.
The module can be used for the macro inspection of crystal faces of 6-inch, 8-inch and 12-inch wafers, and can also be used as a transfer station of a wafer conveyor for the pre-alignment of the wafers, so that the macro inspection of the wafers is more complete.
As can be seen from the above description of the structure of the present invention, compared with the prior art, the present invention has the following advantages: the macroscopic examination can be carried out by enabling light rays, angles and distances to be optimal through transmission of a Y axis and a large-rotation R axis.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this application, are included to provide a further understanding of the invention, and are incorporated in and constitute a part of this specification. In the drawings:
fig. 1 is a schematic structural view of a large rotating mechanism for crystal plane macroscopic inspection according to the present invention;
fig. 2 is a schematic view of a structure of a rotation module of the large rotation mechanism for crystal plane macroscopic inspection according to the present invention;
fig. 3 is a schematic view of a rotary module structure of the large rotary mechanism for crystal plane macroscopic inspection according to the present invention.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more clearly understood, the present invention is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
Examples
Refer to fig. 1, fig. 2 and fig. 3, a big rotary mechanism of crystal face macroscopical examination, including frame 1, rotatory module and rotation module, rotatory module is fixed at frame 1 inner chamber, rotatory module includes first motor 2, carousel 3 and frame 4, frame 4 is fixed in carousel 3 upper ends, it includes second motor 5 to rotate the module, belt pulley module 6, axis of rotation 7 and wafer adsorption apparatus 8, wafer adsorption apparatus 8 passes through axis of rotation 7 to be fixed on frame 4 top, axis of rotation 7 passes through belt pulley module 6 and is connected with second motor 5, second motor 5 is fixed in frame 4 one side.
The upper end surface of the wafer adsorption mechanism 8 is provided with a sucker 9 for sucking the wafer in vacuum.
An adjusting module 10 consisting of an adjusting slide block and a bolt is arranged at the fixing position of the second motor 5 and the frame 4.
A first sensing piece 11 and a plurality of groups of first sensors 12 matched with the first sensing piece are arranged on the side edge of the rotary disc 3.
The lower end of the belt pulley module 6 is provided with a second sensing piece 13, and a limiting block 14 and a second sensor 15 which are matched with the second sensing piece are arranged.
Two groups of limiting blocks 14 are respectively positioned at two sides of the belt pulley group module 6 and are positioned at the same horizontal line with the spindle axis of the second motor 5.
The first motor 2 drives the turntable 2 to rotate, so that the best crystal face macroscopic inspection angle is selected in a rotating mode; drive axis of rotation 7 through second motor 5 and belt pulley module 6 and realize that wafer adsorption structure 8 rotates, under the stopper cooperation, turned angle is 180 degrees.
The above description is only exemplary of the present invention and should not be taken as limiting the scope of the present invention, as any modifications, equivalents, improvements and the like made within the spirit and principles of the present invention are intended to be included within the scope of the present invention.
Claims (6)
1. A large rotating mechanism for crystal face macroscopic inspection is characterized in that: including frame (1), rotatory module and rotation module, rotatory module is fixed at frame (1) inner chamber, rotatory module includes first motor (2), carousel (3) and frame (4), frame (4) are fixed in carousel (3) upper end, it includes second motor (5), belt pulley module (6), axis of rotation (7) and wafer adsorption apparatus structure (8) to rotate the module, wafer adsorption apparatus structure (8) are fixed on frame (4) top through axis of rotation (7), and axis of rotation (7) are connected with second motor (5) through belt pulley module (6), second motor (5) are fixed in frame (4) one side.
2. A large rotation mechanism for crystal plane macro inspection according to claim 1, wherein: and a sucker (9) for sucking the wafer in vacuum is arranged on the upper end surface of the wafer adsorption mechanism (8).
3. A large rotation mechanism for crystal plane macro inspection according to claim 1, wherein: and an adjusting module (10) consisting of an adjusting slide block and a bolt is arranged at the fixing position of the second motor (5) and the rack (4).
4. A large rotation mechanism for crystal plane macro inspection according to claim 1, wherein: a first sensing piece (11) and a plurality of groups of first sensors (12) matched with the first sensing piece are installed on the side edge of the rotary disc (3).
5. A large rotation mechanism for crystal plane macro inspection according to claim 1, wherein: and a second sensing piece (13) is installed at the lower end of the belt pulley module (6), and a limiting block (14) and a second sensor (15) which are matched with the second sensing piece are arranged.
6. A large rotation mechanism for crystal plane macro-inspection according to claim 5, wherein: two groups of limiting blocks (14) are respectively positioned on two sides of the belt pulley module (6) and are positioned on the same horizontal line with the axis of the main shaft of the second motor (5).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202220883368.7U CN217981720U (en) | 2022-04-18 | 2022-04-18 | Large rotating mechanism for crystal surface macroscopic inspection |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202220883368.7U CN217981720U (en) | 2022-04-18 | 2022-04-18 | Large rotating mechanism for crystal surface macroscopic inspection |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN217981720U true CN217981720U (en) | 2022-12-06 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202220883368.7U Active CN217981720U (en) | 2022-04-18 | 2022-04-18 | Large rotating mechanism for crystal surface macroscopic inspection |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN217981720U (en) |
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2022
- 2022-04-18 CN CN202220883368.7U patent/CN217981720U/en active Active
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