CN2179636Y

CN2179636Y - Mould for making solar cell electrode

Info

Publication number: CN2179636Y
Application number: CN 93226421
Authority: CN
Inventors: 郭里辉; 张怡彬; 张永书
Original assignee: DEJIA SCIENCE AND TECHNOLOGY COMPREHENSIVE Co SHANGHAI
Current assignee: DEJIA SCIENCE AND TECHNOLOGY COMPREHENSIVE Co SHANGHAI
Priority date: 1993-10-14
Filing date: 1993-10-14
Publication date: 1994-10-12
Anticipated expiration: 2003-10-14

Abstract

The utility model relates to a mould for making solar cells by a metal evaporating process, which is especially suitable for making grid-shaped electrodes of MIS/IL solar cells so as to replace the lithography process in the manufacture of the MIS/IL solar cells. The utility model is characterized in that a template 2 is a threading male mould made of sheet ferromagnetic material with thickness from 0.02 to 0.3 mm; the hole strips of the threading male mould are respectively correspondingly equivalent to the grid strips, the gird spacing and the conflux strips of the grid-shaped electrodes, and the base sheets of workpieces are processed and are clamped and fixed in the middle by the magnetic force of a lower mould. The utility model can be used for processing the grid-shaped electrodes of the solar cells in the industrial scale.

Description

Mould for making solar cell electrode

The utility model is the mould that is used to make solar cell, is specially adapted to make metal one insulating barrier semiconductor/inversion layer solar cell electrode of (being called for short the MIS/IL solar cell).

Solar cell is subjected to the electrode of plane of illumination to be gate-shaped electrode.The manufacturing of the gate-shaped electrode of PN junction solar cell can be adopted photoetching process or mask evaporation technology, also can adopt the technology of silver slurry silk screen printing sintering.

The MIS/IL solar cell is a kind of novel solar cell, and patent DE 2846096 and Chinese patent application file (application number: 93225310.5 and 93112435.2) record to some extent, but its technological equipment for making does not have any disclosure.

Because the working mechanism of MIS/IL solar cell is different with the PN junction solar cell, and bigger sheet resistance is arranged, therefore, the grid spacing of its gate-shaped electrode and the width of grizzly bar are much narrow than the PN junction solar cell.It is unfavorable continuing to use silver slurry silk screen printing sintering process, and adopts photoetching process also because its cost height, production efficiency are low, is unfavorable for suitability for industrialized production MIS/IL solar cell.Need seek the way that solves in addition.

In prior art, it is ripe that metal directly is evaporated to surface of the work (being evaporation technology), it also is feasible adopting the mask evaporation technology to make PN junction solar cell gate-shaped electrode, problem be to provide meet the gate-shaped electrode specification requirement, particularly to meet MIS/IL solar cell gate-shaped electrode spacing be 100～700 μ m, grizzly bar wide be the needed mould that requires of 10～50 μ m.This mould will satisfy the requirement of the industrial high efficiency rate mode of production simultaneously.

The purpose of this utility model is to provide the mould that satisfies above-mentioned requirements employing evaporation technology manufacturing gate-shaped electrode.

The utility model is achieved in that on laminar ferromagnetic material, size by solar cell base sheet plane to be processed, in the middle according to the pattern of required gate-shaped electrode, comprise grizzly bar length, grid spacing and bus bar sizes, cut level of wearing into and upright opening bar with photoetching or other ways, constitute negative template, or claim mask plate; Adopt one to have and the onesize smooth hard magnetic material piece in mask plate plane, and vertically magnetize up and down as lower module; In order to locate and to install and remove conveniently, mask plate and lower module are respectively charged in the framework, constitute patrix and counterdie separately, form required mould jointly.

During use solar cell substrate to be processed is placed between patrix and the counterdie, rely on magnetic force, the bar that is not fallen by photoetching of mask plate covers on substrate obediently.After placing evaporator to evaporate, just leave the corresponding to metal pattern of hole bar pattern that is fallen by photoetching with mask plate on the substrate, promptly required gate-shaped electrode.

The utility model has the advantages that: the photoetching of mask plate has guaranteed the meticulous accurate of physical dimension, satisfy of the harsh requirement of the gate-shaped electrode of gate-shaped electrode, particularly MIS/IL solar cell fully to grizzly bar and grid spacing, this is that silver slurry silk screen printing sintering process institute is inaccessible, has avoided again part of workpiece is carried out the numerous and diverse of photoetching simultaneously; Selected materials and thickness thereof had both made mounting or dismounting conveniently improve work efficiency, further made mask plate and base sheet be close to again, had reduced " overlap ", " burr ", had improved the accuracy of gate-shaped electrode size.

＜Fig. 1〉is the utility model not exclusive embodiment generalized section, wherein:

(solar cell of gate-shaped electrode to be processed) substrate 1, its raw material are P type semiconductor, are generally circle or square, also other shapes have been passed through preceding processes, and gate-shaped electrode to be evaporated is arranged.Its thickness is 0.06～0.5mm.

Mask plate 2 is big than substrate 1, with thickness is that 0.02～0.3mm ferromagnetic material thin slice is made, in the middle with the area of substrate 1 identical size on, physical dimensions such as, grid spacing wide, busbar by the grizzly bar of required gate-shaped electrode, level reaches vertically and is the hole bar to wearing to carve to remove, and makes former.

Lower module 3 is made for hard magnetic material, and upper and lower surface is identical and equate that with the last lower plane of mask plate 2 its thickness is 5～15mm.

Framework 4 usefulness non-magnetic materials are made, and lower module 3 embeds its middle groove more tightly.Depth of groove is less than the thickness of lower module 3.

The material of framework 5 and peripheral size are identical with framework 4, and the middle part is the hole that has upper and lower step, and the shape in hole is identical bigger with substrate 1, and big gap can freely be inserted and not have to substrate 1.The groove that the topping bar of hole constituted can embed mask plate 2 just and fixingly not move, and its degree of depth equates that with the thickness of mask plate 2 the inverted Baltimore groove of getting out of a predicament or an embarrassing situation and being constituted in hole can freely be inserted the top of lower module 3.

Mask plate 2 constitutes patrix with framework 5.

Lower module 3 constitutes counterdie with framework 4.

Substrate 1 is placed the relevant position, middle part of lower module, cover patrix and just can carry out gate-shaped electrode and evaporated.

＜Fig. 2〉is substrate 1 when square, the top schematic view of mask plate 2, wherein:

The grizzly bar of wide 10～50 μ m in horizontal strip hole and gate-shaped electrode is suitable; Horizontal strip pitch of holes 100～700 μ m are suitable with interval of grid strip; Vertical direction has the busbar of the strip hole of concentric reducer and gate-shaped electrode suitable.

＜Fig. 3〉is substrate 1 when circular, the top schematic view of mask plate 2, and all implications are identical with＜Fig. 2 〉.

When＜Fig. 4〉is substrate 1 for another kind of shape, the top schematic view of mask plate 2, all implications also are identical with＜Fig. 2〉among the figure.

Claims

1, a kind of employing evaporation of metal technology is made the solar cell gate-shaped electrode, the mould of MIS/IL solar cell gate-shaped electrode particularly, by mask plate 2, patrix and lower module 3 that framework 5 is formed, the counterdie that framework 4 is formed is formed jointly, solar cell substrate 1 to be processed is placed between mask plate 2 and the lower module 3, it is characterized in that: mask plate 2 is the thin slice ferromagnetic material that is not more than 0.02～0.3mm with the thickness former of boring a hole in pairs, its horizontal direction strip width of orifice degree is 10～50 μ m, the lateral aperture stripe pitch is 100～700 μ m, vertical direction hole bar has concentric reducer, respectively with the grizzly bar of the gate-shaped electrode that will make, the physical dimension of grid spacing and busbar is suitable, and lower module 3 usefulness hard magnetic materials are made.