CN217741970U - Electrode plate position adjusting device of plasma equipment - Google Patents
Electrode plate position adjusting device of plasma equipment Download PDFInfo
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- CN217741970U CN217741970U CN202220976399.7U CN202220976399U CN217741970U CN 217741970 U CN217741970 U CN 217741970U CN 202220976399 U CN202220976399 U CN 202220976399U CN 217741970 U CN217741970 U CN 217741970U
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Abstract
The utility model discloses a plate electrode position adjusting device of plasma equipment, including side bearing mechanism and the electrically conductive plug connection mechanism of adjustable height, side bearing mechanism installs in the plate electrode both sides, electrically conductive plug connection mechanism connects between plate electrode and electrically conductive plug. Compared with the prior art, the utility model the advantage be: the position and the distance of the electrode plates can be adjusted according to the conclusion of the process uniformity, the photoresist removing rate corresponding to the position of the electrode plates is indirectly adjusted, the photoresist removing rate in the whole cavity can be effectively enabled to reach a consistent level, and the uniformity of the overall photoresist removing rate is improved.
Description
Technical Field
The utility model relates to an adjustment mechanism especially relates to a plate electrode position control device of plasma equipment.
Background
In the process of wafer manufacturing, plasma glue sweeping equipment is indispensable equipment in the whole production process, and with the development of times and the progress of scientific technology, the requirement on uniformity of plasma glue removal in the wafer manufacturing process is higher and higher. The power electrode plate is an important part of plasma equipment, and radio frequency power is fed into the power electrode plate so as to generate plasma in the vacuum cavity.
In the conventional plasma photoresist removing equipment, the position of a power electrode plate is fixed or the adjustable range is limited, the photoresist removing rate of the plasma is greatly influenced by the distance between the electrode plates, and the strength of the plasma shows a rule that an upper layer is larger than a lower layer in the whole cavity, so that the optimization scheme of the uniformity of the photoresist removing process is limited. If the position of the electrode plate can be flexibly adjusted, the uniformity of the whole cavity becomes better.
Generally, there are 13 slots inside the plasma equipment cavity, and the distance between slot and slot equals, and a plate electrode can be installed to every slot, and consequently the distance of plate electrode equals the geometric multiple of slot distance, and in the accommodation process of the homogeneity of removing glue, can appear between the plate electrode distance or too big, the speed of removing glue is on the high side, or too little, the speed of removing glue is on the low side to influence the homogeneity of removing glue of whole cavity.
Therefore, it is an urgent problem for those skilled in the art to develop an electrode plate position adjusting device for plasma equipment.
SUMMERY OF THE UTILITY MODEL
The utility model provides a solve above-mentioned not enough, provide a plate electrode position control device of plasma equipment.
The above object of the present invention is achieved by the following technical solutions: the utility model provides a plate electrode position adjusting device of plasma equipment, is including adjustable height's side bearing mechanism and the electrically conductive plug coupling mechanism of adjustable height, side bearing mechanism installs in the plate electrode both sides, electrically conductive plug coupling mechanism connects between plate electrode and electrically conductive plug.
Furthermore, the side supporting mechanism comprises a nut piece, an adjusting screw piece and an insulating ceramic bracket, wherein one side of the nut piece is connected with a supporting roller, and the supporting roller is installed and travels on a sliding rail on the inner wall of the cavity of the plasma equipment; the insulating ceramic support is provided with a connecting hole, and the upper end of the adjusting screw piece is rotatably inserted into the insulating ceramic support.
Furthermore, the connecting hole is a semi-counterbore, the upper end of the adjusting screw rod is provided with a semi-countersunk head matched with the semi-counterbore, namely, the upper end of the adjusting screw rod is in an inverted T-shaped structure, and the semi-countersunk head at the upper end of the adjusting screw rod can be rotatably inserted into the semi-counterbore.
Furthermore, the conductive plug connecting mechanism comprises an adjusting block and an electrode plate connecting end, a conductive plug is connected to the outer side of the adjusting block, and the conductive plug is inserted into a slot on the electrode column; be equipped with waist shape hole on the regulating block, the one end of plate electrode link is equipped with the screw hole to through jackscrew or screw locking connection in the waist shape hole on the regulating block, the other end and the plate electrode of plate electrode link are connected.
Furthermore, the adjusting block is 'Contraband', the waist-shaped holes are formed in two sides of the adjusting block, one end of the connecting end of the electrode plate is placed in the adjusting block, and the screw holes are formed in two sides of the connecting end of the electrode plate and are connected in a locking mode through jackscrews or screws.
During the use, can rotate screw rod spare low level earlier, with the utmost point board slot position as far as possible level, install all plate electrodes in the slot that corresponds again, the height of plate electrode is adjusted to the homogeneity result of removing glue that accessible current structure obtained, if a certain layer is removed glue speed and is end partially, then turn down the plate electrode interval on this layer, the distance between the plate electrode is less, the concentration of plasma just is big more, the rate of removing glue also becomes thereupon, on the contrary, the rate of removing glue is high then the interval of turning up, when adjusting the plate electrode height, need side bearing mechanism and conductive plug coupling mechanism to adjust simultaneously, the horizontal degree of accessible spirit level meter measurement plate electrode, ensure that the amplitude of adjustment of every adjustable position is unanimous. Thus, more precise photoresist stripping rate adjustment can result in better overall photoresist stripping uniformity.
Compared with the prior art, the utility model the advantage be: the position and the distance of the electrode plates can be adjusted according to the conclusion of the process uniformity, the photoresist removing rate corresponding to the position of the electrode plates is indirectly adjusted, the photoresist removing rate in the whole cavity can be effectively enabled to reach a consistent level, and the uniformity of the overall photoresist removing rate is improved.
Drawings
Fig. 1 is a schematic structural diagram of the present invention.
Fig. 2 is a schematic structural view of the middle side supporting mechanism of the present invention.
Fig. 3 is a schematic structural diagram of the connecting mechanism of the middle conductive plug of the present invention.
Fig. 4 is a schematic view of the present invention installed in a plasma equipment chamber.
Detailed Description
The present invention will be described in detail with reference to the accompanying drawings.
As shown in fig. 1 to 4, an electrode plate position adjusting device for a plasma apparatus includes a height-adjustable side supporting mechanism 1 and a height-adjustable conductive plug connecting mechanism 2, wherein the side supporting mechanism 1 is installed on both sides of an electrode plate 3, and the conductive plug connecting mechanism 2 is connected between the electrode plate 3 and a conductive plug 4.
Further, the side supporting mechanism 1 comprises a nut member 101, an adjusting screw member 102 and an insulating ceramic support 103, wherein one side of the nut member 101 is connected with a supporting roller 104, and the supporting roller 104 is installed on and travels on a slide rail 6 on the inner wall of the plasma equipment cavity 5; the insulating ceramic support 103 is provided with a connecting hole 7, and the upper end of the adjusting screw member 102 is rotatably inserted into the insulating ceramic support 103.
Furthermore, the connecting hole 7 is a half counter bore, the upper end of the adjusting screw member 102 is provided with a half counter bore 8 matched with the half counter bore, that is, the upper end of the adjusting screw member 102 is in an inverted T-shaped structure, and the half counter bore at the upper end of the adjusting screw member 102 can be rotatably inserted into the half counter bore.
Further, the conductive plug connecting mechanism 2 comprises an adjusting block 201 and an electrode plate connecting end 202, the outer side of the adjusting block 201 is connected with a conductive plug 4, and the conductive plug 4 is inserted into a slot 901 on the electrode column 9; be equipped with waist shape hole 203 on the regulating block 201, the one end of electrode plate link 202 is equipped with the screw hole to through jackscrew 204 or screw locking connection in waist shape hole 203 on the regulating block 201, the other end and the electrode plate 3 of electrode plate link 202 are connected.
Furthermore, the adjusting block 201 is in a shape of Contraband, the waist-shaped holes 203 are formed in two sides of the adjusting block, one end of the electrode plate connecting end 202 is placed inside the adjusting block 201, and the screw holes are formed in two sides of the electrode plate connecting end 202 and are connected in a locking manner through jackscrews 204 or screws.
During the use, can rotate adjusting screw member 102 to the low level earlier, with the utmost extent level of plate electrode 3 slot 901 position, install all plate electrodes 3 in corresponding slot 901 again, the height of plate electrode 3 is adjusted to the homogeneity result of removing glue that accessible current structure obtained, if a certain layer removes the speed to the end, then adjust the plate electrode 3 interval on this layer for a short time, the distance between plate electrode 3 is less, the concentration of plasma just is big more, the rate of removing glue also increases thereupon, on the contrary, remove the speed for a long time and adjust the interval for a long time that the speed is high, when adjusting plate electrode 3 height, need side bearing mechanism 1 and conductive plug coupling mechanism 2 to adjust simultaneously, the horizontal degree of plate electrode 3 is measured to accessible spirit level, guarantee that the amplitude of adjustment of every adjustable position is unanimous. Thus, more precise photoresist stripping rate adjustment can result in better overall photoresist stripping uniformity.
The above only is the embodiment of the present invention, not limiting the patent scope of the present invention, all the equivalent structures or equivalent processes that are used in the specification and the attached drawings or directly or indirectly applied to other related technical fields are included in the patent protection scope of the present invention.
Claims (5)
1. An electrode plate position adjusting device of plasma equipment, its characterized in that: the height-adjustable electric plug connecting mechanism is characterized by comprising a side supporting mechanism with adjustable height and an electric plug connecting mechanism with adjustable height, wherein the side supporting mechanism is installed on two sides of the electrode plate, and the electric plug connecting mechanism is connected between the electrode plate and an electric plug.
2. The electrode plate position adjusting device of a plasma equipment according to claim 1, wherein: the side supporting mechanism comprises a nut piece, an adjusting screw piece and an insulating ceramic support, wherein one side of the nut piece is connected with a supporting roller which is arranged on a sliding rail on the inner wall of the cavity of the plasma equipment and travels; the insulating ceramic support is provided with a connecting hole, and the upper end of the adjusting screw piece is rotatably inserted into the insulating ceramic support.
3. The electrode plate position adjusting device of a plasma apparatus according to claim 2, wherein: the connecting hole is a semi-counterbore, a semi-countersunk head matched with the semi-counterbore is arranged at the upper end of the adjusting screw rod, and the semi-countersunk head at the upper end of the adjusting screw rod can be rotatably inserted into the semi-counterbore.
4. The electrode plate position adjusting device of a plasma apparatus according to claim 1, wherein: the conductive plug connecting mechanism comprises an adjusting block and a plate electrode connecting end, a conductive plug is connected to the outer side of the adjusting block, and the conductive plug is inserted into a slot on the electrode column; be equipped with waist shape hole on the regulating block, the one end of plate electrode link is equipped with the screw hole to through jackscrew or screw locking connection in the waist shape hole on the regulating block, the other end and the plate electrode of plate electrode link are connected.
5. The electrode plate position adjusting device of a plasma apparatus according to claim 4, wherein: the adjusting block is in a shape of Contraband, the waist-shaped holes are formed in two sides of the adjusting block, one end of the connecting end of the electrode plate is placed in the adjusting block, and the screw holes are formed in two sides of the connecting end of the electrode plate and are connected in a locking mode through jackscrews or screws.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202220976399.7U CN217741970U (en) | 2022-04-26 | 2022-04-26 | Electrode plate position adjusting device of plasma equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202220976399.7U CN217741970U (en) | 2022-04-26 | 2022-04-26 | Electrode plate position adjusting device of plasma equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN217741970U true CN217741970U (en) | 2022-11-04 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202220976399.7U Active CN217741970U (en) | 2022-04-26 | 2022-04-26 | Electrode plate position adjusting device of plasma equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN217741970U (en) |
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2022
- 2022-04-26 CN CN202220976399.7U patent/CN217741970U/en active Active
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