CN217716309U - Thickness detection equipment of transparent film - Google Patents
Thickness detection equipment of transparent film Download PDFInfo
- Publication number
- CN217716309U CN217716309U CN202221909136.0U CN202221909136U CN217716309U CN 217716309 U CN217716309 U CN 217716309U CN 202221909136 U CN202221909136 U CN 202221909136U CN 217716309 U CN217716309 U CN 217716309U
- Authority
- CN
- China
- Prior art keywords
- light
- light source
- reflecting mirror
- frequency domain
- interference
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Landscapes
- Length Measuring Devices By Optical Means (AREA)
Abstract
The utility model discloses a thickness detection equipment of transparent film belongs to the optical detection field. The method comprises the following steps: the device comprises a light source, an interference component, a frequency domain detection device and a data processor; the interference assembly is a Michelson interference device, the light source is arranged on an extension line of a central axis of a light entrance port of the Michelson interference device, the frequency domain detection device is arranged on an extension line of a central axis of a light exit port of the Michelson interference device, and the frequency domain detection device can acquire an interference signal generated by a light path after being reflected by the Michelson interference device and transmit the signal to the data processor; and a sample film to be measured is placed between the beam splitter prism and the reflecting mirror of the Michelson interference device. The utility model discloses an adopt the measuring method of projection formula, this method precision is high, and measuring range is big, and the structure is nimble simultaneously, processing method is simple, does not require to strictly place the sample, avoids scraping colored film surface, influences the product quality of film, can also measure the refracting index of film simultaneously.
Description
Technical Field
The utility model belongs to the optical detection field, especially a thickness detection equipment of transparent film.
Background
The Lens film is an optical element, is widely applied to the technical field of optical fiber communication, and can receive optical signals and converge the optical signals on a photosensitive device CMOS/CCD to reduce aberration. With the rapid development of optical communication, the requirements on the quality of lens are higher and higher. At present, the thickness of the lens film is tested manually through a micrometer, and the contact detection method is easy to scrape the surface of the lens film and influence the product quality of the lens film.
SUMMERY OF THE UTILITY MODEL
In order to overcome the technical defect, the utility model provides a thickness detection equipment of transparent film to solve the problem that the background art relates.
The utility model provides a thickness detection equipment of transparent film, include:
the system comprises a light source, an interference component, a frequency domain detection device and a data processor;
the interference assembly is a Michelson interference device, the light source is arranged on an extension line of a central axis of a light entrance port of the Michelson interference device, the frequency domain detection device is arranged on an extension line of a central axis of a light exit port of the Michelson interference device, and the frequency domain detection device can acquire an interference signal generated by a light path after being reflected by the Michelson interference device and transmit the signal to the data processor;
the sample film to be measured is placed between the beam splitter prism and the mirror of the michelson interference device.
Preferably or optionally, the light entrance port central axis and the light exit port central axis are perpendicular to each other.
Preferably or optionally, the frequency domain detection means is a spectrometer.
Preferably or optionally, the michelson interference apparatus comprises: the light source device comprises a light splitting prism, a first reflecting mirror and a second reflecting mirror, wherein the light splitting prism is positioned at the central position and is installed at a preset angle, the first reflecting mirror is arranged on one side far away from a light entrance port, and the second reflecting mirror is arranged on one side far away from a light exit port.
Preferably or optionally, a first focusing lens, a second focusing lens, a third focusing lens and a fourth focusing lens are respectively arranged on the light path between the light source, the first reflector, the second reflector, the frequency domain detection device and the beam splitting prism.
Preferably or optionally, the sample film to be measured is placed in the light path between the first mirror and the second focusing lens.
Preferably or optionally, the light source is a broadband light source.
Preferably or optionally, the broadband light source has a center wavelength of 1327nm and a bandwidth of 70nm.
The utility model relates to a thickness detection equipment of transparent film compares in prior art, has following beneficial effect: the utility model discloses an adopt the measuring method of projection formula, this method precision is high, and measuring range is big, and the structure is nimble simultaneously, processing method is simple, does not require strictly to place the sample, avoids scraping colored film surface, influences the product quality of film, can also measure the refracting index of film simultaneously.
Drawings
Fig. 1 is a first schematic structural diagram of the present invention.
Fig. 2 is a schematic structural diagram of a michelson interference device of the present invention.
Fig. 3 is a schematic structural diagram of the present invention.
The reference signs are: the device comprises a light source 10, a Michelson interference device 20, a frequency domain detection device 30, a data processor 40, a sample film 50 to be measured, a beam splitter prism 21, a first reflecting mirror 22, a second reflecting mirror 23, a first focusing lens 24, a second focusing lens 25, a third focusing lens 26 and a fourth focusing lens 27.
Detailed Description
In the following description, numerous specific details are set forth in order to provide a more thorough understanding of the present invention. It will be apparent, however, to one skilled in the art, that the present invention may be practiced without one or more of these specific details. In other instances, well-known features have not been described in order to avoid obscuring the present invention.
Referring to fig. 1 to 3, a thickness detecting apparatus of a transparent film includes: the device comprises a light source 10, a Michelson interference device 20, a frequency domain detection device 30, a data processor 40, a sample film 50 to be measured, a light splitting prism 21, a first reflecting mirror 22, a second reflecting mirror 23, a first focusing lens 24, a second focusing lens 25, a third focusing lens 26 and a fourth focusing lens 27.
The interference component is a michelson interference device 20, the light source 10 is arranged on an extension line of a central axis of a light entrance port of the michelson interference device 20, the frequency domain detection device 30 is a spectrometer and arranged on an extension line of a central axis of a light exit port of the michelson interference device 20, the frequency domain detection device 30 can obtain an interference signal generated by a light path after being reflected by the michelson interference device 20 and transmit the signal to the data processor 40, and the data processor 40 is used for performing fourier transform and information comparison processing. The central axis of the light entrance port and the central axis of the light exit port are perpendicular to each other, a sample thin film 50 to be measured is placed between the beam splitter prism 21 and the reflecting mirror of the michelson interference device 20, and the sample thin film 50 to be measured can be, but is not limited to, a lens film.
The michelson interference device 20, which is the most common type of optical interferometer, includes a beam splitter prism 21 located at a central position and installed at a predetermined angle, a first reflecting mirror 22 disposed at a side away from the light incident port, and a second reflecting mirror 23 disposed at a side away from the light exit port. In the detection process, one incident light beam is divided into two incident light beams by the spectroscope and then reflected back by the corresponding plane mirror, and the two incident light beams are identical in frequency, identical in vibration direction and constant in phase difference, so that interference can occur due to the fact that the two incident light beams meet interference conditions. The different optical paths of the two beams of light in the interference can be realized by adjusting the length of the interference arm and changing the refractive index of the medium, so that different interference patterns can be formed.
Since the broadband light source 10 is a divergent light source 10, the optical path is adjusted as needed by adding a focusing lens in front of the interferometer, which also serves as part of the interference assembly. Therefore, a first focusing lens 24, a second focusing lens 25, a third focusing lens 26 and a fourth focusing lens 27 are respectively disposed on the optical path between the light source 10, the first reflecting mirror, the second reflecting mirror, the frequency domain detecting device 30 and the splitting prism 21.
During detection, light is guided out from the broadband light source 10 by the optical fiber to become a divergent point light source 10, the divergent point light source is converged by the first focusing lens 24, and the light is split into two beams by the beam splitting prism 21. For convenience of illustration, the first reflecting mirror 22 is used as a sample mirror, and the second reflecting mirror 23 is used as a reference mirror. Before reaching the two reflectors, the light is focused into a point by the second focusing lens 25 and the third focusing lens 26 respectively, then is converged into a bundle of emergent light by the beam splitting prism 21 after being reflected by the first reflector and the second reflector, is converged into a point by the fourth focusing lens 27, and is transmitted to the spectrometer through the optical fiber. The spectrometer outputs the spectral signal of the interference signal to the data processor 40, and the data processor 40 performs fourier transform on the received signal to obtain the relative optical path difference between the two mirrors.
If the sample film 50 to be measured is added in front of the first reflector 22, the sample film 50 to be measured does not need to be attached to the first reflector 22, but only needs to be placed between the first reflector 22 and the second focusing lens 25, and then the second measurement is performed, and due to the addition of the sample film 50 to be measured, the relative optical path difference between the two reflectors is changed compared with the first measurement. If the refractive index of the sample film 50 to be measured is known, the thickness of the sample can be obtained by comparing the two relative optical path difference information.
Briefly explaining this embodiment with reference to an engineering embodiment, in this engineering embodiment, the center wavelength of the broadband light source 10 is 1327nm, the bandwidth is 70nm, and the spectrum of the interference signal of the broadband light source 10 received by the spectrometer is fourier transformed by the processor, that is, the optical path difference information of the sample mirror relative to the reference mirror is obtained when the sample film 50 to be measured is not added; then a layer of sample film 50 to be measured is placed between the first reflector 22 and the third focusing lens 26, the sample film 50 to be measured is perpendicular to the optical path, i.e. parallel to the reflector, and a second measurement is performed, and then the interference signal spectrum received by the spectrometer is subjected to fourier transform to obtain information of relative optical path difference. Comparing the optical path difference information of the two times, it can be seen that the optical path difference between the two reflectors changes due to the introduction of a layer of sample film 50 to be measured, and the two peak positions are the optical path difference positions of the sample mirror relative to the reference mirror during the two times of measurement. Then, the two relative optical path difference information are compared, and the two peak positions are respectively represented as x1 and x2, then: (n 2-n 1) × d = x2-x1; wherein n2 is the refractive index of the plastic sample film 50 to be measured, n1 is the refractive index of air, and d is the thickness of the sample film 50 to be measured.
If the refractive index of the sample film 50 to be measured is unknown, the sample film 50 to be measured can be rotated by an angle, and the optical path difference information of the sample mirror relative to the reference mirror at this time. The refractive index and thickness of the sample film 50 to be measured can be obtained by combining the optical path geometry information of the propagation of light at this time.
It should be noted that the various features described in the above embodiments may be combined in any suitable manner without departing from the scope of the invention. In order to avoid unnecessary repetition, the present invention does not separately describe various possible combinations.
Claims (8)
1. A thickness detection apparatus of a transparent film, comprising: the device comprises a light source, an interference component, a frequency domain detection device and a data processor;
the interference component is a Michelson interference device, the light source is arranged on an extension line of a central axis of a light entrance port of the Michelson interference device, the frequency domain detection device is arranged on an extension line of a central axis of a light exit port of the Michelson interference device, and the frequency domain detection device can acquire an interference signal generated by a light path after being reflected by the Michelson interference device and transmit the signal to the data processor;
and a sample film to be measured is placed between the beam splitter prism and the reflecting mirror of the Michelson interference device.
2. The apparatus according to claim 1, wherein the light entrance port central axis and the light exit port central axis are perpendicular to each other.
3. The apparatus for detecting the thickness of a transparent film according to claim 2, wherein the frequency domain detecting means is a spectrometer.
4. The apparatus of claim 1, wherein the michelson interference device comprises: the light source device comprises a light splitting prism, a first reflecting mirror and a second reflecting mirror, wherein the light splitting prism is positioned at the central position and is installed at a preset angle, the first reflecting mirror is arranged on one side far away from a light entrance port, and the second reflecting mirror is arranged on one side far away from a light exit port.
5. The apparatus according to claim 4, wherein a first focusing lens, a second focusing lens, a third focusing lens and a fourth focusing lens are disposed on the optical path between the light source, the first reflecting mirror, the second reflecting mirror, the frequency domain detecting device and the beam splitting prism, respectively.
6. The apparatus according to claim 5, wherein the sample film to be measured is placed in an optical path between the first reflecting mirror and the second focusing lens.
7. The apparatus for detecting the thickness of a transparent film according to claim 1, wherein the light source is a broadband light source.
8. The apparatus of claim 7, wherein the broadband light source has a center wavelength of 1327nm and a bandwidth of 70nm.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202221909136.0U CN217716309U (en) | 2022-07-24 | 2022-07-24 | Thickness detection equipment of transparent film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202221909136.0U CN217716309U (en) | 2022-07-24 | 2022-07-24 | Thickness detection equipment of transparent film |
Publications (1)
Publication Number | Publication Date |
---|---|
CN217716309U true CN217716309U (en) | 2022-11-01 |
Family
ID=83780403
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202221909136.0U Active CN217716309U (en) | 2022-07-24 | 2022-07-24 | Thickness detection equipment of transparent film |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN217716309U (en) |
-
2022
- 2022-07-24 CN CN202221909136.0U patent/CN217716309U/en active Active
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US6806965B2 (en) | Wavefront and intensity analyzer for collimated beams | |
CN113219640B (en) | Transmission-reflection type digital holographic microscopic system | |
CN109253801B (en) | Near-infrared polarization spectrum testing device and method | |
US6215596B1 (en) | Optical element, optical device provided therewith, and method for evaluating optical element | |
KR20180087691A (en) | Microspot spectroscopic ellipsometer with 4-reflectors | |
US5355210A (en) | Method and apparatus for measuring optical properties of optical devices | |
CN114812889A (en) | Large-caliber optical element stress detection device and detection method thereof | |
CN109580182A (en) | Curved optical device refractive index measurement method and device based on Brewster's law | |
CN217716309U (en) | Thickness detection equipment of transparent film | |
CN110631510B (en) | High-precision angle measuring device and method based on Michelson structure | |
CN109458959B (en) | Variable-inclination-angle phase-shift grazing incidence interferometer measuring device and method | |
US6486942B1 (en) | Method and system for measurement of a characteristic of lens | |
US11313789B2 (en) | Measurement system based on optical interference and measuring method using same | |
CN113804646B (en) | Near infrared Fourier transform polarization spectrometer | |
JPH0449642B2 (en) | ||
US4541720A (en) | Apparatus for phase symmetrizing optical wave fronts | |
CN212567516U (en) | Detection device | |
CN216900213U (en) | Flying spot scanning white light spectrum light splitting interferometer | |
CN217520426U (en) | Infrared broadband tunable Taeman-Green interferometer | |
KR20190106405A (en) | Parallel light generating arraratus for large area | |
CN212932371U (en) | Reflected light phase information characterization device | |
JP3470267B2 (en) | Symmetric X-type optical system | |
CN118089534A (en) | High-precision error calibration device for Fizeau interferometer | |
CN117629085A (en) | Online detection device and method for thickness and uniformity of film | |
CN112082602A (en) | Detection device and detection method thereof |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
GR01 | Patent grant | ||
GR01 | Patent grant |