CN217556284U - Wafer lifting mechanism of CVD equipment - Google Patents

Wafer lifting mechanism of CVD equipment Download PDF

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Publication number
CN217556284U
CN217556284U CN202221440548.4U CN202221440548U CN217556284U CN 217556284 U CN217556284 U CN 217556284U CN 202221440548 U CN202221440548 U CN 202221440548U CN 217556284 U CN217556284 U CN 217556284U
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China
Prior art keywords
cylinder
guide rod
guide arm
lifting mechanism
wall
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CN202221440548.4U
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Chinese (zh)
Inventor
禅明
李靖
黄善发
臧宇
王金
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Shengjisheng Semiconductor Technology Wuxi Co ltd
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Shengjisheng Semiconductor Technology Wuxi Co ltd
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Abstract

The utility model discloses a wafer lifting mechanism of CVD equipment relates to CVD vacuum coating equipment technical field, to current CVD equipment intracavity wafer lifting mechanism and adopt the cylinder direct-connected mode more, its drawback is firstly lift the in-process and probably produce rotatoryly, lead to the offset, secondly produce the problem of interfering to other spare parts of equipment, now propose following scheme, take guide arm cylinder one side outer wall screwed connection to have the cylinder fixed plate, take guide arm cylinder inner wall one side to be provided with first guide arm, take the guide arm cylinder to keep away from first guide arm one side inner wall and be provided with the second guide arm, the utility model has the advantages of it is following: the air inlet of the cylinder with the guide rod is used for ventilation, so that the piston rod moves upwards, the connecting rod does not rotate by utilizing the characteristic of the cylinder with the guide rod, the lifting corrugated pipe is driven to move upwards by the floating joint, and radial force cannot be generated between the connecting rod and the plastic bearing by utilizing the characteristic of the floating joint.

Description

Wafer lifting mechanism of CVD equipment
Technical Field
The utility model belongs to the technical field of CVD vacuum coating equipment technique and specifically relates to a novel wafer lifting mechanism.
Background
CVD vacuum coating refers to a method of forming a thin film by heating a metal or non-metal material under high vacuum to evaporate and condense it on the surface of a workpiece (metal, semiconductor or insulator), but in order to facilitate the coating work, it is usually performed by using a wafer lift apparatus.
The existing CVD equipment intracavity wafer lifting mechanism mostly adopts a cylinder direct connection mode, and has the defects that the lifting process can rotate to cause the problem of positioning deviation, and the direct connection of the cylinder causes the length to be increased to cause interference to other parts of equipment.
SUMMERY OF THE UTILITY MODEL
The to-be-solved technical problem of the utility model is that, current CVD equipment intracavity wafer lifting mechanism adopts the cylinder mode of directly alliing oneself with more, and its drawback is first to lift the in-process and probably to produce rotatoryly, leads to the location skew problem, and second directly connects the cylinder and leads to length increase, produces other spare parts to the equipment and interferes, so provides the wafer lifting mechanism of a CVD equipment, makes it solve above problem.
The utility model provides a technical scheme that technical problem adopted is: a wafer lift mechanism of a CVD apparatus, comprising: the air cylinder with the guide rod is characterized in that an air cylinder fixing plate is connected to the outer wall of one side of the air cylinder with the guide rod through screws, a first guide rod is arranged on one side of the inner wall of the air cylinder with the guide rod, a second guide rod is arranged on the inner wall of one side, away from the first guide rod, of the air cylinder with the guide rod, and the air cylinder with the guide rod is adopted to prevent rotation and deviation.
As a preferred technical scheme of the utility model, first guide arm bottom fixedly connected with base, base upper end fixed connection second guide arm is convenient for make the bellows that lifts rise through first guide arm and second guide arm.
As a preferred technical scheme of the utility model, base lower extreme one side fixedly connected with connecting plate, the connecting plate is kept away from and is taken guide arm cylinder one end to be provided with unsteady joint, is convenient for make through the connecting plate and takes guide arm cylinder and float and carry out fixed connection between the joint.
As a preferred technical scheme of the utility model, the unsteady joint upper end is provided with the connecting rod, is convenient for drive through unsteady joint and connecting rod and lifts bellows downstream.
As a preferred technical scheme of the utility model, cylinder fixed plate top is provided with the mount pad, the first backup pad of cylinder fixed plate upper end fixedly connected with is kept away from to the mount pad.
As a preferred technical scheme of the utility model, first backup pad upper end one side fixedly connected with lifts the bellows, lift bellows top end fixedly connected with second backup pad, first backup pad and second backup pad shape are circularly, take the guide arm cylinder through with lift bellows parallel mode to reduce occupation space.
The utility model has the advantages of it is following: the air inlet of the cylinder with the guide rod is used for ventilation, so that the piston rod moves upwards, the connecting rod does not rotate by utilizing the characteristic of the cylinder with the guide rod, the lifting corrugated pipe is driven to move upwards by the floating joint, and radial force cannot be generated between the connecting rod and the plastic bearing by utilizing the characteristic of the floating joint.
Drawings
Fig. 1 is a schematic structural diagram of a preferred embodiment of the present invention;
FIG. 2 is a schematic front view of the preferred embodiment of the present invention;
fig. 3 is a schematic side view of the preferred embodiment of the present invention.
Fig. 4 is a schematic view of a partial cross-sectional structure of a preferred embodiment of the present invention.
Description of reference numerals: 1. a cylinder with a guide rod; 2. a cylinder fixing plate; 3. a first guide bar; 4. a second guide bar; 5. a base; 6. a connecting plate; 7. a floating joint; 8. a connecting rod; 9. a mounting seat; 10. a first support plate; 11. lifting the bellows; 12. a second support plate.
Detailed Description
The technical solution of the present invention will be clearly and completely described with reference to the accompanying drawings. In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplification of description, but do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying a relative importance.
In the description of the present invention, it should be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected" and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood in specific cases to those skilled in the art.
The present invention will be further explained with reference to the accompanying drawings.
Referring to fig. 1-4, a wafer lifting mechanism of a CVD apparatus of the present invention includes: the guide rod-provided air cylinder 1 is provided with a guide rod, an air cylinder fixing plate 2 is in screwed connection with the outer wall of one side of the guide rod-provided air cylinder 1, the guide rod-provided air cylinder 1 is fixed through the air cylinder fixing plate 2, a first guide rod 3 is arranged on one side of the inner wall of the guide rod-provided air cylinder 1, a second guide rod 4 is arranged on the inner wall of one side, far away from the first guide rod 3, of the guide rod-provided air cylinder 1, and the first guide rod 3 and the second guide rod 4 are moved through the guide rod-provided air cylinder 1.
As shown in fig. 1 and fig. 2, the base 5 is fixedly connected to the bottom ends of the first guide rod 3 and the second guide rod 4, the connecting plate 6 is fixedly connected to the lower end of the base 5, the cylinder 1 with the guide rod is connected to the floating joint 7 through the connecting plate 6, the floating joint 7 is disposed on the upper side of the connecting plate 6, which is far away from the cylinder 1 with the guide rod, and the connecting rod 8 is disposed on one side of the upper end of the floating joint 7.
Wherein, mount pad 9 sets up in 2 top one sides of cylinder fixed plate, and first backup pad 10 sets up in mount pad 9 upper end one side, is convenient for make through floating joint 7 and connecting plate 6 and lifts 11 downstream of bellows, lifts bellows 11 and 10 upper end fixed connection of first backup pad, second backup pad 12 and 11 upper ends fixed connection of bellows that lift.
Specifically, the utility model discloses during the use, when needs operation lifting action, through taking guide arm cylinder 1, make and take 1 air inlet of guide arm cylinder to ventilate, thereby make the piston rod upward movement, simultaneously by connecting plate 6, unsteady joint 7 drives lifting bellows 11 upward movement, thereby utilize the characteristic of taking the guide arm cylinder, it is rotatory not to make the connecting rod produce, when needs reset, can ventilate for taking 1 other air inlet of guide arm cylinder, thereby make the piston rod downstream, simultaneously by connecting plate 6, unsteady joint 7 drives lifting bellows 11 downward movement, thereby be convenient for lift and reset, utilize the characteristic that unsteady connects, can not produce radial force between messenger's connecting rod and the plastic bearing.
The foregoing is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, a plurality of improvements and decorations can be made without departing from the principle of the present invention, and these improvements and decorations should also be regarded as the protection scope of the present invention.
Other parts not described in detail in the present invention belong to the prior art, and are not described herein again.
Finally, it should be noted that: the above embodiments are only used to illustrate the technical solution of the present invention, and not to limit the same; although the present invention has been described in detail with reference to the foregoing embodiments, it should be understood by those skilled in the art that: the technical solutions described in the foregoing embodiments may still be modified, or some or all of the technical features may be equivalently replaced; such modifications and substitutions do not depart from the spirit and scope of the present invention.

Claims (6)

1. A wafer lifting mechanism of a CVD apparatus, comprising: the guide rod-equipped air cylinder (1) is characterized in that an air cylinder fixing plate (2) is connected to the outer wall of one side of the guide rod-equipped air cylinder (1) in a screwed mode, a first guide rod (3) is arranged on one side of the inner wall of the guide rod-equipped air cylinder (1), and a second guide rod (4) is arranged on the inner wall of one side, far away from the first guide rod (3), of the guide rod-equipped air cylinder (1).
2. The wafer lifting mechanism of CVD equipment, according to claim 1, wherein the bottom of the first guide rod (3) is fixedly connected with a base (5), and the upper end of the base (5) is fixedly connected with the second guide rod (4).
3. The wafer lifting mechanism of CVD equipment, according to claim 2, wherein a connecting plate (6) is fixedly connected to one side of the lower end of the base (5), and a floating joint (7) is arranged at one end of the connecting plate (6) far away from the cylinder (1) with the guide rod.
4. A wafer lifting mechanism of CVD apparatus according to claim 3, wherein a connection rod (8) is provided at an upper end of the floating joint (7).
5. The wafer lifting mechanism of CVD equipment, as recited in claim 1, wherein the top of the cylinder fixing plate (2) is provided with a mounting seat (9), and a first supporting plate (10) is fixedly connected to the mounting seat (9) far away from the upper end of the cylinder fixing plate (2).
6. The wafer lifting mechanism of CVD equipment according to claim 5, wherein a lifting bellows (11) is fixedly connected to one side of the upper end of the first support plate (10), a second support plate (12) is fixedly connected to the top end of the lifting bellows (11), and the first support plate (10) and the second support plate (12) are both circular.
CN202221440548.4U 2022-06-10 2022-06-10 Wafer lifting mechanism of CVD equipment Active CN217556284U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202221440548.4U CN217556284U (en) 2022-06-10 2022-06-10 Wafer lifting mechanism of CVD equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202221440548.4U CN217556284U (en) 2022-06-10 2022-06-10 Wafer lifting mechanism of CVD equipment

Publications (1)

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CN217556284U true CN217556284U (en) 2022-10-11

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117660922A (en) * 2023-11-29 2024-03-08 江苏协鑫特种材料科技有限公司 Vapor deposition furnace for silicon carbide coating production
CN118073268A (en) * 2024-04-22 2024-05-24 盛吉盛半导体科技(无锡)有限公司 Wafer lifting device and wafer lifting method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117660922A (en) * 2023-11-29 2024-03-08 江苏协鑫特种材料科技有限公司 Vapor deposition furnace for silicon carbide coating production
CN118073268A (en) * 2024-04-22 2024-05-24 盛吉盛半导体科技(无锡)有限公司 Wafer lifting device and wafer lifting method

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