CN217505700U - Device for measuring horizontal heights of multiple samples on scanning electron microscope sample stage - Google Patents

Device for measuring horizontal heights of multiple samples on scanning electron microscope sample stage Download PDF

Info

Publication number
CN217505700U
CN217505700U CN202220641158.7U CN202220641158U CN217505700U CN 217505700 U CN217505700 U CN 217505700U CN 202220641158 U CN202220641158 U CN 202220641158U CN 217505700 U CN217505700 U CN 217505700U
Authority
CN
China
Prior art keywords
sample
measuring
measuring device
scanning electron
electron microscope
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
CN202220641158.7U
Other languages
Chinese (zh)
Inventor
朱欣欣
程雅琳
李紫燕
党娟
许明哲
徐艳丽
梁栋
杜国强
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kaifeng Times New Energy Technology Co ltd
Original Assignee
Kaifeng Times New Energy Technology Co ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kaifeng Times New Energy Technology Co ltd filed Critical Kaifeng Times New Energy Technology Co ltd
Priority to CN202220641158.7U priority Critical patent/CN217505700U/en
Application granted granted Critical
Publication of CN217505700U publication Critical patent/CN217505700U/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

The utility model relates to a scanning electron microscope tests technical field, specific measure device of a plurality of sample level on scanning electron microscope sample bench that says so, including measuring device base, two bracing pieces and detachable upper portion measuring disc, the measuring device base is circular structure, and two bracing pieces all are vertical setting. The utility model has the advantages that: the utility model discloses simple structure, the required raw materials of accessory are cheap easily to be obtained, and the equipment is convenient, and measuring device's stability is good, and the practicality is strong. The utility model discloses measuring device possesses following function: the highest points of a plurality of samples with different heights can be adjusted to the same horizontal plane; and measuring the real height of the fixed sample scanning electron microscope test sample stage. The problem that samples placed on the sample table at different heights cannot be tested at the same time by using a small working distance can be solved. The real height of the sample and the sample stage system is measured by the testing device, and the safe distance that the sample stage can ascend to the minimum working distance and can not collide with the pole shoe of the lens cone can be set.

Description

Device for measuring horizontal heights of multiple samples on scanning electron microscope sample stage
Technical Field
The utility model relates to a scanning electron microscope tests technical field, a measure device of a plurality of sample level on scanning electron microscope sample bench specifically says so.
Background
The scanning electron microscope has high resolution as a tool for analyzing and testing the microscopic morphology of the material, and is increasingly widely applied to observation of micro-nano materials. With the development of novel materials, the research on the microscopic nano-scale of the materials is gradually increased, so that a scanning electron microscope is required to shoot a higher-resolution and clearer microscopic morphology image.
The Working distance of a scanning electron microscope (scanning distance) refers to the distance from the convergence point of an electron beam to the pole shoe of a lens cone of the scanning electron microscope. The electron beam emitted by the scanning electron microscope bombards the surface of the sample to generate various signals, wherein the incident electrons and the electrons with weak valence of constraint in the sample generate inelastic collision so that the electrons with weak valence of constraint are escaped to form secondary electrons. The secondary electron generation area is 5-10 nm thick on the surface of the sample, and the secondary electron generation area is small and has higher resolution. With the research on the micro-nano morphology of the sample, the requirement for the scanning electron microscope to shoot high-resolution images is higher and higher. For secondary electron imaging, the smaller the working distance, the higher the resolution, which is generally the case without changing other conditions. Therefore, when a high-power and high-resolution picture needs to be taken, the smaller the working distance of the scanning electron microscope, the better. Scanning electron microscopes from some manufacturers of scanning electron microscopes (e.g., Zeiss/FEI/TESCAN) are typically equipped with a sample stage base, and a plurality of nail-shaped sample stages containing samples can be fixed on the nail-shaped sample stage base and simultaneously placed in the electron microscope for testing. Under the condition that only a single nail-shaped sample table is arranged on a nail-shaped sample table base, the test can be carried out within a very small working distance, but for a plurality of samples which are not on the same horizontal plane, when a lower sample is observed at a closer working distance, the higher sample has the risk of touching a pole shoe of a scanning electron microscope and other detectors. Therefore, the test can be carried out in batches only, and then the sample needs to be replaced, and the vacuum is pumped for multiple times, so that the working efficiency is reduced. In addition, when a sample is replaced at a short working distance for testing, due to the fact that the sample height is different, if the sample platform is directly rotated to the position of the sample to be tested, a high sample can collide with the objective lens pole shoe, the sample platform can only be lowered firstly and then ascended to the required working distance after the sample is refocused, the working efficiency is low, and if the sample height is strictly on the same horizontal plane, the problems can be avoided. Based on these circumstances, the utility model relates to a measuring device can accurately measure whether a plurality of co-altitude samples can be at same horizontal plane to can test multiple co-altitude samples safely under minimum working distance (< 3 mm).
SUMMERY OF THE UTILITY MODEL
To the problem among the prior art, the utility model provides a can accurate measurement scanning electron microscope sample platform not device at same horizontal plane of co-altitude sample for overcome defect among the prior art, the utility model discloses the core purpose of measuring device design will be fixed on the nail shape sample bench co-altitude sample micro-adjustment arrives same horizontal plane, guarantees under the condition that the sample platform can not collide the objective pole shoe, can rise to minimum working distance, and then can shoot high magnification and high resolution picture.
The utility model provides a technical scheme that its technical problem adopted is: a device for measuring the horizontal heights of a plurality of samples on a sample table of a scanning electron microscope comprises a measuring device base, two supporting rods and a detachable upper measuring disc, wherein the measuring device base is of a circular structure, the two supporting rods are vertically arranged and are respectively arranged at the edges of two sides of the measuring base, and the upper measuring disc is arranged between the two supporting rods;
the middle part of the upper measuring disc is of a circular structure, and two sides of the upper measuring disc are provided with sliding blocks;
the middle parts of the two support rods are provided with grooves matched with the sliding blocks.
The utility model discloses a further technological improvement lies in: the diameter of measuring device base is 70mm, and the height of measuring device base is 10mm, and measuring device base material can select plastics or metal for use, and the base surfacing.
The utility model discloses a further technological improvement lies in: the upper end face of the measuring device base is horizontally arranged, and a clamping groove matched with the sample table base is formed in the upper end of the measuring device base.
The utility model discloses a further technological improvement lies in: two sliders all are "L" shape structure, and two sliders cup joint respectively in the recess of two bracing pieces, and two bracing pieces are evenly fixed on circular base's edge. For supporting the upper levelling disk.
The utility model discloses a further technological improvement lies in: the height of bracing piece is 75mm, and the bottom width is 8mm, and bottom length is 8mm, and the bracing piece lateral wall is provided with the scale.
The utility model discloses a further technological improvement lies in: the height of recess is 75mm, and the width is 5mm, and length is 5 mm.
The utility model discloses a further technological improvement lies in: the diameter of the upper measuring disc is 50mm, and the thickness is 2 mm.
The using method of the device specifically comprises the following steps:
the method comprises the following steps: firstly, fixing a sample A, a sample B and a sample C on three nail-shaped sample tables respectively by using carbon conductive adhesive tapes, then placing the nail-shaped sample tables for fixing the samples on bases of the nail-shaped sample tables, and fixing the sample A on the center of the bases of the nail-shaped sample tables;
step two: the upper measuring disc is slightly shifted downwards while the descending position of the upper measuring disc is observed, so that the upper measuring disc descends to the position right above the central sample A, and the sample is ensured to be contacted and not extruded;
step three: and then, lifting the nail-shaped sample stage of the sample B by using tweezers to enable the nail-shaped sample stage to be in contact with the upper measuring disc, fixing the nail-shaped sample stage on a nail-shaped sample stage base by using a screwdriver, fixing the sample C by using the same operation, enabling the highest parts of the three samples to be on the same horizontal plane, recording the position of the upper measuring disc at the moment, wherein the height is the real height of the whole system of the sample stage after the sample is fixed, and after the test is finished, putting the sample stage into a scanning electron microscope warehouse to perform subsequent test.
Compared with the prior art, the beneficial effects of the utility model are that:
the utility model discloses simple structure, the required raw materials of accessory are cheap easily to be obtained, and the equipment is convenient, and measuring device's stability is good, and the practicality is strong. The utility model discloses measuring device possesses following function: the highest points of a plurality of samples with different heights can be adjusted to the same horizontal plane; and measuring the real height of the fixed sample scanning electron microscope test sample stage. The problem that samples placed on the sample table at different heights cannot be tested at the same time by using a small working distance can be solved. The real height of the sample and the sample stage system is measured by the testing device, and the safe distance that the sample stage can ascend to the minimum working distance and can not collide with the pole shoe of the lens cone can be set.
Drawings
The present invention will be further described with reference to the accompanying drawings and examples.
Fig. 1 is a schematic view of the overall structure of the present invention.
Fig. 2 is a top view of the whole structure of the present invention.
Fig. 3 is a front view of the support rod of the present invention.
Fig. 4 is a top view of the support rod of the present invention.
Fig. 5 is a top view of the upper measuring disk.
Fig. 6 is a front view of the upper measuring pan.
In the figure: 1. a measuring device base; 2. a support bar; 3. an upper measuring pan; 4. a sample stage base; 5. a groove; 6. a slide block.
Detailed Description
In order to make the technical means, creation features, achievement purposes and functions of the present invention easy to understand and understand, the present invention is further described below with reference to the following embodiments.
As shown in fig. 1-6, the device for measuring the horizontal heights of a plurality of samples on a sample stage of a scanning electron microscope of the present invention comprises a measuring device base 1, two support rods 2 and a detachable upper measuring disc 3, wherein the measuring device base 1 is of a circular structure, the two support rods 2 are both vertically arranged, the two support rods 2 are respectively arranged at the edges of the two sides of the measuring base, the upper measuring disc 3 is arranged between the two support rods 2, the disc of the upper measuring disc 3 is made of a plastic material, and the disc is transparent and not easy to deform;
the middle part of the upper measuring disc 3 is of a circular structure, and two sides of the upper measuring disc 3 are provided with sliding blocks 6;
the middle parts of the two support rods 2 are provided with grooves 5 matched with the sliding blocks 6.
The utility model discloses in an optional implementation of embodiment, measuring device base 1's diameter is 70mm, and measuring device base 1's height is 10mm, and measuring device base 1 material can select plastics or metal for use, and base surfacing.
The utility model discloses in an optional implementation of embodiment, measuring device base 1 up end is the level setting, and measuring device base 1 upper end be provided with the draw-in groove of 4 looks adaptations of sample platform base.
The utility model discloses in an optional implementation of embodiment, two sliders 6 all are "L" shape structure of falling, and two sliders 6 cup joint respectively in the recess 5 of two bracing pieces 2, and two bracing pieces 2 are evenly fixed on circular base's edge. The supporting rod is hollow and is used for supporting the upper leveling disk, and the sliding block 6 of the upper measuring disk 3 can freely slide up and down in the supporting rod 2. The support rod is marked with scales and used for accurately measuring the real height of the sample table after the sample is fixed.
The utility model discloses in an optional implementation of embodiment, the height of bracing piece 2 is 75mm, and the bottom width is 8mm, and bottom length is 8mm, and 2 lateral walls of bracing piece are provided with the scale.
In an optional implementation manner of the embodiment of the present invention, the height of the groove 5 is 75mm, the width is 5mm, and the length is 5 mm.
In an optional implementation manner of the embodiment of the present invention, the diameter of the upper measuring disc 3 is 50mm, and the thickness is 2 mm.
When the device for measuring the horizontal heights of a plurality of samples on the sample table of the scanning electron microscope is used, a nail-shaped sample table (commercial) with the diameter of 12.5mm is taken as an example, a nail-shaped sample table base 4 capable of placing a plurality of nail-shaped sample tables is taken as an example (a nail-shaped sample table with the diameter of 46mm and the height of 9mm is taken as an example, commercial), and the device can adjust the samples with the height difference within 5mm to the same horizontal plane. First, sample a (5 mm high), sample B (3 mm high), and sample C (2mm high) were fixed on three nail-shaped sample stages with carbon conductive tapes, respectively. These sample-fixing nail-shaped sample stages were then placed on the nail-shaped sample stage base 4, and sample a (5 mm high) was fixed on the center of the nail-shaped sample stage base 4. While slightly poking the upper measuring disc 3 downwards, the position of the upper measuring disc 3 descending is observed, so that the upper measuring disc 3 descends to the position right above the central sample A (with the height of 5mm), and the contact with the sample is ensured without extruding the sample. Then, the nail-shaped sample stage of the sample B (height 3mm) is lifted by tweezers to contact the upper measuring plate 3, and then the nail-shaped sample stage is fixed on the base of the nail-shaped sample stage by a screwdriver. The sample C (2mm high) is fixed by the same operation, at the moment, the highest parts of the three samples are on the same horizontal plane, and the position of the upper measuring disc 3 at the moment is recorded, and the height is the real height of the whole system of the sample table after the sample is fixed. After the test is finished, the sample stage can be placed in a scanning electron microscope chamber for subsequent test.
The foregoing illustrates and describes the principles, general features, and advantages of the present invention. It should be understood by those skilled in the art that the present invention is not limited to the above embodiments, and the description in the above embodiments and the specification is only for explaining the principle of the present invention, and that the present invention can also have various changes and modifications without departing from the spirit and scope of the present invention, and these changes and modifications all fall into the scope of the present invention as claimed. The scope of the invention is defined by the appended claims and equivalents thereof.

Claims (7)

1. The utility model provides a device for measuring scanning electron microscope sample bench is a plurality of sample level, includes measuring device base (1), two bracing pieces (2) and detachable upper portion measuring disk (3), its characterized in that: the measuring device comprises a measuring device base (1), two supporting rods (2), an upper measuring disc (3) and a lower measuring disc, wherein the measuring device base (1) is of a circular structure, the two supporting rods (2) are vertically arranged, the two supporting rods (2) are respectively arranged at the edges of two sides of the measuring base, and the upper measuring disc (3) is arranged between the two supporting rods (2);
the middle part of the upper measuring disc (3) is of a circular structure, and two sides of the upper measuring disc (3) are provided with sliding blocks (6);
the middle parts of the two support rods (2) are provided with grooves (5) matched with the sliding blocks (6).
2. The apparatus according to claim 1, wherein the apparatus comprises: the diameter of the measuring device base (1) is 70mm, and the height of the measuring device base (1) is 10 mm.
3. The apparatus according to claim 2, wherein the apparatus comprises: the upper end face and the lower end face of the measuring device base (1) are both horizontally arranged, and a clamping groove matched with the sample table base (4) is formed in the upper end of the measuring device base (1).
4. The apparatus according to claim 1, wherein the apparatus comprises: the two sliding blocks (6) are both in an inverted L-shaped structure, and the two sliding blocks (6) are respectively sleeved in the grooves (5) of the two supporting rods (2).
5. The apparatus according to claim 1, wherein the apparatus comprises: the height of bracing piece (2) is 75mm, and the bottom width is 8mm, and bottom length is 8mm, and bracing piece (2) lateral wall is provided with the scale.
6. The apparatus according to claim 4, wherein the apparatus comprises: the height of recess (5) is 75mm, and the width is 5mm, and length is 5 mm.
7. The apparatus according to claim 3, wherein the apparatus comprises: the diameter of the upper measuring disc (3) is 50mm, and the thickness of the upper measuring disc is 2 mm.
CN202220641158.7U 2022-03-23 2022-03-23 Device for measuring horizontal heights of multiple samples on scanning electron microscope sample stage Active CN217505700U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202220641158.7U CN217505700U (en) 2022-03-23 2022-03-23 Device for measuring horizontal heights of multiple samples on scanning electron microscope sample stage

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202220641158.7U CN217505700U (en) 2022-03-23 2022-03-23 Device for measuring horizontal heights of multiple samples on scanning electron microscope sample stage

Publications (1)

Publication Number Publication Date
CN217505700U true CN217505700U (en) 2022-09-27

Family

ID=83347295

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202220641158.7U Active CN217505700U (en) 2022-03-23 2022-03-23 Device for measuring horizontal heights of multiple samples on scanning electron microscope sample stage

Country Status (1)

Country Link
CN (1) CN217505700U (en)

Similar Documents

Publication Publication Date Title
US20130090778A1 (en) Method for the collision-free positioning of a micromanipulator tool
CN109411381A (en) Focusing method and wafer detecting apparatus in wafer characterization processes
CN217505700U (en) Device for measuring horizontal heights of multiple samples on scanning electron microscope sample stage
CN111521103A (en) Method and device for detecting flatness of crystal bar
CN111750801A (en) Offline non-contact steel plate type evaluation method and measurement platform
CN114624269A (en) Device for measuring horizontal heights of multiple samples on scanning electron microscope sample stage
CN212300252U (en) Image measuring instrument capable of automatically adjusting position of sample to be measured
US20180259555A1 (en) Prober and method for positioning probe tip and obtaining probe and polishing sheet contact data
CN110146028B (en) Silver colloid measuring equipment and measuring method
CN204731151U (en) The device of laser measurement nucleopore membranes uniformity coefficient
CN110736416A (en) Flatness detection ruler and method for prefabricated shear wall
CN111103125A (en) Device and method for testing angle of field of endoscope under rectangular field of view
CN211552761U (en) Silicon chip angularity testing arrangement
CN215810611U (en) Sheet metal covering part surface pit depth measuring device
CN210923106U (en) Simple kitchen equipment horizontal testing device
CN212779161U (en) Crystal ingot measuring device
CN113253417A (en) Automatic leveling and automatic focusing method for bone marrow smear scanning
CN217930094U (en) Special altimeter for sapphire detection
CN111623709A (en) Image measuring instrument capable of automatically adjusting position of sample to be measured and measuring method
CN115790840B (en) Device and method for testing illumination of operation shadowless lamp
CN219590199U (en) Inspection device for lens transmittance
CN217637243U (en) Automatic detection system for surface roughness of wafer
CN219977325U (en) Even image measuring apparatu of illumination
CN219842361U (en) Sample supporting device for X-ray fluorescence spectrometer
CN205374197U (en) Portable microstructure observes and tests all -in -one with vickers hardness

Legal Events

Date Code Title Description
GR01 Patent grant
GR01 Patent grant